Presentations -
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Wide Area and High Rate Deposition of Graphitic Carbon by Surface Wave Plasma
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Temporal Variation of Accumulated Charge at the Bottom of High Aspect Hole in Pulse-modulated Capacitively-Coupled Plasma
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グロー放電水素プラズマを用いたスズ-水素プラズマ相互作用の基礎研究
田村 晃汰
ダイバータの学理と応用 NIFS
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A Deuterium Distribution Measurement in Deuterium Plasma Exposed-Tin
Kota Tamura1), Haruka Suzuki1), Suguru Masuzaki2), Masayuki Tokitani2), Junichi Miyazawa2), Hirotaka Toyoda1,2) 1)Nagoya Univ., 2) NIFS
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High speed and wide area conductive carbon film deposition by surface-wave plasma.
H.Bae 1), K.Hikita 1), H.Suzuki 1) 2), K.Sasai 2), H.Toyoda 1) 2) 3) (1) Department of electronics, Nagoya univ., (2) Center for Low-temperature Plasma Sciences(cLPS), Nagoya univ., (3) National Institute for Fusion Science(NIFS)
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Surface treatment of resin material by pulsed microwave atmospheric pressure Ar/O2 plasma
OGASAWARA Tomohiro1), SUZUKI Haruka1), TOYODA Hirotaka1,2) (1)Nagoya Univ.,2)NIFS)
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Evaluation of charge density at the bottom of the capillary plate in a pulse modulated dual frequency CCP International conference
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Application of atmospheric pressure microwave plasma to large area and high-speed surface treatment
2020.12.3
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Quantitative Evaluation of Hydrogen Retention of Solid and Liquid Tin by Thermal Desorption Spectroscopy International conference
Kota TAMURA1, Haruka SUZUKI1, Junichi MIYAZAWA2, Suguru MASUZAKI2, Hirotaka TOYODA1;2 1. Nagoya University
The 29th International Toki Conference on Plasma and Fusion Research
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Evaluation of absolute charge density at the bottom of hole pattern using high aspect ratio capillary plate International conference
MAKOTO MORIYAMA, NAOYA NAKAHARA, HARUKA SUZUKI,HIROTAKA TOYODA
GEC20 Meeting of The American Physical Society、RW3.4
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Film Surface Treatment with O2/Ar Line Plasma under Atmospheric Pressure International conference
Haruka Suzuki, Hirotsugu Koma, Tomohiro Ogasawara, Manh Hung Chu, Hirotaka Toyoda
GEC20 Meeting of The American Physical Society、LT3.00007 2020.10.6
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パルス変調容量結合型プラズマにおけるキャピラリープレート下部の電荷密度変化
中原 尚哉 ,森山 誠 ,鈴木 陽香 ,豊田 浩孝
第81回応用物理学会秋季学術講演会
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Time-resolved measurement of charge density at the bottom of capillary plate in a pulse modulated CCP
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Ag Particle Behavior in an Inductively Coupled Plasma
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Surface Hydrophilic Treatment by Microwave Line Plasma at Atmospheric Pressure
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Heat flux evaluation of the atmospheric pressure microwave line plasma from spatio-temporal temperature measurement of the slot-plate
(M2) Manh Hung Chu1, Haruka Suzuki1, Hirotaka Toyoda1
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Suppression of redissolution of p lasma synthesis silver nanoparticles using alkaline agent
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Absolute charge density evaluation of a capillary plate in a pulse modulated CCP
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Estimation of voltage at the top of capillary plate in a CCP
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Temperature measurement of slot-plate in an atmospheric-pressure microwave linear plasma International conference
ISPlasma/IC-PLANTS2020