Presentations -
-
Improvement of Silicon Thin Film Quality for Photovoltaic Cells by Newly-developed Microwave Antenna International conference
YUKI ITO, JUNJI SAKAI, TASTUO ISHIJIMA AND HIROTAKA TOYODA
3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
-
Flowing Liquid Treatment by Microwave Plasma under Reduced Pressure Condition International conference
KOJI KANETAKE, TATSUO ISHIJIMA AND HIROTAKA TOYODA
3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
-
Improvement of Adhesion Strength between Polyimide and Copper Foil by High Density Plasma Treatment Invited International conference
T. Ishijima, K. Usami, H. Toyoda
11th International Symposium on Biomimetic Materials Processing(BWWMP-11)
-
Evaluation of Absolute SiH3 Radical Density in H2/SiH4 Surface Wave Exited Plasma International conference
M. Ikeda, T. Kuroda, T. Ishijima, and H. Toyoda
The 12th International Workshop of Advanced Plasma Processing and Diagnostics
-
Time and Space Resolved Measurement of Microwave Electric Field in Atmospheric Pressure Plasma Invited International conference
H. Toyoda, A. Kamata, T. Murase, T. Ishijima
The 12th International Workshop of Advanced Plasma Processing and Diagnostics
-
表面波プラズマ処理によるCu膜とポリイミドフィルムの密着性向上
宇佐見健二，石島達夫，豊田浩孝
第20日本MRS学術シンポジウム
-
Organic Solute Decomposition in Water using Microwave Plasma
T. Ishijima, K. Kanetake and H. Toyoda
-
Diagnostics of atmospheric pressure plasma by space and time-resolved Stark broadening Invited International conference
H. Toyoda, A. Kamata, T. Murase, and T. Ishijima
The 2nd International Plasma Nanoscience Symposium
-
Microwave H2/SiH4 PCVD by Modified Microwave Antenna for Improvement of Silicon Film Quality International conference
J. Sakai, Y. Ito, T. Ishijima, H. Toyoda
The 32nd International Symposium on Dry Process
-
RFマグネトロンプラズマにおける高エネルギー粒子の挙動 Invited
豊田 浩孝 , 後藤 和也，石島 達夫
第26回九州・山口プラズマ研究会
-
マグネトロンプラズマ中の高エネルギー負イオン計測 Invited
豊田 浩孝
真空・表面科学合同講演会
-
プラズマ計測：電気的計測
豊田 浩孝
第21回プラズマエレクトロニクス講習会
-
Influences of Liquid Temperature and Pressure on Microwave-Excited Bubble Plasma Production International conference
T. Ishijima, R. Saito, K. Kanetake, H. Toyoda
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
Formation of High Energy Oxygen Species in RF Magnetron Sputter Plasma International conference
K. Goto, T. Ishijima, T. Morita, K. Ono, N. Ohshima, K. Kinoshita, H. Toyoda
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
Study on modified surface layer of photoresist employing fluorocarbon ion beam and radicals International conference
Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
Synthesis of High Quality SiO2 Film by Capacitively-Coupled Plasma CVD with Comb-Type Electrodes International conference
Takahiro Hiramatsu, Tokiyoshi Matsuda, Toshiyuki Kawaharamura, Mamoru Furuta, Takashi Hirao, Koji Kanetake, Hirotaka Toyoda
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
Space- and Time-Resolved Measurement of Hb Emission Spectrum in Atmospheric-pressure Pulsed Microwave Plasma International conference
Azumi Kamata, Takuya Murase, Tatsuo Ishijima and Hirotaka Toyoda
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
Absolute Density Measurement of SiHx Radicals in SiH4/H2 Microwave Plasma by Modified Appearance Mass Spectrometry International conference
T. Kuroda, M. Ikeda, T. Ishijima and H. Toyoda
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
Capacitively Coupled Plasma Source with Comb-Type Electrodes for Uniform Plasma Processing International conference
Hirotaka Toyoda, Koji Kanetake, Takahiro Hiramatsu, Tokiyoshi Matsuda, Toshiyuki Kawaharamura, Mamoru Furuta, Takashi Hirao
7th International Conference on Reactive Plasmas, 28th Symposium on Plasma Processing and 63rd Gaseous Electronics Conference
-
フルオロカーボンプラズマビームによるフォトレジスト表面改質層の解析
竹内拓也、尼崎新平、竹田圭吾、石川健治、近藤博基、豊田浩孝、関根誠、康松潤、沢田郁夫、堀勝
第71回応用物理学会学術講演会