講演・口頭発表等 - 豊田 浩孝
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Deposition of Microcrystalline Silicon Thin Film by 915 MHz Microwave Plasma CVD
J. Sakai, T. Ishijima, H. Toyoda
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Periodic Peal Structure on O- Energy Distribution in RF Magnetron Plasma
K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kinoshita, H. Toyoda
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Analysis of the surface reactions of ArF photoresist during fluorocarbon plasma etching by XPS 国際会議
Takuya Takeuchi, Makoto Sekine, Hirotaka Toyoda, Keigo Takeda, Masaru Hori, Song-Yun Kang, Ikuo Sawada
62nd Annual GEC
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Spatial variation of O− Energy distribution in an RF magnetron plasma 国際会議
H. Toyoda, K. Goto, T. Ishijima, N. Ohshima, K. Kinoshita
62nd Annual GEC
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Temporal variation of plasma density in atmospheric pressure 国際会議
H. Toyoda, H. Yang, T. Ishijima
62nd Annual GEC
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2次元大面積プラズマ生成用表面波の並列励起
平成18年度電気関係学会東海支部連合大会
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TIME-DEPENDENT PLASMA-DENSITY MEASUREMENT OF ATMOSPHERIC-PRESSURE PULSED-MICROWAVE PLASMA BY STARK BROADENING 国際会議
H. Toyoda, H. Yang, T. Ishijima
7th International Workshop on "Microwave Discharges: Fundamentals and Applications"
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SIH4 GAS DISSOCIATION PROCESS IN HIGH-DENSITY MICROWAVE PLASMA FOR SILICON FILM DEPOSITION 国際会議
T. Ishijima, H. Asano, J. Sakai, T. Kuroda, M. Ikeda, H. Toyoda
7th International Workshop on "Microwave Discharges: Fundamentals and Applications"
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Time-dependent measurement of plasma density in atmospheric-pressure microwave plasma using Stark broadening 国際会議
H. Toyoda, H. Yang, T. Ishijima
International Conference on Plasma Surface Engineering (AEPSE2009)
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Monosilane Dissociation Process in Microwave-Excited High-Density H2/SiH4 Plasma 国際会議
H. Asano, H. Endo, T. Ishijima and H. Toyoda
The 31th International Symposium on Dry Process
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TOC Evaluation of Organic Solute Treated by Microwave-Excited Bubble Plasma 国際会議
R. Saito, H. Sugiura, T. Ishijima and H. Toyoda
The 31th International Symposium on Dry Process
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Temporal Variation of Hydrogen Atom Spectrum Emitted from Pulsed Microwave Plasma under Atmospheric Pressure 国際会議
H. Yang, T. Ishijima, and H. Toyoda
The 31th International Symposium on Dry Process
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Investigation of photoresist surface modeified layer by fluorocarbon ion ombardment 国際会議
T. Takeuchi, M. Sekine, H. Toyoda, K. Takeda, M. Hori, S-Y. Kang, I. Sawada
The 31th International Symposium on Dry Process
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Energy distribution of oxygen negative ion in an RF magnetron plasma 国際会議
H. Toyoda, K. Goto, T. Ishijima, N. Ohshima, K. Kinoshita
2nd International Conference on Microelectronics and Plasma Technology(ICMAP 2009)
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Rapid Improvement of Polymer Film Adhesion by High Density Plasma 国際会議
Y. Gunjo, K. Goto, T. Ishijima, H. Toyoda, K. Iseki, and H. Sugai
International Conference on Plasma Surface Engineering (AEPSE2009)
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High-density microwave plasma for fabrication of silicon thin film solar cells 招待有り 国際会議
Hirotaka Toyoda
International Conference on Plasma Surface Engineering (AEPSE2009)
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マイクロ波プラズマCVD における基板への熱流束評価
坂井 淳二，石島 達夫，豊田 浩孝
平成21年度電気関係学会東海支部連合大会
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微結晶シリコン薄膜堆積用SiH4/H2 マイクロ波プラズマの気相診断
黒田 俊之，石島 達夫，豊田 浩孝
平成21年度電気関係学会東海支部連合大会
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酸化物ターゲットRF マグネトロンプラズマにおける高エネルギー酸素負イオンの空間分布計測
後藤 和也，石島 達夫，大嶋 則和，木下 啓藏，豊田 浩孝
平成21年度電気関係学会東海支部連合大会
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915MHz表面波プラズマCVDにおける高付着性ラジカルの抑制
浅野弘嗣、池田昌平、石島達夫、豊田浩孝
第70回応用物理学会学術講演会