講演・口頭発表等 - 豊田 浩孝
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マイクロ波励起プラズマを用いた有機物含有流体処理におけるプロセスの高効率化
金武 浩司，石島 達夫，豊田 浩孝
第72回応用物理学会学術講演会
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Flowing Liquid Treatment by Microwave Plasma 国際会議
K. Kanetake, T. Ishijima, and H. Toyoda
The 13th International Workshop on Advanced Plasma Processing and Diagnostics
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Spatiotemporal measurement of microwave electric field in an atmospheric pressure microwave plasma 招待有り 国際会議
Hirotaka Toyoda, Takuya Murase, Tasuo Ishijima
The 13th International Workshop on Advanced Plasma Processing and Diagnostics
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Behavior of High Energy Negative Ions in RF Magnetron Sputtering Plasma 招待有り
H. Toyod, T. Ishijima, K. Ono, T. Morita, N. Ohshima, K. Kinoshita
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Flowing Liquid Treatment by Microwave Plasma under Reduced Pressures
Koji Kanetake, Tatsuo Ishijima and Hirotaka Toyoda
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Time- and Space-Resolved Characteristics of Ozone Concentration in Atmospheric Pressure Plasma using Ultra Short Pulses 国際会議
T. Murase, A. Kamata, T. Ishijima, Y. Kinoshita, H. Kawauchi, K. Yoshida, and H. Toyoda
The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011)
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Enhancement of Polyimide/Copper Film Adhesion by Dense Carbon Interlayer using Microwave Plasma CVD 国際会議
K. Usami, T. Ishijima, and H. Toyoda
The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011)
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RFマグネトロン・スパッタリング法で作製したMgO障壁層MTJのMgO結晶配向性と高エネルギー負イオンとの関係 招待有り
小野一修, 大嶋則和, 後藤和也, 森田正, 木下啓藏, 石島達夫, 豊田浩孝
日本HDD協会 ヘッド・ディスク部会
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有機物含有流体の減圧下における連続プラズマ処理
金武 浩司，石島 達夫，豊田 浩孝
第58回応用物理学関係連合講演会
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熱流束抑制による微結晶シリコン薄膜特性の改善
伊藤裕紀，坂井淳二，石島達夫，豊田浩孝
第58回応用物理学関係連合講演会
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SiH4/H2マイクロ波プラズマ中のSiH3ラジカル空間分布計測
池田昌平, 黒田 俊之, 石島 達夫, 豊田 浩孝
第58回応用物理学関係連合講演会
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質量分析法による大気圧プラズマの気相診断
澤口 陽介，石島 達夫，豊田 浩孝
第58回応用物理学関係連合講演会
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Space- and Time-Resolved Measurement of Electric Field 国際会議
T. Murase, A. Kamata, T. Ishijima and H. Toyoda
The 4th International Conference on Plasma-Nano Technology & Science
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Improvement of Silicon Thin Film Quality for Photovoltaic Cells by Modified Microwave Antenna Structure 国際会議
Y. Ito, J. Sakai, T. Ishijima and H. Toyoda
The 4th International Conference on Plasma-Nano Technology & Science
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Measurement of SiH3 Spatial Profile in H2/SiH4 Microwave Plasma 国際会議
M. Ikeda, T. Kuroda, T. Ishijima and H. Toyoda
The 4th International Conference on Plasma-Nano Technology & Science
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Treatment of Flowing Organic Solution by Microwave Excited Plasma under Reduced-Pressure Condition 国際会議
K. Kanetake, T. Ishijima and H. Toyoda
The 4th International Conference on Plasma-Nano Technology & Science
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Reactive Species Measurement of an Atmosphere-pressure Plasma by a Differentially-Pumped Mass-Spectrometer 国際会議
Y. Sawaguchi, T. Ishijima and H. Toyoda
The 4th International Conference on Plasma-Nano Technology & Science
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Investigation of C6H6 Dissociation Process in a Microwave Plasma 国際会議
K .Keyamura, T. Ishijima and H. Toyoda
The 4th International Conference on Plasma-Nano Technology & Science
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Dissociation Process of C6H6 Molecules in Surface Wave Plasma 国際会議
KAZUKI KEYAMURA, TATSUO ISHIJIMA AND HIROTAKA TOYODA
3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Gas-Phase Diagnostics of Hydrogen Diluted Silane Plasma by Modified Appearance Mass Spectrometry 国際会議
MASAHIRA IKEDA, TOSHIYUKI KURODA, TATSUO ISHIJIMA AND HIROTAKA TOYODA
3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials