Papers - USAMI Noritaka
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Simple method for significant improvement of minority-carrier lifetime of evaporated BaSi2 thin film by sputtered-AlOx passivation
N.M. Shaalan, K.O. Hara, C.T. Trinh, Y. Nakagawa, and N. Usami
Materials Science in Semiconductor Processing Vol. 76 page： 37-41 2018.3
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Simple method for significant improvement of minority-carrier lifetime of evaporated BaSi2 thin film by sputtered-AlOx passivation
Shaalan N. M., Hara K. O., Trinh C. T., Nakagawa Y., Usami N.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING Vol. 76 page： 37 - 41 2018.3
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Formation of black silicon using SiGe self-assembled islands as a mask for selective anisotropic etching of silicon
D. V. Yurasov, A. V. Novikov, M. V. Shaleev, N. A. Baidakova, E. E. Morozova, E. V. Skorokhodov, Y. Ota, A. Hombe, Y. Kurokawa, and N. Usami
Materials Science in Semiconductor Processing ( 75 ) page： 143-148 2018.3
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Formation of black silicon using SiGe self-assembled islands as a mask for selective anisotropic etching of silicon
Yurasov D. V., Novikov A. V., Shaleev M. V., Baidakova N. A., Morozova E. E., Skorokhodov E. V., Ota Y., Hombe A., Kurokawa Y., Usami N.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING Vol. 75 page： 143 - 148 2018.3
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BaSi2 formation mechanism in thermally-evaporated films and its application to reducing oxygen impurity concentration
K.O. Hara, C. Yamamoto, J. Yamanaka, K. Arimoto, K. Nakagawa, and N. Usami
Japanese Journal of Applied Physics ( 57 ) page： 04FS01 2018.2
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A quantum-dot spin qubit with coherence limited by charge noise and fidelity higher than 99.9% Open Access
Yoneda Jun, Takeda Kenta, Otsuka Tomohiro, Nakajima Takashi, Delbecq Matthieu R., Allison Giles, Honda Takumu, Kodera Tetsuo, Oda Shunri, Hoshi Yusuke, Usami Noritaka, Itoh Kohei M., Tarucha Seigo
NATURE NANOTECHNOLOGY Vol. 13 ( 2 ) page： 102 - + 2018.2
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Alternative simple method to realize p-type BaSi2 thin films for Si heterojunction solar cell applications
Takahashi Kazuma, Nakagawa Yoshihiko, Hara Kosuke O., Takahashi Isao, Kurokawa Yasuyoshi, Usami Noritaka
MRS ADVANCES Vol. 3 ( 25 ) page： 1435-1442 2018
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Suppression of Near-interface Oxidation in Thermally-evaporated BaSi2 Films and Its Effects on Preferred Orientation and the Rectification Behavior of n-BaSi2/p(+)-Si Diodes
Hara Kosuke O., Arimoto Keisuke, Yamanaka Junji, Nakagawa Kiyokazu, Usami Noritaka
MRS ADVANCES Vol. 3 ( 25 ) page： 1387-1392 2018
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Fabrication of silicon nanowire based solar cells using TiO2/Al2O3 stack thin films
Kurokawa Yasuyoshi, Nezasa Ryota, Kato Shinya, Miyazaki Hisashi, Takahashi Isao, Usami Noritaka
MRS ADVANCES Vol. 3 ( 25 ) page： 1419-1426 2018
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Local Structure of High Performance TiOx Passivating Layer Revealed by Electron Energy Loss Spectroscopy
Mochizuki Takeya, Gotoh Kazuhiro, Ohta Akio, Kurokawa Yasuyoshi, Miyazaki Seiichi, Yamamoto Takahisa, Usami Noritaka
2018 IEEE 7TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION (WCPEC) (A JOINT CONFERENCE OF 45TH IEEE PVSC, 28TH PVSEC & 34TH EU PVSEC) page： 3896-3899 2018
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Photoresponsivity improvement of BaSi2 epitaxial films by capping with hydrogenated amorphous Si layers by radio-frequency H-2 plasma
Xu Zhihao, Gotoh Kazuhiro, Deng Tianguo, Sato Takuma, Toko Kaoru, Usami Noritaka, Suemasu Takashi
2018 IEEE 7TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION (WCPEC) (A JOINT CONFERENCE OF 45TH IEEE PVSC, 28TH PVSEC & 34TH EU PVSEC) page： 1871-1873 2018
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Application of light trapping structure using Ge dot mask by alkaline etching to heterojunction solar cell
Hombe Atsushi, Kurokawa Yasuyoshi, Gotoh Kazuhiro, Usami Noritaka
2018 IEEE 7TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION (WCPEC) (A JOINT CONFERENCE OF 45TH IEEE PVSC, 28TH PVSEC & 34TH EU PVSEC) page： 3097-3101 2018
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Evaluation of Si Nanowire MOS Capacitor Using High-k Dielectric Materials
Nezasa R., Kurokawa Y., Usami N.
2018 IEEE 18TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO) page： . 2018
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Development of the Passivation Layer For P-type CuI Thin Film Fabricated by the 2-step Method as the Novel Hole Selective Contact of Silicon Heterojunction Solar Cells
Cui Min, Gotoh Kazuhiro, Kurokawa Yasuyoshi, Usami Noritaka
2018 IEEE 7TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION (WCPEC) (A JOINT CONFERENCE OF 45TH IEEE PVSC, 28TH PVSEC & 34TH EU PVSEC) page： 2118-2120 2018
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Deposition and Characterization of Si Quantum Dot Multilayers Prepared by Plasma Enhanced Chemical Vapor Deposition using SiH4 and CO2 Gases
Akaishi Ryushiro, Kitazawa Kouhei, Ono Satoshi, Gotoh Kazuhiro, Ichihara Eiji, Kato Shinya, Usami Noritaka, Kurokawa Yasuyoshi
2018 IEEE 7TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION (WCPEC) (A JOINT CONFERENCE OF 45TH IEEE PVSC, 28TH PVSEC & 34TH EU PVSEC) page： 2852-2856 2018
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Controllable Optical and Electrical Properties of Nb Doped TiO2 Films by RF Sputtering
Cheng Xuemei, Gotoh Kazuhiro, Mochizuki Takeya, Usami Noritaka
2018 IEEE 7TH WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION (WCPEC) (A JOINT CONFERENCE OF 45TH IEEE PVSC, 28TH PVSEC & 34TH EU PVSEC) page： 1986-1990 2018
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Investigation on the origin of preferred a-axis orientation of BaSi2 films deposited on Si(100) by thermal evaporation
Hara Kosuke O., Yamamoto Chiaya, Yamanaka Junji, Arimoto Keisuke, Nakagawa Kiyokazu, Usami Noritaka
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING Vol. 72 page： 93-98 2017.12
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Selective etching of Si, SiGe, Ge and its usage for increasing the efficiency of silicon solar cells
Baidakova N. A., Verbus V. A., Morozova E. E., Novikov A. V., Skorohodov E. V., Shaleev M. V., Yurasov D. V., Hombe A., Kurokawa Y., Usami N.
SEMICONDUCTORS Vol. 51 ( 12 ) page： 1542 - 1546 2017.12
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Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion implanted Si (100) substrates
Y. Arisawa, Y. Hoshi, K. Sawano, J. Yamanaka, K. Arimoto, C. Yamamoto, and N. Usami
Materials Science in Semiconductor Processing ( 70 ) page： 127-132 2017.11
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Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion implanted Si (100) substrates
Arisawa You, Hoshi Yusuke, Sawano Kentarou, Yamanaka Junji, Arimoto Keisuke, Yamamoto Chiaya, Usami Noritaka
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING Vol. 70 page： 127 - 132 2017.11