Papers - USAMI Noritaka
-
Fabrication of n(+)-BaSi2/p(+)-Si Tunnel Junction on Si(111) Surface by Molecular Beam Epitaxy for Photovoltaic Applications
T. Saito, Y. Matsumoto, M. Suzuno, M. Takeishi, R. Sasaki, T. Suemasu and N. Usami
Applied Physics Express Vol. 3 ( 2 ) 2010
-
Lattice-Latching Effect in Metalorganic Vapor Phase Epitaxy Growth of InGaAsN Film Lattice-Matched to Bulk InGaAs Substrate
S. Sanorpim, R. Katayama, K. Onabe, N. Usami and K. Nakajima
Japanese Journal of Applied Physics Vol. 49 ( 4 ) 2010
-
Epitaxial Growth and Photoresponse Properties of BaSi2 Layers toward Si-Based High-Efficiency Solar Cells
Y. Matsumoto, D. Tsukada, R. Sasaki, M. Takeishi, T. Saito, T. Suemasu, N. Usami and M. Sasase
Japanese Journal of Applied Physics Vol. 49 2010
-
On the Controlling Mechanism of Preferential Orientation of Polycrystalline-Silicon Thin Films Grown by Aluminum-Induced Crystallization
M. Jung, A. Okada, T. Saito, T. Suemasu and N. Usami
Applied Physics Express Vol. 3 ( 9 ) 2010
-
Growth behavior of faceted Si crystals at grain boundary formation
K. Fujiwara, S. Tsumura, M. Tokairin, K. Kutsukake, N. Usami, S. Uda and K. Nakajima
Journal of Crystal Growth Vol. 312 ( 1 ) page： 19-23 2009.12
-
Formation mechanism of a faceted interface: In situ observation of the Si(100) crystal-melt interface during crystal growth
M. Tokairin, K. Fujiwara, K. Kutsukake, N. Usami and K. Nakajima
Physical Review B Vol. 80 ( 17 ) 2009.11
-
Growth of Compositionally Graded SiGe Bulk Crystal and Its Application As Substrate with Lateral Variation in Ge Content
R. Nihei, N. Usami and K. Nakajima
Japanese Journal of Applied Physics Vol. 48 ( 11 ) 2009.11
-
Strain relaxation mechanisms in compositionally uniform and step-graded SiGe films grown on Si(110) substrates
K. Arimoto, M. Watanabe, J. Yamanaka, K. Nakagawa, K. Sawano, Y. Shiraki, N. Usami and K. Nakajima
Solid-State Electronics Vol. 53 ( 10 ) page： 1135-1143 2009.10
-
Strain dependence of hole effective mass and scattering mechanism in strained Ge channel structures
K. Sawano, K. Toyama, R. Masutomi, T. Okamoto, N. Usami, K. Arimoto, K. Nakagawa and Y. Shiraki
Applied Physics Letters Vol. 95 2009.9
-
Fabrication of (111)-oriented Si layers on SiO2 substrates by an aluminum-induced crystallization method and subsequent growth of semiconducting BaSi2 layers for photovoltaic application
D. Tsukada, Y. Matsumoto, R. Sasaki, M. Takeishi, T. Saito, N. Usami and T. Suemasu
Journal of Crystal Growth Vol. 311 ( 14 ) page： 3581-3586 2009.7
-
Microstructures of Si multicrystals and their impact on minority carrier diffusion length
H. Y. Wang, N. Usami, K. Fujiwara, K. Kutsukake and K. Nakajima
Acta Materialia Vol. 57 ( 11 ) page： 3268-3276 2009.6
-
Photoresponse Properties of Polycrystalline BaSi2 Films Grown on SiO2 Substrates Using (111)-Oriented Si Layers by an Aluminum-Induced Crystallization Method
D. Tsukada, Y. Matsumoto, R. Sasaki, M. Takeishi, T. Saito, N. Usami and T. Suemasu
Applied Physics Express Vol. 2 ( 5 ) 2009.5
-
Generation and Wavelength Control of Resonant Luminescence from Silicon Photonic Crystal Microcavities with Ge Dots
J. Xia, R. Tominaga, S. Fukamitsu, N. Usami and Y. Shiraki
Japanese Journal of Applied Physics Vol. 48 ( 2 ) 2009.2
-
Quantitative analysis of subgrain boundaries in Si multicrystals and their impact on electrical properties and solar cell performance
K. Kutsukake, N. Usami, T. Ohtaniuchi, K. Fujiwara and K. Nakajima
Journal of Applied Physics Vol. 105 ( 4 ) 2009.2
-
Floating cast method to realize high-quality Si bulk multicrystals for solar cells
Y. Nose, I. Takahashi, W. Pan, N. Usami, K. Fujiwara and K. Nakajima
Journal of Crystal Growth Vol. 311 ( 2 ) page： 228-231 2009.1
-
Resonant photoluminescence from Ge self-assembled dots in optical microcavities
J. S. Xia, R. Tominaga, N. Usami, S. Iwamoto, Y. Ikegami, K. Nemoto, Y. Arakawa and Y. Shiraki
JOURNAL OF CRYSTAL GROWTH Vol. 311 page： 883-887 2009
-
Local control of strain in SiGe by ion-implantation technique
K. Sawano, Y. Hoshi, Y. Hiraoka, N. Usami, K. Nakagawa and Y. Shiraki
JOURNAL OF CRYSTAL GROWTH Vol. 311 ( 3 ) page： 806-808 2009
-
Fabrication of thin strain-relaxed SiGe buffer layers with high Ge composition by ion implantation method
Y. Hoshi, K. Sawano, Y. Hiraoka, Y. Sato, Y. Ogawa, A. Yamada, N. Usami, K. Nakagawa and Y. Shiraki
JOURNAL OF CRYSTAL GROWTH Vol. 311 ( 3 ) page： 825-828 2009
-
Structural and transport properties of strained SiGe grown on V-groove patterned Si(110) substrates
K. Arimoto, G. Kawaguchi, K. Shimizu, M. Watanabe, J. Yamanaka, K. Nakagawa, N. Usami, K. Nakajima, K. Sawano and Y. Shiraki
J. Cryst. Growth Vol. 311 page： 814-818 2009
-
Strain relaxation mechanisms in step-graded SiGe/Si(110) heterostructures grown by gas-source MBE at high temperatures
K. Arimoto, M. Watanabe, J. Yamanaka, K. Nakagawa, N. Usami, K. Nakajima, K. Sawano and Y. Shiraki
J. Cryst. Growth Vol. 311 page： 819-824 2009