研究者詳細 - 石川　健治

論文 - 石川　健治

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イネ圃場における定期的な低温プラズマ処理による生育や収穫に対する検討 (III) 査読有り

北野英己, 水野寛子, 阿部明子, 湯浅元気, 東野里江, 橋爪博司, 石川健治, 田中宏昌, 松本省吾, 仁川進, 榊原均, 前島正義, 堀勝, 水野正明

応用物理学会学術講演会講演予稿集 2020.1 巻 ( 0 ) 頁： 1622 - 1622 2020年2月

プラズマ照射したカイワレ種子の吸水の時間推移評価査読有り

石川健治, Pankaj Attri, 奥村賢直, 古閑一憲, 有田涼, 佐藤僚哉, 田中颯, 廣松真弥, 鎌瀧晋礼, 松尾かよ, 山下大輔, 板垣奈穂, 堀勝, 白谷正治

応用物理学会学術講演会講演予稿集 2020.1 巻 ( 0 ) 頁： 1620 - 1620 2020年2月

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study 査読有り国際共著

Fukunaga, Y; Longo, RC; Ventzek, PLG; Lane, B; Ranjan, A; Hwang, GS; Hartmann, G; Tsutsumi, T; Ishikawa, K; Kondo, H; Sekine, M; Hori, M

JOURNAL OF APPLIED PHYSICS 127 巻 ( 2 ) 2020年1月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Journal of Applied Physics

In this work, first principles calculations combined with advanced surface diagnostics are used to unravel the mechanisms of plasma oxygen interaction with organic films of interest for advanced patterning in semiconductor device manufacturing. Results from a combination of x-ray photoelectron spectroscopy (XPS) diagnosed oxygen plasma exposed polystyrene films and first principles modeling of organic films (polystyrene, polyethylene, and derivatives) provide insights into how organic films are oxidized by oxygen atoms. XPS measurements show the rapid formation of C-O structures and their saturation after oxygen exposure on both pristine and argon bombarded polystyrene samples. Quantum mechanics calculations confirm that C-OH formation can be immediate without recourse to previously formed dangling bonds. Multiple oxygen impacts are required for scission of pristine ethylene carbon strands. Therefore, ethylene films can be converted to polyols that are stable, whereas more likely strands are broken before polyol formation through the formation of water and C=O. On the contrary, intermediate compounds with adjacent C=O bonds are not likely to form stable structures. The combination of XPS measurements and modeling implies that the oxidation of polystyrene and polyethylene is self-limiting on both hydrogen saturated and dehydrogenated (after argon ion plasma bombardment) surfaces.

DOI： 10.1063/1.5127863

Web of Science

Scopus

Inactivation mechanism of fungal spores through oxygen radicals in atmospheric-pressure plasma 査読有り

Ito M., Hashizume H., Oh J.S., Ishikawa K., Ohta T., Hori M.

Japanese Journal of Applied Physics 60 巻 ( 1 ) 頁： 010503 2020年

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics

A brief history of the development of our plasma technology for the disinfection of agricultural harvests is presented in this review. We focused on the influence of reactive oxygen species (ROS), e.g. ground-state oxygen atoms [O(3P j )], excited-state oxygen molecules [O2(1Δg)], and ozone (O3), generated from atmospheric-pressure plasmas on the inactivation of fungal spores under dry conditions. For elucidating the inactivation mechanisms, it is essential to reveal the key ROS. Using some powerful tools, we revealed that the dose of O(3P j ) strongly correlates with the inactivation of fungal spores when compared to those of another ROS, such as O2(1Δg) and O3. The balance of antioxidants in the spores is possibly modulated by O(3P j ), leading to oxidation of organelles in spores. Herein, we introduce and discuss how O(3P j ) contributes to the inactivation of fungal spores associated with in situ diagnostics of plasma generated ROS and in situ intracellular observations of a few fungal spore species.

DOI： 10.35848/1347-4065/abcbd1

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Leukocyte depletion and size-based enrichment of circulating tumor cells with pressure-sensing microfiltration system 査読有り Open Access

Kuboyama D., Onoshima D., Kihara N., Tanaka H., Hase T., Yukawa H., Ishikawa K., Odaka H., Hasegawa Y., Hori M., Baba Y.

21st International Conference on Miniaturized Systems for Chemistry and Life Sciences Microtas 2017 頁： 882 - 883 2020年

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：21st International Conference on Miniaturized Systems for Chemistry and Life Sciences Microtas 2017

We present a study of blood microfiltration system towards optimal approach of non-invasive liquid biopsy for cancer detection by circulating tumor cells (CTCs). Filtration behavior of a microfilter was experimentally analyzed for tumor cell isolation from leukocytes in whole blood. This approach achieved an average of >96% recovery of spiked tumor cells and >99% total leukocytes depletion.

DOI： 10.1021/acsmeasuresciau.2c00057

Open Access

Scopus

Cell deposition and isolation with micropipette control over liquid interface motion in microfluidic channel 査読有り

Onoshima D., Yukawa H., Hattori Y., Ishikawa K., Hori M., Baba Y.

21st International Conference on Miniaturized Systems for Chemistry and Life Sciences Microtas 2017 頁： 679 - 680 2020年

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：21st International Conference on Miniaturized Systems for Chemistry and Life Sciences Microtas 2017

We developed a microfluidic chip for depositing single cells in microwells using simple micropipette operation. Cells were delivered to microwells by the meniscus motion of liquid interface. The residue deposits of cells were redistributed with air injection, and the isolated single cells were stored in microwells. Different microwell sizes and depths were studied to evaluate the trapping possibility of cells. Medium replacement and cell viability staining with the isolated single cells were achieved in microwells.

Scopus

Etching characteristics of PECVD-prepared SiN films with CF4/D2 and CF4/H2 plasmas at different temperatures 査読有り

Hsiao, SN; Nguyen, TTN; Tsutsumi, T; Ishikawa, K; Sekine, M; Hori, M

2020 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM) 2020-December 巻 2020年

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

The dependences of plasmas (CF4/D2 and CF4/H2) on etch rates of the PECVD SiN films at different substrate temperatures were investigated. The CF4/D2 plasma exhibited higher etch rates than that for the CF4/D2 plasma at room temperature and higher. The optical emission spectra showed that the CF polymerization, F and Balmer emissions were stronger in the CF4/D2 plasma, by comparing with the CF4/H2 plasma. A thinner fluorocarbon thickness with a lower F/C ratio was found in the sample proceeded by the CF4/H2 plasma. The fluorocarbon thickness and gas phase concentration were not responsible for the increase of etch rate in the CF4/D2 plasma. The abstraction of H inside the SiN films by deuterium and hydrogen dissociation were considered to be important for the etching of the Si-H bond rich SiN films.

DOI： 10.1109/ISSM51728.2020.9377537

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無潤滑下及びベース油中におけるta-CNxコーティングのトライボロジー特性に及ぼすダングリングボンドと表面エネルギーの影響

宮地孝明, 中島悠也, 石川健治, Wooyoung Lee, 野老山貴行, 村島基之, 梅原徳次

年次大会 2020 巻 ( 0 ) 頁： S11314 2020年

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Izawa, M; Ishikawa, K; Hori, M

JOURNAL OF PHYSICS D-APPLIED PHYSICS 52 巻 ( 47 ) 2019年11月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Journal of Physics D Applied Physics

Isotropic atomic-layer etching (ALE) of TiN-by using a plasma-assisted thermal-cyclic process with a 300-mm tool-was demonstrated. The process consists of exposure to a downstream CHF<inf>3</inf>/O<inf>2</inf> plasma (for surface modification) followed by infrared irradiation for thermal desorption of the modified surface. Etched amount of TiN per cycle saturated at around 0.6 nm/cycle with respect to both radical-exposure time and infrared-irradiation time. To examine the reaction mechanism of the cyclic etching, the surfaces of TiN samples after CHF<inf>3</inf>/O<inf>2</inf> plasma exposure were analyzed by in situ X-ray photoelectron spectroscopy (XPS). Self-limiting formation of the surface-modified layer, which was tentatively identified as an ammonium salt such as (NH<inf>4</inf>)<inf>x</inf>TiF<inf>y</inf>, was observed after radical exposure. It was confirmed by in situ XPS that the surface-modified layer was removed after thermal annealing at 110 °C. Isotropic ALE of TiN was thus demonstrated by using formation and desorption of ammonium salt in CHF<inf>3</inf>/O<inf>2</inf> downstream plasma, which was also used for isotropic ALE of Si<inf>3</inf>N<inf>4</inf>.

DOI： 10.1088/1361-6463/ab3cf3

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Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate 査読有り

Isobe, Y; Sakai, T; Suguro, K; Miyashita, N; Kondo, H; Ishikawa, K; Wilson, AF; Shimizu, N; Oda, O; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 37 巻 ( 6 ) 2019年11月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Journal of Vacuum Science and Technology B Nanotechnology and Microelectronics

Nitrogen atoms are versatile for nitridation applications and do not lead to plasma-induced damage. Large-sized wafer processing demands a uniform supply of nitrogen atoms produced in a high-density very-high-frequency excited plasma of N<inf>2</inf> without ammonia. The confinement of plasma through the use of a plasma shield plate (PSP) allows the samples to be separated in a downstream chamber. Generation and transport of N atoms were computationally simulated, and the PSP designs were implemented by PSP parameterization. The supply of high-density N radicals to the sample stage was optimally designed with sufficiently small holes and thin PSP to satisfy an aspect ratio of thickness-to-hole-diameter of less than 2.5.

DOI： 10.1116/1.5114831

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Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions 査読有り Open Access

Tanaka, H; Mizuno, M; Katsumata, Y; Ishikawa, K; Kondo, H; Hashizume, H; Okazaki, Y; Toyokuni, S; Nakamura, K; Yoshikawa, N; Kajiyama, H; Kikkawa, F; Hori, M

SCIENTIFIC REPORTS 9 巻 ( 1 ) 頁： 13657 2019年9月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Scientific Reports

Non-thermal atmospheric pressure plasma has been widely used for preclinical studies in areas such as wound healing, blood coagulation, and cancer therapy. We previously developed plasma-activated medium (PAM) and plasma-activated Ringer’s lactate solutions (PAL) for cancer treatments. Many in vitro and in vivo experiments demonstrated that both PAM and PAL exhibit anti-tumor effects in several types of cancer cells such as ovarian, gastric, and pancreatic cancer cells as well as glioblastoma cells. However, interestingly, PAM induces more intracellular reactive oxygen species in glioblastoma cells than PAL. To investigate the differences in intracellular molecular mechanisms of the effects of PAM and PAL in glioblastoma cells, we measured gene expression levels of antioxidant genes such as CAT, SOD2, and GPX1. Microarray and quantitative real-time PCR analyses revealed that PAM elevated stress-inducible genes that induce apoptosis such as GADD45α signaling molecules. PAL suppressed genes downstream of the survival and proliferation signaling network such as YAP/TEAD signaling molecules. These data reveal that PAM and PAL induce apoptosis in glioblastoma cells by different intracellular molecular mechanisms.

DOI： 10.1038/s41598-019-50136-w

プラズマ活性化乳酸リンゲル点滴 (PAL) によるイネ幼苗の成長促進効果査読有り

橋爪博司, 水野寛子, 北野英己, 湯浅元気, 東野里江, 田中宏昌, 石川健治, 松本省吾, 榊原均, 前島正義, 仁川進, 水野正明, 堀勝

応用物理学会学術講演会講演予稿集 2019.2 巻 ( 0 ) 頁： 1895 - 1895 2019年9月

CH3Fの電子物性と解離査読有り

関根誠, 林俊雄, 堀勝, 石川健治

応用物理学会学術講演会講演予稿集 2019.2 巻 ( 0 ) 頁： 1837 - 1837 2019年9月

イネ圃場における定期的な低温プラズマ処理による生育や収穫に対する検討 (II) 査読有り

橋爪博司, 北野英己, 水野寛子, 湯浅元気, 東野里江, 田中宏昌, 石川健治, 仁川進, 前島正義, 堀勝, 水野正明, 榊原均, 松本省吾

応用物理学会学術講演会講演予稿集 2019.2 巻 ( 0 ) 頁： 1896 - 1896 2019年9月

プラズマ処理によるイチゴ果実中の抗酸化物質量増加査読有り

橋爪博司, 坪田憲紀, 松本省吾, 湯浅元気, 伊藤昌文, 石川健治, 大熊隆之, 榊原均, 仁川進, 堀勝, 水野正明, 北野英己, 前島正義, 田中宏昌, 東野里江

応用物理学会学術講演会講演予稿集 2019.2 巻 ( 0 ) 頁： 1897 - 1897 2019年9月

Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) 査読有り Open Access

Ohta, T; Ito, H; Ishikawa, K; Kondo, H; Hiramatsu, M; Hori, M

C-JOURNAL OF CARBON RESEARCH 5 巻 ( 3 ) 2019年9月

Review of methods for the mitigation of plasma-induced damage to low-dielectric-constant interlayer dielectrics used for semiconductor logic device interconnects 査読有り

Miyajima, H; Ishikawa, K; Sekine, M; Hori, M

PLASMA PROCESSES AND POLYMERS 16 巻 ( 9 ) 2019年9月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Plasma Processes and Polymers

The developments in advanced interconnect technology for semiconductor logic devices for the mitigation of plasma-induced damage to low-dielectric-constant (low-k) materials, including fluorosilicate glass and carbon-doped silicon oxide is reviewed. The chemical bond structures of low-k materials are summarized to help mitigate the k value degradation caused by moisture uptake after plasma processes. Damage suppression is accomplished by integrating deposition chemistries, pattern etch transfer, and post-etch cleaning technologies. On the basis of analyses results, a discussion on the bond engineering of low-k materials and their degradation during plasma processing is given. Challenges facing low-k interconnect technology are also addressed.

DOI： 10.1002/ppap.201900039

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Scopus

Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Izawa, M; Saeki, T; Ishikawa, K; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 37 巻 ( 5 ) 2019年9月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Journal of Vacuum Science and Technology A Vacuum Surfaces and Films

Self-limiting reactions of ammonium salt in CHF<inf>3</inf>/O<inf>2</inf> downstream plasma were demonstrated for thermal-cyclic atomic layer etching (ALE) of Si<inf>3</inf>N<inf>4</inf>. In situ x-ray photoelectron spectroscopy analysis shows that an (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> by-product of the same thickness forms on Si<inf>3</inf>N<inf>4</inf> in a wide gas composition range. The (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> layer prevents etching of Si<inf>3</inf>N<inf>4</inf> during continuous plasma exposure in that wide range. The (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> layer was sublimated by heating, which was consistent with the result of the thermodynamic calculation. The reactions of the (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> layer in CHF<inf>3</inf>/O<inf>2</inf> downstream plasma are used for thermal-cyclic ALE of Si<inf>3</inf>N<inf>4</inf> with a newly developed 300-mm tool equipped with an in situ ellipsometer. It was confirmed that the amount etched per cycle saturates with respect to both plasma exposure time and infrared irradiation time.

DOI： 10.1116/1.5111663

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Simultaneous achievement of antimicrobial property and plant growth promotion using plasma-activated benzoic compound solution 査読有り

Iwata, N; Gamaleev, V; Hashizume, H; Oh, JS; Ohta, T; Ishikawa, K; Hori, M; Ito, M

PLASMA PROCESSES AND POLYMERS 16 巻 ( 8 ) 2019年8月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Plasma Processes and Polymers

This study assesses a potential use of the recently developed nonthermal atmospheric pressure plasma technology in hydroponic plant cultivation. Two types of plasma-activated liquid solutions were compared, namely, l-Phenylalanine (l-Phe), which had a benzene ring structure, and l-Alanine (l-Ala), which did not have a benzene ring structure. Antimicrobial property and plant growth enhancement were simultaneously obtained when plasma-activated l-Phe was used. We found that the benzene ring structure in solution contributed to antimicrobial property. Further, colony forming unit assay indicated that 99% of Escherichia coli (E. coli) were eliminated after 24-h incubation and radish sprout growth increased by about 40% after 2 days of cultivation.

DOI： 10.1002/ppap.201900023

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Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation 査読有り

Ichikawa T., Kondo H., Ishikawa K., Tsutsumi T., Tanaka H., Sekine M., Hori M.

ACS Applied Bio Materials 2 巻 ( 7 ) 頁： 2698 - 2702 2019年7月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：ACS Applied Bio Materials

Nanostructured cell-culture scaffolds of carbon nanowalls (CNWs) were prepared by changing average wall-to-wall distances either 132 or 220 nm. Osteoblast-like cells (Saos-2) proliferated during 4 day incubation on the wider (220 nm) CNW scaffolds in the presence of electrical stimulation (ES). Differentiation gene expression levels of Runt-related transcription factor 2 (Runx2) and osteocalcin (OC) were suppressed after 10 day incubation, which indicated that the average wall-to-wall distances of the CNW scaffolds affect suppression of Runx2 and OC gene expression. This technique holds promise for controlling the differentiation of osteoblast-like cells.

DOI： 10.1021/acsabm.9b00178

<石川 健治>

論文 - 石川 健治

<石川　健治>

論文 - 石川　健治