研究者詳細 - 石川　健治

論文 - 石川　健治

分割表示 417 件中 281 - 300 件目／全件表示 >>

Thermally enhanced formation of photon-induced damage on GaN films in Cl2 plasma 査読有り

Liu Z., Asano A., Imamura M., Ishikawa K., Takeda K., Kondo H., Oda O., Sekine M., Hori M.

Japanese Journal of Applied Physics 56 巻 ( 9 ) 2017年

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics

Deep ultraviolet (UV) photons emitted from Cl<inf>2</inf> plasmas become a critical cause of degradation in both photoluminescence (PL) properties and surface stoichiometry as a result of plasma-induced damage on GaN films in Cl<inf>2</inf> plasma etching at high temperatures. The damages were formed thermally by photon-irradiations of plasma UV emissions with wavelengths of >258-306 nm from Cl<inf>2</inf> plasma at temperatures greater than 500 °C. The damage were observed with a depth of approximately 3.2 nm. The PL property degraded by the UV emission-induced damage at an early period of plasma etching and reached a constant value.

DOI： 10.7567/JJAP.56.096501

Scopus

Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication 査読有り

Shinoda, K; Miyoshi, N; Kobayashi, H; Kurihara, M; Izawa, M; Ishikawa, K; Hori, M

ATOMIC LAYER DEPOSITION APPLICATIONS 13 80 巻 ( 3 ) 頁： 3 - 14 2017年

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Ecs Transactions

A highly selective, rapid thermal-cyclic atomic-level etching (ALE) process for SiNx films has been developed. The first step of this process is exposing SiNx to hydrofluorocarbon plasma to form an (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> layer on the SiNx surface. The second step is rapid thermal annealing with infrared (IR) irradiation to decompose and sublimate the (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> layer. Etching of SiNx was observed after the (NH<inf>4</inf>)<inf>2</inf>SiF<inf>6</inf> layer was removed by thermal annealing. Cyclic etching tests were carried out by repeated plasma exposure and IR irradiation. It was found that the cyclic process is self-limiting because etching depth depends only on the cycle number and not on the plasma exposure time. A high selectivity over SiC<inf>2</inf> and poly Si was confirmed. This paper reviews the novel isotropic ALE for nitride films focusing on the surface reaction mechanism investigated by x-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS). Isotropic ALE of TiN was also demonstrated using the same approach.

DOI： 10.1149/08003.0003ecst

Web of Science

Scopus

Microfluidic transport through micro-sized holes treated by non-equilibrium atmospheric-pressure plasma 査読有り Open Access

Takumi Ito, Kenji Ishikawa, Daisuke Onoshima, Naoto Kihara, Kentaro Tatsukoshi, Hidefumi Odaka, Hiroshi Hashizume, Hiromasa Tanaka, Hiroshi Yukawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Yoshinobu Baba, and Masaru Hori

IEEE Transactions on Plasma Science 44 巻 ( 12 ) 頁： 3060 - 3065 2016年12月

Non-thermal atmospheric pressure plasma activates lactate in Ringer’s solution for anti-tumor effects 査読有り Open Access

Hiromasa Tanaka, Kae Nakamura, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Hiroaki Kajiyama, Fumi Utsumi, Fumitaka Kikkawa, and Masaru Hori

Scientific Reports 6 巻頁： 36282 2016年11月

Effects of assisted magnetic field to an atmospheric-pressure plasma jet on radical generation at the plasma-surface interface and bactericidal function 査読有り

Chih-Tung Liu, Takumi Kumakura, Kenji Ishikawa, Hiroshi Hashizume, Keigo Takeda, Masafumi Ito, Jong-Shinn Wu, and Masaru Hori

Plasma Sources Science and Technology 25 巻 ( 6 ) 頁： 065005 2016年10月

Micro sand timer in glass membrane device separates single circulating tumor cells in blood 査読有り

Daiki Kuboyama, Daisuke Onoshima, Hiroshi Yukawa, Hiromasa Tanaka, Kenji Ishikawa, Masaru Hori, and Yoshinobu Baba

The 20th International Conference on Miniaturized Systems for Chemistry and Life Sciences, Micro Total Analysis Systems 2016 (Convention Center Dublin, Dublin, Ireland, Oct. 9-13, 2016) 頁： 297 - 298 2016年10月

Control of Internal Plasma Parameters Toward Atomic Level Processing 査読有り

Makoto Sekine, Takayoshi Tsutsumi, Yusuke Fukunaga, Keigo Takeda, Hiroki Kondoa, Kenji Ishikawa, and Masaru Hori

ECS Transactions 75 巻 ( 6 ) 頁： 21 - 24 2016年10月

Thermal cyclic etching of silicon nitride by formation and desorption of ammonium fluorosilicate 査読有り

Kazunori Shinoda, Masaru Izawa, Tadamitsu Kanekiyo, Kenji Ishikawa, and Masaru Hori

Applied Physics Express 9 巻 ( 10 ) 頁： 106201 2016年9月

Cold plasma interactions with enzymes in foods and model systems 査読有り国際共著

N. N. Misra, S. K. Pankaj, Annalisa Segat, and Kenji Ishikawa

Trends in Food Science & Technology 55 巻頁： 39 - 47 2016年9月

Synthesis of calcium oxalate crystals in culture medium irradiated with non-equilibrium atmospheric-pressure plasma 査読有り

Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Yoko Yamanishi, and Masaru Hori

Applied Physics Express 9 巻 ( 9 ) 頁： 096201 2016年8月

Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma 査読有り

Yoshinobu Ohya, Manabu Iwata, Kenji Ishikawa, Makoto Sekine, Masaru Hori, and Hideo Sugai

Japanese Journal of Applied Physics 55 巻 ( 8 ) 頁： 080309 2016年7月

ラジカル支援原子層制御ナノプロセス招待有り査読有り

石川健治, 小林明子, 盧翌, 竹田圭吾, 近藤博基, 関根誠, 堀勝

化学工学 2016年7月

Primary dissociation channels of SiH4 and H abstract reactions 査読有り Open Access

Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Japanese Journal of Applied Physics 55 巻 ( 7S2 ) 頁： 07LD07 2016年6月

Helium based cold atmospheric plasma-induced reactive oxygen species-mediated apoptotic pathway attenuated by platinum nanoparticles 査読有り Open Access

Paras Jawaid, Mati Ur Rehman, Qing-Li Zhao, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Tadamichi Shimizu, and Takashi Kondo

Journal of Cellular and Molecular Medicin 20 巻 ( 9 ) 頁： 1737 - 1748 2016年6月

Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas 査読有り

Yoshinobu Ohya, Maju Tomura, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Journal of Vacuum Science and Technology A Letters 34 巻 ( 4 ) 頁： 040602 2016年5月

Effects of nitrogen on apoptosis and changes in gene expression in human lymphoma U937 cells exposed to argon-cold atmospheric pressure plasma 査読有り Open Access

Yoshiaki Tabuchi, Hidefumi Uchiyama, Qing-li Zhao, Tatsuya Yunoki, Qabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Takashi Kondo

International Journal of Molecular Medicine 37 巻頁： 1706-1714 2016年5月

Red Blood Cell Coagulation Induced by Low-temperature Plasma Treatment 査読有り

Kenji Miyamoto, Sanae Ikehara, Hikaru Takei, Yoshihiro Akimoto, Hajime Sakakita, Kenji Ishikawa, Masashi Ueda, Jun-ichiro Ikeda, Masahiro Yamagishi, Jaeho Kim, Takashi Yamaguchi, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara

Archives of Biochemistry and Biophysics 2016年4月

Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition 査読有り

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

Japan. J. Appl. Phys. 55 巻 ( 4 ) 頁： 040305 2016年3月

Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-injection Plasma-enhanced Chemical Vapor Deposition 査読有り

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

Plasma Process Polym. 2016年2月

Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium 査読有り

Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Takashi Kondo, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori

Archives of Biochemistry and Biophysics 2016年1月

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