論文 - 石川 健治
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タングステン加熱触媒体により生成した水素ラジカルによるレジスト用ベースポリマーの分解除去 査読有り
新井 祐, 渡邉 誠, 河野 昭彦, 山岸 忠明, 石川 健治, 堀 勝, 堀邊 英夫
高分子論文集 69 巻 ( 6 ) 頁： 266-273 2012年9月
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As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN 査読有り
Shang Chen, Unhi Honda, Tatsunari Shibata, Toshiya Matumura, Yutaka Tokuda, Kenji Ishikawa, Masaru Hori, Hiroyuki Ueda, Tsutomu Uesugi, and Tetsu Kachi
J. Appl. Phys. 112 巻 ( 5 ) 頁： 053513-1:4 2012年9月
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Real-time In Situ Electron Spin Resonance Measurements on Fungal Spores of Penicillium digitatum during Exposure of Oxygen Plasmas 査読有り
Kenji Ishikawa, Hiroko Moriyama, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
Appl. Phys. Lett. 101 巻 ( 1 ) 頁： 013704-1:4 2012年7月
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Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature 査読有り
Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, and Masaru Hori
AIP advance 2 巻 ( 2 ) 頁： 022149-1:6 2012年6月
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Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma 査読有り
Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori
Appl. Phys. Express 5 巻 ( 3 ) 頁： 035101-1:3 2012年3月
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Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF3 into N2 Downflow Plasma 査読有り
Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu
Jpn. J. Appl. Phys. 51 巻 ( 2 ) 頁： 026505-1:5 2012年2月
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Direct current superposed dual-frequency capacitively-coupled-plasma in selective etch of SiOCH over SiC 査読有り
Tsuyoshi Yamaguchi, Tetsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
J. Phys. D: Appl. Phys. 45 巻 ( 2 ) 頁： 025203-1:7 2012年1月
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Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation 査読有り
Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, and Tetsuya Tatsumi
Jpn. J. Appl. Phys. 51 巻 ( 2 ) 頁： 026201-1:7 2012年1月
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Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature 査読有り
Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
51 巻 ( 1 ) 頁： 016202-1:6 2012年1月
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Quantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma 査読有り
Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu
Jpn. J. Appl. Phys. 51 巻 ( 1 ) 頁： 016201-1:6 2012年1月
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Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas 査読有り
Kenji Ishikawa, Hiroko Moriyama, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Hiromasa Tanaka, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori
MRS Online Proceedings Library 1469 巻 2012年
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Chemical Bond Modification in Porous SiOCH Films by H2 and H2/N2 Plasmas Investigated by in situ Infrared Reflection Absorption Spectroscopy (IR-RAS) 査読有り
Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, and Masaru Hori
J. Appl. Phys. 111 巻 ( 12 ) 頁： 1 2011年12月
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Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma 査読有り
Sachiko Iseki, Hiroshi Hashizume, Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, and Masaru Hori
Appl. Phys. Express 4 巻 頁： 116201 2011年11月
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Impacts of CF+, CF2+, CF3+ and Ar Ion Beam Bombardment with energies from 100eV and 400eV on Surface Modification of Photoresist
Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, and Masaru Hori
Jpn. J. Appl. Phys. 50 巻 ( 8 ) 頁： 08JE05-1:5 2011年8月
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Analysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma 査読有り
Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa, Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, and Tetsuya Tatsumi
Jpn. J. Appl. Phys. 50 巻 ( 8 ) 頁： 08JE03-1:4 2011年8月
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Spatial Distributions of Electron, CF, CF2 Radical Densities and Gas Temperature in dc-Superposed Dual- Frequency- Capacitively-Coupled Plasma Etch Reactor Employing c-C4F8/N2/Ar gas
Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine and Masaru Hori
Jpn. J. Appl. Phys. 50 巻 ( 5 ) 頁： 0 2011年5月
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Synergistic Formation of Radicals with Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real time in situ Electron-Spin-Resonance Study 査読有り
Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
J. Phys. Chem. Lett. 2 巻 頁： 1278-1281 2011年5月
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H2/N2 Plasma Damage on Porous Dielectric SiOCH Film Evaluated by In-situ Film Characterization and Plasma Diagnostics 査読有り
Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, and Tokuhisa Ohiwa
J. Appl. Phys. 109 巻 頁： 084112:1-8 2011年4月
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Dissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma 査読有り
Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou Suu
Jpn. J. Appl. Phys. 50 巻 頁： 036203:1-4 2011年3月
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Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet 査読有り
Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, and Masaru Hori
Appl. Phys. Express 4 巻 頁： 026101:1-3 2011年1月