論文 - 石川 健治
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High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System 査読有り Open Access
Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, and Masaru Hori
JAPANESE JOURNAL OF APPLIED PHYSICS 52 巻 頁： 11NE01 2013年11月
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Field emission of nano-organic-rods armored with metal nanoparticles 査読有り
Toshiya Suzuki, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori
JAPANESE JOURNAL OF APPLIED PHYSICS 52 巻 頁： 120203 2013年11月
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Effect of gas flow on atomic radical transportation in AC Excited Non-equilibrium Atmospheric Pressure Plasma jet 査読有り
Keigo Takeda, Masanori Kato, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Makoto Sekine, and Masaru Hori
JOURNAL OF PHYSICS D-APPLIED PHYSICS 46 巻 頁： 464006 2013年10月
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Highly Precise and Rapid Measurements on Substrate Temperature Using Frequency Domain Low Coherence Interferometer 査読有り
Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi Ito
APPLIED PHYSICS LETTERS 101 巻 頁： 182102 2013年10月
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Inactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source 査読有り
Hiroshi Hashizume, Takayuki Ohta, Jia Fengdong, Keigo Takeda,Kenji Ishikawa,Masaru Hori, and Masafumi Ito
APPLIED PHYSICS LETTERS 101 巻 頁： 53708 2013年10月
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Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO -> F + FNO at an Elevated Temperature 査読有り
Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
JOURNAL OF PHYSICAL CHEMISTRY C 117 巻 ( 40 ) 頁： 20810-20818 2013年9月
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Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls 査読有り
Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru Hori
APPLIED PHYSICS EXPRESS 6 巻 頁： 095201 2013年8月
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A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink 査読有り Open Access
Hitoshi Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, Kenji Ishikawa, H. Kondo, M. Sekine, H. Toyoda, and M. Hori
J. Phys.: Conf. Ser. 441 巻 頁： 12019 2013年6月
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A novel fast and flexible technique of radical kinetic behavior investigation based on pallet for plasma evaluation structure and numerical analysis 査読有り
Malinowski, Arkadiusz; Takeuchi, Takuya; Chen, Shang; Suzuki, Toshiya; Ishikawa, Kenji; Sekine, Makoto; Hori, Masaru; Lukasiak, Lidia; Jakubowski, Andrzej
JOURNAL OF PHYSICS D-APPLIED PHYSICS 46 巻 頁： 265201 2013年6月
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Surface morphology on high-temperature plasma-etched gallium nitride 査読有り
Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
Trans. Mater. Res. Soc. Jpn. 38 巻 頁： 325 2013年6月
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Photoluminescence study of plasma-induced damage of GaInN single quantum well 査読有り
Shouichiro Izumi, Masaki Minami, Michiru Kamada, Tetsuya Tatsumi, Atsushi A. Yamaguchi, Kenji Ishikawa, Masaru Hori, and Shigetaka Tomiya
Japanese Journal of Applied Physics 52 巻 ( 8S ) 頁： 08JL09 2013年5月
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Dissociations of C5F8 and C5HF7 in Etching Plasma 査読有り
Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
JAPANESE JOURNAL OF APPLIED PHYSICS 5 巻 頁： 05EB02 2013年5月
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Wavelength dependence of photon-induced interface defects in hydrogenated silicon nitride/Si structure during plasma etching processes 査読有り
Masanaga Fukasawa, Hiroyasu Matsugai, Takayoshi Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi
JAPANESE JOURNAL OF APPLIED PHYSICS 5 巻 頁： 05ED01 2013年5月
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Surface analysis of gallium nitride (GaN) at elevated substrate temperature 査読有り
Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
APPLIED PHYSICS EXPRESS 6 巻 頁： 056201 2013年4月
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Supercritical Fluid Deposition of High-Density Nanoparticles of Photo-Catalytic TiO2 on Carbon Nanowalls 査読有り
Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
Appl. Phys. Express 6 巻 頁： 045103 2013年4月
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A Room Temperature Si Etching in NO/F2 Gas Chemistry and Its Reaction Mechanism 査読有り
Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
J. Phys. Chem. C 117 巻 ( 10 ) 頁： 5118–5125 2013年2月
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Plasma-activated medium selectively kills glioblastoma brain tumor cells by downregulating a survival signaling molecule, AKT kinase 査読有り
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, and Masaru Hori
Plasma Medicine 3 巻 頁： 1 2013年2月
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Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma 査読有り
Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori
J. Phys. D: Appl. Phys. 46 巻 頁： 102001 2013年2月
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Etching-Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma 査読有り
Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, and Masaru Hori
Japanese Journal of Applied Physics 52 巻 ( 2 ) 頁： 020204 2013年1月
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Impact of hydrogen radical injection plasma on fabrication of microcrystalline silicon thin film for solar cells 査読有り
Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
J. Appl. Phys. 113 巻 ( 2 ) 頁： 033304 2013年1月