論文 - 石川 健治
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Valence fragmentation dynamics of a promising low global warming etching gas CF3CHCF2 査読有り 国際誌 Open Access
Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, ane Kenji Ishikawa
Scientific Reports 15 巻 ( 1 ) 頁： 9507 2025年12月
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Selective dry etching of TiAlC over TiN using nonhalogen N2/H2 plasma 査読有り Open Access
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shi-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
Applied Surface Science 691 巻 頁： 122665 2025年5月
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Low-temperature atomic layer etching of platinum via sequential wet-like reactions of plasma oxidation and complexation 査読有り Open Access
Thi-Thuy-Nga Nguyen, D. Akagi, T. Okato, Kenji Ishikawa, and Masaru Hori
Applied Surface Science 687 巻 頁： 162325 2025年4月
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Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3 査読有り Open Access
Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
Applied Surface Science 684 巻 頁： 161815 2025年3月
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Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer's lactate solution 査読有り Open Access
Junichi Usuda, Kenshin Yagyu, Hiromasa Tanaka, Masaru Hori, Kenji Ishikawa, and Yasufumi Takahashi
Faraday Discussions 257 巻 ( 0 ) 頁： 212 - 223 2025年2月
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Developments in low-temperature plasma applications in Asia 査読有り 国際共著
Pankaj Attri, Kenji Ishikawa, Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, Dae-Yeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, and Masaharu Shiratani
Reviews of Modern Plasma Physics 9 巻 ( 1 ) 頁： 6 2025年2月
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Achieving the in-plane orientation of carbon nanowalls: Implications for sensing, energy harvesting, and nano-bio devices 査読有り Open Access
Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Mineo Hiramatsu, and Masaru Hori
ACS Applied Nano Materials 8 巻 ( 6 ) 頁： 2660 - 2668 2025年2月
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Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor 査読有り Open Access
Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Kenji Ishikawa, and Masaru Hori
Applied Surface Science 681 巻 頁： 161485 2025年2月
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Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori
Journal of Vacuum Science and Technology B 43 巻 ( 2 ) 頁： 022202 2025年1月
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Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
Diamond and Related Materials 151 巻 頁： 111687 2025年1月
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Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori
Scientific Reports 14 巻 ( 1 ) 頁： 30575 2024年12月
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Pseudo-wet plasma mechanism enabling high-throughput dry etching of SiO2 by cryogenic-assisted surface reactions 査読有り Open Access
Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori
Small method 8 巻 ( 12 ) 頁： 2400090 2024年12月
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Low-temperature plasma as a strategy to achieve SDGs 査読有り
Hiromasa Tanaka, Kenji Ishikawa, and Shinya Toyokuni
Free Radical Research 58 巻 ( 19 ) 頁： 594 - 595 2024年10月
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Selective removal of single-layer graphene over double-layer graphene on SiO2 by remote oxygen plasma irradiation 査読有り Open Access
Liugang Hu, Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, and Masaru Hori
Applied Surface Science 669 巻 頁： 160598 2024年10月
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High-speed removal process for organic polymers by non-thermal atmospheric pressure spark discharge at room temperature and its mechanism 査読有り Open Access
Yoshihiro Sakamoto, Takayoshi Tsutsumi, Hiromasa Tanaka, Kenji Ishikawa, Hiroshi Hashizume, and Masaru Hori
Coating 14 巻 ( 10 ) 頁： 1339 2024年10月
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Non-halogen dry etching of metal carbide TiAlC by low-pressure N2/H2 plasma at room temperature 査読有り Open Access
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
ACS Applied Materials and Interfaces 16 巻 ( 39 ) 頁： 53195 - 53206 2024年9月
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Science and applications of plasma activated solutions: Current trends and future directions 査読有り
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Camelia Miron, Yasumasa Okazaki, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama, Masafumi Ito, and Masaru Hori
Plasma Medicine 14 巻 ( 1 ) 頁： 67 - 76 2024年9月
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Dry Process 2023 Open Access
Koga K., Takeda K., Toyoda H., Ishikawa K., Ichiki T., Nunomura S., Kurihara K., Kuboi N., Ohta T., Takenaka K.
63 巻 ( 8 ) 2024年8月
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Effects of plasma ions/radicals on kinetic interactions in nanowall deposition: A review 招待有り 査読有り
Kenji Ishikawa
Advanced Engineering Materials 26 巻 ( 16 ) 頁： 2400679 2024年8月
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Future of plasma etching for microelectronics: Challenges and opportunities 査読有り 国際共著 Open Access
Gottlieb Oehrlein, Stephan Brandstadter, Robert Bruce, Jane Chang, Jessica DeMott, Vincent M. Donnelly, Remi Dussart, Andreas Fischer, Richard Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, Kenji Ishikawa, Steven Jaloviar, Keren Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Polouse, Shahid Rauf, Makoto Sekine, Taylor Smith, Nathan Stafford, Theo Standaert, and Peter Ventzek
Journal of Vacuum Science and Technology B 42 巻 ( 4 ) 頁： 041501 2024年7月