講演・口頭発表等 - 堤 隆嘉
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Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process 国際会議
Ma. Shanlene Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita and Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Study on Plasma Process Using Adsorbed C7F14 as an Etchant 国際会議
Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo and Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Morphological Effect of Carbon Nanowalls on Exosome Capture 国際会議
Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu and Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media 国際会議
Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka and Minoru Sasaki
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Characterization of Plasmas and Polymerized Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas 国際会議
Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Contribution Analysis of Process Parameters in Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon 国際会議
Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process 国際会議
Ma. Shanlene, Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Morphological Effect of Carbon Nanowalls on Exosome Capture 国際会議
Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media 国際会議
Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka, Minoru Sasaki
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma 国際会議
Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Study on Plasma Process Using Adsorbed C7F14 as an Etchant 国際会議
Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface 国際会議
Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori
15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）
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Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas 国際会議
Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
International Symposium on Semiconductor Manufacturing 2022
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Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas 国際会議
Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
International Symposium on Semiconductor Manufacturing 2022
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Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing 国際会議
Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
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Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma 国際会議
Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
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Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing 国際会議
Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
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Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma 国際会議
Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
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Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma 国際会議
A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori
The 43rd International Symposium on Dry Process (DPS2022)
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Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma 国際会議
A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori
The 43rd International Symposium on Dry Process (DPS2022)