講演・口頭発表等 - 堤 隆嘉
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ラジカル注入型プラズマ励起化学気相堆積法においてRFバイアス時間変調がアモルファスカーボン膜の結合構造に及ぼす効果
杉浦 啓嗣、近藤 博基、石川 健治、堤 隆嘉、竹田 圭吾、関根 誠、堀 勝
第78回応用物理学会秋季学術講演会
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Etch profile control of ALD-SiO2 film assisted by alternating ALE process of fluorocarbon deposition and O2 plasma etching 国際会議
M. Zaitsu, T. Tsutsumi, A. Kobayashi, H. Kondo, M. Hori, T. Nozawa, N. Kobayashi
4th International Workshop on Atomic Layer Etching
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Advanced Plasma Etching Processing: Atomic Layer Etching for Nanoscale Devices 招待有り 国際会議
T. Tsutsumi, M. Zaitsu, A. Kobayashi, N. Kobayashi, M. Hori
231st Electrochemical Society
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Energy Balance Analysis by High-Precise Wafer Temperature Monitoring in Plasma Processing 招待有り 国際会議
T. Tsutsumi
The 15th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics and The 9th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
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Behavior of Electron and Negative Ion Density in Very High Frequency Capacitively Coupled Plasma
T. Takayoshi, N. Sirse, A. R Ellingboe, M. Sekine, M. Hori
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酸素プラズマによる新規原子層エッチングプロセス 招待有り
堤 隆嘉, 財津 優, 小林 明子, 小林 伸好, 堀 勝
第199回Siテクノロジー分科会研究会
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Advanced Plasma Etching Processing with Feedback Control of Wafer Temperature for Fabrication of Atomic-Scale Organic Devices 国際会議
T. Tsutsumi, Y. Fukunaga, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
26th Annual Meeting of MRS-J
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Phase-resolved measurement of electron density in afterglow of synchronized dc-imposed pulsed plasmas of fluorocarbon based gases 国際会議
T. Ueyama, M. Iwata, Y. Fukunaga, T. Tsutsumi, K. Takeda, K. Ishikawa, M. Sekine, Y. Ohya, M. Hori, and H. Sugai
2016 International Symposium on Dry Process, G-3
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Electron and negative ion densities in a CW and pulsed 100 MHz capacitively coupled plasma discharge 国際会議
N. Sirse, A. Ellingboe, T. Tsutsumi, S. Makoto, M. Hori
69th Annual Gaseous Electronics Conference
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Control of Internal Plasma Parameters Toward Atomic Level Processing 招待有り 国際会議
M. Sekine, T. Tsutsumi, Y. Fukunaga, K. Takeda, H. Kondo, K. Ishikawa, M. Hori
PRiME 2016
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Electron and negative ion diagnostic in a CW and pulsed, 100 MHz, capacitively coupled plasma discharge 国際会議
N. Sirse, T. Tsutsumi, M. Sekine, M. Hori, A. Ellingboe
The 6th International Conference on Microelectronics and Plasma Technology
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DCシンクロパルスプラズマを用いた最先端絶縁膜エッチングプロセスにおける電子の電極間密度分布およびアフターグローでの挙動
植山 稔正, 岩田 学, 福永 裕介, 堤 隆嘉, 竹田 圭吾, 近藤 博基, 石川 健治, 関根 誠, 大矢 欣伸, 堀 勝, 菅井 秀郎
第77回秋季応用物理学会秋季学術講演会
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Vertical distribution measurement of electron density and optical emission in afterglow of pulsed fluorocarbon plasma 国際会議
T. Ueyama, M. Iwata, Y. Fukunaga, T. Tsutsumi, K. Takeda, , K. Ishikawa, M. Sekine, Y. Ohya, M. Hori, H. Sugai
7th International Workshop on Plasma Spectroscopy
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A novel atomic layer etching of SiO2 with alternating O2 plasma with fluorocarbon film deposition 国際会議
T. Tsutsumi, M. Zaitsu, A. Kobayashi, H. Kondo, T. Nozawa, N. Kobayashi, M. Hori
3rd International Workshop on Atomic Layer Etching
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有機膜表面における活性種によるエッチング反応の基板温度依存性
福永 裕介, 堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 関根 誠, 堀 勝
第63回応用物理学会春季学術講演会
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Low-temperature PECVD process of silicon nitride film with radical and plasma diagnostics 国際会議
B. B. Sahu, Jeon G. Han, Y. Y. Yin, J. S. Lee, Su. B. Lee, T. Tsutsumi, K. Ishikawa, M. Hori
8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science
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Evaluation of Substrate Temperature Effect on Etch Profile Development by Intermittent Plasma Generation for Substrate Temperature Control 国際会議
Y. Fukunaga, T. Tsutsumi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science
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Control of Radial Distribusion of Wafer Temperature during Plasma Process 国際会議
T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science
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Plasma Etching Process based on Teal-time Monitoring of Radical Density and Substrate Temperature 招待有り 国際会議
K. Takeda, Y. Fukunaga, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
The 50th Winter Annual Conference of the Korean Vacuum Society
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Atomic-scale plasma process based on substrate-temperature control system 招待有り 国際会議
T. Tsutsumi, Y. Fukunaga, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
Asia international workshop in plasma science