研究者詳細 - 堤　隆嘉

講演・口頭発表等 - 堤　隆嘉

分割表示 508 件中 241 - 260 件目／全件表示 >>

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region 国際会議

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori and Hajime Sakakita

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021） 2021年3月8日

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls 国際会議

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma 国際会議

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka,Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry 国際会議

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori

Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching 国際会議

Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment 国際会議

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, N. Ohno and M. Hori

Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer 国際会議

M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine and M. Hori

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions 国際会議

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface 国際会議

S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls 国際会議

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region 国際会議

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Hajime Sakakita

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment 国際会議

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka, T. Gohira, Y. Ohya, N. Ohno, M. Hori

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma 国際会議

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi, Masaru Hori

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry 国際会議

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions 国際会議

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

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講演・口頭発表等 - 堤 隆嘉

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講演・口頭発表等 - 堤　隆嘉