講演・口頭発表等 - 堤 隆嘉
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Changes of resistive elements during degradation of carbon nanowalls electrodes for fuel cell synthesized employing a CH4/H2 mixture gas plasma 招待有り 国際会議
Hiroki Kondo, Shun Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
MATERIALS RESEARCH MEETING 2019
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Atomic hydrogen exposures of radical-injection CH4/H2 plasma-enhanced chemical vapor deposited amorphous carbon films 国際会議
Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
MATERIALS RESEARCH MEETING 2019
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In-situ analyses of GaN surfaces irradiated by a Cl2 plasma for atomic layer etching 招待有り
Masaki Hasegawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Hiroki Kondo, Atsushi Tanide, and Masaru Hori
第16回 赤﨑記念研究センターシンポジウム 第21回 CIRFEセミナー「窒化物半導体研究の新展開：新規デバイスの創出をめざして」
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Surface functionalization of wool fabrics using plasma process 国際会議
T. Moriyama, T. Tsutsumi, H. Kondo, M. Sekine, K. Ishikawa, and M. Hori
29th Annual Meeting of MRS-Japan 2019
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Electrical, optical, and physicochemical behaviors of atmospheric pressure plasma jet generated in open air 招待有り 国際会議
Keigo Takeda, Kenji Ishikawa, Takayuki Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori
3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019)
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Time-resolved diagnosis of afterglow phase in synchro-bias of negative direct current on pulsed plasmas 国際会議
K. Nakane, T. Tsutsumi, S.-N. Hsiao, K. Ishikawa, M. Sekine, T. Gohira, Y. Ohya, M. Hori
The 41st International Symposium on Dry Process (DPS2019)
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ALE of SiC by Plasma Modification and F-radical Etching Studied by in-situ Surface Spectroscopy 国際会議
R. H. J. Vervuurt, K. Nakane, T. Tsutsumi, M. Hori, N. Kobayashi
The 41st International Symposium on Dry Process (DPS2019)
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Etching characteristics of silicon nitride film in plasma of fluoroethane (CH2FCHF2), Ar, and O2 mixture 国際会議
J. Ni, S.-N. Hsiao, T. Hayashi, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori
The 41st International Symposium on Dry Process (DPS2019)
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Suppression of etch pit formation in GaN etching using H2-added Cl2 plasma at 400°C 国際会議
T. Omichi, A. Tanide, K. Ishikawa, T. Tsutsumi, H. Kondo, M. Sekine, M. Hor
The 41st International Symposium on Dry Process (DPS2019)
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Effects of functional groups in raw material molecules on synthesis rate and structures of nanographene materials synthesized by in-liquid plasma using alcohols 国際会議
H. Kondo, A. Ando, T. Tsutsumi, K. Takeda, T. Ohta, K. Ishikawa, M. Sekine, M. Ito, M. Hiramatsu, M. Hori
The 41st International Symposium on Dry Process (DPS2019)
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Plasma Processing with Feedback Control of Wafer Temperature By Non-Contact Temperature Measurement System 招待有り 国際会議
T. Tsutsumi, H. Kondo, K. Ishikawa , K. Takeda, T. Ohta, M. Sekine, M. Ito, and M. Hori
236th ECS meeting
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High-aspect-ratio organic-pattern formation with self-limiting manner by controlling plasma process based on substrate temperature measurement. 国際会議
Makoto Sekine,Yusuke Fukunaga,Takayoshi Tsutsumi,Kenji Ishikawa,Hiroki Kondo,Masaru Hori
The 72nd Annual Gaseous Electronics Conference
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Effect of mixing alcohol source on synthesis of nanographene by in-liquid plasma 国際会議
Hiroki Kondo, Atsushi Ando, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Kenji Ishikawa, Makoto Sekine, Masafumi Ito, Mineo Hiramatsu, Masaru Hori
The 72nd Annual Gaseous Electronics Conference
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Mechanism of Aqueous Reactions in Non-equilibrium Atmospheric Pressure Plasma-activated Lactec Solutions
Yang Liu、Kenji Ishikawa、Hiroshi Hashizumi、Hiromasa Tanaka、Takayoshi Tsutsumi、Hiroki Kondo、Makoto Sekine、Masaru Hori
2019年 第80回応用物理学会秋季学術講演会
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自己吸収型マイクロ放電ホローカソード光源を用いた水素プラズマの真空紫外吸収分光計測
清水 奨、竹田 圭吾、堤 隆嘉、平松 美根男、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性
長谷川 将希、堤 隆嘉、近藤 博基、関根 誠、石川 健治、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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SiNx の ALE におけるフッ素ラジカルの In-situ エッチング反応解析
中根 一也、ルネイ ヘリンカス ヨセフ フェーフィート、堤 隆嘉、小林 伸好、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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非平衡大気圧Ar プラズマ源における放電形状の経時変化および水素ラジカル密度空間分布計測
勝野 楓、堤 隆嘉、石川 健治、竹田 圭吾、橋爪 博司、田中 宏昌、近藤 博基、関根 誠、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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Highly-durable carbon nanowalls electrodes for fuel cell synthesized employing a C2F6/H2 mixture gas plasma 国際会議
H. Kondo, S. Imai, T. Tsutsumi, K. Ishikawa, M.Sekine, M. Hiramatsu, M.Hori
International Conference on Solid State Devices and Materials 2019
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Composition of ion species in pulsed dual frequency CCP with synchronized dc bias using fluorocarbon gases 国際会議
Kazuya Nakane, Shin-Nan Hsiao , Takayoshi Tsutsumi, Taku Gohira, Kenji Ishikawa, Makoto Sekin, Yoshinobu Ohya and Masaru Hori
The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)