講演・口頭発表等 - 堤 隆嘉
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Rapid precise measurements of film-covered-substrate temperatures during plasma processes 招待有り 国際会議
M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
The 1st International Conference on Surface Engineering
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Non-contact measurements of substrate-temperature by frequency-domain low coherence interferometry 国際会議
T. Tsutsumi, T. Ohta, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito
AVS 60th International Symposium & Exhibition
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Effect of thin films on wafer temperature during plasma processes investigated by non-contact temperature measurement technique 国際会議
T. Tsutsumi, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
The XXXI International Conference on Phenomena in Ionized Gases
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Precise Rapid Measurement of Substrate Temperature by Frequency-Domain Optical Low-Coherence Interferometry 招待有り 国際会議
M. Ito, T. Ohta, T. Tsutsumi, K. Takeda, M. Hori
17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
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低コヒーレンス干渉計を用いた基板温度計測における波長依存性
加藤 寛人, 柴田 恭平, 太田 貴之, 堤 隆嘉, 堀 勝, 伊藤 昌文
第60回応用物理学会春季学術講演会
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窒化ガリウム（GaN）向けたサファイア基板の周波数領域型低コヒーレンス干渉計による温度計測(Ⅱ) 招待有り
堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
第60回応用物理学会春季学術講演会
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Temperature measurement of carbon nanowall / silicon substrate using super-continuum light source on low-coherence interferometry 国際会議
T. Hiraoka, H. Kato, T. Tsutsumi, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Hori
The 6th International Conference on PLAsma Nano Technology & Science
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Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry 国際会議
T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Ohta, H. Kondo, K. Ishikawa, M. Ito, M. Sekine, M. Hori
5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Monitoring of wafer temperature in plasma processing using optical low-coherence interferometry 招待有り 国際会議
T. Ohta, M. Ito, T. Tsutsumi, T. Hiraoka, K. Takeda, M. Hori
The 16th International Workshop on Advanced Plasma Processing and Diagnostics
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Real time temperature measurements of film-covered-substrate employing Fourier domain low coherence interferometer during plasma processes 国際会議
T. Tsutsumi, T. Hiraoka, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Temperature measurement of substrate with a thin film using low-coherence interference 国際会議
T. Tsutsumi, T. Hiraoka, K. Takeda, K. Ishikawa, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori
65th Annual Gaseous Electronics Conference
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Non-Contact Measurement of Wafer Temperature for plasma processing Using Low Coherence Interferometry 国際会議
T. Ohta, T. Tsutsumi, M. Ito, K. Takeda, M. Hori
The 11th Asia Pacific Conference on Plasma Science and Technology and 25th Symposium on Plasma Science for Materials
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Non-Contact Temperature Measurement of Sapphire Substrate for GaN using Frequency Domain Low Coherence Interferometry 国際会議
T. Tsutsumi, K. Takeda, K. Ishikawa, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori
The 11th Asia Pacific Conference on Plasma Science and Technology and 25th Symposium on Plasma Science for Materials
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光干渉計を用いたプラズマプロセス中の半導体基板の温度計測技術
堤 隆嘉
第6回プラズマエレクトロニクス インキュベーションンホール
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窒化ガリウム（GaN）向けサファイア基板の周波数領域型低コヒーレンス干渉計による温度計測
堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
秋季第73回応用物理学会学術講演会
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High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer 国際会議
T. Tsutsumi, M. Hori, M. Sekine, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito
The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
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光干渉計を用いたカーボンナノウォール/Si基板の基板温度計測
平岡 丈弘, 夏目 将利, 加藤 寛人, 堤 隆嘉, 太田 貴之, 伊藤 昌文, 竹田 圭吾, 近藤 博基, 堀 勝
第59回応用物理学関係連合講演会
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Temperature Measurement of Carbon Nanowall/Silicon Substrate Using Fourier-Domain Low-coherence Interferometry 国際会議
T. Hiraoka, M. Natsume, H. Kato, T. Tsutsumi, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Hori
6th International Conference on PLAsma-Nano Technology & Science
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Non-contact Temperature Measurement of Silicon Wafer Using Frequency Domain Low Coherence Interferometer 国際会議
T. Tsutsumi, T. Ohta, M. Ito, S. Tsuchitani, M. Hori
5th International Conference on PLAsma-Nano Technology & Science
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光干渉計を用いたプラズマプロセス中の非接触ウエア温度モニタリング
太田 貴之, 堤 隆嘉, 伊藤 昌文, 堀 勝
Plasma Conference 2011 Conference & Exhibition