講演・口頭発表等 - 堤 隆嘉
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Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 国際会議
Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021） 2021年3月8日
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Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer 国際会議
M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021） 2021年3月8日
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Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface 国際会議
S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021） 2021年3月8日
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Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching 国際会議
Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021） 2021年3月8日
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Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures 国際会議
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
International Symposium on Semiconductor Manufacturing 2020 (ISSM2020) 2020年12月15日
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Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures 国際会議
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
International Symposium on Semiconductor Manufacturing 2020 (ISSM2020) 2020年12月15日
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Antitumor effect of plasma-activated Ringer’s acetate solution 国際会議
Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori
2020年12月10日
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Antitumor effect of plasma-activated Ringer’s acetate solution 国際会議
Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori
2020年12月10日
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Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma 国際会議
Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori
The 29th International Toki Conference on Plasma and Fusion Research 2020年10月28日
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Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas 国際会議
S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno
The 29th International Toki Conference on Plasma and Fusion Research 2020年10月28日
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Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma 国際会議
Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori
The 29th International Toki Conference on Plasma and Fusion Research 2020年10月28日
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Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas 国際会議
S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno
The 29th International Toki Conference on Plasma and Fusion Research 2020年10月28日
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Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles 国際会議
Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
73th Annual Gaseous Electronics Virtual Conference 2020年10月8日
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Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films 国際会議
Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
73th Annual Gaseous Electronics Virtual Conference 2020年10月9日
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Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles 国際会議
Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
73th Annual Gaseous Electronics Virtual Conference 2020年10月8日
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Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films 国際会議
Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
73th Annual Gaseous Electronics Virtual Conference 2020年10月9日
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カーボンナノウォールの局所電気伝導特性の解明
尾崎 敦士、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝
第81回応用物理学会秋季学術講演会
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液中プラズマを用いたナノグラフェン合成における活性種の効果
近藤 博基、濱地 遼、堤 隆嘉、石川 健治、関根 誠、堀 勝
第81回応用物理学会秋季学術講演会
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カーボンナノウォールの局所電気伝導特性の解明
尾崎 敦士, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝
第81回応用物理学会秋季学術講演会
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液中プラズマを用いたナノグラフェン合成における活性種の効果
近藤 博基, 濱地 遼, 堤 隆嘉, 石川 健治, 関根 誠, 堀 勝
第81回応用物理学会秋季学術講演会