講演・口頭発表等 - 堤 隆嘉
-
Nano-composite innovation based on carbon nanowalls and advanced plasma processes 招待有り 国際会議
Hiroki Kondo, Takayoshi Tsutsumi, Makoto Sekine, Kenji Ishikawa, Masaru Hori, Mineo Hiramatsu
7th International Conference on Advanced Plasma Technologies
-
フルオロカーボンガスを用いた２周波容量結合型パルスプラズマに おける粒子密度のDC重畳効果 招待有り
中根 一也、植山 稔正、解 錫同、堤 隆嘉、竹田 圭吾、近藤 博基、石川 健治、関根 誠、大矢 欣伸、堀 勝
第215回Siテクノロジー分科会研究会
-
Trimming Process with Feedback Control of Wafer Temperature for Organic Material 招待有り 国際会議
T. Tsutsumi, Y. Fukunaga, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
28th Annual Meeting of MRS-J
-
Cell responses of Pseudochoricystis ellipsoidea on atmospheric pressure plasma treatments 国際会議
T. Kato, Y. Hosoi, S.Yamaoka, H.Hashizume, K.Ishikawa, H.Tanaka, T.Tsutsumi, H.Kondo, M.Sekine and M.Hori
28th Annual Meeting of MRS-J
-
Effects and Mechanism of Electric Stimulation Through Carbon Nanowalls Scaffold on Proliferation and Differentiation of Cultured Cells 国際会議
Hiroki Kondo, Tomonori Ichikawa, Kenji Ishikawa, Hiromasa Tanaka, Takayoshi Tsutsumi, Keigo Takeda, Makoto Sekine, Masaru Hori, Mineo Hiramatsu
A Meeting of the Materials Research Society
-
In situ analysis of ion-irradiated and chlorinated GaN surface during cyclic etching processes 国際会議
M. Hasegawa, T. Tsutsumi, A. Tanide, H. Kondo, M. Sekine, K. Ishikawa, M. Hori
The 40th International Symposium on Dry Process
-
Synthesis of composite of tin oxide particles and graphene sheets employing the in-liquid plasma process 国際会議
Ranjit R. Borude , Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo and Masaru Hori
The 40th International Symposium on Dry Process
-
Effects of electrical and spectroscopic properties of nonequilibrium atmospheric pressure plasma source on adhesion strengths of a polymeric resin 国際会議
K. Katsuno, T. Tsutsumi, K. Ishikawa, K. Takeda, T. Jindo, S. Takikawa, A. Niwa, S. Takashima, Y. Nonoyama, H. Hashizume, H. Tanaka, H. Kondo, M. Sekine, and M. Hori
The 40th International Symposium on Dry Process
-
Etch Characteristics of Atomic Layer Etching by Alternating Fluorocarbon Deposition and Oxygen Plasma Etching 国際会議
T. Tsutsumi, A. Kobayashi, T. Nozawa, N. Kobayashi and M. Hori
The 40th International Symposium on Dry Process
-
Plasma Modification of Si-compound Surfaces: Opportunities for Atomic Layer Etching 国際会議
R.H.J. Vervuurt, K. Nakane, T. Tsutsumi, A. Kobayashi, M. Hori and N. Kobayashi
The 40th International Symposium on Dry Process
-
Defect termination mechanism in amorphous carbon films by atomic hydrogen radicals 国際会議
The 40th International Symposium on Dry Process
-
High temperature etching of GaN with H2-added Cl2 plasma 国際会議
T. Omichi, A. Tanide, K. Ishikawa, T. Tsutsumi, H. Kondo, M. Sekine, M. Hori
The 40th International Symposium on Dry Process
-
Fundamental study of the interaction of plasma species with organic materials by experimental and computational approaches 国際会議
Y. Fukunaga, P. Ventzek, B. Lane, A. Ranjan, G. S. Hwang, G. Hartmann, R. Upadhyay, L. L. Raja, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
The 40th International Symposium on Dry Process
-
Floating-Wire-Assisted Atmospheric Pressure Plasma for High-Speed Glass Etching 国際会議
Thi-Thuy-Nga Nguyen, M. Sasaki, H. Odaka, T. Tsutsumi, K. Ishikawa and M. Hori
The 40th International Symposium on Dry Process
-
Effects of synchronized DC bias on densities of charged species in pulsed plasmas of fluorocarbon gases 国際会議
K. Nakane, T. Ueyama, T. Tsutsumi, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, Y. Ohya, and M. Hori
The 40th International Symposium on Dry Process
-
Spatiotemporal behavior of OH radical in AC-excited atmospheric pressure Ar plasma jet generated in open air 国際会議
Keigo Takeda, Ren Kuramashi, Kenji Ishikawa ,Takayuki Tsutsumi, Masaru Hori
71st Annual Gaseous Electronics Conference
-
Floating-wire-assisted remote generation of high-density atmospheric pressure inductively coupled plasma 国際会議
Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
71st Annual Gaseous Electronics Conference
-
Behaviors of Charged Species in Afterglow of Dual Frequency Pulsed Capacitively Coupled Plasma with a Synchronous Negative DC-bias 国際会議
T. Tsutsumi, T. Ueyama, K. Ishikawa, H. Kondo, M. Sekine, Y. Ohya, M. Hori
AVS 65th INTERNATIONAL SYMPOSIUM & EXHIBITION 2018
-
Fundamental Studies of Plasma Species with Organic Materials of Varying Hydrogen and Oxygen Composition by Computational and Experimental Approaches 国際会議
Y. Fukunaga, P. Ventzek, B. Lane, A. Ranjan, M. Sekine, T. Tsutsumi, H. Kondo, K. Ishikawa, R. Upadhyay, L. L. Raja, G. Hartmann, G. S. Hwang, M. Hori
AVS 65th INTERNATIONAL SYMPOSIUM & EXHIBITION 2018
-
Fine Temperature Monitoring of Si Wafer for Plasma Processing 招待有り 国際会議
Masafumi Ito, Takayuki Ohta, Takayoshi Tsutsumi, Masaru Hori
AIMES2018