Presentations -
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Study on Charge Storage and Optical Response of Hybrid Nanodots Floating Gate MOS Devices for Their Optoelectronic Application International conference
S. Miyazaki, M. Ikeda and K. Makihara
224th Electrochemical Society (ECS) Meeting : Dielectric and Semiconductor Materials, Devices, and Processing
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リモート水素プラズマ支援によるFePt合金ナノドットの高密度形成と磁化特性評価
福岡諒、張海、壁谷悠希、恒川直輝、牧原克典、大田晃生、宮崎誠一
第74回応用物理学会秋季学術講演会
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Transient Characteristics of Electroluminescence from Self-aligned Si-based Quantum Dots International conference
Y. Suzuki, K. Makihara M. Ikeda and S. Miyazaki
2013 International Conference on Solid State Devices and Materials
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Characterization of Electron Transport Through Ultra High Density Array of One-dimensionally Self-Aligned Si-based Quantum Dots International conference
H. Niimi, K. Makihara, M. Ikeda and S. Miyazaki
2013 International Conference on Solid State Devices and Materials
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導電性AFM探針による高密度一次元連結Si系量子ドットからの電子放出特性評価
竹内大智、牧原克典、池田弥央、宮崎誠一
第74回応用物理学会秋季学術講演会
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バイアス印加が一次元連結Si系量子ドットのPL特性に及ぼす影響
鈴木善久、牧原克典、池田弥央、宮崎誠一
第74回応用物理学会秋季学術講演会
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リモート水素プラズマ支援によるSiO2上へのFeナノドットの高密度形成
張海、福岡諒、壁谷悠希、牧原克典、宮崎誠一
第74回応用物理学会秋季学術講演会
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外部磁場印加がCoPt合金ナノドットの電子輸送特性に及ぼす影響
壁谷悠希、福岡諒、張海、牧原克典、宮崎誠一
第74回応用物理学会秋季学術講演会
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Low Temperature Formation of Crystalline Si/Ge Heterostructures by Plasma Enhanced CVD in Combination with Ni-NDs Seeding Nucleation International conference
Y. Lu, K. Makihara, D. Takeuchi, K. Sakaike, M. Akazawa, M. Ikeda, S. Higashi and S, Miyazaki
25th International Conference on Amorphous and Nanocrystalline Semiconductor
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Formation of High Density Fe-Nanodots on Ultrathin SiO2 Induced by Remote H2 Plasma International conference
H. Zhang, R. Fukuoka, Y. Kabeya, K. Makihara and and S. Miyazaki
35th International Symposium on Dry Process
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Formation and Characterization of Hybrid Nanodots Floating Gate for Optoelectronic Devices International conference
S. Miyazaki, K. Makihara and M. Ikeda
JSPS Core-to Core Program Seminar "Atomically Controlled Processing for Ultralarge Scale Integration
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High Density Formation of CoPt Alloy Nanodots Induced by Remote H2 Plasma International conference
R. Fukuoka, H. Zhang, Y. Kabeya, K. Makihara, A. Ohta, M. Ikeda and S. Miyazaki
The 8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8) and the 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI)
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Characterization of Electroluminescence from Multiply-Stacked B-doped Si Quantum Dots International conference
T. Yamada, K. Makihara, H. Takami, Y. Suzuki, M. Ikeda and S. Miyazaki
The 8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8) and the 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI)
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Characterization of Electroluminescence from Self-Aligned Si-Based Quantum Dots Stack by Intermittent Bias Application International conference
K. Makihara, H. Takami, Y. Suzuki, M. Ikeda, S. Miyazaki
The 8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8) and the 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI)
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リモートH2プラズマ支援によるCoPtナノドットの高密度形成と帯電・帯磁特性評価
牧原克典、福岡諒、張海、壁谷悠希、大田晃生、宮崎誠一
電気通信情報学会(SDM) [シリコン材料・デバイス]
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SiOx/TiO2積層したMIMダイオードにおける抵抗変化特性評価
大田晃生、福嶋太紀、牧原克典、村上秀樹、東清一郎、宮崎誠一
電気通信情報学会(SDM) [シリコン材料・デバイス]
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Selective Growth of Self-Assembling Si and SiGe Quantum Dots International conference
K. Makihara, M. Ikeda and S. Miyazaki
2013 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices
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High-Sensitive Detection of Electronic Emission through Si-Nanocrystals/Si-Nanocolumnar Structures by Conducting-Probe Atomic Force Microscopy International conference
D. Takeuchi, K. Makihara, M. Ikeda, S. Miyazaki, H. Kaki and T. Hayashi
2013 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices
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High Density Formation of Iron Nanodots on SiO2 Induced by Remote Hydrogen Plasma International conference
H. Zhang, R. Fukuoka, Y. Kabeya, K. Makihara and S. Miyazaki
3rd International Conference on Advanced Engineering Materials and Technology (AEMT 2013)
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導電性AFM探針を用いたSiナノ結晶/柱状Siナノ構造の電子放出特性評価
竹内大智、牧原克典、池田弥央、宮崎誠一、可貴裕和、林司
第60回春季応用物理学会