Presentations -
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Impact of Embedded Mn-Nanodots on Resistive Switching Properties of Si-rich Oxides International conference
T. Arai, A. Ohta, K. Makihara and S. Miyazaki
28th International Microprocesses and Nanotechnology Conference (MNC)
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Formation and Characterization of High Density FePt Nanodots on SiO2 Induced by Remote Hydrogen International conference
K. Makihara, Y. Kabeya, A. Ohta, T. Kato, A. Iwata and S. Miyazaki
2015 International Conference on Solid State Devices and Materials (SSDM 2015)
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Cleaning of 4H-SiC(0001) Surface by using Remote Hydrogen Plasma International conference
T. Nguyen, D. Takeuchi, A. Ohta, K. Makihara, and S. Miyazaki
8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2016) / 9th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2016)
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Self-assembling Formation of Ta Nanodots Induced by Remote Hydrogen Plasma from Ge/Ta Bi-layer Stack International conference
Y. Wang, D. Takeuchi, A. Ohta, M. Ikeda, K. Makihara, and S. Miyazaki
8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2016) / 9th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2016)
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Impact of Magnetic-Field Application on Electron Charging Characteristics of FePt Nanodots International conference
T. Kawase, Y. Mitsuyuki, A. Ohta, K. Makihara, T. Kato, S. Iwata, and S. Miyazaki
8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2016) / 9th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2016)
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Formation of High Density Ta Oxide Nanodots International conference
Y. Wang, D. Takeuchi, A. Ohta, K. Makihara, and S. Miyazaki
8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2016) / 9th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2016)
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Effect of Ge Stacked Layer on Ti Nanodots Formation From Metal Thin Films by Remote Hydrogen Plasma Exposure International conference
Y. Kato, A. Ohta, K. Makihara, and S. Miyazaki
8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2016) / 9th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2016)
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High Density Formation of Fe-silicide Nanodots Induced by Remote H2 Plasma and Characterization of Their Crystalline Structure and Magnetic Properties International conference
H. Zhang, A. Ohta, K. Makihara and S. Miyazaki
The 37th International Symposium on Dry Process (DPS2015)
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Characterization of Electron Field Emission from High Density Self-Aligned Si-Based Quantum Dots International conference
D. Takeuchi, K. Makihara, A. Ohta, M. Ikeda and S. Miyazaki
7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nano materials / 8th International Conference on Plasmas-Nano Technology & Science (ISPlasma2015 / IC-PLANTS2015)
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Formation and Characterization of High Density FeSi Nanodots on SiO2 Induced by Remote H2 Plasma International conference
H. Zhang, K. Makihara, A. Ohta and S. Miyazaki
7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nano materials / 8th International Conference on Plasmas-Nano Technology & Science (ISPlasma2015 / IC-PLANTS2015)
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Study on Electroluminescence from Multiply-Stacking Valencey Controlled Si Quantum Dots International conference
T. Yamada, K. Makihara, A. Ohta, M. Ikeda, and S. Miyazaki
9th International Conference On Silicon Epitaxy And Heterostructures (ICSI-9)
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Impact of Phosphorus Doping to Multiply-Stacking Si Quantum Dots on Electron Field Emission Properties International conference
D. Takeuchi, K. Makihara, A. Ohta, M. Ikeda and S. Miyazaki
The 9th International Conference on Silicon Epitaxy and Heterostructures (ICSI-9)
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Electronic Defect States in Thermally-grown SiO2/4H-SiC Structure Measured by Total Photoelectron Yield Spectroscopy International conference
A. Ohta, K. Makihara, and S. Miyazaki
19th biannual Conference on Insulating Films on Semiconductors 2015 (INFOS2015)
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Electron Transport Properties of High Density FePt-NDs Stacked Structures International conference
Y. Mitsuyuki, K. Makihara, A. Ohta and S. Miyazaki
2015 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD2015)
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Effect of P-doping on Photoluminescence Properties of Si Quantum Dots with Ge Core International conference
K. Kondo, K. Makihara, A. Ohta and S. Miyazaki
2015 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD 2015)
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Impact of Magnetic-Field Application on Electron Transport Through FePt-NDs Stacked Structures International conference
Y. Mitsuyuki, K. Makihara, A. Ohta and S. Miyazaki
JSPS International Core-to-Core Program Workshop, Atomically Controlled Processing for Ultra-large Scale Integration
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Characterization of Field Emission Properties from Multiply-Stacking Si Quantum Dots International conference
D. Takeuchi, K. Makihara, A. Ohta and S. Miyazaki
JSPS Core-to-Core Program Workshop "Atomically Controlled Processing for Ultralarge Scale Integration"
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Impact of Remote H2 Plasma on Surface and Electronic Structures of 4H-SiC(0001) International conference
T. Nguyen, A. Ohta, D. Takeuchi, H. Zhang, K. Makihara and S. Miyazaki
The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
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High Density Formation of Fe silicide-nanodots on SiO2 Induced by Remote H2-plasma International conference
H. Zhang, A. Ohta, K. Makihara and S. Miyazaki
The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
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High Density Formation of Ta Nanodots Induced by Remote Hydrogen Plasma International conference
Y. Wang, D. Takeuchi, K. Makihara, A. Ohta, and S. Miyazaki
68th Annual Gaseous Electronics Conferences/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing