Presentations -
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GeコアSi量子ドットのエレクトロルミネッセンス特性
山田 健太郎、池田 弥央、牧原 克典、宮崎 誠一
第77回応用物理学会秋季学術講演会
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HfO2/SiO2/Si(100)構造における内部電位分布、界面ダイポールの定量評価
藤村信幸、大田晃生、池田弥生、牧原克典、宮崎誠一
第77回応用物理学会秋季学術講演会
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FePtナノドットスタック構造における磁場印加後の電気伝導特性評価
河瀨平雅、牧原克典、大田晃生 、池田弥央、宮崎誠一
第77回応用物理学会秋季学術講演会
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Ta酸化物ナノドットの高密度・一括形成 (II)
王亜萍、竹内大智、池田弥央、大田晃生、牧原克典、宮崎誠一
第77回応用物理学会秋季学術講演会
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X線光電子分光法による熱酸化SiO2およびGeO2薄膜の誘電関数評価
山本泰史、大田晃生、池田弥央、牧原克典、宮崎誠一
第77回応用物理学会秋季学術講演会
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リモートプラズマCVD SiO2/GaN界面の光電子分光分析
グェンスァン チュン，大田 晃生，牧原 克典，池田 弥央，宮崎 誠一
第77回応用物理学会秋季学術講演会
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Formation of Fe3Si-Nanodots on Ultrathin SiO2 Induced by H2-plasma Treatment and Their Magnetic-Field Dependent Electron Transport Properties International conference
H. Zhang, K. Makihara, M. Ikeda, A. Ohta, and S. Miyazaki
Asia-Pacific Conference on Semiconducting Silicides and Related Materials
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Study of Electron Field Emission from Multiply-Stacking Si Quantum Dots International conference
D. Takeuchi, K. Makihara, A. Ohta, M. Ikeda, S. Miyazaki
9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar" Atomically Controlled Processing for Ultralarge Scale Integration"
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Determination of Electron Affinity of Si-based Materials using by X-ray Photoelectron Spectroscopy International conference
N. Fujimura, A. Ohta, K. Makihara and S. Miyazaki
9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar" Atomically Controlled Processing for Ultralarge Scale Integration"
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Impact of Ge Capping Layer on Ta Nanodots Formation Induced by Remote Hydrogen Plasma International conference
Y. Wang, D. Takeuchi, M. Ikeda, K. Makihara, A. Ohta, and S. Miyazaki
9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar" Atomically Controlled Processing for Ultralarge Scale Integration"
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Evaluation of Electronic States of Thermally-grown SiO2/4H-SiC International conference
H. Watanabe, A. Ohta, N, Fujimura, K. Makihara, and S. Miyazaki
9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar" Atomically Controlled Processing for Ultralarge Scale Integration"
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Characterization of Electronic Charged States of FePt-NDs Stacked Structures by Kelvin Force Microscopy International conference
T. Kawase, Y. Mitsuyuki, A. Ohta, K. Makihara, T. Kato, S. Iwata and S. Miyazaki
9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar" Atomically Controlled Processing for Ultralarge Scale Integration"
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High Density Ti Nanodots Formation and Improvement of ReRAM Characteristics by Embedding Ti Nanodots International conference
Y. Kato, A. Ohta, K. Makihara and S. Miyazaki
9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar" Atomically Controlled Processing for Ultralarge Scale Integration"
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Impact of Phosphorus Doping to Multiply-Stacking Si Quantum Dots on Electron Emission Properties International conference
D. Takeuchi, K. Makihara, A. Ohta, M. Ikeda, S. Miyazaki
7th International Symposium on Control of Semiconductor Interfaces and 8th International SiGe Technology and Device Meeting joint meeting (ISCSI-VII/ISTDM 2016)
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Determination of Energy Band Profile of Thermally-grown SiO2/4H-SiC Structure Using XPS International conference
H. Watanabe, A. Ohta, K. Makihara, and S. Miyazaki
7th International Symposium on Control of Semiconductor Interfaces and 8th International SiGe Technology and Device Meeting joint meeting (ISCSI-VII/ISTDM 2016)
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Electron Transport Properties of High Density FePt-NDs Stacked Structures International conference
T. Kawase, Y. Mitsuyuki, K. Makihara, A. Ohta, M. Ikeda and S. Miyazaki
7th International Symposium on Control of Semiconductor Interfaces and 8th International SiGe Technology and Device Meeting joint meeting (ISCSI-VII/ISTDM 2016)
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Formation and Electron Transport Properties of Fe3Si Nanodots on Ultrathin SiO2 International conference
Hai Zhang, Mitsuhisa Ikeda, Katsunori Makihara, Akio Ohta and Seiichi Miyazaki
2016 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices
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Embedding of Ti Nanodots into SiOx and Its Impact on Resistance Switching Behaviors International conference
Yusuke Kato, Akio Ohta, Mitsuhisa Ikeda, Katsunori Makihara, and Seiichi Miyazaki
2016 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices
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熱酸化SiO2/4H-SiC Si面およびC面の電子占有欠陥および化学構造評価
渡辺浩成、大田晃生、池田弥生、牧原克典、森大輔、寺尾豊、宮崎誠一
第16回日本表面科学会中部支部学術講演会
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A Study of Magnetoelectronic Transport in Double Stack FePt Nanodots on Ultrathin SiO2/c-Si for Functional Memories International conference
Seiichi Miyazaki, Yusuke Mitsuyuki, Taiga Kawase, Mitsuhisa Ikeda, and Katsunori Makihara
E-MRS 2016 Fall Meeting