講演・口頭発表等 - 牧原 克典
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光電子収率分光法によるSiO2/SiC構造の電子状態計測(2)
大田晃生、渡邊浩成、グェンスァンチュン、牧原克典、宮崎誠一
第62回春季応用物理学会
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リモート水素プラズマ支援によるTaナノドットの高密度一括形成
王亜萍、牧原克典、大田晃生、竹内大智、宮崎誠一
第62回春季応用物理学会
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リモート水素プラズマ処理した4H-SiC表面の化学構造および電子状態分析
グェンスァンチュン、大田晃生、竹内大智、張海、牧原克典、宮崎誠一
第62回春季応用物理学会
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高密度FePtナノドットスタック構造の電子輸送特性
壁谷悠希、満行優介、張海、大田晃生、牧原克典、宮崎誠一
第62回春季応用物理学会
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リモート水素プラズマ支援によるFeシリサイドナノドットの高密度一括形成と磁化特性評価
張海、牧原克典、大田晃生、壁谷悠希、宮崎誠一
第62回春季応用物理学会
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P添加がGeコアSi量子ドットのPL特性に及ぼす影響
近藤圭悟、牧原克典、宮崎誠一
第62回春季応用物理学会
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不純物添加がSi量子ドット多重集積構造のEL特性に及ぼす影響
山田敬久、牧原克典、池田弥央、宮崎誠一
第62回春季応用物理学会
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外部磁場がFePt合金ナノドットへの電子注入特性に及ぼす影響
満行優介、壁谷悠希、張海、大田晃生、牧原克典、宮崎誠一
第62回春季応用物理学会
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Photoluminescence Properties of Si Quantum Dots with Ge Core 国際会議
K. Kondo, K. Makihara and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Characterization of Electroluminescence from Multiply-Stack of Doped Si Quantum Dots 国際会議
T. Yamada, K. Makihara, M. Ikada and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Characterization of Electron Field Emission from High Density Self-aligned Si-based Quantum Dots 国際会議
D. Takeuchi, K. Makihara, A. Ohta, M. Ikada and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Impact of Post Metallization Annealing on Chemical Bonding Features and Interfacial Reactions in Ge-MIS Structure with HfO2/TaGexOy Dielectric Stack 国際会議
A. Ohta, H. Murakami, K. Makihara and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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High Density Formation of Fe-Silicide Nanodots Induced by Remote Hydrogen Plasma 国際会議
H. Zhang, K. Makihara, A. Ohta, M. Ikada and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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High Density Formation of Mn-Ge Nanodots Induced by Remote Hydrogen Plasma 国際会議
Y. Wen, K. Makihara, A. Ohta and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Impact of Magnetic-Field Application on Electron Transport Through FePt Alloy Nanodots 国際会議
Y. Kabeya, H. Zhang, A. Ohta, K. Makihara and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Formation and Characterization of High Density FePt Alloy Nanodots Induced by Remote Hydrogen Plasma 国際会議
Y. Mitsuyuki, Y. Kabeya, K. Makihara, T. Kato, S. Iwata and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Impact of Remote Hydrogen Plasma on Micro-roughness and Electronic States at 4H-SiC(0001) Surface 国際会議
T. Nguyen, A. Ohta, D. Takeuchi, H. Zhang, K. Makihara and S. Miyazaki
8th International WorkShop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically Controlled Processing for Ultralarge Scale Integration"
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Si-rich酸化膜へのMnナノドット埋め込みが抵抗変化特性へ及ぼす影響
荒井崇、大田晃生、牧原克典、宮崎誠一
ゲートスタック研究会 (第20回研究会)
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Magnetic-Field Dependence of Electron Transport Through FePt Alloy-NDs on Ultrathin SiO2 国際会議
K. Makihara, Y. Kabeya, Y. Mitsuyuki, A. Ohta, Y. Darma, and S. Miyazaki
8th International Conference on Materials for Advanced Technologies of the Materials Research Society of Singapore & 16th IUMRS-International Conference in Asia
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Evaluation of Valence Band Maximum and Electron Affinity of SiO2 and Si-based Semiconductors Using XPS 国際会議
N. Fujimura, A. Ohta, K. Makihara and S. Miyazaki
2015 International Workshop on Dielectric Thin Films for Future Electron Devices (IWDTF)