Faculty Profiles - ISHIKAWA, Kenji

Papers - ISHIKAWA, Kenji

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Adhesion enhancement and amine reduction using film redeposited at the interface of a stack of plasma-enhanced CVD dielectrics for Cu/low-k interconnects Reviewed

Miyajima Hideshi, Watanabe Kei, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 58 ( 2 ) 2019.2

Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system Reviewed

Fukunaga Yusuke, Tsutsumi Takayoshi, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 58 ( 2 ) 2019.2

Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl-2 gas mixtures and a separate supply of nitrogen precursors from a high density radical source Reviewed

Tanide Atsushi, Nakamura Shohei, Horikoshi Akira, Takatsuji Shigeru, Kohno Motohiro, Kinose Kazuo, Nadahara Soichi, Nishikawa Masazumi, Ebe Akinori, Ishikawa Kenji, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 58 ( SA ) 2019.2

Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Han Jeon Geon, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 58 ( SA ) 2019.2

Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

Borude, RR; Sugiura, H; Ishikawa, K; Tsutsumi, T; Kondo, H; Ikarashi, N; Hori, M

ACS APPLIED NANO MATERIALS Vol. 2 ( 2 ) page： 649 - 654 2019.2

Language：English Publishing type：Research paper (scientific journal) Publisher：ACS Applied Nano Materials

The in situ binding of tin oxide (SnO<inf>2</inf>) nanoparticles (SNp) and graphene nanosheets (GNs) that synthesized simultaneously in single-step atmospheric-pressure processing was achieved at a low temperature by employing in-liquid plasma in a solution of tin chloride (SnCl<inf>2</inf>·2H<inf>2</inf>O) in ethanol as the only precursor. Transmission electron microscopy, Raman analysis, and X-ray diffraction revealed the composite (SNp/GNs) synthesis with SNp of sizes 2-3 nm, which were distributed uniformly and attached to both sides of the GNs. The SNp/GNs composite synthesis was provided by the simple, low-cost, single-processing method of the in-liquid plasma for future gas-sensing and lithium-ion battery applications.

DOI： 10.1021/acsanm.8b02201

Web of Science

Scopus

Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H-2 plasma-enhanced chemical vapor deposition Reviewed

Imai Shun, Kondo Hiroki, Hyungjun Cho, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

APPLIED PHYSICS EXPRESS Vol. 12 ( 1 ) 2019.1

Batch Fabrication of Nano-Gap Electrode Array Using Photo-Patterning and Resist UV-Curing

Nguyen Hai Minh, Kumeuchi Mako, Kumagai Shinya, Ishikawa Kenji, Hori Masaru, Sasaki Minoru

IEEJ Transactions on Sensors and Micromachines Vol. 139 ( 1 ) page： 27 - 28 2019.1

Language：English Publishing type：Research paper (scientific journal) Publisher：The Institute of Electrical Engineers of Japan

<p>A nano-gap electrode array is batch-fabricated based on photolithography. A high resolution is obtained by using an over-hanging resist cover on the under-etched metal film. The process includes two-time mask-patterning. The first photoresist is UV-cured, allowing second patterning without degrading the first pattern. A nano-gap width of 237±63 nm is obtained from a 704-electrode array with an yield of 97%.</p>

DOI： 10.1541/ieejsmas.139.27

CiNii Research

Molecular mechanisms of non-thermal plasmainduced effects in cancer cells Reviewed

Tanaka Hiromasa, Mizuno Masaaki, Ishikawa Kenji, Toyokuni Shinya, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

BIOLOGICAL CHEMISTRY Vol. 400 ( 1 ) page： 87 - 91 2019.1

Single-cell microscopic raman spectroscopy for rapid microbial detection Reviewed

Onoshima D., Uchida K., Yukawa H., Ishikawa K., Hori M., Baba Y.

23rd International Conference on Miniaturized Systems for Chemistry and Life Sciences Microtas 2019 page： 1374 - 1375 2019

Language：English Publishing type：Research paper (scientific journal) Publisher：23rd International Conference on Miniaturized Systems for Chemistry and Life Sciences Microtas 2019

We present a study of microbial Raman spectroscopy towards optimal approach of rapid microbiological methods (RMMs). Raman spectra of single microorganism cells were measured and analyzed by data clustering to identify the microbial species without culturing for colony formation.

Scopus

Effect of N-2/H-2 plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) Reviewed Open Access

Amalraj Frank Wilson, Dhasiyan Arun Kumar, Lu Yi, Shimizu Naohiro, Oda Osamu, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Ikarashi Nobuyuki, Hori Masaru

AIP ADVANCES Vol. 8 ( 11 ) 2018.11

Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 10 ) 2018.10

Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H-2 at 300-500 degrees C Reviewed

Kako Takashi, Liu Zecheng, Ishikawa Kenji, Kondo Hiroki, Oda Osamu, Sekine Makoto, Hori Masaru

VACUUM Vol. 156 page： 219 - 223 2018.10

Cytotoxic effects of plasma-irradiated fullerenol Reviewed

Kanno Daiki, Tanaka Hiromasa, Ishikawa Kenji, Hashizume Hiroshi, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS Vol. 51 ( 37 ) 2018.9

大気圧プラズマ処理による異種材料接合 Invited Reviewed

近藤博基, 堤隆嘉, 石川健治, 関根誠, 堀勝

化学工学 Vol. 82 ( 9 ) 2018.9

New hopes for plasma-based cancer treatment Reviewed

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Shinya Toyokuni, Hiroaki Kajiyama, Fumitaka Kikkawa, and Masaru Hori

Plasma Vol. 1 ( 1 ) page： 150 - 155 2018.9

Real-time control of a wafer temperature for uniform plasma process Reviewed

Tsutsumi T., Fuknaga Y., Ishikawa K., Kondo H., Sekine M., Hori M.

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings Vol. 2018-December 2018.7

Language：English Publishing type：Research paper (international conference proceedings) Publisher：IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Our developed non-contact method for measurement of temperature of silicon (Si) wafer by using autocorrelation-type fourier domain low coherence interferometer has advantageous in accuracy and rapid response. We demonstrate measurements in temperature for Si wafer at real-time during plasma process and in estimation of heat flux to the wafer from plasma, involving heats balanced plasma source and conductive loss in Si. The analysis indicated that other heat sources like the chamber parts with relatively high temperature impact on the duty ratio during the process with feedback control of the wafer teperture.

DOI： 10.1109/ISSM.2018.8651183

Scopus

Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes Reviewed

Ando Atsushi, Takeda Keigo, Ohta Takayuki, Ito Masafumi, Hiramatsu Mineo, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Suzuki Tomoko, Inoue Sakae, Ando Yoshinori, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 6 ) 2018.6

Effects of gas residence time of CH4/H-2 on sp(2) fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

Sugiura Hirotsugu, Jia Lingyun, Kondo Hiroki, Ishikawa Kenji, Tsutsumi Takayoshi, Hayashi Toshio, Takeda Keigo, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 6 ) 2018.6

Dry Process FOREWORD Reviewed

Karahashi Kazuhiro, Kinoshita Keizo, Higashi Seiichiro, Ishikawa Kenji, Ishijima Tatsuo, Kuboi Nobuyuki

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 6 ) 2018.6

Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry Reviewed

Hayashi Toshio, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 6 ) 2018.6

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Papers - ISHIKAWA, Kenji