Papers - ISHIKAWA, Kenji
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Selective dry etching of TiAlC over TiN using nonhalogen N2/H2 plasma Reviewed Open Access
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shi-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
Applied Surface Science Vol. 691 page： 122665 2025.5
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Low-temperature atomic layer etching of platinum via sequential wet-like reactions of plasma oxidation and complexation Reviewed Open Access
Thi-Thuy-Nga Nguyen, D. Akagi, T. Okato, Kenji Ishikawa, and Masaru Hori
Applied Surface Science Vol. 687 page： 162325 2025.4
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Valence fragmentation dynamics of a promising low global warming etching gas CF3CHCF2 Reviewed International journal Open Access
Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, ane Kenji Ishikawa
Scientific Reports Vol. 15 ( 1 ) page： 9507 2025.3
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Hydrofluoroethane plasma etching of SiN, SiO2, and poly-Si films with CHF2CF3, CF3CH3, and CHF2CH3 Reviewed Open Access
Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
Applied Surface Science Vol. 684 page： 161815 2025.3
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Nanoscale visualization of the anti-tumor effect of a plasma-activated Ringer's lactate solution Reviewed Open Access
Junichi Usuda, Kenshin Yagyu, Hiromasa Tanaka, Masaru Hori, Kenji Ishikawa, and Yasufumi Takahashi
Faraday Discussions Vol. 257 ( 0 ) page： 212 - 223 2025.2
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Developments in low-temperature plasma applications in Asia Reviewed International coauthorship
Pankaj Attri, Kenji Ishikawa, Nozomi Takeuchi, Tomohiro Nozaki, Rajdeep Singh Rawat, Zhitong Chen, Bo Ouyang, Takamasa Okumura, Danni Fu, Katsuyuki Takahashi, Dae-Yeong Kim, Xiaozhong Chen, Kunihiro Kamataki, Koichi Takaki, Eun Ha Choi, Masaru Hori, Kazunori Koga, and Masaharu Shiratani
Reviews of Modern Plasma Physics Vol. 9 ( 1 ) page： 6 2025.2
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Achieving the in-plane orientation of carbon nanowalls: Implications for sensing, energy harvesting, and nano-bio devices Reviewed Open Access
Shintaro Iba, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Mineo Hiramatsu, and Masaru Hori
ACS Applied Nano Materials Vol. 8 ( 6 ) page： 2660 - 2668 2025.2
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Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α'-dichloro-p-xylene as a precursor Reviewed Open Access
Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Kenji Ishikawa, and Masaru Hori
Applied Surface Science Vol. 681 page： 161485 2025.2
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Shohei Nakamura, Atsushi Tanide, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori
Journal of Vacuum Science and Technology B Vol. 43 ( 2 ) page： 022202 2025.1
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Analysis of the synergetic effect of process parameters of hydrogenated amorphous carbon deposition in plasma-enhanced chemical vapor deposition using machine learning Reviewed Open Access
Yusuke Ando, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
Diamond and Related Materials Vol. 151 page： 111687 2025.1
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Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition (vol 14, 10861, 2024) Reviewed Open Access
Arun Kumar Dhasiyan, Frank Wilson Amalraj, Swathy Jayaprasad, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori
Scientific Reports Vol. 14 ( 1 ) page： 30575 2024.12
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Pseudo-wet plasma mechanism enabling high-throughput dry etching of SiO2 by cryogenic-assisted surface reactions Reviewed Open Access
Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Micheal Kin Ting Mo, Yusuke Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara, and Masaru Hori
Small method Vol. 8 ( 12 ) page： 2400090 2024.12
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Low-temperature plasma as a strategy to achieve SDGs Reviewed
Hiromasa Tanaka, Kenji Ishikawa, and Shinya Toyokuni
Free Radical Research Vol. 58 ( 19 ) page： 594 - 595 2024.10
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Selective removal of single-layer graphene over double-layer graphene on SiO2 by remote oxygen plasma irradiation Reviewed Open Access
Liugang Hu, Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, and Masaru Hori
Applied Surface Science Vol. 669 page： 160598 2024.10
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High-speed removal process for organic polymers by non-thermal atmospheric pressure spark discharge at room temperature and its mechanism Reviewed Open Access
Yoshihiro Sakamoto, Takayoshi Tsutsumi, Hiromasa Tanaka, Kenji Ishikawa, Hiroshi Hashizume, and Masaru Hori
Coating Vol. 14 ( 10 ) page： 1339 2024.10
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Non-halogen dry etching of metal carbide TiAlC by low-pressure N2/H2 plasma at room temperature Reviewed Open Access
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
ACS Applied Materials and Interfaces Vol. 16 ( 39 ) page： 53195 - 53206 2024.9
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Science and applications of plasma activated solutions: Current trends and future directions Reviewed
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Camelia Miron, Yasumasa Okazaki, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama, Masafumi Ito, and Masaru Hori
Plasma Medicine Vol. 14 ( 1 ) page： 67 - 76 2024.9
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Dry Process 2023 Open Access
Koga K., Takeda K., Toyoda H., Ishikawa K., Ichiki T., Nunomura S., Kurihara K., Kuboi N., Ohta T., Takenaka K.
Vol. 63 ( 8 ) 2024.8
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Effects of plasma ions/radicals on kinetic interactions in nanowall deposition: A review Invited Reviewed
Kenji Ishikawa
Advanced Engineering Materials Vol. 26 ( 16 ) page： 2400679 2024.8
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Future of plasma etching for microelectronics: Challenges and opportunities Reviewed International coauthorship Open Access
Gottlieb Oehrlein, Stephan Brandstadter, Robert Bruce, Jane Chang, Jessica DeMott, Vincent M. Donnelly, Remi Dussart, Andreas Fischer, Richard Gottscho, Satoshi Hamaguchi, Masanobu Honda, Masaru Hori, Kenji Ishikawa, Steven Jaloviar, Keren Kanarik, Kazuhiro Karahashi, Akiteru Ko, Hiten Kothari, Nobuyuki Kuboi, Mark Kushner, Thorsten Lill, Pingshan Luan, Ali Mesbah, Eric Miller, Shoubhanik Nath, Yoshinobu Ohya, Mitsuhiro Omura, Chanhoon Park, John Polouse, Shahid Rauf, Makoto Sekine, Taylor Smith, Nathan Stafford, Theo Standaert, and Peter Ventzek
Journal of Vacuum Science and Technology B Vol. 42 ( 4 ) page： 041501 2024.7