Papers - ISHIKAWA, Kenji
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Primary dissociation channels of SiH4 and H abstract reactions Reviewed Open Access
Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
Japanese Journal of Applied Physics Vol. 55 ( 7S2 ) page： 07LD07 2016.6
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Helium based cold atmospheric plasma-induced reactive oxygen species-mediated apoptotic pathway attenuated by platinum nanoparticles Reviewed Open Access
Paras Jawaid, Mati Ur Rehman, Qing-Li Zhao, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Tadamichi Shimizu, and Takashi Kondo
Journal of Cellular and Molecular Medicin Vol. 20 ( 9 ) page： 1737 - 1748 2016.6
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Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas Reviewed
Yoshinobu Ohya, Maju Tomura, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
Journal of Vacuum Science and Technology A Letters Vol. 34 ( 4 ) page： 040602 2016.5
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Effects of nitrogen on apoptosis and changes in gene expression in human lymphoma U937 cells exposed to argon-cold atmospheric pressure plasma Reviewed
Yoshiaki Tabuchi, Hidefumi Uchiyama, Qing-li Zhao, Tatsuya Yunoki, Qabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori and Takashi Kondo
International Journal of Molecular Medicine Vol. 37 page： 1706-1714 2016.5
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Red Blood Cell Coagulation Induced by Low-temperature Plasma Treatment Reviewed
Kenji Miyamoto, Sanae Ikehara, Hikaru Takei, Yoshihiro Akimoto, Hajime Sakakita, Kenji Ishikawa, Masashi Ueda, Jun-ichiro Ikeda, Masahiro Yamagishi, Jaeho Kim, Takashi Yamaguchi, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara
Archives of Biochemistry and Biophysics 2016.4
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Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition Reviewed
Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu and Masaru Hori
Japan. J. Appl. Phys. Vol. 55 ( 4 ) page： 040305 2016.3
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Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-injection Plasma-enhanced Chemical Vapor Deposition Reviewed
Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori
Plasma Process Polym. 2016.2
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Cell survival of glioblastoma grown in medium containing hydrogen peroxide and/or nitrite, or in plasma-activated medium Reviewed
Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Takashi Kondo, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Masaru Hori
Archives of Biochemistry and Biophysics 2016.1
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Real-time temperature-monitoring of Si substrate during plasma processing and its heat-flux analysis Reviewed
Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori
Japan. J. Appl. Phys. Vol. 55 page： 01AB04 2016.1
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Cover Picture: Plasma Process. Polym. 12∕2015 (page 1329) Reviewed
Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara and Shuichi Enomoto
Plasma Processes and Polymers Vol. 12 ( 12 ) page： 1329 2015.12
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Plasma Blood Coagulation Without Involving the Activation of Platelets and Coagulation Factors Reviewed
Sanae Ikehara, Hajime Sakakita, Kenji Ishikawa, Yoshihiro Akimoto, Takashi Yamaguchi, Masahiro Yamagishi, Jaeho Kim, Masashi Ueda, Jun-ichiro Ikeda, Hayao Nakanishi, Nobuyuki Shimizu, Masaru Hori, and Yuzuru Ikehara
Plasma Processes and Polymers Vol. 12 ( 12 ) page： 1348–1353 2015.12
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Superhydrophilic glass membrane device with open-microhole array for filtering and counting rare tumor cells Reviewed
Akihiro Yonese, Daisuke Onoshima, Hiroshi Yukawa, Kenji Ishikawa, Masaru Hori, and Yoshinobu Baba
Micro Total Analysis Systems 2015 page： 493-495 2015.10
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Histological and nuclear medical comparison of inflammation after haemostasis with non-thermal plasma and thermal coagulation Reviewed
Masashi Ueda, Daiki Yamagami, Keiko Watanabe, Asami Mori, Hiroyuki Kimura, Kohei Sano, Hideo Saji, Kenji Ishikawa, Masaru Hori, Hajime Sakakita, Yuzuru Ikehara, and Shuichi Enomoto
Plasma Processes and Polymers Vol. 12 ( 12 ) page： 1338–1342 2015.9
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Plasma with high electron density and plasma-activated medium for cancer treatment Reviewed
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinya Toyokuni, Shin’ichi Akiyama, Shoichi Maruyama, Suguru Yamada, Yasuhiro Kodera, Hiroki Kaneko, Hiroko Terasaki, Hirokazu Hara, Tetsuo Adachi, Machiko Iida, Ichiro Yajima, Masashi Kato, Fumitaka Kikkawa, and Masaru Hori
Clinical Plasma Medicine Vol. 3 page： 72-76 2015.9
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EPR-Spin Trapping and Flow cytometric Studies of Free Radicals Generated using Cold Atmospheric Argon Plasma and X-ray irradiation in Aqueous Solutions and Intracellular Milieu Reviewed
Hidefumi Uchiyama, Qing-Li Zhao, Mariame Ali Hassan, Gabor Andocs, Nobuyuki Nojima, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Takashi Kondo
PLoS One Vol. 10 ( 8 ) page： e0136956 2015.8
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Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching Reviewed
Takayoshi Tsutsumi, Yusuke Fukunaga, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori
IEEE Trans Semiconductor manufacturing Vol. 28 ( 4 ) page： 515-520 2015.8
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Decreased expression levels of cell cycle regulators and matrix metalloproteinases in melanoma from RET-transgenic mice by single irradiation of non-equilibrium atmospheric pressure plasmas Reviewed
Machiko Iida, Ichiro Yajima, Nobutaka Ohgami, Li Xiang, Cunchao Zou, Kenji Ishikawa, Masaru Hori, and Masashi Kato
International Journal of Clinical and Experimental Pathology Vol. 8 ( 8 ) page： 9326-9331 2015.8
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Suppression of plasma-induced damage on GaN etched by a Cl2 plasma at high temperatures Reviewed
Zecheng Liu, Jialin Pan, Takashi Kako Kenji Ishikawa, Osamu Oda, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
Japan. J. Appl. Phys. Vol. 54 page： 06GB04 2015.6
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Electronic properties of HBr, O2 and Cl2 used in Si etching Reviewed
Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
Japan. J. Appl. Phys. Vol. 54 page： 06GA03 2015.5
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Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton Reviewed
Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
Japan. J. Appl. Phys. Vol. 54 ( 4 ) page： 040303 2015.3