Presentations -
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Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma International conference
A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori
The 43rd International Symposium on Dry Process (DPS2022)
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Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma Invited International conference
H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori
242nd ECS Meeting
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Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma Invited International conference
H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori
242nd ECS Meeting
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Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature International conference
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets International conference
Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma International conference
Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias International conference
Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature International conference
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets International conference
Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias International conference
Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma International conference
Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析
近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝
2022年 第83回 応用物理学会 秋季学術講演
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イオン照射角制御によるカーボンナノウォールの配向成長
射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝
2022年 第83回 応用物理学会 秋季学術講演
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イオン照射角制御によるカーボンナノウォールの配向成長
射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝
2022年 第83回 応用物理学会 秋季学術講演
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水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析
近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝
2022年 第83回 応用物理学会 秋季学術講演
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Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition International conference
Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22
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In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas International conference
Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22
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In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas International conference
Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22
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Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition International conference
Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22
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Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process Invited International conference
Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI
The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022)