Presentations -
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Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region International conference
Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori and Hajime Sakakita
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls International conference
Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference
Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka,Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference
Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching International conference
Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 International conference
Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment International conference
B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, N. Ohno and M. Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer International conference
M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine and M. Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions International conference
Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface International conference
S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma International conference
Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls International conference
Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region International conference
Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Hajime Sakakita
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment International conference
B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka, T. Gohira, Y. Ohya, N. Ohno, M. Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference
Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference
Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure International conference
Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.9
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Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions International conference
Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8