Presentations -
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Highly-durable carbon nanowalls electrodes for fuel cell synthesized employing a C2F6/H2 mixture gas plasma International conference
H. Kondo, S. Imai, T. Tsutsumi, K. Ishikawa, M.Sekine, M. Hiramatsu, M.Hori
International Conference on Solid State Devices and Materials 2019
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自己吸収型マイクロ放電ホローカソード光源を用いた水素プラズマの真空紫外吸収分光計測
清水 奨、竹田 圭吾、堤 隆嘉、平松 美根男、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性
長谷川 将希、堤 隆嘉、近藤 博基、関根 誠、石川 健治、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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SiNx の ALE におけるフッ素ラジカルの In-situ エッチング反応解析
中根 一也、ルネイ ヘリンカス ヨセフ フェーフィート、堤 隆嘉、小林 伸好、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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非平衡大気圧Ar プラズマ源における放電形状の経時変化および水素ラジカル密度空間分布計測
勝野 楓、堤 隆嘉、石川 健治、竹田 圭吾、橋爪 博司、田中 宏昌、近藤 博基、関根 誠、堀 勝
2019年 第80回応用物理学会秋季学術講演会
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Intracellular response of HeLa cells treated by plasma- activated Ringer's lactate solution International conference
Shogo Maeda, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Fumitaka Kikkawa, Masaaki Mizuno and Masaru Hori
The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)
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Composition of ion species in pulsed dual frequency CCP with synchronized dc bias using fluorocarbon gases International conference
Kazuya Nakane, Shin-Nan Hsiao , Takayoshi Tsutsumi, Taku Gohira, Kenji Ishikawa, Makoto Sekin, Yoshinobu Ohya and Masaru Hori
The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)
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Intracellular responses of Coccomyxa sp. during culture in plasma-treated nutrient solution International conference
Takumi Kato, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)
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H2-added Cl2 plasma etching of GaN at high temperature International conference
Takahiro Omichi, Atsushi Tanide, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)
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Selectivity during Plasma ALE of Si-Compounds: Reaction Mechanism Studied by in-situ Surface Spectroscopy International conference
René Vervuurt, Kazuya Nakane, Takayoshi Tsutsumi, Masaru Hori, Nobuyoshi Kobayashi
AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)
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Electrical conductivity for vertical direction of radical injection plasma enhanced chemical vapor deposited carbon nanowalls (RI-PECVD-CNW) International conference
Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)
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Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition International conference
Hitotsugu Sugiura, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)
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Effects of fluorine introduction and termination of CNWs on their electrochemical reactions International conference
Hiroki Kondo, Masakazu Tomatsu, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu
XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)
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Electron loss process in afterglow of pulsed magnetic neutral loop discharge using Ar/O2/ CF4 or C4F8 International conference
X. Xie, J. Ni, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)
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Control of the Interface Layer in ALE Process by Alternating O2 Plasma with Fluorocarbon Deposition for High Selectivity Etching International conference
Takayoshi Tsutsumi, Akiko Kobayashi, Nobuyoshi Kobayashi, Masaru Hori
AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)
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Chlorinated Surface Layer of GaN in Quasi Atomic Layer Etching of Cyclic Processes of Chlorine Adsorption and Ion Irradiation International conference
Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, Masaru Hori
AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)
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プラズマ支援原子層プロセスにおける表界面反応層制御・診断 Invited
堤 隆嘉，近藤 博基，石川 健治，関根 誠，堀 勝
第４回 Atomic Layer Process (ALP) Workshop
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Precisely wafer-temperature-controlled plasma etching and its application for nano-scale pattern fabrication of organic material International conference
Makoto Sekine, Yusuke Fukunaga, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Masaru Hori
24th International Symposium on Plasma Chemistry (ISPC24)
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Plasma-assisted Synthesis and Modification of Carbon Nanowalls for Emerging Applications Invited International conference
Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu
International Conference NANO-M&D2019 Fabrication, Properties and Applications of Nano-Materials and Nano-Devices
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Gene expression dynamics of glioblastoma cells in plasma-activated medium and plasma-activated Ringer's lactate solution International conference
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Makoto Sekine, Hiroki Kondo, Hiroshi Hashizume, Takayoshi Tsutsumi, Kae Nakamura, Nobuhisa Yoshikawa, Hiroaki Kajiyama, Shinya Toyokuni, Fumitaka Kikkawa, Masaru Hori
24th International Symposium on Plasma Chemistry (ISPC24)