研究者詳細 - 豊田　浩孝

論文 - 豊田　浩孝

分割表示 156 件中 21 - 40 件目／全件表示 >>

High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing 査読有り

Bae Hansin, Sasai Kensuke, Suzuki Haruka, Toyoda Hirotaka

VACUUM 192 巻頁： 110429-1 - 110429-8 2021年10月

担当区分：最終著者,　責任著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Vacuum

A method for graphite-like carbon (GLC) deposition using Ar/C6H6 surface-wave plasma (SWP) is proposed. Characteristic of the SWP, i.e., high plasma density with wide spatial uniformity realized uniform carbon film deposition at high deposition rates. To increase sp2 ratio in carbon films, a pulsed negative bias voltage up to ~2 kV is applied to a substrate. Conductive carbon films of low sheet resistances below ~102 Ω/sq is achieved at high deposition rates up to ~6 nm/s with good spatial uniformity (±5%) in an area of ~18×3 cm2. Film structure is evaluated by Raman spectroscopy, Fourier-transform infra-red spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, scanning transmission electron microscopy and electron energy loss spectroscopy. At high negative bias voltages, sp2-rich with reduced hydrogen content of the film is observed.

DOI： 10.1016/j.vacuum.2021.110429

Web of Science

Scopus

Quantitative evaluation of hydrogen retention of solid tin after exposure to hydrogen plasma 査読有り

Kota Tamura,Haruka Suzuki, Junichi Miyazawa,Suguru Masuzaki,Hirotaka Toyoda

Fusion Engineering and Design 170 巻 ( September 112532 ) 頁： 112532-1 - 112532-6 2021年9月

Spatial Uniformity Evaluation of Atmospheric-Pressure Microwave Line Plasma for Wide-Area Surface Treatment 査読有り

Suzuki Haruka, Koma Hirotsugu, Ogasawara Tomohiro, Koike Yosuke, Toyoda Hirotaka

Plasma and Fusion Research 16 巻 ( 0 ) 頁： 1406046 - 1406046 2021年4月

担当区分：最終著者,　責任著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：一般社団法人プラズマ・核融合学会

<p>Spatial uniformity of an atmospheric-pressure microwave line plasma is evaluated from surface hydrophilicity treatment of polyethylene terephthalate film as well as observation of optical emission from the plasma. Prior to the experiments, the structure of the waveguide-based plasma source is optimized using a three-dimensional electromagnetic simulation to suppress standing-wave generation for the uniformity of plasma production. The spatial distribution in the longitudinal direction of the Argon (Ar) plasma is investigated by operating the microscope parallel to the slot and by irradiating film with the plasma to improve surface wettability of the film. Uniform profile of water contact angle is obtained in 40cm with very high-speed processing.</p>

DOI： 10.1585/pfr.16.1406046

Web of Science

Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma 査読有り

Makoto Moriyama, Naoya Nakahara, Kazuaki Kurihara, Daiki Iino, Hiroyuki Fukumizu, Haruka Suzuki, and Hirotaka Toyoda

Japanese Journal of Applied Physics 60 巻 ( 016001 ) 頁： 016001-1 - 016001-5 2021年1月

担当区分：最終著者記述言語：英語掲載種別：研究論文（学術雑誌）

harging and discharging behavior of high aspect-ratio (AR) hole capillary plate (CP) exposed to a pulse-modulated very high frequency (VHF) capacitively-coupled plasma is investigated. From an equivalent circuit model, time-dependent charge density on the bottom of the CP is quantitatively evaluated. AR of the CP plays very important role for the charging current, although the discharge current is dominated by the leakage current of the CP. Importance of electron current flowing into the CP bottom during the VHF pulse-on phase is suggested at higher self-bias voltages.

DOI： 10.35848/1347-4065/abd0ca

長尺大気圧マイクロ波プラズマの生成と表面処理への応用

豊田　浩孝、鈴木　陽香

表面技術 71 巻 ( 10 ) 頁： 624-628 2020年10月

Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma

Makoto Moriyama1*, Naoya Nakahara1, Akihiro Mitsuya1, Haruka Suzuki1 , Kazuaki Kurihara2, Daiki Iino2, Hiroyuki Fukumizu2, and Hirotaka Toyoda1,3

Japanese Journal of Applied Physics 59 巻頁： SJJB03 2020年4月

Atmospheric-pressure microwave line plasma with an asymmetric cross-section waveguide for long-scale N2 plasma production

Haruka Suzuki1, Yuto Tamura1, Manh Hung Chu2 and Hirotaka Toyoda1

Japanese Journal of Applied Physics 59 巻 ( 016002 ) 頁： 016002-1-016002-6 2020年1月

Microwave plasma

Toyoda H.

RF Power Semiconductor Generator Application in Heating and Energy Utilization 頁： 181 - 194 2020年1月

高密度表面波励起プラズマによるフッ素樹脂の表面改質

豊田浩孝

機能材料 ( 12月 ) 頁： PP 2019年12月

Rapid resist ashing by slot-excited atmospheric pressure microwave O2 plasma

Hirotaka Toyoda1, Shota Ishikawa1, Haruka Suzuki1 and Takeshi Honda2

Japanese Journal of Applied Physics 58 巻 ( 12 ) 頁： 126001-1-4 2019年11月

大気圧マイクロ波放電による高密度長尺ラインプラズマ査読有り

豊田浩孝、鈴木陽香

応用物理 88 巻 ( 2 ) 頁： 101-104 2019年2月

Atmospheric pressure water-vapor plasma in an air-shielded environment by water flow 査読有り

Hikaru Senba, Haruka Suzuki and Hirotaka Toyoda

Japanese Journal of Applied Physics 58 巻 ( SA ) 頁： pp.SAAC05-1～SAAC05-5 2018年12月

Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

Sasai Kensuke, Keyamura Kazuki, Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 6 ) 2018年6月

液体処理用マイクロ波励起プラズマの生成

豊田　浩孝

表面と真空 61 巻 ( 3 ) 頁： 113-118 2018年3月

Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD

Sahu Bibhuti Bhusan, Toyoda Hirotaka, Han Jeon Geon

PHYSICS OF PLASMAS 25 巻 ( 2 ) 頁： 023511-1-14(2018) 2018年2月

Development and plasma characterization of an 850 MHz surface-wave plasma source 査読有り

B. B. Sahu, S. Koga, H. Toyoda, and Jeon G. Han

AIP Advances 7 巻頁： 105213-1-17(2017) 2017年10月

Quantitative evaluation of high-energy O- ion particle flux in a DC magnetron sputter plasma with an indium-tin-oxide target

Suyama Taku, Bae Hansin, Setaka Kenta, Ogawa Hayato, Fukuoka Yushi, Suzuki Haruka, Toyoda Hirotaka

JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 巻 ( 44 ) 頁： 445201 2017年10月

An approach to line-shaped nitrogen plasma production at atmospheric pressure by slot-excited microwave discharge

Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS 56 巻 ( 11 ) 2017年9月

液体処理用マイクロ波励起プラズマの生成査読有り

豊田浩孝

表面と真空 61 巻 ( 3 ) 頁： 113-118 2017年2月

Enhancement of Liquid Treatment Efficiency by Microwave Plasma under Flow-Induced Reduced Pressure 査読有り

Michiko Ito, Tomohiro Takahashi, Sho Takitou, Seigo Takashima, Norio Nomura, Tominori Kitagawa, Hirotaka Toyoda

Japanese Journal of Applied Physics 56 巻頁： 026201-1-6 2017年1月

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