研究者詳細 - 豊田　浩孝

論文 - 豊田　浩孝

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*Fine Structure of O Kinetic Energy Distribution in RF Plasma and Its Formation Mechanism 査読有り

H.Toyoda, K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kinoshita

Applied Physics Express 2 巻 ( 12 ) 頁： 126001-(1-3) 2009年11月

Design of Large-Area Surface Wave Plasma Excited by Slotted Waveguide Antennas with Novel Power Divider 査読有り

Tatsuo Ishijima, Hirotaka Toyoda, Yudai Takanishi, and Hideo Sugai

Jpn. J. Appl. Phys. 50 巻頁： 036002 2011年3月

*Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma 査読有り

Y. Takagi, Y. Sakashita, H. Toyoda, and H. Sugai

Vacuum 80 巻 ( 6 ) 頁： 581-587 2006年3月

*Evidence of Radical-free Etching of SiO₂ by Fluorocarbon Molecules under Ion Bombardment 査読有り

N. Takada, H. Toyoda and H. Sugai

Transacitons of the Materials Research Society of Japan 30 巻 ( 1 ) 頁： 319-322 2005年

*Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H₂/SiH₄ Plasma 査読有り

S. Somiya, H. Toyoda, Y. Hotta and H. Sugai

Jpn. J. Appl. Phys. 43 巻 ( 11A ) 頁： 7696-7700 2004年

Measurement of energy-resolved ion angular distribution in a dual-frequency capacitively coupled argon plasma Open Access

Kim D., Kawamura S., Naito M., Iino D., Fukumizu H., Kurihara K., Suzuki H., Toyoda H.

Japanese Journal of Applied Physics Part 1 Regular Papers and Short Notes and Review Papers 64 巻 ( 5 ) 頁： 05SP15-1 - 05SP15-7 2025年5月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics Part 1 Regular Papers and Short Notes and Review Papers

An energy-resolved angular distribution measurement of ions impinging on a biased radiofrequency (RF) electrode was performed in a dual-frequency capacitively coupled plasma. The ion angular distribution (IAD) was measured using a microchannel plate (MCP) in a drift chamber directly connected to the RF electrode. Using deflector plates with pulse-modulated voltage, IADs with various incident energies for Ar were successfully observed using a time-of-flight technique. Images measured using the MCP originated from the spatially overlapped IADs of various incident energies. Through image reconstruction assisted by a gradient descent method, the images were separated into energy-resolved IADs. The angular widths (AW) of the Ar ions were evaluated as a function of the incident energy, showing a monotonic decrease in AW as the energy increased. From the energy dependence of the AW, the Ar ion temperature was evaluated as 0.044 eV. The result demonstrated the validity of the energy-resolved IAD measurement using this method.

DOI： 10.35848/1347-4065/adce84

Open Access

Scopus

Angular distribution measurement of high-energy ions and neutrals impinging on an RF electrode in a dual-frequency capacitively-coupled Ar plasma 査読有り

Kawamura, S; Kim, D; Ichikawa, K; Suzuki, H; Iino, D; Fukumizu, H; Kurihara, K; Toyoda, H

PLASMA SOURCES SCIENCE & TECHNOLOGY 34 巻 ( 5 ) 頁： 055006-1 - 055006-9 2025年5月

Dry Process 2023 Open Access

Koga K., Takeda K., Toyoda H., Ishikawa K., Ichiki T., Nunomura S., Kurihara K., Kuboi N., Ohta T., Takenaka K.

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 63 巻 ( 8 ) 2024年8月

Influence of bias voltage on the Ar/CH2F2/O2 plasma etching of Si3N4 films 査読有り

Kuboi, S; Kataoka, J; Iino, D; Kurihara, K; Toyoda, H; Fukumizu, H

JAPANESE JOURNAL OF APPLIED PHYSICS 63 巻 ( 8 ) 2024年8月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

The etching mechanism of silicon nitride (Si3N4) films depending on peak-to-peak bias voltage ( V pp ) in an Ar/CH2F2/O2 gas-mixture plasmas for high-aspect-ratio etching process was investigated. It was observed that the Si3N4 film etch rate initially decreased with an increase in the V pp up to 3630 V, but then increased beyond this threshold. This unusual etching behavior can be attributed to the formation of a modified layer on the surface of the Si3N4 film. The characteristics of the modified layer, such as thickness and atomic composition, were found to be strongly influenced by the ion energy and gas chemistry of the process conditions.

DOI： 10.35848/1347-4065/ad6d20

Web of Science

Scopus

Evaluation of the spatial structure of multiline emission in a capacitively coupled plasma using tomographic reconstruction 査読有り

Kyuzo, M; Harada, K; Izumi, R; Suzuki, H; Toyoda, H

JAPANESE JOURNAL OF APPLIED PHYSICS 63 巻 ( 5 ) 2024年5月

担当区分：最終著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics

By imaging a capacitively coupled plasma from multiple directions using telecentric lens cameras and optical bandpass filters, the spatial structure of emission at specific wavelengths was reconstructed using the Tikhonov-Phillips regularization method. Camera parameters, crucial for relating three-dimensional structures to two-dimensional images, were evaluated experimentally to avoid a complex analytical approach. Assuming an axisymmetric emission profile, 750.4 nm Ar and 585.2 nm Ne emissions from Ar/Ne mixture plasma were reconstructed. The pressure dependence of the reconstructed Ar profile showed a similar trend to that of the two-dimensional emission images. The spatial structure of the emission intensity ratio of Ne to Ar from the reconstructed Ar and Ne profiles agreed well with a spatial distribution of electron temperatures measured with a Langmuir probe.

DOI： 10.35848/1347-4065/ad46b0

Web of Science

Scopus

Time-varying mechanism of ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma 査読有り

Kuboi, S; Kato, H; Akatsuka, Y; Suzuki, H; Toyoda, H

JAPANESE JOURNAL OF APPLIED PHYSICS 63 巻 ( 1 ) 頁： 016001 2024年1月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics

The time-varying mechanism of the positive-ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma was investigated in detail using a quadrupole mass spectrometer equipped with an electrostatic energy analyzer. Time-resolved measurements of the ion composition with respect to the pulse-off period ( T off ) revealed that the electron temperature ( T e ) just after turning on the pulse is an important factor in determining the ratio of the ionization rates of the Ar+ and Cx Fy + ions. The time-varying phenomenon of the ion composition was also investigated through a numerical analysis based on the particle balance model, considering the production and loss rates of ions, ion-ion recombination processes, and ion-molecule reactions. When the VHF power ( P VHF ) was increased, a decrease in the ambipolar diffusion loss time constants of the ions ( τ loss i ) was observed, and the change in electronegativity was pointed out as the cause of this phenomenon.

DOI： 10.35848/1347-4065/ad121f

Web of Science

Scopus

Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma 国際誌

Kuboi, S; Kato, H; Seki, Y; Suzuki, H; Toyoda, H

JAPANESE JOURNAL OF APPLIED PHYSICS 62 巻 ( SI ) 頁： SI1003 2023年7月

Polyvinyl alcohol-potassium iodide gel probe to monitor the distribution of reactive species generation around atmospheric-pressure plasma jet

Tran, TN; Hu, M; Ogasawara, T; Iwata, Y; Suzuki, H; Sakamoto, J; Akiyoshi, M; Toyoda, H; Matsuura, H

PLASMA SCIENCE & TECHNOLOGY 25 巻 ( 3 ) 2023年3月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Plasma Science and Technology

This study proposes polyvinyl alcohol-potassium iodide (PVA-KI) as a novel gel chemical probe. The probe uses the reactions among PVA, KI, water, borax, and oxidative species to visualize the distribution of reactive species. This method provides information regarding the distribution of reactive species by coloration on the gel surface. The effects of the surrounding gas phase on the distribution and diffusion of the reactive species are also investigated using the PVA-KI gel probe. Further, the relationship between the irradiation distance and reactive species diffusion is determined on the surface of the PVA-KI probe with and without plastic shielding. Adjusting the irradiation distance appropriately leads to an increase in the modified area as detected by the PVA-KI gel probe analysis. The relative concentration distributions of the reactive species are also obtained from visualized color distributions measured using a colorimeter. Furthermore, reactive species generation by long-scale line plasma is confirmed by the color reaction on the PVA-KI gel surface, with a greater area being covered by an atmospheric-pressure pulsed microwave line plasma source.

DOI： 10.1088/2058-6272/ac9891

Web of Science

Scopus

Influence of small ground surface on plasma property in an inductively-coupled plasma with floating liner 国際誌

Kyuzo, M; Chiba, Y; Suzuki, H; Toyoda, H

JAPANESE JOURNAL OF APPLIED PHYSICS 62 巻 ( SA ) 頁： SA1008-1 - SA1008-7 2023年1月

記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics

Currently, the components of semiconductor processing chamber are coated with oxides to avoid metal contamination. As a result, electrical ground is hidden from the plasma. In this study, we experimentally investigate the effect of small ground surfaces in an inductively-coupled plasma (ICP) generated in an electrically floating liner. Peak-to-peak and DC voltages at a biasing stage and a floating liner are measured as a function of stage peak-to-peak voltage for various ICP powers and the ground surface areas. The results show that the stage and liner voltages vary with changing ground surface area due to a change in sheath thickness. The analytical plasma potentials, calculated from the experimental values are compared with the simulation results, show good agreement. It is suggested that under low biased voltage and high ICP power conditions, such as in the atomic layer etching process, the small ground surface affects the potential structure in the chamber.

DOI： 10.35848/1347-4065/ac7e19

Web of Science

Scopus

その他リンク： https://iopscience.iop.org/article/10.35848/1347-4065/ac7e19

Experimental study on boron distribution and transport at plasma-facing components during impurity powder dropping in the Large Helical Device 査読有り Open Access

Kawate T., Ashikawa N., Goto M., Oishi T., Kawamoto Y., Toyoda H., Shoji M., Kawamura G., Masuzaki S., Nespoli F., Gilson E. P., Lunsford R., Suzuki C., Nagy A., Gates D.

NUCLEAR FUSION 62 巻 ( 12 ) 頁： 126052-1 - 126052-9 2022年12月

Bubbling phenomenon of liquidized Sn-Bi-Li-Er alloy under hydrogen plasma exposure 査読有り

Tamura Kota, Miyazawa Junichi, Masuzaki Suguru, Tokitani Masayuki, Hamaji Yukinori, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS 61 巻 ( 10 ) 頁： 106005 2022年10月

Dry Process

Japanese Journal of Applied Physics 61 巻 ( SI ) 2022年7月

High-speed hydrophilic and ashing treatments of polyimide using Ar/O-2 atmospheric-pressure microwave line plasma 査読有り

Japanese Journal of Applied Physics 61 巻 ( SI ) 頁： 1008-1 - 1008-5 2022年7月

Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film 査読有り

Bae Hansin, Hamaguchi Ikumi, Sasai Kensuke, Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS 60 巻 ( 12 ) 2021年12月

担当区分：最終著者,　責任著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Japanese Journal of Applied Physics

A method for enhancing ion flux to the substrate via high-voltage pulse biasing is investigated in an electron cyclotron resonance plasma. When high-voltage pulse biases above 500 V are applied to the stage, an increase in the stage current is observed, especially in the case of diverging magnetic field configurations in front of the bias stage. The growth and decay time constants of the plasma density and emission intensity are evaluated using a time-resolved Langmuir probe and emission spectroscopy while the pulse is on, and the enhancement of the ionization rate during the bias application is estimated using the zero-dimensional global model. The estimated density enhancement from the model is in good agreement with the measured one. From the numerical simulation of secondary electron trajectory, it is concluded that the electron confinement from the magnetic field is the key factor in plasma density enhancement during stage biasing. Using the high-density plasma produced by the bias voltage, conductive carbon is deposited at a high deposition rate of ∼4 nm s-1.

DOI： 10.35848/1347-4065/ac32b6

Web of Science

Scopus

Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma 査読有り

Keita Ichikawa, Manh Hung CHU, Makoto Moriyama, Naoya Nakahara, Haruka Suzuki, Daiki Iino, Hiroyuki Fukumizu, Kazuaki KURIHARA and Hirotaka TOYODA

Applied Physics Express 14 巻 ( 126001 ) 頁： 126001-1 - 126001-5 2021年11月

High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing 査読有り

Bae Hansin, Sasai Kensuke, Suzuki Haruka, Toyoda Hirotaka

VACUUM 192 巻頁： 110429-1 - 110429-8 2021年10月

担当区分：最終著者,　責任著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：Vacuum

A method for graphite-like carbon (GLC) deposition using Ar/C6H6 surface-wave plasma (SWP) is proposed. Characteristic of the SWP, i.e., high plasma density with wide spatial uniformity realized uniform carbon film deposition at high deposition rates. To increase sp2 ratio in carbon films, a pulsed negative bias voltage up to ~2 kV is applied to a substrate. Conductive carbon films of low sheet resistances below ~102 Ω/sq is achieved at high deposition rates up to ~6 nm/s with good spatial uniformity (±5%) in an area of ~18×3 cm2. Film structure is evaluated by Raman spectroscopy, Fourier-transform infra-red spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, scanning transmission electron microscopy and electron energy loss spectroscopy. At high negative bias voltages, sp2-rich with reduced hydrogen content of the film is observed.

DOI： 10.1016/j.vacuum.2021.110429

Web of Science

Scopus

Quantitative evaluation of hydrogen retention of solid tin after exposure to hydrogen plasma 査読有り

Kota Tamura,Haruka Suzuki, Junichi Miyazawa,Suguru Masuzaki,Hirotaka Toyoda

Fusion Engineering and Design 170 巻 ( September 112532 ) 頁： 112532-1 - 112532-6 2021年9月

Spatial Uniformity Evaluation of Atmospheric-Pressure Microwave Line Plasma for Wide-Area Surface Treatment 査読有り

Suzuki Haruka, Koma Hirotsugu, Ogasawara Tomohiro, Koike Yosuke, Toyoda Hirotaka

Plasma and Fusion Research 16 巻 ( 0 ) 頁： 1406046 - 1406046 2021年4月

担当区分：最終著者,　責任著者記述言語：英語掲載種別：研究論文（学術雑誌）出版者・発行元：一般社団法人プラズマ・核融合学会

Spatial uniformity of an atmospheric-pressure microwave line plasma is evaluated from surface hydrophilicity treatment of polyethylene terephthalate film as well as observation of optical emission from the plasma. Prior to the experiments, the structure of the waveguide-based plasma source is optimized using a three-dimensional electromagnetic simulation to suppress standing-wave generation for the uniformity of plasma production. The spatial distribution in the longitudinal direction of the Argon (Ar) plasma is investigated by operating the microscope parallel to the slot and by irradiating film with the plasma to improve surface wettability of the film. Uniform profile of water contact angle is obtained in 40cm with very high-speed processing.

DOI： 10.1585/pfr.16.1406046

Web of Science

Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma 査読有り

Makoto Moriyama, Naoya Nakahara, Kazuaki Kurihara, Daiki Iino, Hiroyuki Fukumizu, Haruka Suzuki, and Hirotaka Toyoda

Japanese Journal of Applied Physics 60 巻 ( 016001 ) 頁： 016001-1 - 016001-5 2021年1月

担当区分：最終著者記述言語：英語掲載種別：研究論文（学術雑誌）

harging and discharging behavior of high aspect-ratio (AR) hole capillary plate (CP) exposed to a pulse-modulated very high frequency (VHF) capacitively-coupled plasma is investigated. From an equivalent circuit model, time-dependent charge density on the bottom of the CP is quantitatively evaluated. AR of the CP plays very important role for the charging current, although the discharge current is dominated by the leakage current of the CP. Importance of electron current flowing into the CP bottom during the VHF pulse-on phase is suggested at higher self-bias voltages.

DOI： 10.35848/1347-4065/abd0ca

長尺大気圧マイクロ波プラズマの生成と表面処理への応用

豊田　浩孝、鈴木　陽香

表面技術 71 巻 ( 10 ) 頁： 624-628 2020年10月

Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma

Makoto Moriyama1*, Naoya Nakahara1, Akihiro Mitsuya1, Haruka Suzuki1 , Kazuaki Kurihara2, Daiki Iino2, Hiroyuki Fukumizu2, and Hirotaka Toyoda1,3

Japanese Journal of Applied Physics 59 巻頁： SJJB03 2020年4月

Atmospheric-pressure microwave line plasma with an asymmetric cross-section waveguide for long-scale N2 plasma production

Haruka Suzuki1, Yuto Tamura1, Manh Hung Chu2 and Hirotaka Toyoda1

Japanese Journal of Applied Physics 59 巻 ( 016002 ) 頁： 016002-1-016002-6 2020年1月

Microwave plasma

Toyoda H.

RF Power Semiconductor Generator Application in Heating and Energy Utilization 頁： 181 - 194 2020年1月

高密度表面波励起プラズマによるフッ素樹脂の表面改質

豊田浩孝

機能材料 ( 12月 ) 頁： PP 2019年12月

Rapid resist ashing by slot-excited atmospheric pressure microwave O2 plasma

Hirotaka Toyoda1, Shota Ishikawa1, Haruka Suzuki1 and Takeshi Honda2

Japanese Journal of Applied Physics 58 巻 ( 12 ) 頁： 126001-1-4 2019年11月

大気圧マイクロ波放電による高密度長尺ラインプラズマ査読有り

豊田浩孝、鈴木陽香

応用物理 88 巻 ( 2 ) 頁： 101-104 2019年2月

Atmospheric pressure water-vapor plasma in an air-shielded environment by water flow 査読有り

Hikaru Senba, Haruka Suzuki and Hirotaka Toyoda

Japanese Journal of Applied Physics 58 巻 ( SA ) 頁： pp.SAAC05-1～SAAC05-5 2018年12月

Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

Sasai Kensuke, Keyamura Kazuki, Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 6 ) 2018年6月

液体処理用マイクロ波励起プラズマの生成

豊田　浩孝

表面と真空 61 巻 ( 3 ) 頁： 113-118 2018年3月

Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD

Sahu Bibhuti Bhusan, Toyoda Hirotaka, Han Jeon Geon

PHYSICS OF PLASMAS 25 巻 ( 2 ) 頁： 023511-1-14(2018) 2018年2月

Development and plasma characterization of an 850 MHz surface-wave plasma source 査読有り

B. B. Sahu, S. Koga, H. Toyoda, and Jeon G. Han

AIP Advances 7 巻頁： 105213-1-17(2017) 2017年10月

Quantitative evaluation of high-energy O- ion particle flux in a DC magnetron sputter plasma with an indium-tin-oxide target

Suyama Taku, Bae Hansin, Setaka Kenta, Ogawa Hayato, Fukuoka Yushi, Suzuki Haruka, Toyoda Hirotaka

JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 巻 ( 44 ) 頁： 445201 2017年10月

An approach to line-shaped nitrogen plasma production at atmospheric pressure by slot-excited microwave discharge

Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS 56 巻 ( 11 ) 2017年9月

液体処理用マイクロ波励起プラズマの生成査読有り

豊田浩孝

表面と真空 61 巻 ( 3 ) 頁： 113-118 2017年2月

Enhancement of Liquid Treatment Efficiency by Microwave Plasma under Flow-Induced Reduced Pressure 査読有り

Michiko Ito, Tomohiro Takahashi, Sho Takitou, Seigo Takashima, Norio Nomura, Tominori Kitagawa, Hirotaka Toyoda

Japanese Journal of Applied Physics 56 巻頁： 026201-1-6 2017年1月

Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition 査読有り

K. Sasai, T. Hagihara, T. Noda, H. Suzuki, H. Toyoda

Jpn. J. Appl. Phys., 55 巻頁： 086202 -1-5(2016) 2016年7月

Desorption behavior of zinc atoms from zinc-sulfate solution irradiated with pulsed DC plasma 査読有り

Takafumi Takaba, Haruka Suzuki and Hirotaka Toyoda

Journal of Physics D: Applied Physics, Volume 49, Number 29 49 巻 ( 29 ) 頁： 295202 2016年6月

Characteristics of an atmospheric-pressure line plasma excited by 2.45 GHz microwave travelling wave 査読有り

Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori, Hirotaka Toyoda

Jpn. J. Appl. Phys. ( 55 ) 頁： Article ID: 01AH09-1-6(2016) 2015年12月

Low pressure sustainment of surface-wave microwave plasma with modified microwave coupler 査読有り

Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

Jpn. J. Appl. Phys. ( 55 ) 頁： Article ID: 016203-1-5(2016) 2015年12月

New line plasma source excited by 2.45 GHz microwave at atmospheric pressure 査読有り

Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori and Hirotaka Toyoda

8 巻 ( 3 ) 頁： 036001 2015年2月

Synergistic effect of microwave plasma and ultrasonic wave on decomposition of organic compounds in water 査読有り

Tomohiro Takahashi, Noriharu Takada, and Hirotaka Toyoda

Japanese Journal of Applied Physics 53 巻 ( 7S ) 頁： 07KE01 2014年6月

酸化物ターゲットを用いたRFマグネトロンプラズマにおける高エネルギー粒子の挙動招待有り査読有り

豊田浩孝

Journal of the Vacuum Society of Japan 57 巻 ( 3 ) 頁： 80-83 2014年3月

Influence of Si Substrate Temperature and Bias Voltage on Surface Reaction of Br Radical in HBr Inductively Coupled Plasma

D. Iino, Y. Fujii, T. Oike, H. Toyoda

JPS Conf. Proc. 1 巻頁： 015070-1-4 (2014) 2014年3月

Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma 査読有り

Daiki Iino , Yasuhiro Nojiri, Keiji Suzuki, Takumi Oike, Yoshitaka Fujii, and Hirotaka Toyoda

Japanese Journal of Applied Physics 52 巻 ( 11 ) 頁： 11NC01-1-6 2013年11月

High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System 査読有り

Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda and Masaru Hori

Jpn. J. Appl. Phys. 52 巻頁： 11NE01 2013年11月

A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink

H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, H. Toyoda and M. Hori

Journal ofPhysics:ConferenceSeries 441 巻頁： 012019 2013年6月

Rapid Plasma Treatment of Polyimide for Adhesive and Durable Copper Film Deposition

K. Usami, T. Ishijima, H. Toyoda

Thin Solid Films 521 巻頁： 22-26 2012年10月

High performance of carbon nanowall supported Pt catalyst for methanol electro-oxidation

Chengxu Zhang , Jue Hu , Xiangke Wang , Xiaodong Zhang , Hirotaka Toyoda , Masaaki Nagatsu , Yuedong Meng

CARBON 50 巻頁： 3731–3738 2012年4月

Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source 査読有り

Yasuhiro Hara , Keigo Takeda, Koji Yamakawa, Shoji Den, Hirotaka Toyoda, Makoto Sekine, and Masaru Hori

Applied Physics Express 5 巻頁： 035801 2012年2月

Characterization of a steam plasma jet at atmospheric pressure

Guohua Ni, Peng Zhao, Cheng Cheng, Ye Song, Hirotaka Toyoda and Yuedong Meng

Plasma Sources Sci. Technol. 21 巻頁： 015009 (12pp) 2012年1月

Microphase separated hydroxide exchange membrane synthesis by a novel plasma copolymerization approach

Chengxu Zhang, Jue Hua, Xiangke Wang, Hirotaka Toyoda, Masaaki Nagatsu, Xiaodong Zhang, Yuedong Meng

Journal of Power Sources 198 巻頁： 112– 116 2011年10月

Spatial Profile Measurement of SiH₃ Radical Flux in SiH₄/H₂ Microwave Plasma by Modified Appearance Mass Spectrometry 査読有り

Toshiyuki Kuroda, Masahira Ikeda, Tatsuo Ishijima, and Hirotaka Toyoda

Jpn. J. Appl. Phys. 50 巻頁： 08JB05 2011年8月

High-Performance Plasma-Polymerized Alkaline Anion-Exchange Membranes for Potential Application in Direct Alcohol Fuel Cells

Chengxu Zhang, Jue Hu, Masaaki Nagatsu, Yuedong Meng, Wei Shen, Hirotaka Toyoda, Xingsheng Shu

Plasma Process. Polym. 8 巻頁： 1024–1032 2011年8月

Preparation of high-performance hydroxide exchange membrane by a novel ablation restriction plasma polymerization approach

Chengxu Zhang, Jue Hu, Yuedong Meng, Masaaki Nagatsu and Hirotaka Toyoda

Chem. Commun. 47 巻頁： 10230–10232 2011年5月

Magnetron sputtering of platinum nanoparticles onto vertically aligned carbon nanofibers for electrocatalytic oxidation of methanol

Chengxu Zhang, Jue Hu, Masaaki Nagatsu, Xingsheng Shu, Hirotaka Toyoda, Shidong Fang, Yuedong Meng

Electrochimica Acta 56 巻頁： 6033– 6040 2011年5月

Refractory Organic Solute Decomposition in Water using Microwave Plasma 査読有り

Tatsuo Ishijima, Ryota Saito, Hiroyasu Sugihara, and Hirotaka Toyoda

Transactions of the Materials Research Society of Japan 36 巻 ( 3 ) 頁： 475-478 2011年3月

Influence of temperature and pressure on solute decomposition efficiency by microwave-excited plasma 査読有り

R. Saito , H. Sugiura , T. Ishijima, H. Toyoda

Current Applied Physics 11 巻 ( 5 ) 頁： S195-S198 2011年3月

Pulsed plasma-polymerized alkaline anion-exchange membranes for potential application in direct alcohol fuel cells

Chengxu Zhang, Jue Hu, Jie Cong, Yanping Zhao, Wei Shen, Hirotaka Toyoda, Masaaki Nagatsuc, Yuedong Menga

Journal of Power Sources 196 巻頁： 5386–5393 2011年2月

Effect of O Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB-MgO Magnetic Tunnel Junctions 査読有り

Kazunaga Ono, Norikazu Ohshima, Kazuya Goto, Hiroki Yamamoto, Tadashi Morita, Keizo Kinoshita, Tatsuo Ishijima, and Hirotaka Toyoda

Jpn. J. Appl. Phys. 50 (2011) 023001 50 巻頁： 023001 2011年2月

Plasma-grafted alkaline anion-exchange membranes based on polyvinyl chloride for potential application in direct alcohol fuel cell

Jue Hu, Chengxu Zhang, Jie Cong, Hirotaka Toyoda, Masaaki Nagatsu, Yuedong Meng

196 巻頁： 4483–4490 2011年1月

Novel Antenna Coupler Design for Production of Meter-ScaleHigh-Density Planar Surface Wave Plasma 査読有り

Tatsuo Ishijima, Yasunori Nojiri, Hirotaka Toyoda, Hideo Sugai

49 巻頁： 086002 2010年8月

Efficient production of microwave bubble plasma in water for plasma processing in liquid 査読有り

T. Ishijima, H. Sugiura, R. Saito, H. Toyoda, H. Sugai

Plasma Sources Sci. Technol. 015010 19 巻頁： 015010 2010年

Spatial Variation of Negative Oxygen Ion Energy Distribution in RF Magnetron Plasma with Oxide Target 査読有り

T. Ishijima, K. Goto, N. Ohshima, K. Kinoshita, and H. Toyoda

Jpn. J. Appl. Phys. 48 巻頁： 116004 2009年11月

メタルスパッタリングプラズマの高度化とその最新動向

豊田浩孝（分担執筆）

電気学会技術報告書 1162 巻頁： pp.11~14 2009年7月

Rapid treatment of polyimide film surfaces using high-density microwave plasma for enhancement of Cu layer adhesion 査読有り

Y. Takagi , Y. Gunjo , H. Toyoda , H. Sugai

Vacuum, 83 巻頁： 501–505 2008年10月

Effect of Sputtering Deposition Process on Magnetic Properties on Magnetic Multilayers 査読有り

Y. Maeda, Y. Suzuki, Y. Sakashita, S. Iwata, T. Kato, S. Tsunashima, H. Toyoda and H. Sugai

Jpn. J. Appl. Phys. 47 巻 ( 10 ) 頁： 7879-7885 2008年10月

Surface Modification of Fluorocarbon Polymer Film by High Density Microwave Plasma 査読有り

K. Ishikawa, T. ishijima, K. Sasai, H. Toyoda and H. Sugai

Transactions of the Materials Research Society of Japan 33 巻 ( 3 ) 頁： 683-686 2008年9月

Characteristics of Low-energy Atom and Molecule Beams Generated by the Charge Exchange Reaction 査読有り

Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Sekine, M. Hori

J. Appl. Phys. 103 巻 ( 5 ) 頁： 053301 1-5 2008年5月

Deposition of polycrystalline SiGe by surface wave excited plasma 査読有り

Y. Takanishi, T. Okayasu, H. Toyoda, H. Sugai

Thin Solid Films Vol., pp. 516 巻頁： 3554-3557 2008年4月

スパッタプラズマ中の高エネルギー粒子計測と制御査読有り

豊田浩孝

真空 51 巻 ( 4 ) 頁： 258-263 2008年4月

Suppression of Super High-Energy Species by VHF-DC Superimposed Magnetron Sputter Plasma 査読有り

Y. Sakashita, Y. Takagi, T. Kato, H. Toyoda, S. Iwata, S. Tsunashima and H. Sugai

Transaction of Materials Research Society of Japan 32 巻 ( 2 ) 頁： 481-484 2007年12月

Suppression of High-Energy Backscattered Particles in Magnetron Plasma 査読有り

Yusuke Takagi, Hirotaka Toyoda, and Hideo Sugai

Jpn. J. Appl. Phys. 46 巻 ( 12 ) 頁： 7865-7869 2007年12月

Tunable Low-energy Ar Fast Atom Source with Large Diameter 査読有り

Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Hori

Appl. Phys.Lett. 91 巻 ( 23 ) 頁： 23502 1-3 2007年12月

High-Speed μc-Si Films Deposition and Large-Grain Poly-Si Films Deposition by Surface Wave Discharge 査読有り

Y. Hotta, H. Toyoda and H. Sugai

Thin Solid Films 515 巻頁： 4983-4987 2007年4月

Role of atomic nitrogen during GaN growth by plasma-assisted molecular beam epitaxy revealed by appearance mass spectrometry 査読有り

J. Osaka, M. Senthil Kumar, H. Toyoda, T. Ishijima, H. Sugai and T. Mizutani

APPLIED PHYSICS LETTERS 90 巻頁： 172114 1-3 2007年4月

Investigation of the ion dese non-uniformity caused by sheath-lens focusing effect on silicon wafers 査読有り

N. Holtzer , E. Stamate, H. toyoda and H. Sugai

Thin Solid Films 515 巻頁： 4887-4891 2007年4月

Dependence of Giant Magnetoresitance in Cn/Cu Multilayers on Sputtering Condition 査読有り

Changchuan Chen, Y. Suzuki, T. Kato. S. Iwata, S. Tsunashima, H. Toyoda, H. Sugai

Japanese Juenal of Applied Physics 45 巻 ( 10B ) 頁： 8466-8468 2006年10月

Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma 査読有り

Y. Takagi, Y. Sakashita, H. Toyoda, and H. Sugai

Vacuum 80 巻 ( 6 ) 頁： 581-587 2006年3月

Evidence of Direct SiO2 Etching by Fluorocarbon Molecules under Ion Bombardment 査読有り

N. Takada, H. Toyoda, I. Murakami and H. Sugai

Journal of Applied Physics 97 巻 ( 1 ) 頁： 013534 1-5 2005年

バイアス光プローブによる反応性プラズマのEEDF測定査読有り

豊田浩孝

プラズマ・核融合学会誌 81 巻 ( 7 ) 頁： 496-501 2005年

High-energy ions and atoms sputtered and reflected from magnetron source for deposition of magnetic thin films 査読有り

H. Matsui, H. Toyoda and H. Sugai

J. Vac. Sci. Technol. A 23 巻 ( 4 ) 頁： 671-675 2005年

Evidence of Radical-free Etching of SiO2 by Fluorocarbon Molecules under Ion Bombardment 査読有り

N. Takada, H. Toyoda and H. Sugai

Transacitons of the Materials Research Society of Japan 30 巻 ( 1 ) 頁： 319-322 2005年

Beam Study of the Si and SiO₂ Etching Processes by Energetic Fluorocarbon Ions 査読有り

H. Toyoda, H. Morishima, R. Fukute, Y. Hori, I .Murakami and H. Sugai

J. Appl. Phys. 95 巻頁： 5172-5179 2004年

Dramatic Reduction of Chemical Sputtering of Graphite under Intercalation of Lithium 査読有り

H. Yagi, H. Toyoda, H. Sugai

J. Nucl. Mater. 313-316 巻頁： 284-287 2003年

Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductively-Coupled Plasma 査読有り

T. Kojima, A. Ohishi, H. Toyoda, M. Goto, M. Nishitani and H. Sugai

Jpn. J. Appl. Phys. 40 巻 ( 1 ) 頁： 322-325 2001年

Rapid Diffusion of Lithium into Bulk Graphite in Lithium Conditioning 査読有り

N. Itou, H. Toyoda, K. Morita and H. Sugai

J. Nucl. Mater. 290-293 巻頁： 381-385 2001年

Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field 査読有り

H. Sugai, H. Toyoda, J. Ihde and J. Winter

J. Plasma and Fusion Research 77 巻 ( 2 ) 頁： 130-136 2001年

Electron Energy Distribution Function and the Influence on Fluorocarbon Plasma Chemistry 査読有り

H. Sugai, I. Ghanashev, M. Hosokawa, K. Mizuno, K. Nakamura, H. Toyoda and K. Yamauchi

Plasma Sources Sci. Technol 10 巻頁： 378-385 2001年

Measurement of Electron-Impact-Dissociation Cross Section for Neutral Products 査読有り

H. Sugai, H. Toyoda

AIP Conf. Proc. 500 巻頁： 349-358 2000年

Laboratory Experiment on Lithium Chemistry and its Application to Effective Wall Conditioning 査読有り

S. Kato, M. Watanabe, H. Toyoda, H. Sugai

J. Nucl. Mater. 266-269 巻頁： 406-411 1999年

リチウムコンディショニングによる炭素不純物の抑制機構査読有り

豊田浩孝、加藤伸一、菅井秀郎

プラズマ・核融合学会誌 75 巻 ( 4 ) 頁： 459-466 1999年

気相および表面におけるラジカル生成のビーム実験査読有り

豊田浩孝、菅井秀郎

プラズマ・核融合学会誌 75 巻 ( 7 ) 頁： 779-784 1999年

壁コンディショニングの機能と将来の展望

豊田浩孝

プラズマ・核融合学会誌 75 巻 ( 4 ) 頁： 403-408 1999年

Lower Temperature Deposition of Poly-Crystalline Silicon Films from a Modified Inductively-Coupled Silane Plasma

K. Goshima, H. Toyoda, T. Kojima, M. Nishitani, M. Kitagawa, H. Yamazoe, H. Sugai

Jpn. J. Appl. Phys. 38 巻 ( 6A ) 頁： 3655-3659 1999年

オプティカルマルチチャンネルアナライザによる高感度吸収分光計測査読有り

豊田浩孝

応用物理 68 巻 ( 5 ) 頁： 551-552 1999年

代替エッチングガスC₃HF₇Oの電子衝突解離断面積査読有り

Jpn.J.Appl.Phys. 37 巻 ( 9A ) 頁： 5053-5059 1998年

プラズマプロセスに関連した低エネルギー多原子イオンの表面解離の観察

J.Vac.Sci.Technol. 16 巻 ( 1 ) 頁： 290-293 1998年

電子サイクロトロン共鳴放電によるその場磁化ボロナイゼーションの基礎研究査読有り

J.Nucl.Mater. 241-243 巻頁： 1217-1221 1997年

改良型誘導結合プラズマによるアモルファスおよび多結晶シリコン膜の低温形成査読有り

応用物理学会欧文誌 36 巻 ( 6A ) 頁： 3714-3720 1997年

C₄F₈の電子衝突解離による中性およびイオン化ラジカル種の生成断面積査読有り

応用物理学会欧文誌 36 巻 ( 6A ) 頁： 3730-3735 1997年

リチウム堆積環境下における水素および不純物挙動の実験室実験

241-243 巻頁： 1031-1035 1997年

Diagnostics for Advanced Plasma Control of Materials Processing 査読有り

H. Sugai, T.H. Ahn, I. Ghanashev, M. Goto, H. Toyoda, N. Nagatsu, K. Nakamura, K. Suzuki

Plasma Phys. Control. Fusion 39 巻頁： A445-458 1997年

熱料および不純物制御のためのリチウム壁コンディショニング査読有り

真室 47 巻 ( 6-9 ) 頁： 981-984 1996年

誘導結合シランプラズマを用いた水素化アモルファスシリコン膜の低温形成

応用物理学会欧文誌 35 巻 ( 8A ) 頁： L1009-1011 1996年

低エネルギーフロロカーボンイオンを照射された金属表面からの解離イオンイールド査読有り

34 巻 ( 11A ) 頁： L1486-1489 1995年

ポロニゼーションにおける水蒸量と同位体置換査読有り

220-222 巻頁： 743-747 1995年

低エネルギ炭化水素イオンを照射された金属表面からのイオン散乱の観測査読有り

34 巻 ( 4B ) 頁： L516-519 1995年

リチウム蒸着による壁のコンディショニング査読有り

220-222 巻頁： 254 1995年

紫外透過分光法を用いたシランプラズマ中におけるSiH3ラジカルと微粒子の簡便直接測定査読有り

34 巻 ( 4A ) 頁： L448-451 1995年

プラズマ中の電子エネルギー分布測定の為のバイアス光プローブ法

4 巻頁： 366372 1995年

LHDへの応用をめざしたボロニゼーション研究

220-222 巻頁： 623-626 1995年

SF₆のSF_X(X=1-3)ラジカルへの電子衝突解離の相対断面積測定査読有り

35 巻 ( 4-5 ) 頁： 405-413 1995年

電子衝突によるCF₄およびCHF₃のCF_X(X=1-3)ラジカルへの解離断面積の絶対測定査読有り

35 巻 ( 4-5 ) 頁： 415-420 1995年

ダイアモンド成長DC放電中におけるCH₃およびCHラジカル密度査読有り

35 巻 ( 4-5 ) 頁： 359-373 1995年

Measurement of CH3 and CH Densities in a Diamond Growth d. c. Discharge 査読有り

M.A. Childs, K.L. Menningen, H. Toyoda, L.W. Anderson, J.E. Lawler

Europhys. Lett. 25 巻 ( 9 ) 頁： 729-734 1994年

Measurement of Absolute Hydrogen Dissociation in a Diamond Deposition System 査読有り

M.A. Childs, K.L. Menningen, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. Lawler

Phys. Lett. A 194 巻頁： 119123 1994年

Ultraviolet Spectroscopy of Gaseous Spacies in a Hot Filament Diamond Deposition System When C2H2 and H2 are the Input Gases. 査読有り

H. Toyoda, M.A. Childs, K.L. Menningen, L.W. Anderson, J.E. Lawler

J. Appl. Phys. 75 巻 ( 6 ) 頁： 3142-3150 1994年

Absolute Radical Density Measurements in a CH4-H2 d.c. Discharge 査読有り

K.L. Menningen, M.A. Childs, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. Lawler

Diamond and Related Mater 3 巻頁： 422-425 1994年

Evaluation of a Substrate Pretreatment for Hot Filament CVD 査読有り

K.L. Menningen, M.A. Childs, H. Toyoda, L.W. Anderson, J.E. Lawler

J. Mater. Res. 9 巻 ( 4 ) 頁： 915-920 1994年

Cross Section Measurements for Electron-Impact Dissociation of CHF3 into Neutral and Ionic Radicals, 査読有り

M. Goto, K. Nakamura, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys., 33 巻 ( 6A ) 頁： 3602-3607 1994年

プラズマによる表面改質とラジカル計測査読有り

200 巻頁： 403-411 1993年

CF₄エッチングプラズマにおけるCF₃ CF₂ラジカルの空間分布と表面損失査読有り

32 巻 ( 3A ) 頁： L353-L356 1993年

CF₄エッチングプラズマへの水素添加によるCF₂,CF₃のふるまいの劇的変化査読有り

32 巻 ( 5A ) 頁： L690-L693 1993年

Methyl Radical Production in a Hot Filament CVD System 査読有り

K.L. Menningen, M.A. Childs, P. Chevako, H. Toyoda, L.W. Anderson, J.E. Lawler

Chem. Phys. Lett 204 巻 ( 5-6 ) 頁： 573-577 1993年

Appearance Mass Spectrometry of Neutral Radicals in Radio Frequency Plasmas 査読有り

H. Sugai, H. Toyoda

Journal of Vacuum Science and Technology A10 巻 ( 4 ) 頁： 1193-12004 1992年

プラズマ界面における異常発光とフラグメンテーション査読有り

片寄恭一, 豊田浩孝, 菅井秀郎

核融合研究 67 巻 ( 1 ) 頁： 51-61 1992年

In-situ Boron Nitride Coating and Comparison with Existing Boronization 査読有り

M. Yamage, T. Ejima, H. Toyoda, H. Sugai

J. Nucl. Mater. 196-198 巻頁： 618-621 1992年

High Speed Cleaning of Boronized Wall with a CF₄ Containing Plasma 査読有り

H. Toyoda, A. Hanami, M. Yamage, H. Sugai

Japanese Journal of Applied Physics 30 巻 ( 3B ) 頁： L514-517 1991年

Interactions of Bulk-Boronized Graphites with Deuterium Plasmas in the PISCES-B Facility 査読有り

Y. Hirooka, R.W. Conn, H. Toyoda, H. Sugai et al.

Fusion Technol 19 巻頁： 2059-2069 1991年

Electron Impact Dissociation of Methane into CH3 and CH2 Radicals, II. Absolute Cross Sections 査読有り

T. Nakano, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. 30 巻 ( 11A ) 頁： 2912-2915 1991年

Electron Impact Dissociation of Methane into CH3 and CH2 Radicals, I. Relative Cross Sections 査読有り

T. Nakano, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. 30 巻 ( 11A ) 頁： 2908-2911 1991年

Spatial Distribution of CH₂ and CH₂ Radicals in a Methane RF Discharge 査読有り

H. Sugai, H. Kojima, A. Ishida, H. Toyoda

Applied Physics Letters 56 巻 ( 26 ) 頁： 2616-2618 1990年

Ion-Induced Radical Production on Surfaces during Deposition of Hydrogenated Amorphous Carbon 査読有り

Y. Yamashita, K. Katayose, H. Toyoda, H. Sugai

Journal of Applied Physics 68 巻 ( 7 ) 頁： 3735-3737 1990年

RF Plasma Production at Ultralow Pressure with Surface Magnetic Confinement 査読有り

T. Shirakawa, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. 29 巻 ( 6 ) 頁： L1015-1018 1990年

Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge 査読有り

H. Toyoda, A. Hanami, H. Sugai

Jpn. J. Appl. Phys. 29 巻 ( 7 ) 頁： 1322-1323 1990年

Effects of Carbon Wall on the Bahaviour of Heliotron-E Plasmas 査読有り

N. Noda, T. Mizuuchi, H. Toyoda, S. Yoshida, H. Sugai et al.

J. Nucl. Mater. 162-164 巻頁： 769-775 1989年

Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma 査読有り

S. Yoshida, H. Sugai, H. Toyoda

Jpn. J. Appl. Phys 28 巻 ( 6 ) 頁： 1101-1108 1989年

Genaration of a Large Electron Beam for Plasma Processing, 査読有り

H. Sugai, N. Yabuoshi, H. Toyoda

Jpn. J. Appl. Phys. 28 巻 ( 5 ) 頁： L868-870 1989年

Hydrogen Recycling Control by Helium Ion Bombardment onto Carbonized Surfaces 査読有り

H. Sugai, H. Toyoda, S. Ohshita, S. Yoshida, A. Sagara

J. Nucl. Meter. 162-164 巻頁： 1035-1039 1989年

Carbonization Experiment by ECR Discharge in JIPPT-IIU 査読有り

Y.Sakamoto, H. Amemiya, H. Toyoda, H. Sugai et al.

J. Nucl. Mater. 162-164 巻頁： 783-786 1989年

Mass Spectroscopic Investigation of the CH₃ Radicals in a Methane RF Discharge 査読有り

H. Toyoda, H. Kojima, H. Sugai

Applied Physics Letters 54 巻 ( 16 ) 頁： 1507-1509 1989年

Hydrogen Retention and Release Dynamics of Amorphous Carbon Filsm Exposed to a Hydrogen Plasma 査読有り

H. Sugai, S. Yoshida, H. Toyoda

Applied Physics Letters 54 巻 ( 15 ) 頁： 1412-1414 1989年

In situ Boron Coating and its Removal by Glow Discharge Processes 査読有り

H. Toyoda, T. Isozumi, H. Sugai, T. Okuda

Journal of Nuclear Materials 162-164 巻頁： 732-736 1989年

Observation of CH2 Radical and Comparison with CH3 Radical in a RF Methane Discharge 査読有り

H. Kojima, H. Toyoda, H. Sugai

Applied Physics Letters 55 巻 ( 13 ) 頁： 1292-1294 1989年

Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge 査読有り

Y. Yamashita, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. 28 巻 ( 9 ) 頁： L1647-1650 1989年

Control of Hydrogen Content of Boron Films Produced by a DC Toroidal Discharge 査読有り

H. Toyoda, H. Sugai, T. Isozumi, T. Okuda

Applied Physics Letters 51 巻 ( 11 ) 頁： 798-800 1987年

イオン束を制御した水素化アモルファスシリコンの生成と成膜過程査読有り

豊田浩孝, 菅井秀郎, 吉田　明, 奥田孝美

応用物理 55 巻 ( 7 ) 頁： 718-726 1986年

Hydrogenated Amorphous Silicon Formation by Flux Control and Hydrogen Effects on the Growth Mechanism 査読有り

H. Toyoda, H. Sugai, K. Kato, A. Yoshida, T. Okuda

Appl. Phys. Lett. 48 巻 ( 24 ) 頁： 1648-1650 1986年

Ion and Radical Contributions to a Si : H Film Formation in a DC Toroidal Discharge 査読有り

H. Sugai, H. Toyoda, A. Yoshida, T. Okuda

Applied Physics Letters 46 巻 ( 11 ) 頁： 1048-1050 1985年

プラズマイオン分析器の開発査読有り

菅井秀郎, 小島啓明, 森　直生, 豊田浩孝, 奥田孝美

核融合研究 51 巻 ( 3 ) 頁： 221-240 1984年

A Mass Spectrometer for Boundary Plasma Diagnostics 査読有り

H. Kojima, H. Sugai, T. Mori, H. Toyoda, T. Okuda

J. Nucl. Mater 128-129 巻頁： 965-968 1984年

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