論文 - 牧原 克典
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X-ray Photoemission Study of SiO2/Si/Si0.55Ge0.45/Si Heterostructures 査読有り
A. Ohta. K. Makihara, S. Miyazaki, M. Sakuraba and J. Murota
IEICE TRANSACTIONS on Electronics 96-C 巻 ( 5 ) 頁: 680-685 2013年
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Evaluation of Chemical Composition and Bonding Features of Pt/SiOx/Pt MIM Diodes and Its Impact on Resistance Switching Behavior 査読有り
A. Ohta, K. Makihara, M. Ikeda, H. Murakamis, S. Higashi and S. Miyazaki
IEICE TRANSACTIONS on Electronics 96-C 巻 ( 5 ) 頁: 702-707 2013年
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Characterization of Resistive Switching of Pt/Si- rich Oxide/TiN System 査読有り
M. Fukushima, A. Ohta, K. Makihara and S. Miyazaki
IEICE TRANSACTIONS on Electronics 96-C 巻 ( 5 ) 頁: 708-713 2013年
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Characterization of Local Electronic Transport through Ultrathin Au/Highly-dense Si Nanocolumar Structures by Conducting-Probe Atomic Force Microscopy 査読有り
D. Takeuchi, K. Makihara, M. Ikeda, S. Miyazaki, H. Kaki and T. Hayashi
IEICE TRANSACTIONS on Electronics 96-C 巻 ( 5 ) 頁: 718-721 2013年
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Photoexcited Carrier Transfer in a NiSi-Nanodots/Si-Quantum-Dots Hybrid Floating Gate in MOS Structures 査読有り
M. Ikeda, K. Makihara and S. Miyazaki,
IEICE TRANSACTIONS on Electronics 96-C 巻 ( 5 ) 頁: 694-698 2013年
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Characterization of Electroluminescence from One-dimensionally Self-Aligned Si-based Quantum Dots 査読有り
H. Takami, K. Makihara, M. Ikeda and S. Miyazaki
Japanese Journal of Applied Physics 52 巻 ( 4 ) 頁: 04CG08 2013年
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Temporal Changes of Charge Distribution in High Density Self-aligned Si-based Quantum Dots as Evaluated by AFM/KFM 査読有り
N. Tsunekawa K. Makihara, M. Ikeda and S. Miyazaki
Trans. of MRS-J 38 巻 ( 3 ) 頁: 393-396 2013年
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Characterization of Resistive Switching Behaviors of RF Sputtered Si Oxide ReRAMs with Ti-based Electrodes 査読有り
A. Ohta, M. Fukusima, K. Makihara, H. Murakami, S. Higashi and S. Miyazaki
Jpn. J. Appl. Phys. 52 巻 頁: 11NJ06 2013年
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Highly-crystallized Ge:H Film Growth from GeH4 VHF-ICP -Crystalline Nucleation Initiated by Ni-nanodots- 査読有り
K. Makihara, J. Gao, K. Sakaike, S. Hayashi, H. Deki, M. Ikeda, S. Higashi and S. Miyazak
Jpn. J. Appl. Phys. 52 巻 ( 9 ) 頁: 11NA04 2013年
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Study on Charge Storage and Optical Response of Hybrid Nanodots Floating Gate MOS Devices for Their Optoelectronic Application 査読有り
S. Miyazaki, M. Ikeda and K. Makihara
ECS Trans 58 巻 ( 9 ) 頁: 231-237 2013年
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Resistive Switching Properties of SiOx/TiO2 Multi-Stack in Ti-electrode MIM Diodes 査読有り
A. Ohta, K. Makihara, M. Fukusima, H. Murakami, S. Higashi and S. Miyazaki
ECS Trans 58 巻 ( 9 ) 頁: 293-300 2013年
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Evaluation of Charge Trapping Properties of Microcrystalline Germanium Thin Films by Kelvin Force Microscopy 査読有り
K. Makihara, H. Deki, M Ikeda and S, Miyazaki
Journal of Non-Crystalline Solids 358 巻 ( 17 ) 頁: 2086-2089 2012年
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Electroluminescence from One-dimensionally Self-Aligned Si-based Quantum Dots with High Areal Dot Density 査読有り
K. Makihara, H. Deki, M Ikeda and S, Miyazaki
Japanese Journal of Applied Physics 51 巻 ( 4 ) 頁: 04DG08 2012年
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Characterization of Resistance-Switching Properties of SiOx Films Using Pt Nanodots Electrodes 査読有り
K. Makihara, M. Fukushima, A. Ohta, M. Ikeda and S. Miyazaki
ECS TRANSACTIONS 50 巻 ( 9 ) 頁: 459-464 2012年
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Study of Electron Transport Characteristics Through Self-Aligned Si-Based Quantum Dots 査読有り
K. Makihara, M. Ikeda and S. Miyazaki
Journal of Applied Physics 112 巻 頁: 104301 2012年
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Light Induced Carrier Transfer in NiSi-Nanodots/Si-Quantum-Dots Hybrid FG in MOS Structures 査読有り
N. Morisawa, M. Ikeda, S. Nakanishi, A. Kawanami, K. Makihara and S. Miyazaki
Japanese Journal of Applied Physics 49 巻 頁: 04DJ04 2011年
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Characterization of Electronic Charged States of Impurity Doped Si Quantum Dots Using AFM/Kelvin Probe Technique 査読有り
K. Makihara and S. Miyazaki
Japanese Journal of Applied Physics 49 巻 ( 2 ) 頁: 065002 2011年
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High Density Formation of Ge Quantum Dots on SiO2 査読有り
K. Makihara, M. Ikeda, A. Ohta, S. Takeuchi, Y. Shimura, S. Zaima and S. Miyazaki
Solid State Electronics 60 巻 頁: 65-69 2011年
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Optical Response of Si-Quantum-Dots/NiSi-Nanodots Stack Hybrid Floating Gate in MOS Structures 査読有り
N. Morisawa, M. Ikeda, K. Makihara and S. Miyazaki
Key Engineering Materials 470 巻 頁: 135-139 2011年
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Study on Collective Electron Motion in Si-Nano Dot Floating Gate MOS Capacitor 査読有り
M. Muraguchi, Y. Sakurai, Y. Takada, S. Nomura, K. Shiraishi, M. Ikeda, K. Makihara, S. Miyazaki, Y. Shigeta, T. Endoh
IEICE TRANSACTIONS on Electronics 94-C 巻 ( 5 ) 頁: 730-736 2011年