論文 - 牧原 克典
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Growth of two-dimensional Ge crystal by annealing of heteroepitaxial Ag/Ge(111) under N-2 ambient
Ito Koichi, Ohta Akio, Kurosawa Masashi, Araidai Masaaki, Ikeda Mitsuhisa, Makihara Katsunori, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 6 ) 2018年6月
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Total photoelectron yield spectroscopy of energy distribution of electronic states density at GaN surface and SiO2/GaN interface
Ohta Akio, Nguyen Xuan Truyen, Fujimura Nobuyuki, Ikeda Mitsuhisa, Makihara Katsunori, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 6 ) 2018年6月
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Low-temperature formation of Ga-oxide/GaN interface with remote oxygen plasma and its interface properties
Yamamoto Taishi, Taoka Noriyuki, Ohta Akio, Nguyen Xuan Truyen, Yamada Hisashi, Takahashi Tokio, Ikeda Mitsuhisa, Makihara Katsunori, Shimizu Mitsuaki, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 6 ) 2018年6月
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Interface properties of SiO2/GaN structures formed by chemical vapor deposition with remote oxygen plasma mixed with Ar or He
Nguyen Xuan Truyen, Taoka Noriyuki, Ohta Akio, Makihara Katsunori, Yamada Hisashi, Takahashi Tokio, Ikeda Mitsuhisa, Shimizu Mitsuaki, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 6 ) 2018年6月
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Direct evaluation of electrical dipole moment and oxygen density ratio at high-k dielectrics/SiO2 interface by X-ray photoelectron spectroscopy analysis
Fujimura Nobuyuki, Ohta Akio, Ikeda Mitsuhisa, Makihara Katsunori, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 4 ) 2018年4月
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High thermal stability of abrupt SiO2/GaN interface with low interface state density
Nguyen Xuan Truyen, Taoka Noriyuki, Ohta Akio, Makihara Katsunori, Yamada Hisashi, Takahashi Tokio, Ikeda Mitsuhisa, Shimizu Mitsuaki, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 4 ) 2018年4月
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Segregated SiGe ultrathin layer formation and surface planarization on epitaxial Ag(111) by annealing of Ag/SiGe(111) with different Ge/(Si plus Ge) compositions
Ito Koichi, Ohta Akio, Kurosawa Masashi, Araidai Masaaki, Ikeda Mitsuhisa, Makihara Katsunori, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 4 ) 2018年4月
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Characterization of remote O-2-plasma-enhanced CVD SiO2/GaN(0001) structure using photoemission measurements
Nguyen Xuan Truyen, Ohta Akio, Makihara Katsunori, Ikeda Mitsuhisa, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 1 ) 2018年1月
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Electroluminescence of superatom-like Ge-core/Si-shell quantum dots by alternate field-effect-induced carrier injection
Makihara Katsunori, Ikeda Mitsuhisa, Fujimura Nobuyuki, Yamada Kentaro, Ohta Akio, Miyazaki Seiichi
APPLIED PHYSICS EXPRESS 11 巻 ( 1 ) 2018年1月
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Formation of Mn-germanide nanodots on ultrathin SiO2 induced by remote hydrogen plasma
Wen Yinghui, Makihara Katsunori, Ohta Akio, Ikeda Mitsuhisa, Miyazaki Seiichi
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 1 ) 2018年1月
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Characterization of remote O2-plasma-enhanced CVD SiO2/GaN(0001) structure using photoemission measurements 査読有り
N. X. Truyen, A. Ohta, K. Makihara, M. Ikeda, and S. Miyazaki
Japanese Jounal of Applied Physics 57 巻 頁： 01AD02 2018年
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Electroluminescence of superatom-like Ge-core/Si-shell quantum dots by alternate field-effect-induced carrier injection 査読有り
K. Makihara, M. Ikeda, N. Fujimura, K. Yamada, A. Ohta, and S. Miyazaki
Applied Physics Express 11 巻 頁： 011305 (4pages) 2018年
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Segregated SiGe ultrathin layer formation and surface planarization on epitaxial Ag(111) by annealing of Ag/SiGe(111) with different Ge/(Si+Ge) compositions 査読有り
K. Ito, A. Ohta, M. Kurosawa, M. Araidai, M. Ikeda, K. Makihara, and S. Miyazaki
Japanese Jounal of Applied Physics 57 巻 頁： 04FJ05 2018年
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Carrier Conduction in SiO2/GaN Structure with Abrupt Interface
Nguyen Xuan Truyen, Taoka Noriyuki, Ohta Akio, Yamada Hisashi, Takahashi Tokio, Ikeda Mitsuhisa, Makihara Katsunori, Shimizu Mitsuaki, Miyazaki Seiichi
2018 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA) 頁： . 2018年
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High Density Formation and Magnetoelectronic Transport Properties of Fe3Si Nanodots 査読有り
Hai Zhang, Katsunori Makihara, Mitsuhisa Ikeda, Akio Ohta, and Seiichi Miyazaki
ECS Trans. 86 巻 ( 7 ) 頁： 131-138 2018年
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Impact of phosphorus doping to multiple-stacked Si quantum dots on electron emission properties
Takeuchi Daichi, Makihara Katsunori, Ohta Akio, Ikeda Mitsuhisa, Miyazaki Seiichi
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 70 巻 頁： 183-187 2017年11月
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リモートプラズマCVD SiO<sub>2</sub>/GaN界面の熱安定性
グェン スァン チュン, 田岡 紀之, 大田 晃生, 山田 永, 高橋 言緒, 池田 弥央, 牧原 克典, 清水 三聡, 宮崎 誠一
応用物理学会学術講演会講演予稿集 2017.2 巻 ( 0 ) 頁： 3024 - 3024 2017年8月
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Magnetoelectronic transport of double stack FePt nanodots
Makihara Katsunori, Kawase Taiga, Ohta Akio, Ikeda Mitsuhisa, Miyazaki Seiichi
APPLIED PHYSICS LETTERS 111 巻 ( 5 ) 2017年7月
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Evaluation of energy distribution of filled defects of Si oxide thin films from total photoelectron yield spectroscopy
Ohta Akio, Ikeda Mitsuhisa, Makihara Katsunori, Miyazaki Seiichi
MICROELECTRONIC ENGINEERING 178 巻 頁： 85-88 2017年6月
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Potential changes and chemical bonding features for Si-MOS structure as evaluated from HAXPES analysis
Ohta Akio, Murakami Hideki, Ikeda Mitsuhisa, Makihara Katsunori, Ikenaga Eiji, Miyazaki Seiichi
MICROELECTRONIC ENGINEERING 178 巻 頁： 80-84 2017年6月