講演・口頭発表等 - 石川 健治
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Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ electron spin resonance measurements 国際会議
Kenji Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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A High Temperature Plasma Etching of GaN and Its Reaction Mechanism 国際会議
R. Kometani, S. Chen, M. Liu, Kenji Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Studies on Plasma Etching of Si3N4 in Capacitively Coupled Plasma employing C5HF7 国際会議
Y. Miyawaki, Y. Kondo, M. Sekine, Kenji Ishikawa, T. Hayashi, K. Takeda, A. Ito, H. Matsumoto, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism 国際会議
K. Asano, Y. Miyawaki, Kenji Ishikawa, M. Sekine, K. Takeda, A. Ito, H. Matsumoto, H. Kondo, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Quantum chemical investigations for excitation dissociations of C5F8 and C5HF7 etching gases 国際会議
T. Hayashi, Kenji Ishikawa, M. Sekine, M. Hori
The 34th International Symposium on Dry Process (DPS)
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Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP 国際会議
T. Komuro, K. Takeda, Kenji Ishikawa, M. Sekine, Y. Ohya, H. Kondo, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma 国際会議
M. Fukasawa, H. Matsugai, T. Honda, Y. Miyawaki, Y. Kondo, K. Takeda, H. Kondo, Kenji Ishikawa, M. Sekine, K. Nagahata, F. Uesawa, M. Hori, and T. Tatsumi
The 34th International Symposium on Dry Process (DPS)
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An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN 国際会議
Z. Liu, S. Chen, Y. Lu, R. Kometani, Kenji Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma 国際会議
Y. Abe, A. Fukushima, Y. Lu, Y. Kim, K. Takeda, H. Kondo, Kenji Ishikawa, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Evaluation of gas-surface reaction dynamics during the plasmaless Si etching using NO/F2 gas mixture 国際会議
S. Tajima, T. Hayashi, Kenji Ishikawa, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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(INVITED) Real time In Situ Electron Spin Resonance (ESR) Study of Free Radicals on Materials Created by Plasmas 国際会議
Kenji Ishikawa,
American Vacuum Society (AVS)
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Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist 国際会議
Arkadiusz Malinowski, Makoto Sekine, Kenji Ishikawa,
American Vacuum Society (AVS)
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Evaluation of Surface Chemical Bonding State and Surface Roughness of Chemical Dry Etched Si using NO and F2 Gas Mixture 国際会議
Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
American Vacuum Society (AVS)
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Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN) 国際会議
Makoto Sekine, Ryosuke Kometani, Kenji Ishikawa,
American Vacuum Society (AVS)
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Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes 国際会議
Toshiya Suzuki, Kenji Ishikawa,
American Vacuum Society (AVS)
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(Coburn Winters Finalist) Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis 国際会議
Yusuke Kondo, Kenji Ishikawa,
American Vacuum Society (AVS)
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Measurement of activated species generated by 60 Hz excited atmospheric pressure Ar plasma in atmospheric gas 国際会議
Keigo Takeda, Jerome Jolibois, Kenji Ishikawa, Hiromasa Tanaka, Hiroyuki Kano, Makoto Sekine, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
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Reaction model for etching surface interacted with hydrofluorocarbon plasmas 国際会議
Kenji Ishikawa, Yusuke Kondo, Yudai Miyawaki, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
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Study on synthesis processes and crystallinity changes of nanographene materials synthesized by alcohol liquid-plasma 国際会議
Hiroki Kondo, Tatusya Hagino, Keigo Takeda, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
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Precise plasma process control based on combinatorial plasma etching 国際会議
Makoto Sekine, Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)