講演・口頭発表等 - 石川 健治
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ガスデザインに基づいたSiO2膜エッチングとその機構解明（II）
宮脇雄大，竹田圭吾，伊東安曇，中村昌洋，石川健治，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-9
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ポーラスSiOCH膜プラズマ処理後の大気曝露の影響(II)
鈴木俊哉，山本洋，竹田圭吾，近藤博基，石川健治，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-10
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誘導結合型H2/N2プラズマによる有機low-k薄膜のための小型コンビナトリアルプラズマエッチングプロセス
堀勝，チャンソン ムン，竹田圭吾，関根誠，節原裕一，白谷正治，石川健治，近藤博基
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-18
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和周波振動分光によるプラズマ処理表面の解析
石川健治，竹田圭吾，近藤博基，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 19a-R-14
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Dissociation channel of c-C4F8 to CF2 radical in reactive plasma
The 3rd International Conference on PLAsma-Nano Technology & Science (IC-PLANTS2010), Meijo University, Nagoya Japan
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Quasi-Bragg grating with sub-wavelength particles
The 3rd International Conference on PLAsma-Nano Technology & Science (IC-PLANTS2010), Meijo University, Nagoya Japan
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Radical Kinetics in N2-H2 Plasma Generated by Novel High Density Radical Source
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Siloxane Polymer Surface Modifications by Exposure of Plasma-Beams: A Vibrational Sum-Frequency Generation Spectroscopy (SFG) Study
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Fabrication of carbon nanomaterials synthesized by plasma enhanced chemical vapor deposition for solar cell applications
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Diagnostics in High Pressure SiH4/H2 Plasma for Deposition of Microcrystalline Si
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Synthesis of Amorphous Carbon Films using Nonequilibrium Atmosperic-Pressure Plasma
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Low-Temperature Treatment Using High-Density Non-Equilibrium Atmospheric of Pressure Plasma
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Effect of Plasma Surface Treatments on Supporting of Platinum Nanoparticles to Graphite Materials in Supercritical Carbon Dioxide
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Effect of Ion Irradiation on Carbon Nanowalls Growth
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Initial Nucleation in Carbon Nnowalls Growth on Si and SiO2 Surface
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Effect of Oxygen Etching on the Morphologies of Carbon Nanowalls
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Measurement of Si Wafer Temperature with Metal Thin Film during Plasma Process Using Low-Coherence Interferometer
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Deep-Level Defect Passivation by High Density Hydrogen Radical Exposure on Ion Irradiated Si
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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Analysis of ArF Photoresist Modified by Fluorocarbon Ion Bombardment
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
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SiO2 Cotact Hole Etch Mechanism Using Environment-Friendly New Gas, C5F7H
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan