Presentations -
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IR spectra of monosaccharide treated with atmospheric pressure plasma using sum frequency generation spectroscopy International conference
Yuta Yoshida, Takayuki Ohta, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effects of non-equilibrium atmospheric pressure plasma on aquaculture feed International conference
Takumi Yamauchi, Kenji Ishikawa, Hiromasa Tanaka, Shin'ichi Akiyama, Hiroshi Hashizume and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Efficacy of plasma treatment in a paddy field for yield and grain quality of rice International conference
Kaoru Sanda, Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activated lactated solutions International conference
Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference
Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer International conference
Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface International conference
Suganthamalar Selvaraj, Masahiro Hazumi, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 International conference
Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching International conference
Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Atomic Layer Etching of GaN Using Cl2/Ar Plasma at 400℃ International conference
Shohei Nakamura, Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference
Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Plasma applications for agriculture from seeds to field International conference
Hiroshi Hashizume, Hiroko Mizuno, Akiko Abe, Kenki Tsubota, Genki Yuasa, Satoe Tohno, Mikiko Kojima, Yumiko Takebayashi, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Shogo Matsumoto, Hitoshi Sakakibara, Takayuki Okuma, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021 2021.3.1
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Roles of seed pigments in responses of seeds to plasma treatment International conference
Kazunori Koga, Pankaj Attri, Ryo Arita, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Kayo Matsuo, Daisuke Yamashita, Kenji Ishikawa, Naho Itagaki, Kunihiro Kamataki, Masaharu Shiratani, and Vida Mildaziene
3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021 2021.3.1
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Electron spin resonace study on germination dynamics of plasma-activated seeds of radish sprouts International conference
Kenji Ishikawa, Ryo Arita, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Tomoaki Yoshida, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Daisuke Yamashita, Kayo Matsuo, Kazunori Koga, and Masaharu Shiratani
3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021 2021.3.1
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(Plenary) Plasma-surface interactions in plasma etching of future device fabrication International conference
Kenji Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T. Hayashi, M. Sekine, and M. Hori
The 16th International Workshop on Advanced Plasma Processing and Diagnostics
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Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ electron spin resonance measurements International conference
Kenji Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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A High Temperature Plasma Etching of GaN and Its Reaction Mechanism International conference
R. Kometani, S. Chen, M. Liu, Kenji Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Studies on Plasma Etching of Si3N4 in Capacitively Coupled Plasma employing C5HF7 International conference
Y. Miyawaki, Y. Kondo, M. Sekine, Kenji Ishikawa, T. Hayashi, K. Takeda, A. Ito, H. Matsumoto, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism International conference
K. Asano, Y. Miyawaki, Kenji Ishikawa, M. Sekine, K. Takeda, A. Ito, H. Matsumoto, H. Kondo, and M. Hori
The 34th International Symposium on Dry Process (DPS)