Presentations -
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CF4/H2プラズマによるエピタキシャル成長したSi0.7Ge0.3/Si/Si0.7Ge0.3積層膜からのSiナノシートの形成
尾崎孝太朗，堤隆嘉，石川健治，Yamamoto Yuji，Wen Wei-Chen，牧原克典
2025.3.17
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エピタキシャル成長したSi0.7Ge0.3およびSi薄膜におけるH2希釈CF4ガスによるドライエッチング -基板温度依存性-
尾崎 孝太朗、佐分利 伊吹、堤 隆嘉、石川 健治、Yamamoto Yuji、Wen Wei-Chen、牧原 克典
2025.3.15
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Impact of electrical stimulation and wall thickness variation on the differentiation potential of human mesenchymal stem cells cultured on SiC-coated CNWs
第72回応用物理学会春季学術講演会 2025.3.16
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Time course analysis of NO radicals in plasma-activated Ringer's lactate solution
第72回応用物理学会春季学術講演会 2025.3.16
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酸素ラジカル活性化L-トリプトファン溶液中に生成されたキヌレニンによる線維芽細胞の増殖促進効果
福井公輝、田島慶人、石川健治、田中宏昌、堀勝、伊藤昌文
2025.3.16
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酸素ラジカル活性化インドール溶液による殺菌効果の温度依存性
北川大慈、清水健太、渡邊拓哉、志水元亨、加藤雅士、田中宏昌、石川健治、堀勝、伊藤昌文
2025.3.16
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大気圧質量分析法を用いたソラマメ種皮の酸化窒素ラジカル透過率測定
川口幸大、塚越啓央、田中宏昌、石川健治、堀勝、伊藤昌文
2025.3.16
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Real-time Analysis of Neutral species spectrum Using Machine Learning
第72回応用物理学会春季学術講演会 2025.3.17
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Effects of Radical Sticking Probability on Transport in High-Aspect-Ratio Holes
第72回応用物理学会春季学術講演会 2025.3.17
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In-situ Surface Reaction Analysis during Atomic Layer Etching of TiN Irradiated by Cl Radicals at Low Temperature
第72回応用物理学会春季学術講演会 2025.3.17
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A Cyclic Etching of Platinum Thin Films by An Oxygen Plasma and A Formic Acid Vapor Treatment
第72回応用物理学会春季学術講演会 2025.3.17
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計算化学による1-C4F8の電子物性と解離特性
林俊雄、石川健治、関根誠、堀勝
2025.3.17
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1-C5F10分子の電子物性と解離
林俊雄、石川健治、関根誠、堀勝
2025.3.17
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酸素添加塩素プラズマによるGaN 選択エッチングの温度依存性
中村昭平，谷出敦，木村貴弘，トラン グエン トラン，井上健一，石川健治
2025.3.17
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Free Radical Formation Induced by Low-temperature Plasma in Amino acids. An EPR-Spin Trapping Study
第72回応用物理学会春季学術講演会 2025.3.15
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Effects of plasma irradiation on the ascorbic acid content in Artemia International conference
Hayato Shirata, Kenji Ishikawa, Shinichi Akiyama, Hiroshi Hashizume, Masaru Hori, and Hiromasa Tanaka
2025.3.5
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Investigation of mitophagy-inducing substances and their effects on mitochondrial function in plasma-activated Ringer's lactate solution International conference
Kohei Mori, Taishi Yamakawa, Masaru Hori, Kenji Ishikawa, and Hiromasa Tanaka
2025.3.5
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Evaluation of lateral selective etching with CF4/H2 plasma of Si0.7Ge0.3/Si/Si0.7Ge0.3 layers International conference
Kotaro Ozaki, Noriharu Takada, Yusuke Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Yuji Yamamoto, Wei-Chen Wen, and Katsunori Makihara
2025.3.4
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Irradiation time dependence of bactericidal effect of oxygen radical-activated indole solution International conference
Daiji Kitagawa, Takuya Watanabe, Motoyuki Shimizu, Masashi Kato, Kenji Ishikawa, Hiromasa Tanaka, Masaru Hori, and Masafumi Ito
2025.3.4
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Fabrication of cubic boron nitride films on WC substrates using electron beam excited plasma CVD method International conference
Toru Harigai, Seigo Takashima, Kenichi Inoue, HIroyuki Kousaka, Kenji Ishikawa, and Masaru Hori
2025.3.4
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The effect of electrical stimulation on the multipotency of mesenchymal stem cells on SiC-coated CNW scaffolds International conference
Koki Ono, Ayoko Tanaka, Kenji Ishikawa, Wakana Takeuchi, Kenichi Uehara, Shigeo Yasuhara, Masaru Hori, and Hiromasa Tanaka
2025.3.4
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Damage evaluation for electron-beam-assisted modification of GaN surface International conference
Takayoshi Tsutsumi, Yusuke Izumi, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
2025.3.4
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Low-damage plasma etching of metal gate TiAlC using nonhalogen chemistries at room temperature International conference
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
2025.3.4
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Surface reactions by deep ultraviolet laser irradiation for GaN etching International conference
Ryoto Takahashi, Takayoshi Tsutsumi, Kenichi Inoue, Ryusei Sakai, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
2025.3.4
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Plasma-activated Ringer’s lactate solution induces changes in the planarian regeneration International conference
Yota Kojima, Kenji Ishikawa, Hiroshi Hashizume, Masaru Hori, and Hiromasa Tanaka
2025.3.4
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In-situ analysis of chlorination of TiN surfaces by chlorine radical irradiations International conference
Shunya Hirai, Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenichi Inoue, and Kenji Ishikawa
2025.3.4
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Growth promotion of pea sprouts (Pisum Sativum) by non-equilibrium atmospheric pressure plasma irradiation International conference
Yuta Ibuka, Hiroshi Hashizume, Kenji Ishikawa, Masaru Hori, and Hiromasa Tanaka
2025.3.4
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Effect of sticking probability on radical transports in high-aspect-ratio holes International conference
Takumi Kurushima, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
2025.3.4
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Analysis of radical production in plasma-activated Ringer’s lactate solution using electron spin resonance International conference
Taishi Yamakawa, Kenichi Inoue, Masaru Hori, Kenji Ishikawa, and Hiromasa Tanaka
2025.3.4
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Optimizing plasma etching processes by elucidating C3HF5 primary dissociation mechanisms International conference
Nguyen Trung Tran, Hiroshi Iwayama, Toshio Hayashi, and Kenji Ishikawa
2025.3.4
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Effects of PAL targeting cancer-initiating cells International conference
Takaya Suzuki, Taishi Yamakawa, Ayako Tanaka, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, Kae Nakamura, Kenji Ishikawa, Masaru Hori, and Hiromasa Tanaka
2025.3.4
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新規創薬プロセスの確立を目指したプラズマ源開発
山川太嗣、井上健一、石川健治、堀勝，田中宏昌
2025.2.8
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がん治療増感に関わる放射線，温熱、超音波および低温プラズマの相互関係
近藤隆、村谷珠輝、古澤之裕、井上健一、橋爪博司、田中宏昌、石川健治、堀勝
2025.2.2
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アカデミックロードマップ：バイオ
石川健治
2025.1.29
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UVレーザー光照射エッチングプロセスにおけるGaN表面の脱離挙動
高橋遼人，酒井流星，堤隆嘉，井上健一，関根誠，堀勝，石川健治
2025.1.29
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Computational chemistry of plasma-driven reactions in lactated solution International conference
第34回日本MRS年次大会 2024.12.16
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The impact of plasma irradiation on the ascorbic acid of Artemia International conference
第34回日本MRS年次大会 2024.12.16
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Understanding surface reaction in PECVD process by combining in-situ monitoring and machine learning International conference
Takayoshi Tsutsumi, Yusuke Ando, Makoto Sekine, Masaru Hori, and Kenji Ishikwa
2024.12.9
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The effect of electrical stimulation on the cellular response of human mesenchymal stem cells on SiC-coated CNW scaffolds International conference
Koki Ono, Ayako Tanaka, Kenji Ishikawa, Wakana Takeuchi, Kenichi Uehara, Shigeo Yasuhara, Masaru Hori, and Hiromasa Tanaka
2024.12.4
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In-situ observation of reaction layer in surface for damage-free atomic layer etching International conference
Tsutsumi Takayoshi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
2024.12.1
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プラズマ活性乳酸リンゲル液による乳がん細胞選択的殺傷機構の解明
田中文子、水野正明、石川健治、ミロン カメリア、橋爪博司、岡崎泰昌、豊國伸哉、中村香江、梶山広明、堀勝、田中宏昌
2024.11.29
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プラズマ活性乳酸リンゲル液内オートファジー誘導物質の特定
山川太嗣、田中文子、ミロン カメリア、中村香江、梶山広明、豊國伸哉、水野正明、石川健治、堀勝、田中宏昌
2024.11.28
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プラズマ活性溶液による細胞運命の制御生命エレクトロニクスの展開
田中宏昌，水野正明，石川健治，梶山広明，豊國伸哉，堀勝
2024.11.17
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四重極型質量分析を用いた材料表面の中性粒子の付着確率計測
来島拓海，堤隆嘉，関根誠，堀勝，石川健治
2024.11.17
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機械学習を用いたアモルファスカーボン薄膜の体積機構におけるプロセスパラメータの寄与度解析
安藤悠介，堤隆嘉，近藤博基，関根誠，石川健治，堀勝
2024.11.17
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Hydrofluoroethane plasmas with CHF2CF3, CF3CH3, and CHF2CH3 on reactions of etching surface of SiN, SiO2 and poly-Si films International conference
Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
2024.11.15
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Plasma-enhanced atomic layer deposition of carbon films International conference
Liugang Hu, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Kenji Ishikawa, and Masaru Hori
2024.11.14
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UV laser ionization desorption of surfaces for GaN etching International conference
Ryoto Takahashi, Ryusei Sakai, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
2024.11.15
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Etching of GaN using Ar/F2 plasma at high temperatures International conference
J. He, Shohei Nakamura, Atsushi Tanide, Tran Trung Nguyen, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, and Kenji Ishikawa
2024.11.15
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Plasma-driven sciences: exploring complex interactions at plasma-boundaries International conference
Kenji Ishikawa
2024.11.12
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In-situ measurements of plasma-induced defects and radical adsorption in ALE International conference
Takayoshi Tsutsumi, Makoto Sekine, Kenji Ishikawa, Masaru Hori
2024.11.5
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Advanced semiconductor plasma processes pioneered by understanding and controlling plasma-surface interactions International conference
Masaru Hari, Makoto Sekine, Takayoshi Tsutsumi, Kenji Ishikawa
2024.11.4
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シロイヌナズナの種子における酸素ラジカルの照射効果
川口幸大，大竹将平，塚越啓央，田中宏昌，石川健治，堀勝，伊藤昌文
2024.11.2
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低温環境下での酸素ラジカル活性化ピロール溶液の殺菌効果
渡邊 拓哉，北川 大慈, 石川 健治, 田中 宏昌, 堀 勝, 伊藤 昌文
2024.11.2
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酸素ラジカル処理されたヒスチジン溶液が線維芽細胞へ与える影響
福井 公輝，石川 健治，田中 宏昌，堀 勝，伊藤 昌文
2024.11.2
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Behavior of radical adsorption on plasma induced defect for atomic layer etching International conference
Airah Peraro Osonio, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
2024.10.29
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超音波および低温プラズマによるフリーラジカル生成に関するスピン捕捉法による検討
近藤隆、水野裕貴、安田啓司、石川健治、堀勝
2024.10.19
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Effect of bias voltage on etching reaction of SiO2 in cryogenic process with HF contained plasmas International conference
Yusuke Imai, Shih-Nan Hsiao, Makoto Sekine, Kenji Ishikawa, Takayoshi Tsutsumi, Yuki Iijima, and Masaru Hori
2024.10.15
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In situ electron spin resonance and spin trapping study for kinetics of free radical reactions at plasma/liquid interfaces plasma chemistry on liquids International conference
Kenichi Inoue, Takashi Kondo, Kenji Ishikawa, and Masaru Hori
2024.10.3
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Process control of plasma etching of SiN, SiO2 and poly-Si films via enhanced fragmentation of CHF2CF3 and CF3CH3, CHF2CH3 International conference
Trung Nguyen Tran, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori, Kenji Ishikawa
2024.10.1
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Identification of autophagy inducers on cancer cell treated by plasma-activated Ringer’s lactate solution International conference
Taishi Yamakawa, Kae Nakamura, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, Kenji Ishikawa, Masaru Hori, and Hiromasa Tanaka
2024.10.2
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プラズマ活性乳酸リンゲル液（PAL）が及ぼすプラナリアの再生評価
小島 陽太、石川 健治、橋爪 博司、堀 勝、田中 宏昌
2024.9.20
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プラズマ活性乳酸リンゲル液（PAL）が及ぼすプラナリアの再生評価
小島 陽太、石川 健治、橋爪 博司、堀 勝、田中 宏昌
2024.9.20
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Heプラズマジェットを用いた直接照射による豚皮膚への影響
山田 真帆、中村 香江、梶山 広明、豊國 伸哉、水野 正明、石川 健治、堀 勝、田中 宏昌
2024.9.20
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マンモスフェア由来細胞を標的としたプラズマ活性溶液の影響
鈴木 崇矢、山川 太嗣、田中 文子、水野 正明、豊國 伸哉、梶山 広明、中村 香江、石川 健治、堀 勝、田中 宏昌
2024.9.20
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プラズマ活性乳酸リンゲル液による正常細胞のマイトファジー誘導評価
森 皓平、石川 健治、田中 宏昌、堀 勝
2024.9.20
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酸素ラジカル活性L-トリプトファン溶液による線維芽細胞の増殖促進効果
田島 慶人、石川 健治、堀 勝、伊藤 昌文
2024.9.20
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SiC被覆カーボンナノウォール上でのヒト間葉系幹細胞への電気刺激印加の効果
小野 浩毅、田中 文子、石川 健治、竹内 和歌奈、上原 賢一、安原 重雄、堀 勝、田中 宏昌
2024.9.20
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酸素ラジカル活性化インドール溶液による中性pH領域での殺菌効果
北川 大慈、渡邊 拓哉、志水 元亨、加藤 雅士、石川 健治、堀 勝、伊藤 昌文
2024.9.20
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温度制御した酸素ラジカル活性化ピロール溶液の殺菌効果
渡邊 拓哉、北川 大慈、石川 健治、堀 勝、伊藤 昌文
2024.9.20
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スピントラップ法を用いたプラズマ/液相界面ラジカルの実時間検出
井上 健一、近藤 隆、石川 健治、堀 勝
2024.9.20
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カーボンナノウォール成長時の構造制御と基板温度効果
ゴ クアンミン、ノ ヴァンノン、小田 修、石川 健治、堀 勝
2024.9.19
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CF4/H2プラズマによるSiO2低温エッチングのRFバイアス依存性
今井 祐輔、蕭 世男、関根 誠、堤 隆嘉、石川 健治、堀 勝
2024.9.18
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高アスペクト比ホール内におけるラジカルの付着確率の輸送への影響
来島 拓海、堤 隆嘉、関根 誠、堀 勝、石川 健治
2024.9.18
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紫外光照射時のGaN表面エッチング反応機構
高橋 遼人、酒井 流星、石川 健治、関根 誠、堤 隆嘉、堀 勝
2024.9.18
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酸素プラズマとギ酸蒸気によるPtの原子層エッチング時の表面反応
三輪 和弘、Thi-Thuy-Nga Nguyen、赤木 大二郎、岡東 健、堀 勝、石川 健治
2024.9.18
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電子線支援原子層エッチングにおけるGaN表面フッ素化反応
泉 祐輔、堤 隆嘉、近藤 博基、関根 誠、石川 健治、堀 勝
2024.9.18
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EBEP CVD法を用いたBN膜形成における基板種の影響
針谷 達、井上 健一、髙島 成剛、上坂 裕之、石川 健治、堀 勝
2024.9.18
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リモート酸素プラズマによるSiO2上の単層グラフェンの選択的除去
胡 留剛、石川 健治、Thi-Thuy-Nga Nguyen、蕭 世男、堀 勝
2024.9.18
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エピタキシャル成長した Si0.7Ge0.3 および Si 薄膜におけるH2 希釈 CF4 ガスによるドライエッチングの選択性評価
尾崎 孝太朗、高田 昇治、堤 隆嘉、石川 健治、Yamamoto Yuji、Wen Wei-Chen、牧原 克典
2024.9.16
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酸素ラジカル活性L-トリプトファン溶液による線維芽細胞の増殖促進効果
田島 慶人、石川 健治、堀 勝、伊藤 昌文
2024.9.20
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プラズマ活性乳酸リンゲル液による正常細胞のマイトファジー誘導評価
森 皓平、石川 健治、田中 宏昌、堀 勝
2024.9.20
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マンモスフェア由来細胞を標的としたプラズマ活性溶液の影響
鈴木 崇矢、山川 太嗣、田中 文子、水野 正明、豊國 伸哉、梶山 広明、中村 香江、石川 健治、堀 勝、田中 宏昌
2024.9.20
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Heプラズマジェットを用いた直接照射による豚皮膚への影響
山田 真帆、中村 香江、梶山 広明、豊國 伸哉、水野 正明、石川 健治、堀 勝、田中 宏昌
2024.9.20
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EBEP CVD法を用いたBN膜形成における基板種の影響
針谷 達、井上 健一、髙島 成剛、上坂 裕之、石川 健治、堀 勝
2024.9.18
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SiC被覆カーボンナノウォール上でのヒト間葉系幹細胞への電気刺激印加の効果
小野 浩毅、田中 文子、石川 健治、竹内 和歌奈、上原 賢一、安原 重雄、堀 勝、田中 宏昌
2024.9.20
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酸素ラジカル活性化インドール溶液による中性pH領域での殺菌効果
北川 大慈、渡邊 拓哉、志水 元亨、加藤 雅士、石川 健治、堀 勝、伊藤 昌文
2024.9.20
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温度制御した酸素ラジカル活性化ピロール溶液の殺菌効果
渡邊 拓哉、北川 大慈、石川 健治、堀 勝、伊藤 昌文
2024.9.20
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スピントラップ法を用いたプラズマ/液相界面ラジカルの実時間検出
井上 健一、近藤 隆、石川 健治、堀 勝
2024.9.20
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カーボンナノウォール成長時の構造制御と基板温度効果
ゴ クアンミン、ノ ヴァンノン、小田 修、石川 健治、堀 勝
2024.9.19
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CF4/H2プラズマによるSiO2低温エッチングのRFバイアス依存性
今井 祐輔、蕭 世男、関根 誠、堤 隆嘉、石川 健治、堀 勝
2024.9.18
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高アスペクト比ホール内におけるラジカルの付着確率の輸送への影響
来島 拓海、堤 隆嘉、関根 誠、堀 勝、石川 健治
2024.9.18
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紫外光照射時のGaN表面エッチング反応機構
高橋 遼人、酒井 流星、石川 健治、関根 誠、堤 隆嘉、堀 勝
2024.9.18
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酸素プラズマとギ酸蒸気によるPtの原子層エッチング時の表面反応
三輪 和弘、Thi-Thuy-Nga Nguyen、赤木 大二郎、岡東 健、堀 勝、石川 健治
2024.9.18
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電子線支援原子層エッチングにおけるGaN表面フッ素化反応
泉 祐輔、堤 隆嘉、近藤 博基、関根 誠、石川 健治、堀 勝
2024.9.18
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低温プラズマ農業のもたらす効果と技術化への期待
橋爪博司，北野英己，松本省吾，阿部明子，水野寛子，三田薫，湯浅元気，東野里江，田中宏昌，石川健治，榊原均，広末庸治, 前島正義，齋藤邦彰，水野正明，堀勝
2024.9.12
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Bactericidal and plant-growth effects of amino-acid solutions irradiated by electrically-neutral oxygen radicals International conference
Masafumi Ito, Naoyuki Iwata, Kenji Ishikawa, Yasuhiro Nishikawa, Motoyuki Shimizu, Hironaka Tsukakoshi, Masashi Kato, Masaru Hori
2024.9.13
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Cancer therapy using plasma-activated solutions International conference
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori
2024.9.9
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Metabolic disorders in E. coli induced by electrically neutral oxygen radicals irradiation of tryptophane-containing solutions International conference
Kenji Ishikawa, Masafumi Ito, Naoyuki Iwata, Yasuhiro Nishikawa, Motoyuki Shimizu, Hironaka Tsukakoshi, Masashi Kato, Masaru Hori, Hiromasa Tanaka
2024.9.13
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Cold atmospheric pressure plasma-treated polymer solutions for cancer treatment International conference
Camelia Miron, Hiromasa Tanaka, L. Marin, M. Iftime, A. Fifere, Takashi Kondo, Kenji Ishikawa, Hiroki Kondo, Shinya Toyokuni, V. Harabagiu, Masaru Hori
2024.9.14
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窒化ガリウムに対するノンイオン原子層エッチングについて
島津 大隼, 堤 隆嘉, 井上 健一, 石川 健治
2024.9.6
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低温プラズマ処理による種子の発芽促進要因の解明
伊藤輝喜、橋爪博司、石川健治、堀勝、田中宏昌
2024.9.6
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複数回PAL処理による抗腫瘍効果の持続性の調査及びメカニズムの解明ー耐性獲得によるがん再発防止の実現ー
若司 瞭, 中村 香江, 水野 正明, 豊國 伸哉, 梶山 広明,堀 勝, 石川 健治, 田中 宏昌
2024.9.6
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塩素ラジカルを用いた金属窒化物の原子層エッチングメカニズムに関する研究
平井 俊也, 篠田 和典, 堤 隆嘉, 井上 健一, 石川 健治
2024.9.6
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非平衡大気圧プラズマを用いたアルテミア卵への応用
藤田力丸, 山内拓、秋山真一、石川健治、堀勝、田中宏昌
2024.9.6
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AHF(無水フッ酸)ガスを用いた異方性エッチング
田中健太郎, 石川 健治, 堤 隆嘉, 関根 誠, 堀 勝
2024.9.6
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Biorefinery processes using non-equilibrium atmospheric-pressure plasmas International conference
Masafumi Ito, Motoyuki Shimizu, Masashi Kato, Hironaka Tsukagoshi, Yasuhiro Nishikawa, Kenji Ishikawa, Masaru Hori
2024.8.21
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A new challenge for developing novel atomic layer etching: applying the Leidenfrost effect to obtain floating nanomist assisted vapor etching International conference
Thi-Thuy-Nga Nguyen, Y. Yamaguchi, Kazunori Shinoda, K. Sun, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, Masaru Hori
2024.8.6
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放射線、超音波および低温プラズマによるフリーラジカル生成―スピン捕捉法による検討
近藤隆，井上健一，橋爪博司，田中宏昌，石川健治，堀勝
2024.7.20
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プラズマ活性乳酸リンゲル液添加に起因する表面形状変化の経時評価
臼田淳一、柳生憲伸、 田中宏昌、石川健治、堀勝、高橋康史
2024.7.18
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温熱による低温プラズマ誘発細胞死の増強ー直接照射から照射溶液の効果へ
近藤隆、村谷珠輝、古澤之裕、齋藤淳一、橋爪博司、田中宏昌、石川健治、堀勝
2024.7.13
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Biological interactions of plasma-activated solutions International conference
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori
2024.6.24
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低温プラズマによるがん治療の可能性―温熱による増強効果―
近藤 隆，村谷珠輝，古澤之裕，齋藤淳一，橋爪博司，田中宏昌，石川健治，堀勝
2024.6.22
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Plasma-based pseudo-wet etching for SiN using hydrogen contained fluorocarbon gases at cryogenic temperatures International conference
Shih-Nan Hsiao, Yusuke Imai, Makoto Sekine, Takayoshi Tsutsumi, Kenji Ishikawa, Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Maju Tomura, Yoshihide Kihara, and Masaru Hori
2024.6.10
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乳がん培養細胞系を用いたプラズマ活性乳酸リンゲル液による選択的殺傷効果の細胞内分子機構
田中宏昌、田中文子、柴田由紀、水野正明、石川健治、岡崎泰昌、豊國伸哉、中村香江、梶山広明，堀勝
2024.5.17
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放射線および低温プラズマによるアミノ酸のフリーラジカル生成―結晶アラニンの脱アミノラジカルを利用した線量評価－
近藤 隆、熊谷 純、平山亮一、橋爪博司、田中宏昌、石川健治、堀勝
2024.5.10
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液中プラズマによるダングリングボンド形成を通じた六方晶窒化ホウ素への官能基修飾
井上 健一, 高木 直人, 伊藤 剛仁, 清水 禎樹, 石川 健治, 堀 勝, 寺嶋 和夫
第70回応用物理学会春季学術講演会 15p-PB03-8 2023.3.15
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プラズマ駆動型科学とは何か～プラズマプロセスの新展開に期待して～ パネルディスカッション
石川 健治, 浜口 智志, 成田 絵美, 白谷 正治, 冨谷 茂隆, 室賀 駿, 佐藤 孝紀, 野崎 智洋, 吉田 朋子
第70回応用物理学会春季学術講演会 16p-A402-10 2023.3.16
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非平衡大気圧プラズマがゼブラフィッシュに及ぼす影響とその機構解明
紅林 佑弥, 石川 健治, 田中 宏昌, 秋山 真一, 橋爪 博司, 堀 勝
第70回応用物理学会春季学術講演会 17p-A409-9 2023.3.17
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プラズマ活性乳酸リンゲル液によるがん細胞死経路上のオートファジー観察
山川 太嗣, 石川 健治, 橋爪 博司, 田中 宏昌, 堀 勝
第70回応用物理学会春季学術講演会 17a-A409-6 2023.3.17
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カーボンナノウォール足場上での電気刺激重畳培養におけるヒト間葉系幹細胞の形態変化
小島 悠暉, 近藤 博基, 田中 宏昌, 石川 健治, 橋爪 博司, 堀 勝
第70回応用物理学会春季学術講演会 17a-A409-2 2023.3.17
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C2F4の電子物性とPTFEの生成機構
林 俊雄, 石川 健治, 関根 誠, 堀 勝, 兒玉 直人, 豊田 浩孝
第70回応用物理学会春季学術講演会 17p-A205-18 2023.3.17
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F2添加 Ar プラズマを用いた基板昇温下での AlGaN の原子層エッチング
中村 昭平, 谷出 敦, 灘原 壮一, 石川 健治, 小田 修, 堀 勝
第70回応用物理学会春季学術講演会 17p-A205-11 2023.3.17
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成膜パラメータの寄与度解析に基づく、 水素化アモルファスカーボン薄膜のエッチ耐性の向上
安藤 悠介, 近藤 博基, 石川 健治, 堤 隆嘉, 関根 誠, 堀 勝
第70回応用物理学会春季学術講演会 17a-A205-7 2023.3.17
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ウエハプロセスのグリーン化イノベーションに向けた戦略的挑戦 Invited
堀 勝、関根 誠、石川 健治
第83回 応用物理学会秋季学術講演会 21p-B104-3 2022.9.21
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プラズマ活性乳酸リンゲル液によるマクロファージの形質発現誘導
出野 雄大、柏倉 慧史、田中 宏昌、石川 健治、橋爪 博司、中村 香江、豊國 伸哉、水野 正明、梶山 広明、堀 勝
第83回 応用物理学会秋季学術講演会 20a-A106-7 2022.9.20
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イオン照射角制御によるカーボンナノウォールの配向成長
射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝
第83回 応用物理学会秋季学術講演会 23p-B102-5 2022.9.23
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プラズマ活性溶液による細胞運命の制御 Invited
田中 宏昌、水野 正明、石川 健治、梶山 広明、豊國 伸哉、吉川 史隆、堀 勝
第83回 応用物理学会秋季学術講演会 21p-B200-5 2022.9.21
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非平衡大気圧プラズマを用いた陸上養殖実現に向けた基礎的研究
紅林 佑弥、石川 健治、田中 宏昌、秋山 真一、橋爪 博司、堀 勝
第83回 応用物理学会秋季学術講演会 20p-A106-13 2022.9.20
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水素化アモルファスカーボン薄膜の合成機構における活性種の寄与度の機械学習を用いた解析
近藤 博基、黒川 純平、堤 隆嘉、関根 誠、石川 健治、堀 勝
第83回 応用物理学会秋季学術講演会 23a-B101-3 2022.9.23
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プラズマアシスト熱サイクル法を用いたSiGeのセルフリミティング性サイクルエッチング
篠田 和典、三浦 勝哉、前田 賢治、伊澤 勝、NGUYEN Thi-Thuy-Nga、石川 健治、堀 勝
第83回 応用物理学会秋季学術講演会 22p-A406-4 2022.9.22
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ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析
近藤 博基、尾崎 敦士、堤 隆嘉、関根 誠、石川 健治、堀 勝、平松 美根男
第69回応用物理学会春季学術講演会 24p-D114-6 2022.3.24
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稲穂への低温プラズマ照射がもたらす酒造品種玄米の品質向上
橋爪 博司、北野 英己、水野 寛子、阿部 明子、三田 薫、蕭 世男、湯浅 元気、東野 里江、田中 宏昌、石川 健治、松本 省吾、榊原 均、仁川 進、前島 正義、水野 正明、堀 勝
第69回応用物理学会春季学術講演会 25p-E105-13 2022.3.24
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網羅的解析に基づくプラズマ活性溶液による細胞死の機構解明
田中 宏昌、水野 正明、石川 健治、橋爪 博司、中村 香江、梶山 広明、吉川 史隆、岡崎 康昌、豊國 伸哉、堀 勝
第69回応用物理学会春季学術講演会 25a-E105-8 2022.3.24
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プラズマ照射乳酸リンゲル液の抗腫瘍成分の評価
伊藤 大貴、岩田 直幸、石川 健治、橋爪 博司、中村 香江、ミロン カメリア、田中 宏昌、梶山 広明、豊國 伸哉、水野 正明、堀 勝
第69回応用物理学会春季学術講演会 25a-E105-7 2022.3.24
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流液への照射によるプラズマ活性溶液の作製と短寿命活性種の測定
柏倉 慧史、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、堀 勝
第69回応用物理学会春季学術講演会 25a-E105-6 2022.3.24
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中性酸素ラジカル源を用いたポリエチレンテレフタレートの生分解速度の向上
五藤 大智、岩田 直幸、石川 健治、橋爪 博司、田中 宏昌、伊藤 昌文、堀 勝
第69回応用物理学会春季学術講演会 25a-E105-1 2022.3.24
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C3H6/H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係
黒川 純平、光成 正、近藤 博基、堤 隆嘉、関根 誠、石川 健治、堀 勝
第69回応用物理学会春季学術講演会 25p-E104-13 2022.3.24
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C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響
吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝
第69回応用物理学会春季学術講演会 25a-E104-7 2022.3.24
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Ar/F2プラズマとBCl3の交互供給によるAlGaN原子層エッチングでの組成比制御
中村 昭平、谷出 敦、木村 貴弘、灘原 壮一、石川 健治、小田 修、堀 勝
第69回応用物理学会春季学術講演会 25a-E104-5 2022.3.24
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窒化ガリウムの基板昇温時サイクルエッチング特性
南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝
第69回応用物理学会春季学術講演会 25a-E104-4 2022.3.24
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プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果
射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝
第69回応用物理学会春季学術講演会 24p-D114-8 2022.3.24
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高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの表面電位制御
橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝
第69回応用物理学会春季学術講演会 24p-D114-7 2022.3.24
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Stable production of high-quality strawberry fruits with cold plasma treatment during cultivation
2022.1.24
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Morphological control of carbon nanowalls grown by a radical injection plasma enhanced chemical vapor deposition using C2F6/H2 mixture gas
2022.1.24
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Deposition of nanographene on ethanol-immersed metal substrates by in-liquid plasma process
2022.1.24
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Effect of morphology and heights of carbon nanowalls on their optical transmittance
2022.1.24
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Biodegradation of polyethylene terephthalate treated neutral oxygen radical
2022.1.24
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Molecular mechanisms of cancer cell death by plasma-activated Ringer's lactate solution
2022.1.24
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Functional nitrogen science for plasma-processing in life and matter Invited International conference
Kenji Ishikawa, Toshiro Kaneko, and Masaru Hori
2021.12.12 Material Research Society of Japan
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Optical transmission of carbon nanowalls from ultra-violet region to infra-red region International conference
Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
Material Research Meeting (MRM 2020) 2021.12.12
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Enhancement of biodegradation technology of polyethylene terephthalate with plasma-pretreatment International conference
Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Plasma-biological reaction networks and aqueous radical chemistry Invited International conference
Kenji Ishkawa, Camelia Miron, Takashi Kondo, Hiromasa Tanaka, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Cellular Respiration System Affected by Low-temperature Plasma International conference
Hiromasa Tanaka, Shogo Maeda, Shogo Matsumura, Masaaki Mizuno, Kenji Ishikawa, Masafumi Ito, Hiroshi Hashizume, Mikako Ito, Kinji Ohno, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Yasumasa Okazaki, Shinya Toyokuni, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Effects of cold plasma treatment with rice seedlings in a paddy on yield and grain quality for different cultivars International conference
Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Anti-tumor effect of plasma-activated solution produced by the flowing system International conference
Satoshi Kashiwagura, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Camelia Miron, Kae Nakamura, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Production of plasma-activated Ringer's lactate solution with regulated surrounding atmosphere International conference
Daiki Ito, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Kae Nakamura, Camelia Miron, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Growth promotion of cultured feed Artemia irradiated with low-temperature plasma International conference
Takumi Yamauchi, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Shin'ichi Akiyama, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Rebound Tailing Pulse method for water reformation International conference
Naohiro Shimizu, Ranjit Borude, Reiko Tanaka, Kenji Ishikawa, Osamu Oda, Hiroki Hosoe, Satoru Ino, Yosuke Inoue, and Masaru Hori
31st Material Research Society in Japan (MRS-J) 2021.12.12
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Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches International conference
Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
42nd International Symposium on Dry Process (DPS) 2021.11.18
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Atomic layer etching of GaN using F2-added Ar plasma removal of BCl3 modified layer at high temperature International conference
Shohei Nakamura Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori
42nd International Symposium on Dry Process (DPS) 2021.11.18
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Random forest model for property control of plasma deposited hydrogenated amorphous carbon films International conference
Junpei Kurokawa, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
42nd International Symposium on Dry Process (DPS) 2021.11.18
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Toward plasma cancer therapy and intracellular metabolic modifications by treatments using low-temperature plasma-activated solutions Invited International conference
Kenji Ishkawa, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori
30th International Toki Conference on Plasma and Fusion Research 2021.11.15
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Floating wire assisted plasma with vapor injection of liquid mixtures for etching titanium compounds International conference
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
67th AVS International Symposium and Exhibition 2021.10.24
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In-situ analysis of surface reactions for plasma-assisted thermal-cyclic atomic layer etching of tantalum nitride International conference
Kazunori Shinoda, M. Hasegawa, H. Hamamura, K. Maeda, K. Yokogawa, M. Izawa, Kenji Ishikawa, and Masaru Hori
67th AVS International Symposium and Exhibition 2021.10.24
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原子層エッチングの反応素過程とその設計、制御 Invited
石川 健治, Nguyen Thi-Thuy-Nga, 堤 隆嘉, 蕭 世男, 近藤 博基, 関根 誠, 堀 勝
第82回応用物理学会秋季学術講演会 11a-S301-5 2021.9.10
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カーボンナノウォールの光透過率に対する壁密度および高さの効果 Invited
射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝
第82回応用物理学会秋季学術講演会 13a-N323-8 2021.9.10
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C3H6/H2プラズマを⽤いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響 Invited
⿊川 純平, 光成 正, 堤 隆嘉, 近藤 博基, 関根 誠, 石川 健治, 堀 勝
第82回応用物理学会秋季学術講演会 13p-N107-1 2021.9.10
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低温プラズマ照射した養殖餌料アルテミアの成⻑促進 Invited
山内 拓海, 石川 健治, 田中 宏昌, 秋山 真⼀, 橋爪 博司, 堀 勝
第82回応用物理学会秋季学術講演会 13p-N107-15 2021.9.10
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CNW細胞培養基板上のSiCコートが細胞増殖に与える影響 Invited
⼩野 浩毅, ⼩出 崇史, 石川 健治, 田中 宏昌, 近藤 博基, 鳴瀧 彩絵, ⾦ 勇, 安原 重雄, 堀 勝, 竹内 和歌奈
第82回応用物理学会秋季学術講演会 13p-N107-1 2021.9.10
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酸素ラジカル照射したL-トリプトファン溶液の殺菌効果 Invited
岩田 直幸, 石川 健治, 橋爪 博司, 田中 宏昌, 伊藤 昌文, 堀 勝
第82回応用物理学会秋季学術講演会 12p-N204-6 2021.9.10
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流液への照射によるプラズマ活性溶液の大量作製と抗腫瘍効果の評価 Invited
柏倉 慧史, 岩田 直幸, 石川 健治, 橋爪 博司, カメリア ミロン, 中村 香江, 田中 宏昌, 梶山 広明, 豊國 伸哉, 水野 正明, 堀勝
第82回応用物理学会秋季学術講演会 12p-N204-4 2021.9.10
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Arパージ下でプラズマ照射した乳酸リンゲル液の抗腫瘍効果の評価 Invited
伊藤 大貴, 岩田 直幸, 石川 健治, 橋爪 博司, 中村 香江, ミロン カメリア, 田中 宏昌, 梶山 広明, 豊國 伸哉, 水野正明, 堀勝
第82回応用物理学会秋季学術講演会 12p-N204-3 2021.9.10
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プラズマ活性溶液及びプラズマ照射が細胞呼吸に与える影響 Invited
田中 宏昌, 前田 昌吾, 松村 翔伍, 水野 正明, 石川 健治, 伊藤 昌文, 橋爪 博司, 伊藤 美佳⼦, 大野 欽司, 中村 香江, 梶山広明, 吉川史隆, 岡崎泰昌, 豊國伸哉, 堀勝
第82回応用物理学会秋季学術講演会 12p-N204-2 2021.9.10
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ポリエチレンテレフタラートの新しい生分解プラズマ技術の開発 Invited
五藤 大智, 岩田 直幸, 石川 健治, 橋爪 博司, 田中 宏昌, 伊藤 昌文, 堀 勝
第82回応用物理学会秋季学術講演会 12p-N204-1 2021.9.10
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Ar/C4F8/SF6を⽤いたガス変調サイクルプロセスにおける活性種の挙動 Invited
吉江 泰斗, 堤 隆嘉, 石川 健治, 堀 勝
第82回応用物理学会秋季学術講演会 12a-N102-3 2021.9.10
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窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測 Invited
南 吏玖, 石川 健治, 堤 隆嘉, 近藤 博基, 関根 誠, ⼩田 修, 堀 勝
第82回応用物理学会秋季学術講演会 12a-N102-2 2021.9.10
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Low-temperature plasma-activated solutions and metabolic modification Invited International conference
Kenji Ishkawa, Hiromasa Tanaka, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori
5th Asia Pacific Conference on Plasma Physics, Division of Plasma Physics, Association of Asia-Pacific Physical Societies (AAPPS-DPP2021) 2021.9.26
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High ionization of analytes for oxygen doped carbon nanowall in surface-assisted laser desorption ionization mass spectrometry (SALDI-MS) International conference
Kenji Ishikawa, Ryusei Sakai, Tomonori Ichikawa, Hiroki Kondo, Takayuki Ohta, Mineo Hiramatsu, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Improvement of Hydrophilic Treatment of Atmospheric Pressure Plasma and its Oxygen Radical Densities International conference
Seigo Takashima, Takahiro Jindo, Kenji Ishikawa, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Epitaxial growth of InN film on GaN template by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) International conference
Frank Wilson Amalraj, Arun Kumar Dhasiyan, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Deformation properties of carbon nanowalls analyzed by nanoindentation International conference
Swapnil Ghodke, Motoyuki Murashima, Dennis Christy, Ngo Van Nong, Osamu Oda, Noritsugu Umehara, Kenji Ishikawa, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Nanosecond high-voltage pulse imposed chemical vapor deposition (ns HV CVD) of sparsely isolated carbon nanowalls International conference
Tomonori Ichikawa, Kenji Ishikawa, Naohiro Shimizu, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Development of the nanocarbon coating process on metal surfaces via in-liquid plasma International conference
Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Development of new biodegradation technology by surface modification of polyethylene terephthalate using atmospheric pressure plasma International conference
Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito, and Masaru Hori
20th Interfinish World Congress (INTERFINISH2020) 2021.9.6
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Cell Death Mechanisms by Plasma Activated Medium and Plasma Activated Ringer’s Lactate Solution International conference
Masaru Hori, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinya Toyokuni, and Fumitaka Kikkawa
8th International Conference on Plasma Medicine (ICPM8) 2021.8.2
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Efficacy for Rice Plant Growth with Plasma Irradiation to Seeds International conference
Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
8th International Conference on Plasma Medicine (ICPM8) 2021.8.2
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Dynamical Changes in Free-radical Signals of Seeds during Water Imbibition and Seed Germination: Analysis of Plasma-Irradiation Effects Using an Electron Spin Resonance (ESR) Technique International conference
Kenji Ishikawa, Ryo Arita, Takamasa Okumura, Pankaj Attri, Kazunori Koga, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Kayo Matsuo, Daisuke Yamashita, Kunihiro Kamataki, Naho Itagaki, Masaru Hori, and Masaharu Shiratani
8th International Conference on Plasma Medicine (ICPM8) 2021.8.2
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Analysis of Cellular Respiration in Plasma-activated Solutions-treated Cancer Cells International conference
Hiromasa Tanaka, Shogo Maeda, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinaya Toyokuni, M. Ito, K. Ohno, Fumitaka Kikkawa, and Masaru Hori
8th International Conference on Plasma Medicine (ICPM8) 2021.8.2
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Numerical analysis of high-electron-density atmospheric pressure argon streamer under pin-to-plane electrode geometry: Effects of applying voltage polarity International conference
Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi, A. Ui, M. Akita, S. Oka, and Masaru Hori
47th Conference on Plasma Physics (EPS47) 2021.6.21
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Dependency of bactericidal effect in oxygen-radical exposed E. coli suspension containing L-tryptophan on its concentration International conference
Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Jun-Seok Oh, Masafumi Ito and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment International conference
B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, Makoto Sekine, Kenji Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, Noriyasu Ohno, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Selective killing effects of organics in plasma-activated Ringer's solutions International conference
Yuki Suda, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Reversible change in surface morphology of lipid bilayer induced by indirect plasma irradiation International conference
Hiroki Kondo, Takuya Tonami, Sotaro Yamaoka, Hiromasa Tanaka, Kenji Ishikawa, Makoto Sekine, Masafumi Ito and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Enhancement of alcohol production of budding yeast by direct irradiation of nonequilibrium atmospheric pressure plasma International conference
Shogo Matsumura, Kenji Ishikawa, Hiromasa Tanaka, Hiroshi Hashizume, Masafumi Ito, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effect of wall-to-wall distance of carbon nanowalls on survival yield in surface assisted laser desorption/ionization mass spectrometry International conference
Ryusei Sakai, Hiroki Kondo, Kenji Ishikawa, Takayuki Ohta, Mineo Hiramatsu, Naohiro Shimizu, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Quality increase of fruits with plasma treatment on strawberry cultivation International conference
Hiroshi Hashizume, Shogo Matsumoto, Kenki Tsubota, Kaoru Sanda, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Hitoshi Sakakibara, Susumu Nikawa, Takayuki Okuma, Masayoshi Maeshima,Masaaki Mizuno, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure International conference
Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls International conference
Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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A comparative study on inn growth at very high frequencies (VHF) by radical enhanced metalorganic chemical vapor deposition (REMOCVD) International conference
Frank Wilson Amalraj, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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IR spectra of monosaccharide treated with atmospheric pressure plasma using sum frequency generation spectroscopy International conference
Yuta Yoshida, Takayuki Ohta, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effects of non-equilibrium atmospheric pressure plasma on aquaculture feed International conference
Takumi Yamauchi, Kenji Ishikawa, Hiromasa Tanaka, Shin'ichi Akiyama, Hiroshi Hashizume and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Efficacy of plasma treatment in a paddy field for yield and grain quality of rice International conference
Kaoru Sanda, Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activated lactated solutions International conference
Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas International conference
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma International conference
Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka, Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer International conference
Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface International conference
Suganthamalar Selvaraj, Masahiro Hazumi, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 International conference
Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching International conference
Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Atomic Layer Etching of GaN Using Cl2/Ar Plasma at 400℃ International conference
Shohei Nakamura, Atsushi Tanide, Takahiro Kimura, Soichi Nadahara, Kenji Ishikawa, and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry International conference
Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori
13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science (ISPlasma2021/IC-PLANTS2021) 2021.3.8
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Plasma applications for agriculture from seeds to field International conference
Hiroshi Hashizume, Hiroko Mizuno, Akiko Abe, Kenki Tsubota, Genki Yuasa, Satoe Tohno, Mikiko Kojima, Yumiko Takebayashi, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Shogo Matsumoto, Hitoshi Sakakibara, Takayuki Okuma, Susumu Nikawa, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori
3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021 2021.3.1
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Roles of seed pigments in responses of seeds to plasma treatment International conference
Kazunori Koga, Pankaj Attri, Ryo Arita, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Kayo Matsuo, Daisuke Yamashita, Kenji Ishikawa, Naho Itagaki, Kunihiro Kamataki, Masaharu Shiratani, and Vida Mildaziene
3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021 2021.3.1
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Electron spin resonace study on germination dynamics of plasma-activated seeds of radish sprouts International conference
Kenji Ishikawa, Ryo Arita, Ryoya Sato, Hayate Tanaka, Masaya Hiromatsu, Tomoaki Yoshida, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Daisuke Yamashita, Kayo Matsuo, Kazunori Koga, and Masaharu Shiratani
3rd international workshop on plasma agriculture (IWOPA3) Greifswald, Germany. online, March 1-3, 2021 2021.3.1
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(Plenary) Plasma-surface interactions in plasma etching of future device fabrication International conference
Kenji Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T. Hayashi, M. Sekine, and M. Hori
The 16th International Workshop on Advanced Plasma Processing and Diagnostics
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Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ electron spin resonance measurements International conference
Kenji Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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A High Temperature Plasma Etching of GaN and Its Reaction Mechanism International conference
R. Kometani, S. Chen, M. Liu, Kenji Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Studies on Plasma Etching of Si3N4 in Capacitively Coupled Plasma employing C5HF7 International conference
Y. Miyawaki, Y. Kondo, M. Sekine, Kenji Ishikawa, T. Hayashi, K. Takeda, A. Ito, H. Matsumoto, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism International conference
K. Asano, Y. Miyawaki, Kenji Ishikawa, M. Sekine, K. Takeda, A. Ito, H. Matsumoto, H. Kondo, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Quantum chemical investigations for excitation dissociations of C5F8 and C5HF7 etching gases International conference
T. Hayashi, Kenji Ishikawa, M. Sekine, M. Hori
The 34th International Symposium on Dry Process (DPS)
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Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP International conference
T. Komuro, K. Takeda, Kenji Ishikawa, M. Sekine, Y. Ohya, H. Kondo, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma International conference
M. Fukasawa, H. Matsugai, T. Honda, Y. Miyawaki, Y. Kondo, K. Takeda, H. Kondo, Kenji Ishikawa, M. Sekine, K. Nagahata, F. Uesawa, M. Hori, and T. Tatsumi
The 34th International Symposium on Dry Process (DPS)
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An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN International conference
Z. Liu, S. Chen, Y. Lu, R. Kometani, Kenji Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma International conference
Y. Abe, A. Fukushima, Y. Lu, Y. Kim, K. Takeda, H. Kondo, Kenji Ishikawa, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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Evaluation of gas-surface reaction dynamics during the plasmaless Si etching using NO/F2 gas mixture International conference
S. Tajima, T. Hayashi, Kenji Ishikawa, M. Sekine, and M. Hori
The 34th International Symposium on Dry Process (DPS)
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(INVITED) Real time In Situ Electron Spin Resonance (ESR) Study of Free Radicals on Materials Created by Plasmas International conference
Kenji Ishikawa,
American Vacuum Society (AVS)
-
(Coburn Winters Finalist) Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis International conference
Yusuke Kondo, Kenji Ishikawa,
American Vacuum Society (AVS)
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Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes International conference
Toshiya Suzuki, Kenji Ishikawa,
American Vacuum Society (AVS)
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Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist International conference
Arkadiusz Malinowski, Makoto Sekine, Kenji Ishikawa,
American Vacuum Society (AVS)
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Evaluation of Surface Chemical Bonding State and Surface Roughness of Chemical Dry Etched Si using NO and F2 Gas Mixture International conference
Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
American Vacuum Society (AVS)
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Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN) International conference
Makoto Sekine, Ryosuke Kometani, Kenji Ishikawa,
American Vacuum Society (AVS)
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Measurement of activated species generated by 60 Hz excited atmospheric pressure Ar plasma in atmospheric gas International conference
Keigo Takeda, Jerome Jolibois, Kenji Ishikawa, Hiromasa Tanaka, Hiroyuki Kano, Makoto Sekine, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
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Reaction model for etching surface interacted with hydrofluorocarbon plasmas International conference
Kenji Ishikawa, Yusuke Kondo, Yudai Miyawaki, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
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Study on synthesis processes and crystallinity changes of nanographene materials synthesized by alcohol liquid-plasma International conference
Hiroki Kondo, Tatusya Hagino, Keigo Takeda, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
-
Precise plasma process control based on combinatorial plasma etching International conference
Makoto Sekine, Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
-
Temperature measurement of substrate with a thin film using low-coherence interference International conference
Takayoshi Tsutsumi, Takehiro Hiraoka, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, and Masaru Hori
65th Annual Gaseous Electronics Conference (GEC)
-
(Invited) Healing Process of Plasma Damaged Gallium Nitride (GaN) International conference
Kenji Ishikawa, Shang Chen,
International conference on emerging advanced nanomaterials (ICEAN)
-
Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals International conference
Yu Arai, Yusuke Noto, Yousuke Goto, Seiji Takahashi, Akihiko Kono, Tatsuo Ishijima, Kenji Ishikawa, Masaru Hori, and Hideo Horibe
7th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD-7)
-
Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer International conference
Akihiko Kono, Yu Arai, Yousuke Goto, Seiji Takahashi, Kenji Ishikawa, Masaru Hori, and Hideo Horibe
7th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD-7)
-
Real-time electron-spin-resonance measurement of plasma induced surface interactions International conference
Naoya Sumi, Kenji Ishikawa, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori
3rd International Symposium on Advance Plasma Science and its Application (ISPlasma2010)
-
(INVITED) Surface analysis of chemical reactions during plasma etching
Kenji Ishikawa, et al.
133th Workshop on Silicon Technology
-
(INVITED) Real-time Electron-Spin-Resonance Study of Plasma-Surface interaction International conference
Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine and Masaru Hori
12th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop
-
(INVITED) In line Electron Spin Resonance Study of Plasma-Surface Interaction for plasma etching
Kenji Ishikawa, Makoto Sekine, Masaru Hori
20th MRS-Japan Academic Symposium, Session A: Frontier of Nano-Materials Based on Advanced Plasma Technologies
-
Polymer Surface Modification: Vibrational Sum Frequency Generation Study for Plasma Etching International conference
Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori
-
(INVITED) In line electron spin resonance observation of surface reactions during plasma etching
-
エタノールを用いた気液プラズマによるカーボンナノ材料の作製
萩野達也，乾裕俊，加納浩之，石川建治，竹田圭吾，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 14a-ZK-6"
-
カーボンナノウォールの成長に対する基板形状の効果
渡邊均，近藤博基，石川健治，竹田圭吾，関根誠，堀勝，平松美根男
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZM-3"
-
和周波振動分光(SFG)によるポリフッ化ビニリデンの分極配向特性評価
石川健治，河野昭彦，堀邊英夫，竹田圭吾，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 14a-K-2"
-
単一カーボンナノウォールの電気特性
神田貴幸，山川晃司，竹田圭吾，石川健冶，近藤博基，平松美根男，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16a-ZQ-6"
-
Spatial distribution measurement of the electron temperature and density of 60 Hz nonequilibrium atmospheric pressure plasma by laser Thomson scattering
賈鳳東，鷲見直也，石川健治，加納浩之，乾裕俊，竹田圭吾，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 15p-D-4"
-
Ｎ原子注入によるアモルファスカーボン膜の結晶性制御
九鬼淳，木野徳重，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZF-2"
-
水素ラジカル注入型プラズマ源を用いた微結晶シリコン薄膜の成膜
川嶋翔，阿部祐介，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16a-ZF-8"
-
非平衡大気圧プラズマによるミドリカビ殺菌速度の酸素ラジカル密度依存性
井関紗千子，太田貴之，伊藤昌文，加納浩之，東島康裕，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 15p-D-17"
-
非平衡大気圧プラズマにおける原子状ラジカルの挙動に関する研究
加藤正規，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 15p-D-16"
-
太陽電池用シリコン薄膜プラズマプロセスにおける水素原子表面損失確率（II）
阿部祐介，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 15p-D-11"
-
アモルファスカーボン膜の結晶構造に対する成長温度の効果
木野徳重，近藤博基，石川健治，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZF-3"
-
プラズマによるGaNエッチング損傷と反応機構の解析
陳尚，米谷亮祐，竹田圭吾，石川健治，近藤博基，加納浩之，徳田豊，関根誠，節原裕一，江川孝志，天野浩，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 17a-ZA-3"
-
高精度Cl2プラズマビームを用いたGaNエッチング表面反応の解明
米谷亮祐，陳尚，竹田圭吾，石川健治，近藤博基，関根誠，江川孝志，節原裕一，天野浩，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 17a-ZA-2"
-
リアルタイム電子スピン共鳴によるプラズマ誘起表面反応の解析
鷲見直也，石川健冶，河野昭彦，堀邊英夫，竹田圭吾，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-13"
-
O2プラズマ曝露によるポーラスSiOCH 膜へのダメージ発生メカニズム
浅野高平，山本洋，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-12"
-
二周波容量結合型エッチングプラズマにおける上部電極へのDCバイアス印加効果(III)
山口剛，竹田圭吾，輿水地塩，近藤博基，石川健治，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-9"
-
サブナノメーター形状揺らぎ制御有機膜エッチングのための主要因子の解明
鈴木俊哉，竹田圭吾，近藤博基，石川健治，関根 誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-8"
-
C5HF7/O2/ArプラズマによるArFレジスト表面ラフネス発生抑制機構
山本洋，宮脇雄大，竹田圭吾，石川健治，近藤博基，関根誠，堀勝，伊東安曇，松本裕一
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-6"
-
ガスデザインに基づいたSiO2膜エッチングとその機構解明（III）
宮脇雄大，近藤祐介，竹田圭吾，伊東安曇，松本裕一，近藤博基，石川健治，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-5"
-
フルオロカーボンプラズマビームによるフォトレジスト表面改質層の解析
竹内拓，尼崎新平，竹田圭吾，石川健治，近藤博基，豊田浩孝，関根誠，堀勝，康松潤，沢田郁夫
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-4"
-
ラジカルが発生し易いエッチングガスと分子構造
林俊雄，石川健治，関根誠，堀勝，河野明廣，鄒弘綱
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-2"
-
C3F6O代替ガスを用いた絶縁膜の高速エッチングとその機構解明
近藤祐介，宮脇雄大，竹田圭吾，石川健治，近藤博基，林俊雄，関根誠，岡本秀一，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16p-ZA-1"
-
Radical Transport Simulation under Roof on Substrate in Processing Plasma
アルカディウス マリノフスキ，堀勝，関根誠，石川健治，近藤博基，山本洋，竹内拓也，鈴木俊哉，宮脇雄大，リディア ルカシャック，アンジェイ ヤクボフスキ，ダニエル トマシェフスキ
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）, 16a-ZA-7"
-
SF6/O2プラズマを用いたSiエッチング機構
尼崎新平，竹内拓也，竹田圭吾，石川健治，近藤博基，関根誠，堀勝，櫻井典子，林久貴，酒井伊都子，大岩徳久
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）,16a-ZA-3"
-
H2/Ar大気圧プラズマによる酸化銅還元反応の検討
乾裕俊，吉田直史，竹田圭吾，近藤博基，石川健治，関根誠，堀勝
"2010年秋季 第71回 応用物理学会学術講演会（長崎大学）,16p-ZF-10"
-
Modification of Si-O-Si Structure in Porous SiOCH Films by O2 plasma International conference
Hiroshi Yamamoto, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori
The 11th International Workshop on Advanced Plasma Processing and Diagnostics, Ramada Jeju Hotel, Jeju, Korea
-
Control in optical properties of amorphous carbon films synthesized by plasma enhanced chemical vapor deposition for solar cell applications
International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan
-
イオン照射誘起深い準位欠陥の水素ラジカルによる不活性化
陳尚，永江陽一，石川健治，中井雅文，加納浩之，竹田圭吾，近藤博基，徳田豊，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 17p-D-7
-
プラズマCVD法における微結晶シリコン薄膜形成のメカニズム解明
川嶋翔，阿部祐介，竹田圭吾，石川健治，近藤博基，関根誠，堀 勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 19a-ZB-8
-
ポーラスSiOCH low-k膜へのH2/N2プラズマアッシングダメージ発生機構の解明(II)
山本洋，竹田圭吾，石川健治，近藤博基，関根誠，堀勝，上夏井健，林久貴，酒井伊都子，大岩徳久
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18a-ZD-8
-
反応性プラズマ中におけるc-C4F8の解離過程
林俊雄，石川健治，関根誠，堀勝，河野明廣，鄒弘綱
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18a-ZD-10
-
反応性プラズマ中におけるC2F4の解離過程
林俊雄，石川健治，関根誠，堀勝，河野明廣，鄒弘綱
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 19a-ZB-11
-
O2プラズマおよびCO2プラズマによるレジストアッシング機構
阿部祐介，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-2
-
SF6/O2プラズマによるフォトレジスト表面改質層の解析
竹内拓也，尼崎新平，竹田圭吾，石川健治，近藤博基，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-3
-
ガスデザインに基づいたSiO2膜エッチングとその機構解明（II）
宮脇雄大，竹田圭吾，伊東安曇，中村昌洋，石川健治，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-9
-
ポーラスSiOCH膜プラズマ処理後の大気曝露の影響(II)
鈴木俊哉，山本洋，竹田圭吾，近藤博基，石川健治，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-10
-
誘導結合型H2/N2プラズマによる有機low-k薄膜のための小型コンビナトリアルプラズマエッチングプロセス
堀勝，チャンソン ムン，竹田圭吾，関根誠，節原裕一，白谷正治，石川健治，近藤博基
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 18p-ZD-18
-
和周波振動分光によるプラズマ処理表面の解析
石川健治，竹田圭吾，近藤博基，関根誠，堀勝
2010年春季 第57回 応用物理学関係連合講演会（東海大学）, 19a-R-14
-
Dissociation channel of c-C4F8 to CF2 radical in reactive plasma
The 3rd International Conference on PLAsma-Nano Technology & Science (IC-PLANTS2010), Meijo University, Nagoya Japan
-
Quasi-Bragg grating with sub-wavelength particles
The 3rd International Conference on PLAsma-Nano Technology & Science (IC-PLANTS2010), Meijo University, Nagoya Japan
-
Radical Kinetics in N2-H2 Plasma Generated by Novel High Density Radical Source
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Siloxane Polymer Surface Modifications by Exposure of Plasma-Beams: A Vibrational Sum-Frequency Generation Spectroscopy (SFG) Study
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Fabrication of carbon nanomaterials synthesized by plasma enhanced chemical vapor deposition for solar cell applications
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Diagnostics in High Pressure SiH4/H2 Plasma for Deposition of Microcrystalline Si
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Synthesis of Amorphous Carbon Films using Nonequilibrium Atmosperic-Pressure Plasma
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Low-Temperature Treatment Using High-Density Non-Equilibrium Atmospheric of Pressure Plasma
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Effect of Plasma Surface Treatments on Supporting of Platinum Nanoparticles to Graphite Materials in Supercritical Carbon Dioxide
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Effect of Ion Irradiation on Carbon Nanowalls Growth
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Initial Nucleation in Carbon Nnowalls Growth on Si and SiO2 Surface
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Effect of Oxygen Etching on the Morphologies of Carbon Nanowalls
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Measurement of Si Wafer Temperature with Metal Thin Film during Plasma Process Using Low-Coherence Interferometer
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Deep-Level Defect Passivation by High Density Hydrogen Radical Exposure on Ion Irradiated Si
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Analysis of ArF Photoresist Modified by Fluorocarbon Ion Bombardment
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
SiO2 Cotact Hole Etch Mechanism Using Environment-Friendly New Gas, C5F7H
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Porous SiOCH Low-k Film Etch Process and its Surface Reactions Employing an Alternative Fluorocarbon Gas C5F10O
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Modeling of Radical Tranformation under `PAPE' Structure and Method of Estimation for Surface Loss Probabilities of Radicals
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Measurement of H Radical Density in H2/Ar Nonequilibrium Atmospheric Pressure Plasma
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Surface Loss Probabilities of H Atom on Various Silicon Thin Films
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
A Well-Established Compact Combinatorial Etching Process Employing Inductively Coupled H2/N2 Plasma
The 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan
-
Nanoscale engineering for plasma etching of future device fabrication International conference
The 10th International Workshop of Advanced Plasma Processing and Diagnostics
-
A new framework for performance prediction of advanced MOSFETs with plasma-induced recess structure and latent defect site International conference
2008 IEEE International Electron Devices Meeting (IEDM), (San Francisco, U.S.A., December 15-17, 2008), 18-2, pp. 443-447.
-
Enhancing Yield and Reliability by Applying Dry Organic Acid Vapor Cleaning to Copper Contact Via-Bottom for 32-nm Nodes and Beyond International conference
The 11th International Interconnect Technology Conference (IITC) 2008, (San Francisco, June 10-12, 2008), pp. 93-96.
-
Reaction mechanism of low-temperature damageless cleaning of Cu2O by HCOOH International conference
Advanced Metallization Conference (AMC) 2006: 16th Asian Session, (Tokyo, September 25-27, 2006), No. 3-6, pp. 111-116.
-
Large Reduction in Standby Power Consumption Achieved with Stress-controlled SRAM Cell Layout International conference
Ext. Abst. the 2006 International conference on Solid State Devices and Materials (SSDM), (Yokohama, Japan, September 12-15, 2006), H-2-2, pp. 172-173.
-
Reduction of Copper Surface with Formic Acid for 32-nm-Node ULSI Metallization: Surface Kinetics Study International conference
The 209th Electrochemical Society Spring Meeting (ECS) (Colorado, U.S.A., May 7-12, 2006), vol. 601, p. 828.
-
Plasma emission irradiation effects on etching surface reactions: Analysis using in-vacuo electron-spin-resonance technique International conference
International conference on reactive plasmas and Symposium on Plasma processing (ICRP 6/SPP 23), (Sendai, Japan, January 24-27, 2006), P-2A-38, p. 467.
-
Structural damage of diamond by oxygen ion beam exposure International conference
International conference on reactive plasmas and Symposium on Plasma processing (ICRP 6/SPP 23), (Sendai, Japan, January 24-27, 2006), G-3A-5, p. 91.
-
Vacuum-ultraviolet photon irradiation effects in fluorocarbon plasmas on SiO2 etching surface reactions using In vacuo electron-spin-resonance
AVS 52nd International Symposium American Vacuum Society (AVS), (Boston, MA, U. S. A., October 31-November 4, 2005), PS-TuA6, p.97.
-
Low temperature dry cleaning technology using formic acid in Cu/Low-k multilecel interconnects for 45 nm node and beyond International conference
Advanced Metallization Conference (AMC) 2005, (Colorado, U. S. A., September 27-29, 2005), pp. 569-574.
-
Efficient reduction of standby leakage current in LSIs for use in mobile devices International conference
Ext. Abst. the 2005 International conference on Solid State Devices and Materials (SSDM), (Kobe, September 13-15, 2005), pp. 878-879.
-
Defect creation in diamond by hydrogen plasma treatment at room temperature International conference
23rd International Conference on Defects in Semiconductors (ICDS-23), (Hyogo, Japan, July 24 -29, 2005), Th-P17, p. 290.
-
Structural change in diamond by hydrogen plasma treatment at room temperature International conference
10th International Conference New Diamond Science and Technology (ICNDST-10), (Tsukuba, Japan, May 11-14, 2005), P5-3, p. 21.
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Using In-vacuo Electron-spin-resonance and infrared spectroscopy technique in the analysis of surface reactions of Low-k films during/after plasma processes
AVS 51th International Symposium American Vacuum Society (AVS), (Anaheim, CA, U. S. A., November 14-17, 2004), PS1-MoM6, p. 62.
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Dangling bond creation and annihilation during plasma processes studied by in-situ ESR technique International conference
AVS 51st International Symposium American Vacuum Society (AVS), (Anaheim, CA, U. S. A., November 14-17, 2004), PS-ThA4, p. 140.
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Cleaning of copper surface using vapor-phase organic acids International conference
2nd EU-Japan Joint Symposium on Plasma processing, (February 17-19, 2004), P-06, p. 322.
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Incident angular dependence of SiO2 and Si3N4 etching with mass-analyzed CFx+ ion beam irradiation International conference
2nd EU-Japan Joint Symposium on Plasma processing, (February 17-19, 2004), P-03, p. 295.
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Incident angular dependence of SiO2 and Si3N4 etching with mass-analyzed CFx+ ion beam irradiation International conference
4th International Symposium on Dry Process, (Hongoh, Tokyo, November 14-15, 2003), 7-3, pp. 271-276.
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Study of SiO2 plasma etching with off-normal mass-analyzed CFx+ ion beam irradiation International conference
AVS 50th International Symposium American Vacuum Society (AVS), (Baltimore, MD, U. S. A., November 2-7, 2003), PS1-WeA9, p. 171.
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Mechanisms of vapor cleaning of copper surface using organic acids International conference
204th Meeting of the Electrochemical Society (ECS), (Orlando, Florida, U. S. A., October 12-17, 2003), G1-613, pp. 259-263.
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Study of fluorocarbon plasma etching and film deposition with mass separated CFx+ ion beam irradiation International conference
16th International Symposium on Plasma Chemistry (ISPC16), (Taorumina, Italy, June 22-27, 2003), p. 307.
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Cleaning of copper surface using vapor-phase organic acids International conference
203rd Meeting of the Electrochemical Society (ECS), (Paris, France, April 27 – May 2, 2003), F2-425, pp. 320-323.
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Vapor treatment of copper surface using organic acids International conference
2003 Spring meeting of the Material Research Society (MRS), (San Francisco, April 21–25, 2003), E3-28, pp. 459-464.
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Study of selective etching of SiO2-to-Si3N4 and a-C:F film deposition with mass-analyzed CFx+ ion beam irradiation International conference
4th International Conference on Microelectronics and Interfaces (ICMI'03), (Santa Clara, CA, March 3-6, 2003), pp. .
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Measurements of Desorbed Products and Etching Yield by CFx+(x=1,2,3) Ion Irradiation International conference
AVS 49th International Symposium American Vacuum Society (AVS), (Denver Colorado, November 3-8, 2002), PS-FrM2, p.137.
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Using Real-time Infrared Spectroscopy and In-vacuo Electron-Spin-Resonance Technique in the Analysis of Surface Reactions during Etching of Organic Low-k Film by a Plasma of N2 and H2 International conference
2nd International Symposium on Dry Process, (Hongoh, Tokyo, October 11-12, 2002), I-7, pp. 39-44.
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Decomposition Mechanism of c-C4F8 in Plasma Assisted Catalytic Technology (PACT) International conference
2nd International Symposium on Dry Process, (Hongoh, Tokyo, October 11-12, 2002). VI-22, pp. 243-248.
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Study of SiO2 plasma etching and fluorocarbon film deposition with mass separated CFx+ ion beam irradiation International conference
2nd International Symposium on Dry Process, (Hongoh, Tokyo, October 11-12, 2002), VII-3, pp. 269-274.
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Dangling Bond Observation during Plasma Etching Processes Using In-vacuo Electron-Spin-Resonance Technique International conference
16th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG) and 5th International Conference on Reactive Plasmas (ICRP), (Grenoble, France, July 15-18, 2002), P1-65, pp.169-170.
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Measurements of desorbed products and etching yield by CFx+ (x=1,2,3) ion irradiation on SiO2 International conference
16th European Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG) and 5th International Conference on Reactive Plasmas (ICRP), (Grenoble, France, July 15-18, 2002), P1-80, pp. 199-200.
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Measurements of SiO2 Etch Yields under F+ and CFx+ Ion Irradiation International conference
3rd International Conference on Microelectronics and Interfaces (ICMI'02), (Santa Clara, CA, February 11-15, 2002), pp. .
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Dangling Bond Observation during Fluorocarbon Plasma Etching Processes Using In-vacuo Electron-Spin-Resonance Technique International conference
1st International Symposium on Dry Process, (Waseda, Tokyo, November 20-21, 2001), VII-6, pp. 301-306.
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In-vacuo Electron-Spin-Resonance Study on Fluorocarbon Films for SiO2 Plasma Etching International conference
AVS 48th International Symposium American Vacuum Society (AVS), (San Francisco, CA, October 28-November 2, 2001), PS1-MoA2, p.64.
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Early-stage modification of Silicon dioxide surface during fluorocarbon plasma etching International conference
25th Intern. Conf. on Phenomena in Ionized Gases (ICPIG), (Nagoya, July 17-22, 2001), 18a35, p. 89.
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Time-Resolved Planer Laser-Induced Fluorescence of Fluorocarbon Radicals in Oxide Etch Process Plasma International conference
25th International Conference on Phenomena in Ionized Gases (ICPIG), (Nagoya, July 17-22, 2001), 18a36, p. 91.
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Electron-Spin-Resonance Investigation on Solid Surfaces Irradiated by Fluorocarbon Plasma International conference
25th International Conference on Phenomena in Ionized Gases (ICPIG), (Nagoya, July 17-22, 2001), 18a34, p. 87.
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Early-stage modification of silicon oxide surface in fluorocarbon plasma for selective etching over silicon International conference
47th International Symposium American Vacuum Society (AVS), (Boston, MA, October 2-6, 2000), PS-MoM4, p. 6.
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An in-situ time-resolved infrared spectroscopic study of silicon dioxide surface during selective etching over silicon using fluorocarbon plasma International conference
Microprocess and Nanotechnology Conference (MNC), (Tokyo, July 11-13, 2000), 13B-9-3, pp. 270-271.
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Early Stage of Native Oxide Growth on an Atomically Flat Hydrogen Terminated Si(111) Surface International conference
Proc. 3rd Intern. Symp. Ultra Clean Processing of Silicon Surface (UCPSS 96), edited by M. Heyns, (Acco Leuven/Amersfoort, 1996), pp. 273-278.
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Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film International conference
26th IEEE Semiconductor Interface Specialist Conf. (SISC 95), (Charleston, South Carolina, December 7-9, 1995), P1.2.
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Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film International conference
Ext. Abst. of the 1995 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Osaka, August 21-24, 1995), PA-1-8, pp. 500-502.
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In-situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces International conference
Ext. Abst. of the 1995 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Osaka, August 21-24, 1995), S-1-1-2, pp.13-15.
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Study on Reaction of Fluorine Radicals with Si(111) Surface Employing an In-situ Combinated of ATR and XPS International conference
8th Intern. Micro Process Conf., (Sendai, July 17-20, 1995), pp. 170-171.
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Contribution of Si/SiO2 Interface Roughness in the Observation of Chemical Structure International conference
Ext. Abst. of the 1994 Intern. Conf. on Solid State Devices and Mater.(SSDM), (Yokohama, August 23-26, 1994), C-8-5, pp. 850-852.
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Effects of Dissolved Oxygen in HF solution on Silicon Surface Morphology International conference
Ext. Abst. of the 1994 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Yokohama, August 23-26, 1994), pp. 437-439.
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New Analytical Method of SiO2 Structure by Infrared Reflection Absorption Spectorscopy (IR-RAS) International conference
1993 Fall Meeting of the Material Research Society (MRS), Proc. 318 (Boston, November 28-December 5, 1993), pp. 425-430.
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FT-IR-RAS Analysis of Native Oxide Grown on Si(111) International conference
S. Fujimura, H. Ogawa, K. Ishikawa, C. Inomata, and H. Mori
Ext. Abst. of the 1993 Intern. Conf. on Solid State Devices and Mater. (SSDM), (Makuhari, August 29-September 1, 1993), pp.618-620.