講演・口頭発表等 - 堤 隆嘉
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Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing 国際会議
Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
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Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma 国際会議
Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
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Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma 国際会議
A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori
The 43rd International Symposium on Dry Process (DPS2022)
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Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma 招待有り 国際会議
H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori
242nd ECS Meeting
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Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature 国際会議
Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias 国際会議
Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma 国際会議
Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets 国際会議
Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)
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水素化アモルファスカーボン薄膜の合成機構における活 性種の寄与度の機械学習を用いた解析
近藤 博基, 黒川 純平, 堤 隆嘉, 関根 誠, 石川 健治, 堀 勝
2022年 第83回 応用物理学会 秋季学術講演
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イオン照射角制御によるカーボンナノウォールの配向成長
射場 信太朗, 近藤 博基, 石川 健治, 堤 隆嘉, 平松 美根男, 関根 誠, 堀 勝
2022年 第83回 応用物理学会 秋季学術講演
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Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition 国際会議
Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22
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In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas 国際会議
Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22
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Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process 招待有り 国際会議
Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI
The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022)
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Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials 招待有り 国際会議
Hiroki KONDO, Takayoshi TSUTSUMI, Kenji ISHIKAWA, Masaru HORI
The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022)
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Study of etching process using CHF3 gas condensed layer in cryogenic region 国際会議
Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
1st International Workshop on Plasma Cryo Etching Processes(PlaCEP2022)
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Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma 国際会議
Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori
MRS Spring Meetings & Exhibits
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C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響
吉江 泰斗、堤 隆嘉、石川 健治、近藤 博基、関根 誠、堀 勝
第69回応用物理学会春季学術講演会
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窒化ガリウムの基板昇温時サイクルエッチング特性
南 吏玖、中村 昭平、谷出 敦、石川 健治、堤 隆嘉、近藤 博基、関根 誠、堀 勝
第69回応用物理学会春季学術講演会
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プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果
射場 信太朗、近藤 博基、石川 健治、堤 隆嘉、平松 美根男、関根 誠、堀 勝
第69回応用物理学会春季学術講演会
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高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの 表面電位制御
橋本 拓海、近藤 博基、田中 宏昌、石川 健治、堤 隆嘉、関根 誠、安井 隆雄、馬場 嘉信、平松 美根男、堀 勝
第69回応用物理学会春季学術講演会