研究者詳細 - 堤　隆嘉

講演・口頭発表等 - 堤　隆嘉

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プラズマ誘起欠陥の発生と修復～RIE-SiO2に伴うSiO2 / Si界面の欠陥評価～

布村正太, 堤隆嘉, 深沢正永, 堀勝

第71回応用物理学会春期学術講演会 2024年3月24日

パルスプラズマにおける負イオンエネルギー分布の時間分解測定

都地一輝, 堤隆嘉, 蕭世男, 関根誠, 堀勝, 石川健治

第71回応用物理学会春期学術講演会 2024年3月24日

カーボンハードマスクの膜特性に対する基板バイアス寄与度の局所的顕在化

安藤悠介, 近藤博基, 堤隆嘉, 石川健治, 関根誠, 堀勝

第71回応用物理学会春期学術講演会 2024年3月24日

Prediction Model for RF Bias Effect on Etch Resistance of Amorphous Carbon in Plasma Enhanced Chemical Vapor Deposition 国際会議

Y. Ando, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13 2024年3月4日

In-situ analysis of chemisorption reactions on SiO2 surface using carbon precursor containing halogen 国際共著国際会議

L. Hu, T. Tsutsumi, N. Kobayashi, D. C. P. Raj, R. Borude, K. Ishikawa, M. Hori

ISPlasma2024/IC-PLANTS2024/APSPT-13 2024年3月5日

ALEにおけるプラズマ誘起欠陥とラジカル吸着のin-situ計測招待有り

堤隆嘉，近藤博基，関根誠，石川健治，堀勝

2024年1月25日

Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma 国際会議

T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 44th International Symposium on Dry Process (DPS2023) 2023年11月22日

Defect characterization at SiO2/Si interface throughout plasma processing and annealing 国際会議

S.Nunomura, T.Tsutsumi, I. Sakata and M Hori

The 44th International Symposium on Dry Process (DPS2023) 2023年11月22日

A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring 国際会議

S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, and M. Hori Y Iijima, R. Suda, Y. Kihara

The 44th International Symposium on Dry Process (DPS2023) 2023年11月22日

Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching 国際会議

Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023) 2023年11月21日

Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching 国際会議

K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, K. Ishikawa

The 44th International Symposium on Dry Process (DPS2023) 2023年11月21日

Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature 国際会議

Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura, Y. Iijima, K. Matsushima, M. Hori

The 44th International Symposium on Dry Process (DPS2023) 2023年11月21日

ドライエッチングと原子層エッチングの基礎と応用招待有り

堤隆嘉

第34回プラズマエレクトロニクス講習会 2023年11月17日

Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism 国際会議

Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori,

AVS 69th International Symposium and Exhibition (AVS 69) 2023年11月6日

Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF6 国際会議

T. Yoshie, K. Ishikawa, TTN Nguyen, S. Hsiao, T. Tsutsumi, M. Sekine, M. Hori

13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023) 2023年11月8日

Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis 国際会議

S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tomura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori

The 76th Annual Gaseous Electronics Conference (GEC76) 2023年10月11日

Plasma-Enhanced Deposition Mechanism of Hydrogenated Amorphous Carbon Analyzed ByCombining Reactive Species Measurement and Machine Learning 招待有り国際会議

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, H. Kousaka, M. Hori

244th ECS Meeting 2023年10月11日

Selective removal of graphene by irradiation of remote oxygen plasma 国際会議

L. Hu, K. Ishikawa, T. Tsutsumi, TTN Nguyen, S. Hsiao, H. Kondo, M. Sekine, M. Hori

Global Plasma Forum in Aomori 2023年10月16日

カーボンハードマスクのプラズマエッチング耐性に対する，成膜過程におけるイオン照射効果

安藤悠介、近藤博基、堤隆嘉、石川健治、関根誠、堀勝

第84回応用物理学会秋季学術講演会 2023年9月21日

CF4/H2プラズマによるSiO2,SiN,a-C膜の低温エッチング

今井祐輔、蕭世男、関根誠、飯島祐樹、須田隆太郎、大矢欣伸、木原嘉英、堤隆嘉、石川健治、堀勝

第84回応用物理学会秋季学術講演会 2023年9月22日

低温における絶縁膜の擬ウェットプラズマエッチング

蕭世男、関根誠、飯島祐樹、須田隆太郎、大矢欣伸、木原嘉英、堤隆嘉、石川健治、堀勝

第84回応用物理学会秋季学術講演会 2023年9月22日

容量結合型パルスプラズマにおける負イオンの電極材料依存性

都地一輝、堤隆嘉、蕭世男、関根誠、石川健治、堀勝

第84回応用物理学会秋季学術講演会 2023年9月22日

プラズマ誘起欠陥の発生と修復～酸素プラズマがSiO2/Si界面に及ぼす影響～

布村正太、堤隆嘉、堀勝

第84回応用物理学会秋季学術講演会 2023年9月21日

原子層エッチングにおけるプラズマ誘起欠陥へのラジカル吸着挙動

オソニオアイラペラロ、堤隆嘉、石川健治、堀勝

第84回応用物理学会秋季学術講演会 2023年9月21日

In-liquid plasma synthesis, morphological control, and functionalization of nanographene materials 国際会議

H. Kondo, T. Tsutsumi, M. Hiramatsu, M. Hori

THERMEC'2023 2023年7月3日

Plasma Synthesis of Graphene-Based Materials: Functionalization and Applications 招待有り国際共著国際会議

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori

THERMEC'2023 2023年7月3日

Recent Progress in the Synthesis of Functional and Three-Dimensional Carbon Nano-Composites By Gas-Liquid Interface Plasma 国際会議

H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori

243rd ECS Meeting

A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films 国際会議

Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

25th International Symposium on Plasma Chemistry (ISPC25)

Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har 国際会議

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 )

熱酸化膜/シリコン界面でのプラズマ誘起欠陥の発生と修復

布村正太、坂田功、堤隆嘉、堀勝

第70回応用物理学会春季学術講演会

成膜パラメータの寄与度解析に基づく、水素化アモルファスカーボン薄膜のエッチ耐性の向上

安藤悠介、近藤博基、石川健治、堤隆嘉、関根誠、堀勝

第70回応用物理学会春季学術講演会

Characterization of Plasmas and Polymerized Hydrofluorocarbon Films in Capacitively Coupled CF4/H2 Plasmas 国際会議

Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

15th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 16th International Conference on Plasma-Nano Technology & Science （ISPlasma2023/IC-PLANTS2023）

Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface 国際会議

Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine and Masaru Hori

Contribution Analysis of Process Parameters in Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon 国際会議

Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma 国際会議

Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine and Masaru Hori

Etching Behavior of Lamellar Poly(styrene-b-2-vinylpyridine) Block Copolymer under N2/H2 Plasma Process 国際会議

Ma. Shanlene Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita and Masaru Hori

Study on Plasma Process Using Adsorbed C7F14 as an Etchant 国際会議

Kohei Masuda, Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao, Takayoshi Tsutsumi, Hiroki Kondo and Masaru Hori

Morphological Effect of Carbon Nanowalls on Exosome Capture 国際会議

Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu and Masaru Hori

MEMS Nozzle for Capturing Lily Pollen in Array and Fixing on Culture Media 国際会議

Sachiko Sugiyama, Gang Han, Takayoshi Tsutsumi, Hiromasa Tanaka and Minoru Sasaki

Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2022

Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing 国際会議

Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI

Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma 国際会議

Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI

Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma 国際会議

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori

The 43rd International Symposium on Dry Process (DPS2022)

Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma 招待有り国際会議

H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

242nd ECS Meeting

Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)

Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias 国際会議

Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)

Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma 国際会議

Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)

Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets 国際会議

Shinji Yoshimura, Yoko Otsubo, Akira Yamashita, Katsuki Johzuka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference (ICRP-11/GEC2022)

水素化アモルファスカーボン薄膜の合成機構における活性種の寄与度の機械学習を用いた解析

近藤博基, 黒川純平, 堤隆嘉, 関根誠, 石川健治, 堀勝

2022年　第83回　応用物理学会　秋季学術講演

イオン照射角制御によるカーボンナノウォールの配向成長

射場信太朗, 近藤博基, 石川健治, 堤隆嘉, 平松美根男, 関根誠, 堀勝

2022年　第83回　応用物理学会　秋季学術講演

Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition 国際会議

Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22

In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Naga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

THE 22ND INTERNATIONAL VACUUM CONGRESS IVC-22

Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process 招待有り国際会議

Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022)

Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials 招待有り国際会議

Hiroki KONDO, Takayoshi TSUTSUMI, Kenji ISHIKAWA, Masaru HORI

The 5th International Union of Materials Research Societies International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM2022)

Study of etching process using CHF3 gas condensed layer in cryogenic region 国際会議

Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

1st International Workshop on Plasma Cryo Etching Processes（PlaCEP2022）

Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma 国際会議

Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

MRS Spring Meetings & Exhibits

C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響

吉江泰斗、堤隆嘉、石川健治、近藤博基、関根誠、堀勝

第69回応用物理学会春季学術講演会

窒化ガリウムの基板昇温時サイクルエッチング特性

南吏玖、中村昭平、谷出敦、石川健治、堤隆嘉、近藤博基、関根誠、堀勝

第69回応用物理学会春季学術講演会

プラズマ励起化学気相堆積法におけるカーボンナノウォールの配向成長に対するイオン照射角度の効果

射場信太朗、近藤博基、石川健治、堤隆嘉、平松美根男、関根誠、堀勝

第69回応用物理学会春季学術講演会

高効率エクソソーム解析に向けたカーボンナノウォールテンプレートの表面電位制御

橋本拓海、近藤博基、田中宏昌、石川健治、堤隆嘉、関根誠、安井隆雄、馬場嘉信、平松美根男、堀勝

第69回応用物理学会春季学術講演会

ラジカル注入型プラズマ励起化学気相堆積法で成長したカーボンナノウォールの3次元構造解析

近藤博基、尾崎敦士、堤隆嘉、関根誠、石川健治、堀勝、平松美根男

第69回応用物理学会春季学術講演会

C3H6 / H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係

黒川純平、光成正、近藤博基、堤隆嘉、関根誠、石川健治、堀勝

第69回応用物理学会春季学術講演会

In-Liquid Plasma Coating of Graphite Films on Metal Surface Immersed in Ethanol 国際会議

Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Magdaleno R. Vasquez Jr., and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Effect of RF Stage-Bias on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 国際会議

Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Three-Dimensional Morphological Analysis of Carbon Nanowalls 国際会議

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar and Mineo Hiramatsu

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Feature profiles in cyclic etch using C4F8 and SF6 gas-modulated plasma 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Correlation analysis between radicals in gas phase and etch resistance of hydrogenated amorphous carbon film 国際会議

Jumpei Kurokawa, Tadashi Mitsunari, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Effect of Air Introduction between Electrodes on Rapid Removal Process of Polymer Contamination on Floor by Atmospheric Pressure Plasma 国際会議

Yoshihiro Sakamoto, Takayoshi Tsutsumi, and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Simple external filter and tuning for operation in dual radio frequency plasmas using compensated Langmuir probe 国際会議

B. B. Sahu, M. Sekine, T. Tsutsumi, K. Ishikawa, H. Shogo, H. Tanaka, N. Ohno, and M. Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Effect of Substrate Temperature on Morphology of Carbon Nanowalls Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Using C2F6 /H2 Mixture Gas 国際会議

Takumi Hashimoto, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

Spectroscopy of H2/CH4/N2 Plasma for Carbon Nanowalls Growth 国際会議

Dennis Christy, Takayoshi Tsutsumi, Ngo Van Nong, Osamu Oda, Masaru Hori and Nikolay Britun

14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science

真空紫外原子吸光分光法による大気圧マイクロ波Ar/O2プラズマのO原子密度計測

岩田悠揮、小笠原知裕、鈴木陽香、堤隆嘉、堀勝、豊田浩孝

C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長されたカーボンナノウォールのモフォロジー制御

橋本拓海、近藤博基、石川健治、堤隆嘉、関根誠、平松美根男、堀勝

液中プラズマプロセスを用いたメタノール内金属基板上へのナノグラフェンの成膜

デラヴェガマリアシャンリン、近藤博基、堤隆嘉、グエンティ・トゥイーンガ、石川健治、関根誠、ヴァスケズマグダレノジュニア、堀勝

カーボンナノウォールの形態と高さが光透過率に及ぼす影響

射場信太朗、近藤博基、石川健治、関根誠、堤隆嘉、平松美根男、堀勝

Optical transmission of carbon nanowalls from ultra-violet region to infra-red region 国際会議

S. Iba, H. Kondo, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hiramatsu, and M. Hori

Material Research Meeting (MRM2021)

Three-dimensional structural analysis of carbon nanowalls synthesized by a radical-injection plasma-enhanced chemical vapor deposition system 国際会議

Hiroki Kondo, Atsushi Ozaki, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Uroš Cvelbar, Mineo Hiramatsu

Material Research Meeting (MRM2021)

Spatial Distribution Measurement of Atomic Oxygen from Atmospheric-Pressure Microwave Line Plasma by Atomic Absorption Spectroscopy 国際会議

Tomohiro Ogasawara, Yuki Iwata, Haruka Suzuki, Takayoshi Tsutsumi, Masaru Hori and Hirotaka Toyoda

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12)

Comparison of CF4/H2 and HF/H2 Plasmas for Etching of PECVD-Prepared SiN Films 国際会議

Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nga, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12)

Behavior of Hydrogen Atom in Atmospheric Pressure Micro-Hollow Cathode Discharge 国際会議

Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori

12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-12)

Random forest model for property control of plasma 国際会議

J. Kurokawa, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori

The 42nd International Symposium on Dry Process (DPS2021)

Selective plasma-enhanced atomic layer etching of SiO using a silane coupling agent 国際会議

A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, M. Hori

The 42nd International Symposium on Dry Process (DPS2021)

Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches 国際会議

T. Yoshie, T. Tsutsumi, K. Ishikawa, M. Hori

The 42nd International Symposium on Dry Process (DPS2021)

Control of Interface Layers for Selective Atomic Layer Etching 招待有り国際会議

Takayoshi Tsutsumi, R. Vervuurt, N. Kobayashi, and Masaru Hori

67th AVS International Symposium and Exhibitio

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2

吉江泰斗、堤隆嘉、石川健治、堀勝

第82回　応用物理学会秋季学術講演会

カーボンナノウォールの光透過率に対する壁密度および高さの効果

射場信太朗、近藤博基、石川健治、堤隆嘉、平松美根男、関根誠、堀勝

第82回　応用物理学会秋季学術講演会

窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測

南吏玖、石川健治、堤隆嘉、近藤博基、関根誠、小田修、堀勝

第82回　応用物理学会秋季学術講演会

原子層エッチングの反応素過程とその設計、制御

石川健治、Nguyen Thi-Thuy-Nga、堤隆嘉、蕭世男、近藤博基、関根誠、堀勝

第82回　応用物理学会秋季学術講演会

螺旋状窒素プラズマ中の窒素原子密度計測

西尾亮佑、梶田信、大野哲靖、田中宏彦、浅岡晃次、堤隆嘉、堀勝

第82回　応用物理学会秋季学術講演会

C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響

黒川純平、光成正、堤隆嘉、近藤博基、関根誠、石川健治、堀勝

第82回　応用物理学会秋季学術講演会

プラズマ誘起欠陥の発生と修復～モバイル水素の役割と考察～

布村正太、坂田功、堤隆嘉、堀勝

第82回　応用物理学会秋季学術講演会

Development of the nanocarbon coating process on metal surfaces via in-liquid plasma 国際会議

Ma. Shanlene D.C. Dela Vega, Hiroki Kondo, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Interfinish 2020 World Congress

Application of Atmospheric Pressure Plasma to Rapid Dry Etching of Polymer Contamination on Floor 国際会議

Y Sakamoto, T Tsutsumi, M Hori

Interfinish 2020 World Congress

Numerical analysis of effects of applying voltage polarity on atmospheric pressure argon streamer discharge under pin-to-plane electrode geometry 国際会議

Y. Sato, K. Ishikawa, T. Tsutsumi, A. Ui, M. Akita, S. Oka and M. Hori

47th Conference on Plasma Physics

塩素吸着による窒化ガリウム原子層エッチングの表面反応の理想と現実

堤隆嘉, 長谷川将希, 中村昭平, 谷出敦，近藤博基, 関根誠, 石川健治, 堀勝

第227回　シリコンテクノロジー分科会　研究集会 2021年3月25日

液中プラズマを用いたナノグラフェン合成における活性種の効果[II]

近藤博基、濱地遼、堤隆嘉、石川健治、関根誠、堀勝

第68回応⽤物理学会春季学術講演会

塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性

堤隆嘉、長谷川将希、中村昭平、谷出敦、近藤博基、関根誠、石川健治、堀勝

2021年第68回応⽤物理学会春季学術講演会

リモート酸素ラジカルによるグラフェンのエッチング反応の分析

胡留剛、堤隆嘉、蕭世男、近藤博基、石川健治、関根誠、堀勝

2021年第68回応⽤物理学会春季学術講演会

マイクロ放電ホローカソードプラズマを用いた真空紫外吸収分光用自己吸収光源の分光診断

竹田圭吾、堤隆嘉、平松美根男、堀勝

2021年第68回応⽤物理学会春季学術講演会

Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動

吉江泰斗、三好康史、堤隆嘉、釘宮克尚、石川健治、堀勝

2021年第68回応⽤物理学会春季学術講演会

プラズマ誘起欠陥の発生と修復～少数キャリアライフタイムによる定量評価～

布村正太、坂田功、堤隆嘉、堀勝

2021年第68回応⽤物理学会春季学術講演会

Design of removal process of SnO2 on glass by H2/Ar plasma at atmospheric pressure and medium pressure 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

13th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science （ISPlasma2021/IC-PLANTS2021） 2021年3月9日

Comparison of Nitrogen Atom Densities Measured with VUVAS and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori

Microwave Nitrogen Plasma Jets under the Moderate Gas Pressure Region 国際会議

Jaeho Kim, Keigo Takeda, Hirotomo Itagaki, Xue-lun Wang, Shingo Hirose, Hisato Ogiso, Tetsuji Shimizu, Naoto Kumagai, Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori and Hajime Sakakita

Crystalline structures and local electrical conductivity at crossing points of carbon nanowalls 国際会議

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori

Ion-attachment mass spectrometric analysis of odorous gas decomposition by atmospheric pressure plasma 国際会議

Tatsuyuki Moriyama, Yosuke Sato, Akio Ui, Shotaro Oka,Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry 国際会議

Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori

Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching 国際会議

Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

Pressure and flow rate dependence of active species in gas modulation cycle process using Ar/C4F8/SF6 国際会議

Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori

Measurements of negative ion density and plasma parameters in Ar/O2/C4F8 etching plasmas by Langmuir probe-assisted laser photodetachment 国際会議

B. B. Sahu, S.Hattori, T. Tsutsumi, N. Britun, M. Sekine, K. Ishikawa, H. Tanaka,T. Gohira, Y. Ohya, N. Ohno and M. Hori

Study of etching process using gas condensed layer at cryogenic temperature 2. Evaluation of cycle etching using gas condensed layer 国際会議

M. Hazumi, S. Selvaraj, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine and M. Hori

Dependence of nitrogen concentrations on cytotoxicity of air-free Ar-N2 mixed atmospheric pressure plasma-activeted lactated solutions 国際会議

Daiki Ito, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

Study of etching process using gas condensed layer at cryogenic temperature 1. Evaluation of CHF3 condensed layer thickness on SiO2 surface 国際会議

S. Selvaraj, M. Hazumi, S. N. Hsiao, C. Abe, T. Sasaki, H. Hayashi, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori

Effects on substrate temperature on the etching behaviors of PECVD- and LPCVD-prepared SiN thin films with CF4/H2 plasmas 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Etching characteristics of PECVD prepared SiN films with CF4/H2 and CF4/D2 plasmas at different substrate temperatures 国際会議

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

International Symposium on Semiconductor Manufacturing 2020 (ISSM2020) 2020年12月15日

Antitumor effect of plasma-activated Ringer’s acetate solution 国際会議

Yuki SudaU, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

2020年12月10日

Nitrogen Atom Density Measurements from Vacuum Ultraviolet Absorption Spectroscopy and Actinometry in Spiral Shape Plasma 国際会議

Ryosuke Nishio, Noriyasu Ohno, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi and Masaru Hori

The 29th International Toki Conference on Plasma and Fusion Research 2020年10月28日

Time resolved measurements of electron density and temperature by an electrostatic probe with conditional averaging method in pulsed capacitively coupled plasmas 国際会議

S. Hattori, B. B. Sahu, H. Tanaka, T. Tsutsumi, S. Kajita, M. Sekine, M. Hori, N. Ohno

The 29th International Toki Conference on Plasma and Fusion Research 2020年10月28日

Interactions of floating-wire-assisted atmospheric-pressure H2/Ar plasma with SnO2 film on glass substrate forming spherical Sn particles 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference 2020年10月8日

Penetration of hydrogen atoms and termination of dangling bonds in amorphous carbon films 国際会議

Hiroki Kondo, Yasuyuki Ohashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

73th Annual Gaseous Electronics Virtual Conference 2020年10月9日

カーボンナノウォールの局所電気伝導特性の解明

尾崎敦士、近藤博基、石川健治、堤隆嘉、平松美根男、関根誠、堀勝

第81回応用物理学会秋季学術講演会

液中プラズマを用いたナノグラフェン合成における活性種の効果

近藤博基、濱地遼、堤隆嘉、石川健治、関根誠、堀勝

第81回応用物理学会秋季学術講演会

Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis 国際会議

Masaki Hasagawa‚ Takayoshi Tsutsumi, Atsushi Tanide‚ Shohei Nakamura, Hiroki Kondo‚ Kenji Ishikawa‚ Masaru Hori

20th International Conference on Atomic Layer Deposition 2020年6月29日

プラズマプロセス中の基板温度分布の経時変化の解析

堤隆嘉、石川健治、近藤博基、関根誠、堀勝

2020年第67回応用物理学会春季学術講演会

Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性 (2)

長谷川将希、堤隆嘉、谷出敦、近藤博基、関根誠、石川健治、堀勝

2020年第67回応用物理学会春季学術講演会

液中プラズマを用いたナノグラフェン合成における照射時間依存性 [II]

近藤博基、濱地遼、堤隆嘉,、石川健治、関根誠、堀勝

2020年第67回応用物理学会春季学術講演会

液中プラズマを用いたナノグラフェン合成における照射時間依存性[Ⅰ]

濱地遼、近藤博基、堤隆嘉、石川健治、関根誠、堀勝

2020年第67回応用物理学会春季学術講演会

プラズマ誘起欠陥の発生と修復～Arイオン照射の効果～

布村正太、中根一也、堤隆嘉、松原浩司、堀勝

2020年第67回応用物理学会春季学術講演会

極低温領域におけるCHF3ガス凝縮層を用いたエッチングプロセスの研究

羽澄匡広, スガンサマラーセルヴァラジ, 蕭世男, 関根誠, 林久貴, 佐々木俊行, 阿部知央, 堤隆嘉, 石川健治, 堀勝

2020年第67回応用物理学会春季学術講演会

プラズマ表面処理が自己集積化膜の分子配向に及ぼす影響

織田祥成、堤隆嘉、石川健治、堀勝

2020年第67回応用物理学会春季学術講演会

Termination of Dangling Bonds in Amorphous Carbon Films by Hydrogen Atoms 国際会議

Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi and Masaru Hori

12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/13th International Conference on Plasma-Nano Technology & Science (ISPlasma2020/IC-PLANTS2020)

Formation of Spherical Sn Particles from SnO2 Film by Atmospheric-Pressure Plasma 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori

Etching Process Using CHF3 Gas Condensed Layer in Cryogenic Region 国際会議

Masahiro Hazumi, Suganthamalar Selvaraj, Shih-Nan Hsiao, Chihiro Abe, Toshiyuki Sasaki, Hisataka Hayashi, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Influence of Temperature on Etch Rate of SiN Films with CF4/H2 Plasma 国際会議

Shin-Nan Hsiao, Kazuya Nakane, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Measurement of Spatial Distribution of Absolute Hydrogen Radical Density in Non Equilibrium Atmospheric Pressure Plasma by Vacuum Ultraviolet Absorption Spectroscopy 国際会議

Kaede Katsuno, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine and Masaru Hori

Self-Absorbing Effect of Micro-Discharge Hollow Cathode Plasma as Light Source for Vacuum Ultraviolet Absorption Spectroscopy 国際会議

Sho Shimizu, Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu and Masaru Hori

Generation of Repulsing Glow Discharge in Centimeter Order Air Gaps 国際会議

Vladislav Gamaleev, Takayoshi Tsutsumi and Masaru Hori

In-Liquid Plasma Synthesis of Iron-Nitrogen-Doped Carbon Nanoflakes with Highly Catalytic Activity 国際会議

Ryo Hamaji, Tomoki Amano, Hiroki Kondo, Takayoshi Tsutsumi, 1Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Mineo Hiramatsu and Masaru Hori

Fluctuation of Local Electrical Conductivity in Carbon Nanowalls Observed by Conductive Atomic Force Microscopy 国際会議

Atsushi Ozaki, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori

Analysis and Control of Surface Reaction in Plasma Enhanced Atomic Layer Etching Processes 招待有り国際会議

Takayoshi Tsutsumi

7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020 4th International Symposium on Energy Research and Application

In-plane distribution of electrical conductivity of carbon nanowalls perpendicular to substrate measured by conductive atomic force microscopy 国際会議

Atsushi Ozaki, Hiroki Kondo, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, Mineo Hiramatsu

7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020 4th International Symposium on Energy Research and Application

Improvement of wool surface charging properties by plasma surface modification process 国際会議

T. Moriyama, T. Tsutsumi, H. Kondo, M. Sekine, K. Ishikawa, and M. Hori

7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020 4th International Symposium on Energy Research and Application

Nano-scale pattern formation of organic material with precisely wafer-temperature-controlled plasma etch system 国際会議

Yusuke Fukunaga, Makoto Sekine, Takayoshi Tsutsumi, Hiroki Kondo, Kenji Ishikawa, and Masaru Hori

The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)

Synthesis and crystallinity of nanographene using in-liquid plasma of ethanol 国際会議

Ryo Hamaji, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Mineo Hiramatsu, and Masaru Hori

MATERIALS RESEARCH MEETING 2019

Modification of lipid metabolism in Coccomyxa sp. treated by non-equilibrium atmosphere pressure plasma 国際会議

Takumi Kato, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

MATERIALS RESEARCH MEETING 2019

Changes of resistive elements during degradation of carbon nanowalls electrodes for fuel cell synthesized employing a CH4/H2 mixture gas plasma 招待有り国際会議

Hiroki Kondo, Shun Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

MATERIALS RESEARCH MEETING 2019

Atomic hydrogen exposures of radical-injection CH4/H2 plasma-enhanced chemical vapor deposited amorphous carbon films 国際会議

Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

MATERIALS RESEARCH MEETING 2019

In-situ analyses of GaN surfaces irradiated by a Cl2 plasma for atomic layer etching 招待有り

Masaki Hasegawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Hiroki Kondo, Atsushi Tanide, and Masaru Hori

第16回　赤﨑記念研究センターシンポジウム第21回　CIRFEセミナー「窒化物半導体研究の新展開：新規デバイスの創出をめざして」

Surface functionalization of wool fabrics using plasma process 国際会議

T. Moriyama, T. Tsutsumi, H. Kondo, M. Sekine, K. Ishikawa, and M. Hori

29th Annual Meeting of MRS-Japan 2019

Electrical, optical, and physicochemical behaviors of atmospheric pressure plasma jet generated in open air 招待有り国際会議

Keigo Takeda, Kenji Ishikawa, Takayuki Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori

3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019)

Time-resolved diagnosis of afterglow phase in synchro-bias of negative direct current on pulsed plasmas 国際会議

K. Nakane, T. Tsutsumi, S.-N. Hsiao, K. Ishikawa, M. Sekine, T. Gohira, Y. Ohya, M. Hori

The 41st International Symposium on Dry Process (DPS2019)

ALE of SiC by Plasma Modification and F-radical Etching Studied by in-situ Surface Spectroscopy 国際会議

R. H. J. Vervuurt, K. Nakane, T. Tsutsumi, M. Hori, N. Kobayashi

The 41st International Symposium on Dry Process (DPS2019)

Etching characteristics of silicon nitride film in plasma of fluoroethane (CH2FCHF2), Ar, and O2 mixture 国際会議

J. Ni, S.-N. Hsiao, T. Hayashi, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori

The 41st International Symposium on Dry Process (DPS2019)

Suppression of etch pit formation in GaN etching using H2-added Cl2 plasma at 400°C 国際会議

T. Omichi, A. Tanide, K. Ishikawa, T. Tsutsumi, H. Kondo, M. Sekine, M. Hor

The 41st International Symposium on Dry Process (DPS2019)

Effects of functional groups in raw material molecules on synthesis rate and structures of nanographene materials synthesized by in-liquid plasma using alcohols 国際会議

H. Kondo, A. Ando, T. Tsutsumi, K. Takeda, T. Ohta, K. Ishikawa, M. Sekine, M. Ito, M. Hiramatsu, M. Hori

The 41st International Symposium on Dry Process (DPS2019)

Plasma Processing with Feedback Control of Wafer Temperature By Non-Contact Temperature Measurement System 招待有り国際会議

T. Tsutsumi, H. Kondo, K. Ishikawa , K. Takeda, T. Ohta, M. Sekine, M. Ito, and M. Hori

236th ECS meeting

High-aspect-ratio organic-pattern formation with self-limiting manner by controlling plasma process based on substrate temperature measurement. 国際会議

Makoto Sekine,Yusuke Fukunaga,Takayoshi Tsutsumi,Kenji Ishikawa,Hiroki Kondo,Masaru Hori

The 72nd Annual Gaseous Electronics Conference

Effect of mixing alcohol source on synthesis of nanographene by in-liquid plasma 国際会議

Hiroki Kondo, Atsushi Ando, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Kenji Ishikawa, Makoto Sekine, Masafumi Ito, Mineo Hiramatsu, Masaru Hori

The 72nd Annual Gaseous Electronics Conference

Mechanism of Aqueous Reactions in Non-equilibrium Atmospheric Pressure Plasma-activated Lactec Solutions

Yang Liu、Kenji Ishikawa、Hiroshi Hashizumi、Hiromasa Tanaka、Takayoshi Tsutsumi、Hiroki Kondo、Makoto Sekine、Masaru Hori

2019年　第80回応用物理学会秋季学術講演会

自己吸収型マイクロ放電ホローカソード光源を用いた水素プラズマの真空紫外吸収分光計測

清水奨、竹田圭吾、堤隆嘉、平松美根男、堀勝

2019年　第80回応用物理学会秋季学術講演会

Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性

長谷川将希、堤隆嘉、近藤博基、関根誠、石川健治、堀勝

2019年　第80回応用物理学会秋季学術講演会

SiNx の ALE におけるフッ素ラジカルの In-situ エッチング反応解析

中根一也、ルネイ　ヘリンカス　ヨセフフェーフィート、堤隆嘉、小林伸好、堀勝

2019年　第80回応用物理学会秋季学術講演会

非平衡大気圧Ar プラズマ源における放電形状の経時変化および水素ラジカル密度空間分布計測

勝野楓、堤隆嘉、石川健治、竹田圭吾、橋爪博司、田中宏昌、近藤博基、関根誠、堀勝

2019年　第80回応用物理学会秋季学術講演会

Highly-durable carbon nanowalls electrodes for fuel cell synthesized employing a C2F6/H2 mixture gas plasma 国際会議

H. Kondo, S. Imai, T. Tsutsumi, K. Ishikawa, M.Sekine, M. Hiramatsu, M.Hori

International Conference on Solid State Devices and Materials 2019

Composition of ion species in pulsed dual frequency CCP with synchronized dc bias using fluorocarbon gases 国際会議

Kazuya Nakane, Shin-Nan Hsiao , Takayoshi Tsutsumi, Taku Gohira, Kenji Ishikawa, Makoto Sekin, Yoshinobu Ohya and Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

Intracellular responses of Coccomyxa sp. during culture in plasma-treated nutrient solution 国際会議

Takumi Kato, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

H2-added Cl2 plasma etching of GaN at high temperature 国際会議

Takahiro Omichi, Atsushi Tanide, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

Intracellular response of HeLa cells treated by plasma- activated Ringer's lactate solution 国際会議

Shogo Maeda, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Fumitaka Kikkawa, Masaaki Mizuno and Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

In situ surface analysis of Ga dangling sites and chlorination layers for determining atomic layer etching properties of GaN 国際会議

Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

Disordering in crystallinity induced by intermediates in synthesis of nanographene using in-liquid plasma 国際会議

Ryo Hamaji, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Mineo Hiramatsu, and Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

Hydrogen atom exposure for termination of dangling bonds in amorphous carbon films 国際会議

Yasuyuki Ohashi, Hirotsugu Sugiura, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

Vacuum Ultraviolet Absorption Spectroscopy with Self-absorbing Micro-discharge Hollow Cathode Lamp 国際会議

S. Shimizu, N. Kishi, K. Takeda, T. Tsutsumi, M. Hiramatsu, and M. Hori

The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2019)

In-liquid plasma synthesis of iron-nitrogen-doped carbon nanosheets with highly electro- catalytic activity for fuel cell application 国際会議

R. Hamaji, T. Amano, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, K. Takeda, M. Hiramatsu, M. Hori

International Conference on Solid State Devices and Materials 2019

Selectivity during Plasma ALE of Si-Compounds: Reaction Mechanism Studied by in-situ Surface Spectroscopy 国際会議

René Vervuurt, Kazuya Nakane, Takayoshi Tsutsumi, Masaru Hori, Nobuyoshi Kobayashi

AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)

Electrical conductivity for vertical direction of radical injection plasma enhanced chemical vapor deposited carbon nanowalls (RI-PECVD-CNW) 国際会議

Atsushi Ozaki, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)

Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 国際会議

Hitotsugu Sugiura, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)

Effects of fluorine introduction and termination of CNWs on their electrochemical reactions 国際会議

Hiroki Kondo, Masakazu Tomatsu, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu

XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)

Electron loss process in afterglow of pulsed magnetic neutral loop discharge using Ar/O2/ CF4 or C4F8 国際会議

X. Xie, J. Ni, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori

XXXIV International Conference on Phenomena in Ionized Gases(XXXIV ICPIG)/10th International Conference on Reactive Plasmas(ICRP-10)

Control of the Interface Layer in ALE Process by Alternating O2 Plasma with Fluorocarbon Deposition for High Selectivity Etching 国際会議

Takayoshi Tsutsumi, Akiko Kobayashi, Nobuyoshi Kobayashi, Masaru Hori

AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)

Chlorinated Surface Layer of GaN in Quasi Atomic Layer Etching of Cyclic Processes of Chlorine Adsorption and Ion Irradiation 国際会議

Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, Masaru Hori

AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)

プラズマ支援原子層プロセスにおける表界面反応層制御・診断招待有り

堤　隆嘉，近藤博基，石川健治，関根誠，堀勝

第４回 Atomic Layer Process (ALP) Workshop

Plasma-assisted Synthesis and Modification of Carbon Nanowalls for Emerging Applications 招待有り国際会議

Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu

International Conference NANO-M&D2019 Fabrication, Properties and Applications of Nano-Materials and Nano-Devices

Gene expression dynamics of glioblastoma cells in plasma-activated medium and plasma-activated Ringer's lactate solution 国際会議

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Makoto Sekine, Hiroki Kondo, Hiroshi Hashizume, Takayoshi Tsutsumi, Kae Nakamura, Nobuhisa Yoshikawa, Hiroaki Kajiyama, Shinya Toyokuni, Fumitaka Kikkawa, Masaru Hori

24th International Symposium on Plasma Chemistry (ISPC24)

Precisely wafer-temperature-controlled plasma etching and its application for nano-scale pattern fabrication of organic material 国際会議

Makoto Sekine, Yusuke Fukunaga, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Masaru Hori

24th International Symposium on Plasma Chemistry (ISPC24)

In-liquid plasma formation at low temperature of in situ binding SnO2/Graphene 国際会議

Kenji Ishikawa, Rajit R.Borude, Hirotsugu Sugiura, Takayoshi Tsusumi, Hiroki Kondo, Nobuyuki Ikarashi, and Masaru Hori

10th International Workshop on Microplasmas IWM-10

Synthesis mechanism and electrochemical properties of nanographene materials obtained by in-liquid plasma method 招待有り国際会議

Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori

2019 Global Conference on Carbon Nanotubes and Graphene Technologies

Floating-Wire-Assisted Atmospheric Pressure Plasma for High-Speed and Large-Area Glass Treatment 国際会議

Thi-Thuy-Nga Nguyen, Minoru Sasaki, Hidefumi Odaka, Takayoshi Tsutsumi, Kenji Ishikawa and Masaru Hori