講演・口頭発表等 - 堤 隆嘉
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非接触基板温度計測システムを用いたプラズマプロセス中の基板温度および熱流速計測
堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
第61回応用物理学会春季学術講演会
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Effect of Ambient Air Engulfment on Generation of Activated Species in 60 Hz Non-Equilibrium Atmospheric Pressure Ar Plasma Jet 国際会議
S. Liang, T. Tsutsumi, A. Ando, K. Sun, K. Takeda, H. Kondo, K. Ishikawa, H. Kano, M. Sekine, M. Hori
7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Measurement of Heat Fluxes of Si Substrate from Plasma by Using Frequency Low Coherence Interferometer 国際会議
T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Accuracy of substrate temperature measurements using optical low coherence interferometry 国際会議
T. Ohta, H. Kato, T. Tsutsumi, K. Takeda, M. Hori, M. Ito
8th International Conference on Reactive Plasmas 31st Symposium on Plasma Processing
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Rapid non-contact measurements of heat fluxes to substrate in nitorogen plasmas 国際会議
T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hor
8th International Conference on Reactive Plasmas 31st Symposium on Plasma Processing
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低コヒーレンス干渉計を用いた基板温度計測における計測精度の検討
宇佐美 拓也, 加藤 寛人, 太田 貴之, 堤 隆嘉, 堀 勝, 伊藤 昌文
電気学会プラズマ研究会
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Rapid precise measurements of film-covered-substrate temperatures during plasma processes 招待有り 国際会議
M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
The 1st International Conference on Surface Engineering
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Non-contact measurements of substrate-temperature by frequency-domain low coherence interferometry 国際会議
T. Tsutsumi, T. Ohta, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito
AVS 60th International Symposium & Exhibition
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Effect of thin films on wafer temperature during plasma processes investigated by non-contact temperature measurement technique 国際会議
T. Tsutsumi, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
The XXXI International Conference on Phenomena in Ionized Gases
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Precise Rapid Measurement of Substrate Temperature by Frequency-Domain Optical Low-Coherence Interferometry 招待有り 国際会議
M. Ito, T. Ohta, T. Tsutsumi, K. Takeda, M. Hori
17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
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低コヒーレンス干渉計を用いた基板温度計測における波長依存性
加藤 寛人, 柴田 恭平, 太田 貴之, 堤 隆嘉, 堀 勝, 伊藤 昌文
第60回応用物理学会春季学術講演会
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窒化ガリウム(GaN)向けたサファイア基板の周波数領域型低コヒーレンス干渉計による温度計測(Ⅱ) 招待有り
堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
第60回応用物理学会春季学術講演会
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Temperature measurement of carbon nanowall / silicon substrate using super-continuum light source on low-coherence interferometry 国際会議
T. Hiraoka, H. Kato, T. Tsutsumi, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Hori
The 6th International Conference on PLAsma Nano Technology & Science
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Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry 国際会議
T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Ohta, H. Kondo, K. Ishikawa, M. Ito, M. Sekine, M. Hori
5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Monitoring of wafer temperature in plasma processing using optical low-coherence interferometry 招待有り 国際会議
T. Ohta, M. Ito, T. Tsutsumi, T. Hiraoka, K. Takeda, M. Hori
The 16th International Workshop on Advanced Plasma Processing and Diagnostics
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Real time temperature measurements of film-covered-substrate employing Fourier domain low coherence interferometer during plasma processes 国際会議
T. Tsutsumi, T. Hiraoka, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
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Temperature measurement of substrate with a thin film using low-coherence interference 国際会議
T. Tsutsumi, T. Hiraoka, K. Takeda, K. Ishikawa, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori
65th Annual Gaseous Electronics Conference
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Non-Contact Measurement of Wafer Temperature for plasma processing Using Low Coherence Interferometry 国際会議
T. Ohta, T. Tsutsumi, M. Ito, K. Takeda, M. Hori
The 11th Asia Pacific Conference on Plasma Science and Technology and 25th Symposium on Plasma Science for Materials
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Non-Contact Temperature Measurement of Sapphire Substrate for GaN using Frequency Domain Low Coherence Interferometry 国際会議
T. Tsutsumi, K. Takeda, K. Ishikawa, H. Kondo, T. Ohta, M. Ito, M. Sekine, M. Hori
The 11th Asia Pacific Conference on Plasma Science and Technology and 25th Symposium on Plasma Science for Materials
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光干渉計を用いたプラズマプロセス中の半導体基板の温度計測技術
堤 隆嘉
第6回プラズマエレクトロニクス インキュベーションンホール