講演・口頭発表等 - 堤 隆嘉
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有機膜表面における活性種によるエッチング反応の基板温度依存性
福永 裕介, 堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 関根 誠, 堀 勝
第63回応用物理学会春季学術講演会
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Low-temperature PECVD process of silicon nitride film with radical and plasma diagnostics 国際会議
B. B. Sahu, Jeon G. Han, Y. Y. Yin, J. S. Lee, Su. B. Lee, T. Tsutsumi, K. Ishikawa, M. Hori
8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science
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Control of Radial Distribusion of Wafer Temperature during Plasma Process 国際会議
T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science
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Evaluation of Substrate Temperature Effect on Etch Profile Development by Intermittent Plasma Generation for Substrate Temperature Control 国際会議
Y. Fukunaga, T. Tsutsumi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science
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Plasma Etching Process based on Teal-time Monitoring of Radical Density and Substrate Temperature 招待有り 国際会議
K. Takeda, Y. Fukunaga, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
The 50th Winter Annual Conference of the Korean Vacuum Society
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Atomic-scale plasma process based on substrate-temperature control system 招待有り 国際会議
T. Tsutsumi, Y. Fukunaga, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
Asia international workshop in plasma science
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Wafer temperature dependence of organic film etch reaction in H2/N2 plasma 国際会議
Y. Fukunaga, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
The 37th International Symposium on Dry Process
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Highly Precise Control of Substrate Temperature During Plasma Etching and the Effect on Etched Profile 国際会議
Y. Fukunaga, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
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Role Of RF/UHF Hybrid Plasmas On The Low Temperature Deposition Of The SiNx: H Film In PECVD Process 国際会議
J. Han, B. Sahu, K. Shin, T. Tsutsumi, M. Hori
The 10th Asian-European International Conference On Plasma Surface Engineering
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Silicon Substrate Temperature Measurement In Sputtering Processes Using Optical Low-coherence Interferometry 国際会議
K. Hattori, T. Ohta, M. Ito, T. Tsutsumi, K. Takeda, M. Hori
The 10th Asian-European International Conference On Plasma Surface Engineering
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Prediction of Radial Distribution from Temporal Variation of Wafer Temperature in a Plasma Reactor 国際会議
T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
The 10th Asian-European International Conference On Plasma Surface Engineering
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Influences of wafer temperature on etch rates and profiles of organic films in H2/N2 plasma 国際会議
T. Tsutsumi, Y. Fukunaga, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
The 10th Asian-European International Conference On Plasma Surface Engineering
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Investigation of Temperature Parameter on Si Substrate Temperature Measurement UsingSpectral-Domain Optical Low-Coherence Interferometry 国際会議
K. Hattori, T. Ohta, M. Ito, T. Tsutsumi, K. Takeda, M. Hori
7th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 8th International Conference on Plasma Nanotechnology and Science
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Analysis of Temporal Changes on Substrate Temperature: Heat Fluxes during Plasma Processes and Influence of Chamber Parts 国際会議
T. Tsutsumi, Y. Fukunaga, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori
7th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 8th International Conference on Plasma Nanotechnology and Science
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Etching Process with System of Control of Wafer Temperatures measured by Non-contact Fourier Domain Low Coherence Interferometry 国際会議
Y. Fukunaga, T. Tsutsumi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
7th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 8th International Conference on Plasma Nanotechnology and Science
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有機膜エッチングにおける側壁保護作用の基板温度依存性
福永 裕介, 堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 関根 誠, 堀 勝
第62回応用物理学会春季学術講演会
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プラズマプロセス中の基板温度制御のための熱流束モデルの解析
堤 隆嘉, 福永 裕介, 石川 健治, 竹田 圭吾, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
第62回応用物理学会春季学術講演会
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高速・高精度基板温度制御によるエッチング形状
堤 隆嘉, 福永 祐介, 石川 健治, 竹田 圭吾, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
応用物理学会SC東海地区学術講演会 2014
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高速・高精度基板温度センサとパルス放電による基板温度制御
堤 隆嘉, 福永 裕介, 石川 健治, 竹田 圭吾, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝
第75回応用物理学会秋季学術講演会
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基板温度制御による有機Low-k膜のエッチング形状制御
福永 裕介, 堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 関根 誠, 堀 勝
第75回応用物理学会秋季学術講演会