Papers - TOYODA, Hirotaka
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Refractory Organic Solute Decomposition in Water using Microwave Plasma Reviewed
Tatsuo Ishijima, Ryota Saito, Hiroyasu Sugihara, and Hirotaka Toyoda
Transactions of the Materials Research Society of Japan Vol. 36 ( 3 ) page： 475-478 2011.3
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Influence of temperature and pressure on solute decomposition efficiency by microwave-excited plasma Reviewed
R. Saito , H. Sugiura , T. Ishijima, H. Toyoda
Current Applied Physics Vol. 11 ( 5 ) page： S195-S198 2011.3
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Pulsed plasma-polymerized alkaline anion-exchange membranes for potential application in direct alcohol fuel cells
Chengxu Zhang, Jue Hu, Jie Cong, Yanping Zhao, Wei Shen, Hirotaka Toyoda, Masaaki Nagatsuc, Yuedong Menga
Journal of Power Sources Vol. 196 page： 5386–5393 2011.2
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Effect of O Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB-MgO Magnetic Tunnel Junctions Reviewed
Kazunaga Ono, Norikazu Ohshima, Kazuya Goto, Hiroki Yamamoto, Tadashi Morita, Keizo Kinoshita, Tatsuo Ishijima, and Hirotaka Toyoda
Jpn. J. Appl. Phys. 50 (2011) 023001 Vol. 50 page： 023001 2011.2
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Plasma-grafted alkaline anion-exchange membranes based on polyvinyl chloride for potential application in direct alcohol fuel cell
Jue Hu, Chengxu Zhang, Jie Cong, Hirotaka Toyoda, Masaaki Nagatsu, Yuedong Meng
Vol. 196 page： 4483–4490 2011.1
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Novel Antenna Coupler Design for Production of Meter-ScaleHigh-Density Planar Surface Wave Plasma Reviewed
Tatsuo Ishijima, Yasunori Nojiri, Hirotaka Toyoda, Hideo Sugai
Vol. 49 page： 086002 2010.8
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Efficient production of microwave bubble plasma in water for plasma processing in liquid Reviewed
T. Ishijima, H. Sugiura, R. Saito, H. Toyoda, H. Sugai
Plasma Sources Sci. Technol. 015010 Vol. 19 page： 015010 2010
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Spatial Variation of Negative Oxygen Ion Energy Distribution in RF Magnetron Plasma with Oxide Target Reviewed
T. Ishijima, K. Goto, N. Ohshima, K. Kinoshita, and H. Toyoda
Jpn. J. Appl. Phys. Vol. 48 page： 116004 2009.11
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メタルスパッタリングプラズマの高度化とその最新動向
豊田浩孝（分担執筆）
電気学会技術報告書 Vol. 1162 page： pp.11~14 2009.7
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Rapid treatment of polyimide film surfaces using high-density microwave plasma for enhancement of Cu layer adhesion Reviewed
Y. Takagi , Y. Gunjo , H. Toyoda , H. Sugai
Vacuum, Vol. 83 page： 501–505 2008.10
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Effect of Sputtering Deposition Process on Magnetic Properties on Magnetic Multilayers Reviewed
Y. Maeda, Y. Suzuki, Y. Sakashita, S. Iwata, T. Kato, S. Tsunashima, H. Toyoda and H. Sugai
Jpn. J. Appl. Phys. Vol. 47 ( 10 ) page： 7879-7885 2008.10
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Surface Modification of Fluorocarbon Polymer Film by High Density Microwave Plasma Reviewed
K. Ishikawa, T. ishijima, K. Sasai, H. Toyoda and H. Sugai
Transactions of the Materials Research Society of Japan Vol. 33 ( 3 ) page： 683-686 2008.9
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Characteristics of Low-energy Atom and Molecule Beams Generated by the Charge Exchange Reaction Reviewed
Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Sekine, M. Hori
J. Appl. Phys. Vol. 103 ( 5 ) page： 053301 1-5 2008.5
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Deposition of polycrystalline SiGe by surface wave excited plasma Reviewed
Y. Takanishi, T. Okayasu, H. Toyoda, H. Sugai
Thin Solid Films Vol., pp. Vol. 516 page： 3554-3557 2008.4
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スパッタプラズマ中の高エネルギー粒子計測と制御 Reviewed
豊田浩孝
真空 Vol. 51 ( 4 ) page： 258-263 2008.4
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Suppression of Super High-Energy Species by VHF-DC Superimposed Magnetron Sputter Plasma Reviewed
Y. Sakashita, Y. Takagi, T. Kato, H. Toyoda, S. Iwata, S. Tsunashima and H. Sugai
Transaction of Materials Research Society of Japan Vol. 32 ( 2 ) page： 481-484 2007.12
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Suppression of High-Energy Backscattered Particles in Magnetron Plasma Reviewed
Yusuke Takagi, Hirotaka Toyoda, and Hideo Sugai
Jpn. J. Appl. Phys. Vol. 46 ( 12 ) page： 7865-7869 2007.12
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Tunable Low-energy Ar Fast Atom Source with Large Diameter Reviewed
Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Hori
Appl. Phys.Lett. Vol. 91 ( 23 ) page： 23502 1-3 2007.12
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High-Speed μc-Si Films Deposition and Large-Grain Poly-Si Films Deposition by Surface Wave Discharge Reviewed
Y. Hotta, H. Toyoda and H. Sugai
Thin Solid Films Vol. 515 page： 4983-4987 2007.4
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Role of atomic nitrogen during GaN growth by plasma-assisted molecular beam epitaxy revealed by appearance mass spectrometry Reviewed
J. Osaka, M. Senthil Kumar, H. Toyoda, T. Ishijima, H. Sugai and T. Mizutani
APPLIED PHYSICS LETTERS Vol. 90 page： 172114 1-3 2007.4