Papers - TOYODA, Hirotaka

High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing Reviewed

Hansin BAE,Kensuke Sasai,Haruka Suzuki,Hirotaka Toyoda

Vacuum   Vol. 192   page： 110429-1 - 110429-8   2021.10

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Authorship：Last author,　Corresponding author   Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.1016/j.vacuum.2021.110429

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Quantitative evaluation of hydrogen retention of solid tin after exposure to hydrogen plasma Reviewed

Kota Tamura,Haruka Suzuki, Junichi Miyazawa,Suguru Masuzaki,Hirotaka Toyoda

Fusion Engineering and Design   Vol. 170 ( September 112532 ) page： 112532-1 - 112532-6   2021.9

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Authorship：Last author,　Corresponding author   Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.1016/j.fusengdes.2021.112532

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Spatial Uniformity Evaluation of Atmospheric-Pressure Microwave Line Plasma for Wide-Area Surface Treatment Reviewed

Haruka SUZUKI, Hirotsugu KOMA, Tomohiro OGASAWARA, Yosuke KOIKE and Hirotaka TOYODA

Plasma and Fusion Research   Vol. 16 ( 0 ) page： 1406046 - 1406046   2021.4

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Authorship：Last author,　Corresponding author   Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.1585/pfr.16.1406046

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Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma Reviewed

Makoto Moriyama, Naoya Nakahara, Kazuaki Kurihara, Daiki Iino, Hiroyuki Fukumizu, Haruka Suzuki, and Hirotaka Toyoda

Japanese Journal of Applied Physics   Vol. 60 ( 016001 ) page： 016001-1 - 016001-5   2021.1

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harging and discharging behavior of high aspect-ratio (AR) hole capillary plate (CP) exposed to a pulse-modulated very high frequency (VHF) capacitively-coupled plasma is investigated. From an equivalent circuit model, time-dependent charge density on the bottom of the CP is quantitatively evaluated. AR of the CP plays very important role for the charging current, although the discharge current is dominated by the leakage current of the CP. Importance of electron current flowing into the CP bottom during the VHF pulse-on phase is suggested at higher self-bias voltages.

DOI： 10.35848/1347-4065/abd0ca

長尺大気圧マイクロ波プラズマの生成と表面処理への応用

豊田　浩孝、鈴木　陽香

表面技術   Vol. 71 ( 10 ) page： 624-628   2020.10

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Authorship：Lead author   Language：Japanese  

Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma

Makoto Moriyama1*, Naoya Nakahara1, Akihiro Mitsuya1, Haruka Suzuki1 , Kazuaki Kurihara2, Daiki Iino2, Hiroyuki Fukumizu2, and Hirotaka Toyoda1,3

Japanese Journal of Applied Physics   Vol. 59   page： SJJB03   2020.4

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Atmospheric-pressure microwave line plasma with an asymmetric cross-section waveguide for long-scale N2 plasma production

Haruka Suzuki1, Yuto Tamura1, Manh Hung Chu2 and Hirotaka Toyoda1

Japanese Journal of Applied Physics   Vol. 59 ( 016002 ) page： 016002-1-016002-6   2020.1

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Language：English   Publishing type：Research paper (scientific journal)  

Microwave plasma

Toyoda H.

RF Power Semiconductor Generator Application in Heating and Energy Utilization     page： 181 - 194   2020.1

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Publishing type：Research paper (scientific journal)   Publisher：RF Power Semiconductor Generator Application in Heating and Energy Utilization  

DOI： 10.1007/978-981-15-3548-2_8

Scopus

高密度表面波励起プラズマによるフッ素樹脂の表面改質

豊田浩孝

機能材料   ( 12月 ) page： PP   2019.12

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Authorship：Lead author   Language：Japanese  

DOI： PP01

Rapid resist ashing by slot-excited atmospheric pressure microwave O2 plasma

Hirotaka Toyoda1, Shota Ishikawa1, Haruka Suzuki1 and Takeshi Honda2

Japanese Journal of Applied Physics   Vol. 58 ( 12 ) page： 126001-1-4   2019.11

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大気圧マイクロ波放電による高密度長尺ラインプラズマ Reviewed

豊田浩孝、鈴木陽香

応用物理   Vol. 88 ( 2 ) page： 101-104   2019.2

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Atmospheric pressure water-vapor plasma in an air-shielded environment by water flow Reviewed

Hikaru Senba, Haruka Suzuki and Hirotaka Toyoda

Japanese Journal of Applied Physics   Vol. 58 ( SA ) page： pp.SAAC05-1～SAAC05-5   2018.12

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Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

Sasai Kensuke, Keyamura Kazuki, Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 57 ( 6 )   2018.6

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Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.7567/JJAP.57.066201

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液体処理用マイクロ波励起プラズマの生成

豊田　浩孝

表面と真空   Vol. 61 ( 3 ) page： 113-118   2018.3

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Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD

Sahu Bibhuti Bhusan, Toyoda Hirotaka, Han Jeon Geon

PHYSICS OF PLASMAS   Vol. 25 ( 2 ) page： 023511-1-14(2018)   2018.2

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Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.1063/1.5016618

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Development and plasma characterization of an 850 MHz surface-wave plasma source Reviewed

B. B. Sahu, S. Koga, H. Toyoda, and Jeon G. Han

AIP Advances   Vol. 7   page： 105213-1-17(2017)   2017.10

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Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.1063/1.4995442

Quantitative evaluation of high-energy O- ion particle flux in a DC magnetron sputter plasma with an indium-tin-oxide target

Suyama Taku, Bae Hansin, Setaka Kenta, Ogawa Hayato, Fukuoka Yushi, Suzuki Haruka, Toyoda Hirotaka

JOURNAL OF PHYSICS D-APPLIED PHYSICS   Vol. 50 ( 44 ) page： 445201   2017.10

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Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.1088/1361-6463/aa87a1

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An approach to line-shaped nitrogen plasma production at atmospheric pressure by slot-excited microwave discharge

Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS   Vol. 56 ( 11 )   2017.9

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Language：English   Publishing type：Research paper (scientific journal)  

DOI： 10.7567/JJAP.56.116001

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液体処理用マイクロ波励起プラズマの生成 Reviewed

豊田浩孝

表面と真空   Vol. 61 ( 3 ) page： 113-118   2017.2

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Enhancement of Liquid Treatment Efficiency by Microwave Plasma under Flow-Induced Reduced Pressure Reviewed

Michiko Ito, Tomohiro Takahashi, Sho Takitou, Seigo Takashima, Norio Nomura, Tominori Kitagawa, Hirotaka Toyoda

Japanese Journal of Applied Physics   Vol. 56   page： 026201-1-6   2017.1

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Language：English   Publishing type：Research paper (scientific journal)