Faculty Profiles - TOYODA, Hirotaka

Papers - TOYODA, Hirotaka

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*Fine Structure of O Kinetic Energy Distribution in RF Plasma and Its Formation Mechanism Reviewed

H.Toyoda, K. Goto, T. Ishijima, T. Morita, N. Ohshima, K. Kinoshita

Applied Physics Express Vol. 2 ( 12 ) page： 126001-(1-3) 2009.11

Design of Large-Area Surface Wave Plasma Excited by Slotted Waveguide Antennas with Novel Power Divider Reviewed

Tatsuo Ishijima, Hirotaka Toyoda, Yudai Takanishi, and Hideo Sugai

Jpn. J. Appl. Phys. Vol. 50 page： 036002 2011.3

*Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma Reviewed

Y. Takagi, Y. Sakashita, H. Toyoda, and H. Sugai

Vacuum Vol. 80 ( 6 ) page： 581-587 2006.3

*Evidence of Radical-free Etching of SiO₂ by Fluorocarbon Molecules under Ion Bombardment Reviewed

N. Takada, H. Toyoda and H. Sugai

Transacitons of the Materials Research Society of Japan Vol. 30 ( 1 ) page： 319-322 2005

*Suppression of Oxygen Impurity Incorporation into Silicon Films Prepared from Surface-Wave Excited H₂/SiH₄ Plasma Reviewed

S. Somiya, H. Toyoda, Y. Hotta and H. Sugai

Jpn. J. Appl. Phys. Vol. 43 ( 11A ) page： 7696-7700 2004

Measurement of energy-resolved ion angular distribution in a dual-frequency capacitively coupled argon plasma Reviewed

Kim, Dohan; Kawamura, Shunya; Naito, Masayoshi; Iino, Daiki; Fukumizu, Hiroyuki; KURIHARA, Kazuaki; Suzuki, Haruka; TOYODA, Hirotaka

Japanese Journal of Applied Physics Vol. 64 page： 05SP15-1 - 05SP15-7 2025.5

Angular distribution measurement of high-energy ions and neutrals impinging on an RF electrode in a dual-frequency capacitively-coupled Ar plasma Invited Reviewed

Shunya Kawamura, Dohan Kim, Keita Ichikawa, Haruka Suzuki, Daiki Iino, Hiroyuki Fukumizu, Kazuaki Kurihara and Hirotaka Toyoda

Plasma Sources Science and Technology 2025.5

Dry Process 2023 Open Access

Koga K., Takeda K., Toyoda H., Ishikawa K., Ichiki T., Nunomura S., Kurihara K., Kuboi N., Ohta T., Takenaka K.

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers Vol. 63 ( 8 ) 2024.8

Influence of bias voltage on the Ar/CH2F2/O2 plasma etching of Si3N4 films Reviewed

Kuboi, S; Kataoka, J; Iino, D; Kurihara, K; Toyoda, H; Fukumizu, H

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 63 ( 8 ) 2024.8

Language：English Publishing type：Research paper (scientific journal) Publisher：Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

The etching mechanism of silicon nitride (Si3N4) films depending on peak-to-peak bias voltage ( V pp ) in an Ar/CH2F2/O2 gas-mixture plasmas for high-aspect-ratio etching process was investigated. It was observed that the Si3N4 film etch rate initially decreased with an increase in the V pp up to 3630 V, but then increased beyond this threshold. This unusual etching behavior can be attributed to the formation of a modified layer on the surface of the Si3N4 film. The characteristics of the modified layer, such as thickness and atomic composition, were found to be strongly influenced by the ion energy and gas chemistry of the process conditions.

DOI： 10.35848/1347-4065/ad6d20

Web of Science

Scopus

Evaluation of the spatial structure of multiline emission in a capacitively coupled plasma using tomographic reconstruction Reviewed

Kyuzo, M; Harada, K; Izumi, R; Suzuki, H; Toyoda, H

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 63 ( 5 ) 2024.5

Authorship：Last author Language：English Publishing type：Research paper (scientific journal) Publisher：Japanese Journal of Applied Physics

By imaging a capacitively coupled plasma from multiple directions using telecentric lens cameras and optical bandpass filters, the spatial structure of emission at specific wavelengths was reconstructed using the Tikhonov-Phillips regularization method. Camera parameters, crucial for relating three-dimensional structures to two-dimensional images, were evaluated experimentally to avoid a complex analytical approach. Assuming an axisymmetric emission profile, 750.4 nm Ar and 585.2 nm Ne emissions from Ar/Ne mixture plasma were reconstructed. The pressure dependence of the reconstructed Ar profile showed a similar trend to that of the two-dimensional emission images. The spatial structure of the emission intensity ratio of Ne to Ar from the reconstructed Ar and Ne profiles agreed well with a spatial distribution of electron temperatures measured with a Langmuir probe.

DOI： 10.35848/1347-4065/ad46b0

Web of Science

Scopus

Time-varying mechanism of ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma Reviewed

Kuboi, S; Kato, H; Akatsuka, Y; Suzuki, H; Toyoda, H

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 63 ( 1 ) page： 016001 2024.1

Language：English Publishing type：Research paper (scientific journal) Publisher：Japanese Journal of Applied Physics

The time-varying mechanism of the positive-ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma was investigated in detail using a quadrupole mass spectrometer equipped with an electrostatic energy analyzer. Time-resolved measurements of the ion composition with respect to the pulse-off period ( T off ) revealed that the electron temperature ( T e ) just after turning on the pulse is an important factor in determining the ratio of the ionization rates of the Ar+ and Cx Fy + ions. The time-varying phenomenon of the ion composition was also investigated through a numerical analysis based on the particle balance model, considering the production and loss rates of ions, ion-ion recombination processes, and ion-molecule reactions. When the VHF power ( P VHF ) was increased, a decrease in the ambipolar diffusion loss time constants of the ions ( τ loss i ) was observed, and the change in electronegativity was pointed out as the cause of this phenomenon.

DOI： 10.35848/1347-4065/ad121f

Web of Science

Scopus

Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4F8/O2 dual-frequency capacitively coupled plasma International journal

Shuichi Kuboi, Haruhito Kato, Yuto Seki, Haruka Suzuki and Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 62 ( SI ) page： SI1003 2023.7

Polyvinyl alcohol-potassium iodide gel probe to monitor the distribution of reactive species generation around atmospheric-pressure plasma jet

Tran, TN; Hu, M; Ogasawara, T; Iwata, Y; Suzuki, H; Sakamoto, J; Akiyoshi, M; Toyoda, H; Matsuura, H

PLASMA SCIENCE & TECHNOLOGY Vol. 25 ( 3 ) 2023.3

Language：English Publishing type：Research paper (scientific journal) Publisher：Plasma Science and Technology

This study proposes polyvinyl alcohol-potassium iodide (PVA-KI) as a novel gel chemical probe. The probe uses the reactions among PVA, KI, water, borax, and oxidative species to visualize the distribution of reactive species. This method provides information regarding the distribution of reactive species by coloration on the gel surface. The effects of the surrounding gas phase on the distribution and diffusion of the reactive species are also investigated using the PVA-KI gel probe. Further, the relationship between the irradiation distance and reactive species diffusion is determined on the surface of the PVA-KI probe with and without plastic shielding. Adjusting the irradiation distance appropriately leads to an increase in the modified area as detected by the PVA-KI gel probe analysis. The relative concentration distributions of the reactive species are also obtained from visualized color distributions measured using a colorimeter. Furthermore, reactive species generation by long-scale line plasma is confirmed by the color reaction on the PVA-KI gel surface, with a greater area being covered by an atmospheric-pressure pulsed microwave line plasma source.

DOI： 10.1088/2058-6272/ac9891

Web of Science

Scopus

Influence of small ground surface on plasma property in an inductively-coupled plasma with floating liner International journal

Manabu Kyuzo, Yukinori Chiba, Haruka Suzuki and Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 62 ( SA ) page： SA1008-1 - SA1008-7 2023.1

Language：English Publishing type：Research paper (scientific journal) Publisher：Japanese Journal of Applied Physics

Currently, the components of semiconductor processing chamber are coated with oxides to avoid metal contamination. As a result, electrical ground is hidden from the plasma. In this study, we experimentally investigate the effect of small ground surfaces in an inductively-coupled plasma (ICP) generated in an electrically floating liner. Peak-to-peak and DC voltages at a biasing stage and a floating liner are measured as a function of stage peak-to-peak voltage for various ICP powers and the ground surface areas. The results show that the stage and liner voltages vary with changing ground surface area due to a change in sheath thickness. The analytical plasma potentials, calculated from the experimental values are compared with the simulation results, show good agreement. It is suggested that under low biased voltage and high ICP power conditions, such as in the atomic layer etching process, the small ground surface affects the potential structure in the chamber.

DOI： 10.35848/1347-4065/ac7e19

Web of Science

Scopus

Other Link： https://iopscience.iop.org/article/10.35848/1347-4065/ac7e19

Experimental study on boron distribution and transport at plasma-facing components during impurity powder dropping in the Large Helical Device Reviewed Open Access

Kawate T., Ashikawa N., Goto M., Oishi T., Kawamoto Y., Toyoda H., Shoji M., Kawamura G., Masuzaki S., Nespoli F., Gilson E. P., Lunsford R., Suzuki C., Nagy A., Gates D.

NUCLEAR FUSION Vol. 62 ( 12 ) page： 126052-1 - 126052-9 2022.12

Bubbling phenomenon of liquidized Sn-Bi-Li-Er alloy under hydrogen plasma exposure Reviewed

Tamura Kota, Miyazawa Junichi, Masuzaki Suguru, Tokitani Masayuki, Hamaji Yukinori, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 61 ( 10 ) page： 106005 2022.10

Dry Process

Japanese Journal of Applied Physics Vol. 61 ( SI ) 2022.7

High-speed hydrophilic and ashing treatments of polyimide using Ar/O-2 atmospheric-pressure microwave line plasma Reviewed

Japanese Journal of Applied Physics Vol. 61 ( SI ) page： 1008-1 - 1008-5 2022.7

Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film Reviewed

Bae Hansin, Hamaguchi Ikumi, Sasai Kensuke, Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 60 ( 12 ) 2021.12

Authorship：Last author,　Corresponding author Language：English Publishing type：Research paper (scientific journal) Publisher：Japanese Journal of Applied Physics

A method for enhancing ion flux to the substrate via high-voltage pulse biasing is investigated in an electron cyclotron resonance plasma. When high-voltage pulse biases above 500 V are applied to the stage, an increase in the stage current is observed, especially in the case of diverging magnetic field configurations in front of the bias stage. The growth and decay time constants of the plasma density and emission intensity are evaluated using a time-resolved Langmuir probe and emission spectroscopy while the pulse is on, and the enhancement of the ionization rate during the bias application is estimated using the zero-dimensional global model. The estimated density enhancement from the model is in good agreement with the measured one. From the numerical simulation of secondary electron trajectory, it is concluded that the electron confinement from the magnetic field is the key factor in plasma density enhancement during stage biasing. Using the high-density plasma produced by the bias voltage, conductive carbon is deposited at a high deposition rate of ∼4 nm s-1.

DOI： 10.35848/1347-4065/ac32b6

Web of Science

Scopus

Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma Reviewed

Keita Ichikawa, Manh Hung CHU, Makoto Moriyama, Naoya Nakahara, Haruka Suzuki, Daiki Iino, Hiroyuki Fukumizu, Kazuaki KURIHARA and Hirotaka TOYODA

Applied Physics Express Vol. 14 ( 126001 ) page： 126001-1 - 126001-5 2021.11

High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing Reviewed

Hansin BAE,Kensuke Sasai,Haruka Suzuki,Hirotaka Toyoda

Vacuum Vol. 192 page： 110429-1 - 110429-8 2021.10

Quantitative evaluation of hydrogen retention of solid tin after exposure to hydrogen plasma Reviewed

Kota Tamura,Haruka Suzuki, Junichi Miyazawa,Suguru Masuzaki,Hirotaka Toyoda

Fusion Engineering and Design Vol. 170 ( September 112532 ) page： 112532-1 - 112532-6 2021.9

Spatial Uniformity Evaluation of Atmospheric-Pressure Microwave Line Plasma for Wide-Area Surface Treatment Reviewed

Haruka SUZUKI, Hirotsugu KOMA, Tomohiro OGASAWARA, Yosuke KOIKE and Hirotaka TOYODA

Plasma and Fusion Research Vol. 16 ( 0 ) page： 1406046 - 1406046 2021.4

Time-dependent measurement of charge density on the bottom of high aspect capillary hole in pulse-modulated VHF capacitively coupled Ar plasma Reviewed

Makoto Moriyama, Naoya Nakahara, Kazuaki Kurihara, Daiki Iino, Hiroyuki Fukumizu, Haruka Suzuki, and Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 60 ( 016001 ) page： 016001-1 - 016001-5 2021.1

Authorship：Last author Language：English Publishing type：Research paper (scientific journal)

harging and discharging behavior of high aspect-ratio (AR) hole capillary plate (CP) exposed to a pulse-modulated very high frequency (VHF) capacitively-coupled plasma is investigated. From an equivalent circuit model, time-dependent charge density on the bottom of the CP is quantitatively evaluated. AR of the CP plays very important role for the charging current, although the discharge current is dominated by the leakage current of the CP. Importance of electron current flowing into the CP bottom during the VHF pulse-on phase is suggested at higher self-bias voltages.

DOI： 10.35848/1347-4065/abd0ca

長尺大気圧マイクロ波プラズマの生成と表面処理への応用

豊田　浩孝、鈴木　陽香

表面技術 Vol. 71 ( 10 ) page： 624-628 2020.10

Evaluation of absolute charge density at the bottom of high aspect capillary holes exposed to a pulsed very high frequency plasma

Makoto Moriyama1*, Naoya Nakahara1, Akihiro Mitsuya1, Haruka Suzuki1 , Kazuaki Kurihara2, Daiki Iino2, Hiroyuki Fukumizu2, and Hirotaka Toyoda1,3

Japanese Journal of Applied Physics Vol. 59 page： SJJB03 2020.4

Atmospheric-pressure microwave line plasma with an asymmetric cross-section waveguide for long-scale N2 plasma production

Haruka Suzuki1, Yuto Tamura1, Manh Hung Chu2 and Hirotaka Toyoda1

Japanese Journal of Applied Physics Vol. 59 ( 016002 ) page： 016002-1-016002-6 2020.1

Microwave plasma

Toyoda H.

RF Power Semiconductor Generator Application in Heating and Energy Utilization page： 181 - 194 2020.1

高密度表面波励起プラズマによるフッ素樹脂の表面改質

豊田浩孝

機能材料 ( 12月 ) page： PP 2019.12

Rapid resist ashing by slot-excited atmospheric pressure microwave O2 plasma

Hirotaka Toyoda1, Shota Ishikawa1, Haruka Suzuki1 and Takeshi Honda2

Japanese Journal of Applied Physics Vol. 58 ( 12 ) page： 126001-1-4 2019.11

大気圧マイクロ波放電による高密度長尺ラインプラズマ Reviewed

豊田浩孝、鈴木陽香

応用物理 Vol. 88 ( 2 ) page： 101-104 2019.2

Atmospheric pressure water-vapor plasma in an air-shielded environment by water flow Reviewed

Hikaru Senba, Haruka Suzuki and Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 58 ( SA ) page： pp.SAAC05-1～SAAC05-5 2018.12

Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

Sasai Kensuke, Keyamura Kazuki, Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 57 ( 6 ) 2018.6

液体処理用マイクロ波励起プラズマの生成

豊田　浩孝

表面と真空 Vol. 61 ( 3 ) page： 113-118 2018.3

Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD

Sahu Bibhuti Bhusan, Toyoda Hirotaka, Han Jeon Geon

PHYSICS OF PLASMAS Vol. 25 ( 2 ) page： 023511-1-14(2018) 2018.2

Development and plasma characterization of an 850 MHz surface-wave plasma source Reviewed

B. B. Sahu, S. Koga, H. Toyoda, and Jeon G. Han

AIP Advances Vol. 7 page： 105213-1-17(2017) 2017.10

Quantitative evaluation of high-energy O- ion particle flux in a DC magnetron sputter plasma with an indium-tin-oxide target

Suyama Taku, Bae Hansin, Setaka Kenta, Ogawa Hayato, Fukuoka Yushi, Suzuki Haruka, Toyoda Hirotaka

JOURNAL OF PHYSICS D-APPLIED PHYSICS Vol. 50 ( 44 ) page： 445201 2017.10

An approach to line-shaped nitrogen plasma production at atmospheric pressure by slot-excited microwave discharge

Suzuki Haruka, Toyoda Hirotaka

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 56 ( 11 ) 2017.9

液体処理用マイクロ波励起プラズマの生成 Reviewed

豊田浩孝

表面と真空 Vol. 61 ( 3 ) page： 113-118 2017.2

Enhancement of Liquid Treatment Efficiency by Microwave Plasma under Flow-Induced Reduced Pressure Reviewed

Michiko Ito, Tomohiro Takahashi, Sho Takitou, Seigo Takashima, Norio Nomura, Tominori Kitagawa, Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 56 page： 026201-1-6 2017.1

Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition Reviewed

K. Sasai, T. Hagihara, T. Noda, H. Suzuki, H. Toyoda

Jpn. J. Appl. Phys., Vol. 55 page： 086202 -1-5(2016) 2016.7

Desorption behavior of zinc atoms from zinc-sulfate solution irradiated with pulsed DC plasma Reviewed

Takafumi Takaba, Haruka Suzuki and Hirotaka Toyoda

Journal of Physics D: Applied Physics, Volume 49, Number 29 Vol. 49 ( 29 ) page： 295202 2016.6

Characteristics of an atmospheric-pressure line plasma excited by 2.45 GHz microwave travelling wave Reviewed

Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori, Hirotaka Toyoda

Jpn. J. Appl. Phys. ( 55 ) page： Article ID: 01AH09-1-6(2016) 2015.12

Low pressure sustainment of surface-wave microwave plasma with modified microwave coupler Reviewed

Kensuke Sasai, Haruka Suzuki, Hirotaka Toyoda

Jpn. J. Appl. Phys. ( 55 ) page： Article ID: 016203-1-5(2016) 2015.12

New line plasma source excited by 2.45 GHz microwave at atmospheric pressure Reviewed

Haruka Suzuki, Suguru Nakano, Hitoshi Itoh, Makoto Sekine, Masaru Hori and Hirotaka Toyoda

Vol. 8 ( 3 ) page： 036001 2015.2

Synergistic effect of microwave plasma and ultrasonic wave on decomposition of organic compounds in water Reviewed

Tomohiro Takahashi, Noriharu Takada, and Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 53 ( 7S ) page： 07KE01 2014.6

酸化物ターゲットを用いたRFマグネトロンプラズマにおける高エネルギー粒子の挙動 Invited Reviewed

豊田浩孝

Journal of the Vacuum Society of Japan Vol. 57 ( 3 ) page： 80-83 2014.3

Influence of Si Substrate Temperature and Bias Voltage on Surface Reaction of Br Radical in HBr Inductively Coupled Plasma

D. Iino, Y. Fujii, T. Oike, H. Toyoda

JPS Conf. Proc. Vol. 1 page： 015070-1-4 (2014) 2014.3

Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma Reviewed

Daiki Iino , Yasuhiro Nojiri, Keiji Suzuki, Takumi Oike, Yoshitaka Fujii, and Hirotaka Toyoda

Japanese Journal of Applied Physics Vol. 52 ( 11 ) page： 11NC01-1-6 2013.11

High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System Reviewed

Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda and Masaru Hori

Jpn. J. Appl. Phys. Vol. 52 page： 11NE01 2013.11

A Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink

H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, H. Toyoda and M. Hori

Journal ofPhysics:ConferenceSeries Vol. 441 page： 012019 2013.6

Rapid Plasma Treatment of Polyimide for Adhesive and Durable Copper Film Deposition

K. Usami, T. Ishijima, H. Toyoda

Thin Solid Films Vol. 521 page： 22-26 2012.10

High performance of carbon nanowall supported Pt catalyst for methanol electro-oxidation

Chengxu Zhang , Jue Hu , Xiangke Wang , Xiaodong Zhang , Hirotaka Toyoda , Masaaki Nagatsu , Yuedong Meng

CARBON Vol. 50 page： 3731–3738 2012.4

Nitriding of Polymer by Low Energy Nitrogen Neutral Beam Source Reviewed

Yasuhiro Hara , Keigo Takeda, Koji Yamakawa, Shoji Den, Hirotaka Toyoda, Makoto Sekine, and Masaru Hori

Applied Physics Express Vol. 5 page： 035801 2012.2

Characterization of a steam plasma jet at atmospheric pressure

Guohua Ni, Peng Zhao, Cheng Cheng, Ye Song, Hirotaka Toyoda and Yuedong Meng

Plasma Sources Sci. Technol. Vol. 21 page： 015009 (12pp) 2012.1

Microphase separated hydroxide exchange membrane synthesis by a novel plasma copolymerization approach

Chengxu Zhang, Jue Hua, Xiangke Wang, Hirotaka Toyoda, Masaaki Nagatsu, Xiaodong Zhang, Yuedong Meng

Journal of Power Sources Vol. 198 page： 112– 116 2011.10

Spatial Profile Measurement of SiH₃ Radical Flux in SiH₄/H₂ Microwave Plasma by Modified Appearance Mass Spectrometry Reviewed

Toshiyuki Kuroda, Masahira Ikeda, Tatsuo Ishijima, and Hirotaka Toyoda

Jpn. J. Appl. Phys. Vol. 50 page： 08JB05 2011.8

High-Performance Plasma-Polymerized Alkaline Anion-Exchange Membranes for Potential Application in Direct Alcohol Fuel Cells

Chengxu Zhang, Jue Hu, Masaaki Nagatsu, Yuedong Meng, Wei Shen, Hirotaka Toyoda, Xingsheng Shu

Plasma Process. Polym. Vol. 8 page： 1024–1032 2011.8

Preparation of high-performance hydroxide exchange membrane by a novel ablation restriction plasma polymerization approach

Chengxu Zhang, Jue Hu, Yuedong Meng, Masaaki Nagatsu and Hirotaka Toyoda

Chem. Commun. Vol. 47 page： 10230–10232 2011.5

Magnetron sputtering of platinum nanoparticles onto vertically aligned carbon nanofibers for electrocatalytic oxidation of methanol

Chengxu Zhang, Jue Hu, Masaaki Nagatsu, Xingsheng Shu, Hirotaka Toyoda, Shidong Fang, Yuedong Meng

Electrochimica Acta Vol. 56 page： 6033– 6040 2011.5

Refractory Organic Solute Decomposition in Water using Microwave Plasma Reviewed

Tatsuo Ishijima, Ryota Saito, Hiroyasu Sugihara, and Hirotaka Toyoda

Transactions of the Materials Research Society of Japan Vol. 36 ( 3 ) page： 475-478 2011.3

Influence of temperature and pressure on solute decomposition efficiency by microwave-excited plasma Reviewed

R. Saito , H. Sugiura , T. Ishijima, H. Toyoda

Current Applied Physics Vol. 11 ( 5 ) page： S195-S198 2011.3

Pulsed plasma-polymerized alkaline anion-exchange membranes for potential application in direct alcohol fuel cells

Chengxu Zhang, Jue Hu, Jie Cong, Yanping Zhao, Wei Shen, Hirotaka Toyoda, Masaaki Nagatsuc, Yuedong Menga

Journal of Power Sources Vol. 196 page： 5386–5393 2011.2

Effect of O Ion Beam Irradiation during RF-Magnetron Sputtering on Characteristics of CoFeB-MgO Magnetic Tunnel Junctions Reviewed

Kazunaga Ono, Norikazu Ohshima, Kazuya Goto, Hiroki Yamamoto, Tadashi Morita, Keizo Kinoshita, Tatsuo Ishijima, and Hirotaka Toyoda

Jpn. J. Appl. Phys. 50 (2011) 023001 Vol. 50 page： 023001 2011.2

Plasma-grafted alkaline anion-exchange membranes based on polyvinyl chloride for potential application in direct alcohol fuel cell

Jue Hu, Chengxu Zhang, Jie Cong, Hirotaka Toyoda, Masaaki Nagatsu, Yuedong Meng

Vol. 196 page： 4483–4490 2011.1

Novel Antenna Coupler Design for Production of Meter-ScaleHigh-Density Planar Surface Wave Plasma Reviewed

Tatsuo Ishijima, Yasunori Nojiri, Hirotaka Toyoda, Hideo Sugai

Vol. 49 page： 086002 2010.8

Efficient production of microwave bubble plasma in water for plasma processing in liquid Reviewed

T. Ishijima, H. Sugiura, R. Saito, H. Toyoda, H. Sugai

Plasma Sources Sci. Technol. 015010 Vol. 19 page： 015010 2010

Spatial Variation of Negative Oxygen Ion Energy Distribution in RF Magnetron Plasma with Oxide Target Reviewed

T. Ishijima, K. Goto, N. Ohshima, K. Kinoshita, and H. Toyoda

Jpn. J. Appl. Phys. Vol. 48 page： 116004 2009.11

メタルスパッタリングプラズマの高度化とその最新動向

豊田浩孝（分担執筆）

電気学会技術報告書 Vol. 1162 page： pp.11~14 2009.7

Rapid treatment of polyimide film surfaces using high-density microwave plasma for enhancement of Cu layer adhesion Reviewed

Y. Takagi , Y. Gunjo , H. Toyoda , H. Sugai

Vacuum, Vol. 83 page： 501–505 2008.10

Effect of Sputtering Deposition Process on Magnetic Properties on Magnetic Multilayers Reviewed

Y. Maeda, Y. Suzuki, Y. Sakashita, S. Iwata, T. Kato, S. Tsunashima, H. Toyoda and H. Sugai

Jpn. J. Appl. Phys. Vol. 47 ( 10 ) page： 7879-7885 2008.10

Surface Modification of Fluorocarbon Polymer Film by High Density Microwave Plasma Reviewed

K. Ishikawa, T. ishijima, K. Sasai, H. Toyoda and H. Sugai

Transactions of the Materials Research Society of Japan Vol. 33 ( 3 ) page： 683-686 2008.9

Characteristics of Low-energy Atom and Molecule Beams Generated by the Charge Exchange Reaction Reviewed

Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Sekine, M. Hori

J. Appl. Phys. Vol. 103 ( 5 ) page： 053301 1-5 2008.5

Deposition of polycrystalline SiGe by surface wave excited plasma Reviewed

Y. Takanishi, T. Okayasu, H. Toyoda, H. Sugai

Thin Solid Films Vol., pp. Vol. 516 page： 3554-3557 2008.4

スパッタプラズマ中の高エネルギー粒子計測と制御 Reviewed

豊田浩孝

真空 Vol. 51 ( 4 ) page： 258-263 2008.4

Suppression of Super High-Energy Species by VHF-DC Superimposed Magnetron Sputter Plasma Reviewed

Y. Sakashita, Y. Takagi, T. Kato, H. Toyoda, S. Iwata, S. Tsunashima and H. Sugai

Transaction of Materials Research Society of Japan Vol. 32 ( 2 ) page： 481-484 2007.12

Suppression of High-Energy Backscattered Particles in Magnetron Plasma Reviewed

Yusuke Takagi, Hirotaka Toyoda, and Hideo Sugai

Jpn. J. Appl. Phys. Vol. 46 ( 12 ) page： 7865-7869 2007.12

Tunable Low-energy Ar Fast Atom Source with Large Diameter Reviewed

Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Hori

Appl. Phys.Lett. Vol. 91 ( 23 ) page： 23502 1-3 2007.12

High-Speed μc-Si Films Deposition and Large-Grain Poly-Si Films Deposition by Surface Wave Discharge Reviewed

Y. Hotta, H. Toyoda and H. Sugai

Thin Solid Films Vol. 515 page： 4983-4987 2007.4

Role of atomic nitrogen during GaN growth by plasma-assisted molecular beam epitaxy revealed by appearance mass spectrometry Reviewed

J. Osaka, M. Senthil Kumar, H. Toyoda, T. Ishijima, H. Sugai and T. Mizutani

APPLIED PHYSICS LETTERS Vol. 90 page： 172114 1-3 2007.4

Investigation of the ion dese non-uniformity caused by sheath-lens focusing effect on silicon wafers Reviewed

N. Holtzer , E. Stamate, H. toyoda and H. Sugai

Thin Solid Films Vol. 515 page： 4887-4891 2007.4

Dependence of Giant Magnetoresitance in Cn/Cu Multilayers on Sputtering Condition Reviewed

Changchuan Chen, Y. Suzuki, T. Kato. S. Iwata, S. Tsunashima, H. Toyoda, H. Sugai

Japanese Juenal of Applied Physics Vol. 45 ( 10B ) page： 8466-8468 2006.10

Generation processes of super-high-energy atoms and ions in magnetron sputtering plasma Reviewed

Y. Takagi, Y. Sakashita, H. Toyoda, and H. Sugai

Vacuum Vol. 80 ( 6 ) page： 581-587 2006.3

バイアス光プローブによる反応性プラズマのEEDF測定 Reviewed

豊田浩孝

プラズマ・核融合学会誌 Vol. 81 ( 7 ) page： 496-501 2005

High-energy ions and atoms sputtered and reflected from magnetron source for deposition of magnetic thin films Reviewed

H. Matsui, H. Toyoda and H. Sugai

J. Vac. Sci. Technol. A Vol. 23 ( 4 ) page： 671-675 2005

Evidence of Direct SiO2 Etching by Fluorocarbon Molecules under Ion Bombardment Reviewed

N. Takada, H. Toyoda, I. Murakami and H. Sugai

Journal of Applied Physics Vol. 97 ( 1 ) page： 013534 1-5 2005

Evidence of Radical-free Etching of SiO2 by Fluorocarbon Molecules under Ion Bombardment Reviewed

N. Takada, H. Toyoda and H. Sugai

Transacitons of the Materials Research Society of Japan Vol. 30 ( 1 ) page： 319-322 2005

Beam Study of the Si and SiO₂ Etching Processes by Energetic Fluorocarbon Ions Reviewed

H. Toyoda, H. Morishima, R. Fukute, Y. Hori, I .Murakami and H. Sugai

J. Appl. Phys. Vol. 95 page： 5172-5179 2004

Dramatic Reduction of Chemical Sputtering of Graphite under Intercalation of Lithium Reviewed

H. Yagi, H. Toyoda, H. Sugai

J. Nucl. Mater. Vol. 313-316 page： 284-287 2003

Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductively-Coupled Plasma Reviewed

T. Kojima, A. Ohishi, H. Toyoda, M. Goto, M. Nishitani and H. Sugai

Jpn. J. Appl. Phys. Vol. 40 ( 1 ) page： 322-325 2001

Rapid Diffusion of Lithium into Bulk Graphite in Lithium Conditioning Reviewed

N. Itou, H. Toyoda, K. Morita and H. Sugai

J. Nucl. Mater. Vol. 290-293 page： 381-385 2001

Radial Density Profile of Microwave Plasma for Wall Conditioning in a Purely Toroidal Magnetic Field Reviewed

H. Sugai, H. Toyoda, J. Ihde and J. Winter

J. Plasma and Fusion Research Vol. 77 ( 2 ) page： 130-136 2001

Electron Energy Distribution Function and the Influence on Fluorocarbon Plasma Chemistry Reviewed

H. Sugai, I. Ghanashev, M. Hosokawa, K. Mizuno, K. Nakamura, H. Toyoda and K. Yamauchi

Plasma Sources Sci. Technol Vol. 10 page： 378-385 2001

Measurement of Electron-Impact-Dissociation Cross Section for Neutral Products Reviewed

H. Sugai, H. Toyoda

AIP Conf. Proc. Vol. 500 page： 349-358 2000

Laboratory Experiment on Lithium Chemistry and its Application to Effective Wall Conditioning Reviewed

S. Kato, M. Watanabe, H. Toyoda, H. Sugai

J. Nucl. Mater. Vol. 266-269 page： 406-411 1999

PSI in Fusion Devices -Function and Perspective of Wall Conditioning

J. Plasma and Fusion Research Vol. 75 ( 4 ) page： 403-408 1999

Lower Temperature Deposition of Poly-Crystalline Silicon Films from a Modified Inductively-Coupled Silane Plasma

K. Goshima, H. Toyoda, T. Kojima, M. Nishitani, M. Kitagawa, H. Yamazoe, H. Sugai

Jpn. J. Appl. Phys. Vol. 38 ( 6A ) page： 3655-3659 1999

High Sensitivity Optical Absorption Spectroscopy by Optical Multichannel Analyzer Reviewed

OYO-BUTURI Vol. 68 ( 5 ) page： 551-552 1999

Beam Experiments on Radical Production in Gas Phase and on Solid Surfaces Reviewed

J. Plasma and Fusion Research Vol. 75 ( 7 ) page： 779-784 1999

Mechanism of Carbon Impurity Suppression by Lithium Conditioning Reviewed

J. Plasma and Fusion Research Vol. 75 ( 4 ) page： 459-466 1999

Cross Sections for Electron-Impact Dissociation of Alternative Etching Gas, C3HF70 Reviewed

H. Tanaka, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 37 ( 9A ) page： 5053-5059 1998

Observation of Surface Dissociation of Low-energy Polyatomic Ions Relevant to Plasma Processing

H. Sugai, Y. Mitsuoka, H. Toyoda

J. Vac. Sci. Technol. Vol. 16 ( 1 ) page： 290-293 1998

Basic Experiments on in-situ Magnetized Boronization by Electron Cycrotron Resonance Discharges Reviewed

H. Kokura, K. Sasaki, H. Toyoda, T. Mizuuchi, K. Kondo, F. Sano, T. Obiki, H. Sugai

J. Nucl. Mater. Vol. 241-243 page： 1217-1221 1997

Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasmas Reviewed

M. Goto, H. Toyoda, M. Kitagawa, T. Hirao, H. Sugai

Japanese Journal of Applied Physics Vol. 36 ( 6A ) page： 3714-3720 1997

Cross Section Measurements for Electron-Impact Dissociation of C4F8 into Neutral and Ionic Radicals Reviewed

H. Toyoda, M. Iio, H. Sugai

Japanese Journal of Applied Physics Vol. 36 ( 6A ) page： 3730-3735 1997

Laboratory Expercment on hydrogen and impurity behaviors in lithium-deposited environment

H. Toyoda, M. Watanabe, H. Sugai

Journal of Nuclear Materials Vol. 241-243 page： 1031-1035 1997

Diagnostics for Advanced Plasma Control of Materials Processing Reviewed

H. Sugai, T.H. Ahn, I. Ghanashev, M. Goto, H. Toyoda, N. Nagatsu, K. Nakamura, K. Suzuki

Plasma Phys. Control. Fusion Vol. 39 page： A445-458 1997

Lithium Wall Conditioning for Fuel and Impurity Control Reviewed

H. Sugai, M. Ohori, H. Toyoda

Vacuum Vol. 47 ( 6-9 ) page： 981-984 1996

Lower Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductivety Coupled Silane Plasma

M. Goto, H. Toyoda, M. Kitagawa, T. Hirao, H. Sugai

Japanese Journal of Applied Physics Vol. 35 ( 8A ) page： L1009-1011 1996

Dissociative Ion Yields on Metal Surfaces Bombarded with Low-Energy Fluorocarbon Ions. Reviewed

Y. Mitsuoka, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 34 ( 11A ) page： L1486-1489 1995

Wall Conditioning with Lithium Evaporation Reviewed

H. Sugai, H. Toyoda, K. Nakamura, K. Furuta, M. Ohori, K. Toi, S. Hirokura, K. Sato

J. Nucl. Mater. Vol. 220-222 page： 254 1995

Simple Direct Monitoring of SiH3 Radical and Particulates in a Silane Plasma with Ultra-Violet Transmission Spectroscopy Reviewed

H. Toyoda, M. Goto, M. Kitagawa, T. Hirao, H. Sugai

Jpn. J. Appl. Phys. Vol. 34 ( 4A ) page： L448-451 1995

A Biased Optical Probe Method for Measurements of Electron Enaergy Distribution in a Plasma

H. Sugai, H. Toyoda, K. Nakano, N. Isomura

Journal of Plasma Sources, Science and Technoloy Vol. 4 page： 366372 1995

Boronization Study for Application to Large Helical Device

N. Noda, A. Sagara, H. Yamada, H. Toyoda, H. Sugai, Y. Kubota, N. Inoue, K. Akaishi,, et al.

J. Nucl. Mater. Vol. 220-222 page： 623-626 1995

Relative Cross Sections for Electron-Impact Dissociation of SF6 into SFx(x=1-3) Neutral Radicals Reviewed

M. Iio, M. Goto, H. Toyoda, H. Sugai

Contribution to Plasma Physics Vol. 35 ( 4-5 ) page： 405-413 1995

Absolute Cross Sections for the Electron-Impact Dissociation of CF4 and CHF3 into the CFx (x=1-3) Neutral Radicals Reviewed

H. Sugai, H. Toyoda, T. Nakano, M. Goto

Contribution to Plasma Physics Vol. 35 ( 4-5 ) page： 415-420 1995

CCH3 and CH Densities in a Diamond Growth DC Discharge Reviewed

K.L. Menningen, M.A. Childs, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. .Lawler

Contribution to Plasma Physics Vol. 35 ( 4-5 ) page： 359-373 1995

Observation of Ion Scattering from Metals Surfaces Bombarded with Low-Energy Hydrocarbon Ions Reviewed

Y. Mitsuoka, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 34 ( 4B ) page： L516-519 1995

Hydrogen Content and Isotope Exchange in Boronization Reviewed

M. Yamage, H. Sugai, T. Saito, H. Toyoda, M. Saidoh, N. Ogiwara, T. Mizuuchi, F. Sano, et al.

J. Nucl. Mater. Vol. 220-222 page： 743-747 1995

Measurement of CH3 and CH Densities in a Diamond Growth d. c. Discharge Reviewed

M.A. Childs, K.L. Menningen, H. Toyoda, L.W. Anderson, J.E. Lawler

Europhys. Lett. Vol. 25 ( 9 ) page： 729-734 1994

Cross Section Measurements for Electron-Impact Dissociation of CHF3 into Neutral and Ionic Radicals, Reviewed

M. Goto, K. Nakamura, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys., Vol. 33 ( 6A ) page： 3602-3607 1994

Measurement of Absolute Hydrogen Dissociation in a Diamond Deposition System Reviewed

M.A. Childs, K.L. Menningen, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. Lawler

Phys. Lett. A Vol. 194 page： 119123 1994

Ultraviolet Spectroscopy of Gaseous Spacies in a Hot Filament Diamond Deposition System When C2H2 and H2 are the Input Gases. Reviewed

H. Toyoda, M.A. Childs, K.L. Menningen, L.W. Anderson, J.E. Lawler

J. Appl. Phys. Vol. 75 ( 6 ) page： 3142-3150 1994

Absolute Radical Density Measurements in a CH4-H2 d.c. Discharge Reviewed

K.L. Menningen, M.A. Childs, H. Toyoda, Y. Ueda, L.W. Anderson, J.E. Lawler

Diamond and Related Mater Vol. 3 page： 422-425 1994

Evaluation of a Substrate Pretreatment for Hot Filament CVD Reviewed

K.L. Menningen, M.A. Childs, H. Toyoda, L.W. Anderson, J.E. Lawler

J. Mater. Res. Vol. 9 ( 4 ) page： 915-920 1994

Plasma-assisted Surface Modification and Radical Diagnostics Reviewed

H. Sugai, M. Yamage, Y. Hikosaka, T. Nakano, H. Toyoda

J. Nucl. Mater Vol. 200 page： 403-411 1993

Methyl Radical Production in a Hot Filament CVD System Reviewed

K.L. Menningen, M.A. Childs, P. Chevako, H. Toyoda, L.W. Anderson, J.E. Lawler

Chem. Phys. Lett Vol. 204 ( 5-6 ) page： 573-577 1993

Spatial Distribution and Surface Loss of CF3 and CF2 Radicals in a CF4 Etching Plasma Reviewed

Y. Hikosaka, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys Vol. 32 ( 3A ) page： L353-L356 1993

Drastic Change in CF2 and CF3 Kinetics Induced by Hydrogen Addition into CF4 Etching Plasma Reviewed

Y. Hikosaka, H. Toyoda, H. Sugai

Japanese J. Appl. Phys Vol. 32 ( 5A ) page： L690-L693 1993

Appearance Mass Spectrometry of Neutral Radicals in Radio Frequency Plasmas Reviewed

H. Sugai, H. Toyoda

Journal of Vacuum Science and Technology Vol. A10 ( 4 ) page： 1193-12004 1992

In-situ Boron Nitride Coating and Comparison with Existing Boronization Reviewed

M. Yamage, T. Ejima, H. Toyoda, H. Sugai

J. Nucl. Mater. Vol. 196-198 page： 618-621 1992

プラズマ界面における異常発光とフラグメンテーション Reviewed

片寄恭一, 豊田浩孝, 菅井秀郎

核融合研究 Vol. 67 ( 1 ) page： 51-61 1992

High Speed Cleaning of Boronized Wall with a CF₄ Containing Plasma Reviewed

H. Toyoda, A. Hanami, M. Yamage, H. Sugai

Japanese Journal of Applied Physics Vol. 30 ( 3B ) page： L514-517 1991

Electron Impact Dissociation of Methane into CH3 and CH2 Radicals, II. Absolute Cross Sections Reviewed

T. Nakano, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 30 ( 11A ) page： 2912-2915 1991

Electron Impact Dissociation of Methane into CH3 and CH2 Radicals, I. Relative Cross Sections Reviewed

T. Nakano, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 30 ( 11A ) page： 2908-2911 1991

Interactions of Bulk-Boronized Graphites with Deuterium Plasmas in the PISCES-B Facility Reviewed

Y. Hirooka, R.W. Conn, H. Toyoda, H. Sugai et al.

Fusion Technol Vol. 19 page： 2059-2069 1991

Spatial Distribution of CH₂ and CH₂ Radicals in a Methane RF Discharge Reviewed

H. Sugai, H. Kojima, A. Ishida, H. Toyoda

Applied Physics Letters Vol. 56 ( 26 ) page： 2616-2618 1990

Rapid Cleaning of Boronized Walls with a Chlorine/Hydrogen Glow Discharge Reviewed

H. Toyoda, A. Hanami, H. Sugai

Jpn. J. Appl. Phys. Vol. 29 ( 7 ) page： 1322-1323 1990

RF Plasma Production at Ultralow Pressure with Surface Magnetic Confinement Reviewed

T. Shirakawa, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 29 ( 6 ) page： L1015-1018 1990

Ion-Induced Radical Production on Surfaces during Deposition of Hydrogenated Amorphous Carbon Reviewed

Y. Yamashita, K. Katayose, H. Toyoda, H. Sugai

Journal of Applied Physics Vol. 68 ( 7 ) page： 3735-3737 1990

Effects of Carbon Wall on the Bahaviour of Heliotron-E Plasmas Reviewed

N. Noda, T. Mizuuchi, H. Toyoda, S. Yoshida, H. Sugai et al.

J. Nucl. Mater. Vol. 162-164 page： 769-775 1989

Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma Reviewed

S. Yoshida, H. Sugai, H. Toyoda

Jpn. J. Appl. Phys Vol. 28 ( 6 ) page： 1101-1108 1989

Genaration of a Large Electron Beam for Plasma Processing, Reviewed

H. Sugai, N. Yabuoshi, H. Toyoda

Jpn. J. Appl. Phys. Vol. 28 ( 5 ) page： L868-870 1989

Hydrogen Recycling Control by Helium Ion Bombardment onto Carbonized Surfaces Reviewed

H. Sugai, H. Toyoda, S. Ohshita, S. Yoshida, A. Sagara

J. Nucl. Meter. Vol. 162-164 page： 1035-1039 1989

Carbonization Experiment by ECR Discharge in JIPPT-IIU Reviewed

Y.Sakamoto, H. Amemiya, H. Toyoda, H. Sugai et al.

J. Nucl. Mater. Vol. 162-164 page： 783-786 1989

Mass Spectroscopic Investigation of the CH₃ Radicals in a Methane RF Discharge Reviewed

H. Toyoda, H. Kojima, H. Sugai

Applied Physics Letters Vol. 54 ( 16 ) page： 1507-1509 1989

Hydrogen Retention and Release Dynamics of Amorphous Carbon Filsm Exposed to a Hydrogen Plasma Reviewed

H. Sugai, S. Yoshida, H. Toyoda

Applied Physics Letters Vol. 54 ( 15 ) page： 1412-1414 1989

In situ Boron Coating and its Removal by Glow Discharge Processes Reviewed

H. Toyoda, T. Isozumi, H. Sugai, T. Okuda

Journal of Nuclear Materials Vol. 162-164 page： 732-736 1989

Observation of CH2 Radical and Comparison with CH3 Radical in a RF Methane Discharge Reviewed

H. Kojima, H. Toyoda, H. Sugai

Applied Physics Letters Vol. 55 ( 13 ) page： 1292-1294 1989

Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge Reviewed

Y. Yamashita, H. Toyoda, H. Sugai

Jpn. J. Appl. Phys. Vol. 28 ( 9 ) page： L1647-1650 1989

Control of Hydrogen Content of Boron Films Produced by a DC Toroidal Discharge Reviewed

H. Toyoda, H. Sugai, T. Isozumi, T. Okuda

Applied Physics Letters Vol. 51 ( 11 ) page： 798-800 1987

イオン束を制御した水素化アモルファスシリコンの生成と成膜過程 Reviewed

豊田浩孝, 菅井秀郎, 吉田　明, 奥田孝美

応用物理 Vol. 55 ( 7 ) page： 718-726 1986

Hydrogenated Amorphous Silicon Formation by Flux Control and Hydrogen Effects on the Growth Mechanism Reviewed

H. Toyoda, H. Sugai, K. Kato, A. Yoshida, T. Okuda

Appl. Phys. Lett. Vol. 48 ( 24 ) page： 1648-1650 1986

Ion and Radical Contributions to a Si : H Film Formation in a DC Toroidal Discharge Reviewed

H. Sugai, H. Toyoda, A. Yoshida, T. Okuda

Applied Physics Letters Vol. 46 ( 11 ) page： 1048-1050 1985

プラズマイオン分析器の開発 Reviewed

菅井秀郎, 小島啓明, 森　直生, 豊田浩孝, 奥田孝美

核融合研究 Vol. 51 ( 3 ) page： 221-240 1984

A Mass Spectrometer for Boundary Plasma Diagnostics Reviewed

H. Kojima, H. Sugai, T. Mori, H. Toyoda, T. Okuda

J. Nucl. Mater Vol. 128-129 page： 965-968 1984

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