Papers - USAMI Noritaka
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Generation of dislocation clusters at triple junctions of random angle grain boundaries during cast growth of silicon ingots Reviewed International journal
Ohno Yutaka, Tajima Kazuya, Kutsukake Kentaro, Usami Noritaka
APPLIED PHYSICS EXPRESS Vol. 13 ( 10 ) 2020.10
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Determination of carrier recombination velocity at inclined grain boundaries in multicrystalline silicon through photoluminescence imaging and carrier simulation Reviewed International journal
Mitamura Kazuki, Kutsukake Kentaro, Kojima Takuto, Usami Noritaka
JOURNAL OF APPLIED PHYSICS Vol. 128 ( 12 ) 2020.9
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Impact of Ge deposition temperature on parameters of c-Si solar cells with surface texture formed by etching of Si using SiGe islands as a mask Reviewed International coauthorship International journal
Nguyen V. H., Novikov A., Shaleev M., Yurasov D., Semma M., Gotoh K., Kurokawa Y., Usami N.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING Vol. 114 2020.8
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Reactive deposition growth of highly (001)-oriented BaSi2 films by close-spaced evaporation Reviewed International journal
Hara Kosuke O., Takizawa Shuhei, Yamanaka Junji, Usami Noritaka, Arimoto Keisuke
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING Vol. 113 2020.7
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Atomic hydrogen passivation for photoresponsivity enhancement of boron-doped p-BaSi2 films and performance improvement of boron-doped p-BaSi2/n-Si heterojunction solar cells Reviewed International coauthorship International journal
Xu Zhihao, Sato Takuma, Benincasa Louise, Yamashita Yudai, Deng Tianguo, Gotoh Kazuhiro, Toko Kaoru, Usami Noritaka, Filonov Andrew B., Migas Dmitri B., Shohonov Denis A., Suemasu Takashi
JOURNAL OF APPLIED PHYSICS Vol. 127 ( 23 ) 2020.6
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Impact of deposition of indium tin oxide double layers on hydrogenated amorphous silicon/crystalline silicon heterojunction Reviewed International journal
Semma Masanori, Gotoh Kazuhiro, Wilde Markus, Ogura Shohei, Kurokawa Yasuyoshi, Fukutani Katsuyuki, Usami Noritaka
AIP ADVANCES Vol. 10 ( 6 ) 2020.6
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Significant enhancement of photoresponsivity in As-doped n-BaSi2 epitaxial films by atomic hydrogen passivation Reviewed International journal
Aonuki Sho, Yamashita Yudai, Sato Takuma, Xu Zhihao, Gotoh Kazuhiro, Toko Kaoru, Terai Yoshikazu, Usami Noritaka, Suemasu Takashi
APPLIED PHYSICS EXPRESS Vol. 13 ( 5 ) page: . 2020.5
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Undoped p-type BaSi2 emitter prepared by thermal evaporation and post-annealing for crystalline silicon heterojunction solar cells Reviewed International journal
Kimura Yuki, Gotoh Kazuhiro, Kurokawa Yasuyoshi, Usami Noritaka
APPLIED PHYSICS EXPRESS Vol. 13 ( 5 ) 2020.5
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Scalable fabrication of GaN on amorphous substrates via MOCVD on highly oriented silicon seed layers Reviewed International coauthorship International journal
Hainey Mel Jr., Robin Yoann, Avit Geoffrey, Amano Hiroshi, Usami Noritaka
JOURNAL OF CRYSTAL GROWTH Vol. 535 2020.4
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3D visualization of growth interfaces in cast Si ingot using inclusions distribution Reviewed International coauthorship International journal
Kamibeppu Soichiro, Krenckel Patricia, Troetschler Theresa, Hess Adam, Riepe Stephan, Usami Noritaka
JOURNAL OF CRYSTAL GROWTH Vol. 535 2020.4
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Drastic enhancement of photoresponsivity in C-doped BaSi2 films formed by radio-frequency sputtering Reviewed International journal
Nemoto T., Matsuno S., Sato T., Gotoh K., Mesuda M., Kuramochi H., Toko K., Usami N., Suemasu T.
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Synthesis of Mg2Si thin film by thermal treatment under inert gas atmosphere and evaluation of film quality Reviewed International journal
Horiba Issei, Fujiwara Michinobu, Nakagawa Yoshihiko, Gotoh Kazuhiro, Kurokawa Yasuyoshi, Itoh Takashi, Usami Noritaka
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Surface inversion layer effective minority carrier mobility as one of the measures of surface quality of the p-aSi:H/i-aSi:H/cSi heterojunction solar cell Reviewed International journal
Kamioka Takefumi, Hayashi Yutaka, Gotoh Kazuhiro, Ozaki Ryo, Nakamura Kyotaro, Morimura Motoo, Naitou Shimako, Usami Noritaka, Ogura Atsushi, Ohshita Yoshio
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Preparation and thermoelectric characterization of phosphorus-doped Si nanocrystals/silicon oxide multilayers Reviewed International journal
Kobayashi Hisayoshi, Akaishi Ryushiro, Kato Shinya, Kurosawa Masashi, Usami Noritaka, Kurokawa Yasuyoshi
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Influence of the time-dependent vapor composition on structural properties of the BaSi2 thin films fabricated by vacuum evaporation Reviewed International journal
Yoshino Takamasa, Nakagawa Yoshihiko, Kimura Yuki, Fujiwara Michinobu, Kurokawa Yasuyoshi, Usami Noritaka
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Fabrication of group IV semiconductor alloys on Si substrate applying Al paste with screen-printing Reviewed International journal
Nakahara Masahiro, Matsubara Moeko, Suzuki Shota, Dhamrin Marwan, Miyamoto Satoru, Hainey Mel Forrest Jr., Usami Noritaka
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Effects of evaporation vapor composition and post-annealing conditions on carrier density of undoped BaSi2 evaporated films Reviewed International journal
Kimura Yuki, Fujiwara Michinobu, Nakagawa Yoshihiko, Gotoh Kazuhiro, Kurokawa Yasuyoshi, Usami Noritaka
JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 2020.4
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Effect of Si substrate modification on improving the crystalline quality, optical and electrical properties of thermally-evaporated BaSi2 thin-films for solar cell applications Reviewed International coauthorship International journal
Mai Thi Kieu Lien, Usami Noritaka
INTERNATIONAL JOURNAL OF MODERN PHYSICS B Vol. 34 ( 8 ) 2020.3
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Surface-orientation control of silicon thin films via aluminum-induced crystallization on monocrystalline cubic substrates International coauthorship
Hainey Mel Jr., Zhou Eddie (Chenhui), Viguerie Loic, Usami Noritaka
JOURNAL OF CRYSTAL GROWTH Vol. 533 2020.3
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Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition Reviewed International journal
Miyagawa Shinsuke, Gotoh Kazuhiro, Ogura Shohei, Wilde Markus, Kurokawa Yasuyoshi, Fukutani Katsuyuki, Usami Noritaka
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A Vol. 38 ( 2 ) 2020.3