Faculty Profiles - TSUTSUMI Takayoshi

Papers - TSUTSUMI Takayoshi

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Atomic nitrogen density measurements by actinometry method in the toroidal device NAGDIS-T Reviewed

Kajita Shin, Asaoka Koji, Tanaka Hirohiko, Nishio Ryosuke, Tsutsumi Takayoshi, Hori Masaru, Ohno Noriyasu

JAPANESE JOURNAL OF APPLIED PHYSICS Vol. 59 ( 8 ) page： . 2020.8

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals Reviewed

Hasegawa Masaki, Tsutsumi Takayoshi, Tanide Atsushi, Nakamura Shohei, Kondo Hiroki, Ishikawa Kenji, Sekine Makoto, Hori Masaru

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A Vol. 38 ( 4 ) 2020.7

Numerical simulations of stable, high-electron-density atmospheric pressure argon plasma under pin-to-plane electrode geometry: effects of applied voltage polarity Reviewed Open Access

Yosuke Sato, Kenji Ishikawa, Takayoshi Tsutsumi, Akio Ui, Masato Akita, Shotaro Oka, Masaru Hori

Journal of Physics D: Applied Physics 2020.4

Generation and Diagnostics of Ambient Air Glow Discharge in Centimeter-Order Gaps Reviewed Open Access

Gamaleev Vladislav, Tsutsumi Takayoshi, Hiramatsu Mined, Ito Masafumi, Hori Masaru

IEEE ACCESS Vol. 8 page： 72607 - 72619 2020.4

Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O-2 and Ar/O-2/C4F8 gas mixture Reviewed

Sirse N, Tsutsumi T, Sekine M, Hori M, Ellingboe A. R

PLASMA SOURCES SCIENCE & TECHNOLOGY Vol. 29 ( 3 ) 2020.3

Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study Reviewed

Fukunaga Yusuke, Longo Roberto C, Ventzek Peter L. G, Lane Barton, Ranjan Alok, Hwang Gyeong S, Hartmann Greg, Tsutsumi Takayoshi, Ishikawa Kenji, Kondo Hiroki, Sekine Makoto, Hori Masaru

JOURNAL OF APPLIED PHYSICS Vol. 127 ( 2 ) 2020.1

Etching characteristics of PECVD-prepared SiN films with CF4/D2and CF4/H2plasmas at different temperatures

Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings Vol. 2020- 2020

Language：English Publishing type：Research paper (international conference proceedings) Publisher：Institute of Electrical and Electronics Engineers Inc.

The dependences of plasmas (CF4/D2 and CF4/H2) on etch rates of the PECVD SiN films at different substrate temperatures were investigated. The CF4/D2 plasma exhibited higher etch rates than that for the CF4/D2 plasma at room temperature and higher. The optical emission spectra showed that the CF polymerization, F and Balmer emissions were stronger in the CF4/D2 plasma, by comparing with the CF4/H2 plasma. A thinner fluorocarbon thickness with a lower F/C ratio was found in the sample proceeded by the CF4/H2 plasma. The fluorocarbon thickness and gas phase concentration were not responsible for the increase of etch rate in the CF4/D2 plasma. The abstraction of H inside the SiN films by deuterium and hydrogen dissociation were considered to be important for the etching of the Si-H bond rich SiN films.

DOI： 10.1109/ISSM51728.2020.9377537

Web of Science

Scopus

Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp2 carbon structures Reviewed

Hirotsugu Sugiura, Yasuyuki Ohashi, Kenji Ishikawa, Hiroki Kondo, Toshiaki Kato, Toshiro Kaneko, Keigo Takeda, Takayoshi Tsutsumi, Toshio Hayashi, Makoto Sekine, Masaru Hori

Diamond and Related Materials Vol. 104 page： 107651 2019.12

In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals Reviewed

Nakane Kazuya, Vervuurt Rene H. J., Tsutsumi Takayoshi, Kobayashi Nobuyoshi, Hori Masaru

ACS APPLIED MATERIALS & INTERFACES Vol. 11 ( 40 ) page： 37263 - 37269 2019.10

Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

Tsutsumi Takayoshi

ACS Applied Bio Materials Vol. 2 ( 7 ) page： 2698 - 2702 2019.7

Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? Reviewed Open Access

Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, Kenji Ishikawa

Japanese Journal of Applied Physics Vol. 58 2019.6

Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development Reviewed

Japanese Journal of Applied Physics Vol. 58 2019.6

Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation Reviewed

Japanese Journal of Applied Physics Vol. 58 2019.6

Facile synthesis of SnO2-graphene composites employing nonthermal plasma and SnO2 nanoparticles-dispersed ethanol Reviewed

Borude Ranjit R, Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS Vol. 52 ( 17 ) 2019.4

Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS Vol. 52 ( 10 ) page： 105503 - 105503 2019.3

Real-time control of a wafer temperature for uniform plasma process

T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

2018 International Symposium on Semiconductor Manufacturing 2019.2

Remotely floating wire-assisted generation of high-density atmospheric pressure plasma and SF6-added plasma etching of quartz glass

Thi-Thuy-Nga Nguyen, Sasaki Minoru, Odaka Hidefumi, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru

JOURNAL OF APPLIED PHYSICS Vol. 125 ( 6 ) page： 063304 - 063304 2019.2

Liquid dynamics in response to an impinging low-temperature plasma jet

Tsutsumi Takayoshi

Journal of Physics D: Applied Physics Vol. 52 ( 7 ) 2019.2

Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition Reviewed

Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics Vol. 58 ( 3 ) page： 030912 2019.2

Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

Ranjit R. Borude, Hirotsugu Sugiura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Nobuyuki Ikarashi, Masaru Hori

ACS Appplied Nano Materials Vol. 2 ( 2 ) page： 649-654 2019.2

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Papers - TSUTSUMI Takayoshi