講演・口頭発表等 - 齋藤 永宏
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水中プラズマを用いた大腸菌および黄色ブドウ球菌の処理
2006年秋季 第67回応用物理学会学術講演会
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反応性イオンプレーティング法によるInGaN成膜における斜め堆積効果
2006年秋季 第67回応用物理学会学術講演会
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液中プラズマ反応場を利用した金ナノ粒子の生成とその機構の解明
2006年秋季 第67回応用物理学会学術講演会
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Diagnosis of organosilane plasma in formation of ultra water repellent thin films by PECVD method
8th Asia ? pacific conference on plasma science and technology and 19th Symposium on Plasma Science for Materials
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Dehradation of Bacteria in Liquid Medium Using Speceal Type of Plasma Dielectric Barrier Discharage Reactor
8th Asia ? pacific conference on plasma science and technology and 19th Symposium on Plasma Science for Materials
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Comparative Surface Analysis by Localized Surface Plasmon Resonance and Surface Enhanced Raman Scattering
8th International Conference on Adnanced Surface Engineering
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Study on Photo-and Plasuma-Calcination Process for Preparation of Mesoporous Tungsten Oxide Thin Films
8th International Conference on Adnanced Surface Engineering
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Deposition process of ultra water-repellent thin films by PECVD method
The 6th Korea-Japan Symposium on Plasma and Thin Film Technology
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ソリューションプラズマ反応場を用いた金ナノコロイドの合成とその機構の解明
平成18年度表面技術若手研究者・技術者研究交流発表会
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Synthesis of gold nanoparticles using solution plasma processing (SPP)
The 4th international workshop on advanced plasma processing and diagnostics & thin film technology for electronic materials
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プラズマCVDプロセスにおける種々の有機シリコン分子の挙動に関する比較研究
第17回日本MRS学術シンポジウム
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Behavior analysis of various organosilicon molecules in PECVD processes
AVS 53rd International Symposium & Exhibition
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Behavior of intramolecular bondings of organosilicon reactants in PECVD processes for SiO:CH films
The 6th Korea-Japan Symposium on Plasma and Thin Film Technology
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メチル系有機シリコン化合物を原料に用いたプラズマCVDにおけるAr分圧の影響
表面技術協会第114回講演大会
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Electrochromic properties of InN films prepared by oblique-angle evaporation with active nitrogen source
The 17th Symposium of The Materials Reserch Society of Japan(MRS-J)
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Columnar shape control of electrochromic indium nitride films by using glancing-angle reactive evaporation method
28th International Symposium on Dry Process
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High controllability of columnar structure in indium nitride films prepared by oblique-angle evaporation with active nitrogen source
The 6th Korea-Japan Symposium on Plasma and Thin Film Technology
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斜め堆積反応性蒸着法を用いて作製したInN薄膜の微細構造制御
日本金属学会2006年秋期(第139回)大会
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Columnar shape control of electrochromic indium nitride films by using glancing-angle reactive evaporation method
7th International Meeting on ELECTROCHROMISM
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Behavior analysis of organosilane molecules in plasmas for fabrication of SiOCH thin films
The 27th International Symposium on Dry Process