Faculty Profiles - OHNO, Noriyasu

Papers - OHNO, Noriyasu

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Chaotic Behavior Driven by an External Periodic Oscillation in a Current-Carrying Unstable Ion Sheath Reviewed

N.Ohno, A.Komori, M.Kono, Y.Kawai

Physics of Fluids B Vol. 5 ( 3 ) page： 796-805 1993

Experimental and Theoretical Study on Plasma Heat Flow to Plasma Facing Materials

S.Masuzaki, H.Konnno, N.Ohno, S.Takamura

Proc. of 20th EPS Conference on Controlled Fusion and Plasma Physics, Lisboa Vol. 743-746 1993

BIFURCATION PHENOMENA IN AN EMISSIVE PLATE - SIMULATED DIVERTOR PLASMA SYSTEM Reviewed

TAKAMURA S, OHNO N, SHIRAISHI K, MASUZAKI S

JOURNAL OF NUCLEAR MATERIALS Vol. 196 page： 448 - 451 1992.12

SHEATH FORMATION ON CARBON AND REFRACTORY-METALS IN A PLASMA WITH ENERGETIC ELECTRONS Reviewed International journal

SHIRAISHI K, OHNO N, UESUGI Y, TAKAMURA S

JOURNAL OF NUCLEAR MATERIALS Vol. 196 page： 745 - 749 1992.12

INTERMITTENCY DURING TRANSITION BETWEEN STATIONARY AND PERIODIC STATES IN PLASMAS Reviewed International journal

KOMORI A, OHNO N, YAMAURA T, KAWAI Y

PHYSICS LETTERS A Vol. 170 ( 6 ) page： 439 - 442 1992.11

Sheath Formation on Carbon and and Refractory Metals in a Plasma with Energetic Electrons Reviewed

K.Shiraishi, N.Ohno, Y.Uesugi, S.Takamura

Journal of Nuclear Materials Vol. 196-198 page： 745-749 1992

高熱流プラズマの生成とその高速掃引プローブ計測システムによる計測 Reviewed Open Access

増崎貴、大野哲靖、高木誠、高村秀一

電気学会論文誌A Vol. 112 ( 11 ) page： 913-921 1992

Intermittency During Transition Between Stationary and Periodic States of Plasmas Reviewed

A.Komori, N.Ohno, T.Yamaura, Y.Kawai

Physics Letter A Vol. 170 ( 6 ) page： 439-442 1992

Bifurcation Phencomena in an Emissive Plate-Simulated Divertor Plasma System Reviewed

S.Takamura, N.Ohno, K.Shiraishi, S.Masuzaki

Journal of Nuclear Materials Vol. 196-198 page： 448-451 1992

Studies on Sheath Formation in Divertor Plasmas by Computer Simulation Using Particle Reviewed

N.Ohno, S.Masuzaki, H.Konno, S.Takamura

Contributions to Plasma Physics Vol. 3 ( 3-4 ) page： 249-354 1992

Gaseous Silicon Plasma Generated by a Low-Temperatue Tokamak Discharge Reviewed

K.Hiramatsu, N.Ohno, S.Takamura

Jouranl of Plasma and Fusion Research Vol. 69 ( 2 ) page： 121-128 1992

Numerical Study of Potential Formation and Negative Resistance in a Currnet Carrying Ion Sheath

N.Ohno, A.Komori, Y.Kawai, S.Takamura

Proc. of 1992 International Conference on Plasma Physics, Innsbruck, Austria page： 1807-1810 1992

26p-C-7 A quasiperiodic route to chaos observed in an ion sheath Reviewed Open Access

Komori A, Ohno N, Kono M, Tanaka M, Kawai Y

Meeting Abstracts of the Physical Society of Japan Vol. 1992 ( 0 ) 1992

Averaging effect of radical particle profile by the scanning plasma method in SiH<inf>4</inf>Ar plasmas Reviewed International journal

Fujiyama H., Kawasaki H., Matsuda Y., Ohno N.

Materials Science and Engineering A Vol. 140 ( C ) page： 569 - 575 1991.7

Authorship：Last author Language：English Publishing type：Research paper (scientific journal) Publisher：Materials Science and Engineering A

A new plasma-enhanced chemical vapour deposition (PECVD) method has been developed for preparation of large-area uniform hydrogenated amorphous silicon (aSi:H) thin films. Detailed two-dimensional profiles of both charged particles and radical particles have been measured in magnetized multielectrode glow discharge plasmas in 10% SiH4Ar gas. The detailed profiles of SiH* and Ar I emissions had two peaks in the negative glow and cathode sheath regions but, for Hα emission, only one peak was observed in the cathode sheath region. It was verified that large-area uniform profiles of not only plasmas but also SiH* emission could be realized in the presence of modulated crossed magnetic and electric fields. By using this scanning plasma method (SPM), inhomogeneities for both profiles of plasma and SiH* (413.5 nm) emission intensity have improved to less than 2.5% near the substrate outside the discharge region. The thickness profile of prepared a-Si:H thin film has also been unified to less than 4.8% by SPM. © 1991.

DOI： 10.1016/0921-5093(91)90480-B

Scopus

INSTABILITIES ASSOCIATED WITH A NEGATIVE RF RESISTANCE IN CURRENT-CARRYING ION SHEATHS Reviewed International journal

OHNO N, KOMORI A, TANAKA M, KAWAI Y

PHYSICS OF FLUIDS B-PLASMA PHYSICS Vol. 3 ( 1 ) page： 228 - 235 1991.1

短ギャップ同軸型マイクロ波放電の放電開始条件に及ぼす磁界の影響 Reviewed Open Access

重水哲郎、大野哲靖、藤山寛

電気学会論文誌A Vol. 111 ( 8 ) page： 727-732 1991

Instabilities associated with a negative of resistance in current-Carrying ion sheaths Reviewed

N.Ohno, A.Komori, M.Tanaka, Y.Kawai

Physics of Fluids Vol. B3 ( 1 ) page： 228-235 1991

Characteristics of ECR Plasmas for Weakly resonant conditions Reviewed

M.Saigoh, N.Ohno, H.Fujiyama

Material Science and Engineering Vol. A139 page： 307-311 1991

ボックスカー撮像法によるプラズマ中磁力線構造可視化システム

櫻井真治、大野哲靖、高村秀一

第6回産業における画像センシング技術シンポジウム講演論文集 page： 177-182 1991

Averaging Effect of Radical Profile by the Scanning Plasma Method in S : H₄-Ar Plasma Reviewed

H.Kawasaki, N.Ohno, Y.Matsuda, H.Fujiyama

Material Science and Engineering Vol. A140 page： 569-575 1991

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Papers - OHNO, Noriyasu