Faculty Profiles - OHNO, Noriyasu

Papers - OHNO, Noriyasu

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Gaseous Silicon Plasma Generated by a Low-Temperatue Tokamak Discharge Reviewed

K.Hiramatsu, N.Ohno, S.Takamura

Jouranl of Plasma and Fusion Research Vol. 69 ( 2 ) page： 121-128 1992

Numerical Study of Potential Formation and Negative Resistance in a Currnet Carrying Ion Sheath

N.Ohno, A.Komori, Y.Kawai, S.Takamura

Proc. of 1992 International Conference on Plasma Physics, Innsbruck, Austria page： 1807-1810 1992

26p-C-7 A quasiperiodic route to chaos observed in an ion sheath Reviewed

Komori A, Ohno N, Kono M, Tanaka M, Kawai Y

Meeting Abstracts of the Physical Society of Japan Vol. 1992 ( 0 ) 1992

Averaging effect of radical particle profile by the scanning plasma method in SiH<inf>4</inf>Ar plasmas Reviewed International journal

Fujiyama H., Kawasaki H., Matsuda Y., Ohno N.

Materials Science and Engineering A Vol. 140 ( C ) page： 569 - 575 1991.7

Authorship：Last author Language：English Publishing type：Research paper (scientific journal) Publisher：Materials Science and Engineering A

A new plasma-enhanced chemical vapour deposition (PECVD) method has been developed for preparation of large-area uniform hydrogenated amorphous silicon (aSi:H) thin films. Detailed two-dimensional profiles of both charged particles and radical particles have been measured in magnetized multielectrode glow discharge plasmas in 10% SiH4Ar gas. The detailed profiles of SiH* and Ar I emissions had two peaks in the negative glow and cathode sheath regions but, for Hα emission, only one peak was observed in the cathode sheath region. It was verified that large-area uniform profiles of not only plasmas but also SiH* emission could be realized in the presence of modulated crossed magnetic and electric fields. By using this scanning plasma method (SPM), inhomogeneities for both profiles of plasma and SiH* (413.5 nm) emission intensity have improved to less than 2.5% near the substrate outside the discharge region. The thickness profile of prepared a-Si:H thin film has also been unified to less than 4.8% by SPM. © 1991.

DOI： 10.1016/0921-5093(91)90480-B

Scopus

INSTABILITIES ASSOCIATED WITH A NEGATIVE RF RESISTANCE IN CURRENT-CARRYING ION SHEATHS Reviewed International journal

OHNO N, KOMORI A, TANAKA M, KAWAI Y

PHYSICS OF FLUIDS B-PLASMA PHYSICS Vol. 3 ( 1 ) page： 228 - 235 1991.1

短ギャップ同軸型マイクロ波放電の放電開始条件に及ぼす磁界の影響 Reviewed

重水哲郎、大野哲靖、藤山寛

電気学会論文誌A Vol. 111 ( 8 ) page： 727-732 1991

Instabilities associated with a negative of resistance in current-Carrying ion sheaths Reviewed

N.Ohno, A.Komori, M.Tanaka, Y.Kawai

Physics of Fluids Vol. B3 ( 1 ) page： 228-235 1991

Characteristics of ECR Plasmas for Weakly resonant conditions Reviewed

M.Saigoh, N.Ohno, H.Fujiyama

Material Science and Engineering Vol. A139 page： 307-311 1991

ボックスカー撮像法によるプラズマ中磁力線構造可視化システム

櫻井真治、大野哲靖、高村秀一

第6回産業における画像センシング技術シンポジウム講演論文集 page： 177-182 1991

Averaging Effect of Radical Profile by the Scanning Plasma Method in S : H₄-Ar Plasma Reviewed

H.Kawasaki, N.Ohno, Y.Matsuda, H.Fujiyama

Material Science and Engineering Vol. A140 page： 569-575 1991

Development of Coaxial ECR Plasma Source for tube inner coating Reviewed

T.Shigemizu, N.Ohno, H.Fujiyama

Material Science and Engineering Vol. A139 page： 312-318 1991

Effect of Magnetic Field on Gaseous Breakdown Conditions of Narrow-Gap Coaxial-type Microwave Discharge Reviewed

Shigemizu Tetsuro, Ohno Noriyasu, Fujiyama Hiroshi

IEEJ Transactions on Fundamentals and Materials Vol. 111 ( 8 ) page： 727 - 732 1991

Language：Japanese Publishing type：Research paper (scientific journal) Publisher：The Institute of Electrical Engineers of Japan

The gaseous breakdown conditions by the microwave field were theoretically and experimentally investigated in the presence of an external crossed magnetic field. We developed the calculating method by taking account of collisions between electrons and neutral gases, and electron losses to a boundary in the magnetic field to be able to calculate the breakdown voltages in a low gas pressure range from 1×10<sup>-4</sup> to 1×10<sup>-2</sup>Torr. These calculated results are in good agreement with experimental ones. In the narrow-gap less than the wavelength of the microwave, both the magnetic field and the electron loss to the boundary play an important role for the breakdown condition. Coaxial-type electron cyclotron resonance (ECR) plasmas can be generated in a metal coaxial tube with a gap length of 4.5mm gap.

DOI： 10.1541/ieejfms1990.111.8_727

Chaotic Behavior of Current -Carrying Plasmas in External Periodic Oscillations Reviewed

N.Ohno, A.Komori, M.Tanaka, Y.Kawai

Journal of Physical Society of Japan Vol. 58 ( 1 ) page： 28-31 1989

Instatbilities Associated with Chaotic Behavior in a Current-Carrying Plasma

A.Komori, N.Ohno, M.Tanaka, Y.Kawai

Proc. of 1989 International Conference on Plasma Physics, New Delhi, India page： 801-804 1989

Chaotic Behavior due to Wave-Wave Interaction in a Modulated Ion Beam-Plasma System

K.Araki, M.Saigoh, N.Ohno, H.Fujiyama, M.Nambu, H.Honjo

Proc. of 1989 International Conference on Plasma Physics, New Delhi, India page： 789-793 1989

イオンビームプラズマ系におけるサブハーモニックスの励起機構の研究

大野哲靖、粕谷俊郎、田中雅慶、小森彰夫、河合良信

九州大学総合理工学研究科報告 Vol. 9 ( 1 ) 1987

Observation of Subharmonic Waves in an Ion Beam-Plasma System

N.Ohno, T.Kasuya, A.Komori, Y.Kawai

Proc. of International Conference on Phenomena in Ionized Gases, Swansea, England, 1987 page： 270-271 1987

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Papers - OHNO, Noriyasu