Presentations -
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化学反応支援マグネトロンスパッタリングによる微結晶シリコン成膜とそのプラズマ診断
深谷康太, 佐々木浩一, 高軍思, 田畑彰守, 豊田浩孝, 岩田聡, 菅井秀郎
第24 回プラズマプロセシング研究会
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Influence of gas-pressure on low-temperature preparation and film properties of nanocrystalline 3C-SiC thin films by HW-CVD using SiH4/CH4/H2 system International conference
4th International Conference on Hot-Wire CVD (Cat-CVD) process
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Structural Change of Hot-Wire CVD Silicon Carbide Thin Films by Gas Flow Rates International conference
4th International Conference on Hot-Wire CVD (Cat-CVD) process
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Hydrogenated microcrystalline silicon films by hot wire chemical vapor deposition with very high hydrogen dilution and two-step deposition International conference
4th International Conference on Hot-Wire CVD (Cat-CVD) process
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Cat-CVD法によるナノ結晶SiC薄膜作成時のガス圧力の与える影響
香村勇介、田畑彰守、成田知岐、近藤明弘
第3回Cat-CVD研究会
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Preparation of B-doped microcrystalline silicon thin films by RF magnetron sputtering International conference
3rd World Conference on Photovoltaic Energy Conversion
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Influences of filament temperature on the structure and optical properties of nanocrystalline silicon carbide films by hot-wire CVD. International conference
3rd World Conference on Photovoltaic Energy Conversion
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Highly photoconductive hydrogenated amorphous silicon carbide thin films prepared by hot-wire chemical vapor deposition International conference
21st International Conference on Amorphous and Nanocrystalline Semiconductors
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Effect of hot-wire passivation on film properties of hydrogenated microcrystalline silicon films International conference
21st International Conference on Amorphous and Nanocrystalline Semiconductors
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Nanocrystalline cubic silicon carbide prepared by hot-wire chemical vapor deposition using SiH4/CH4/H2 at a low substrate temperature International conference
21st International Conference on Amorphous and Nanocrystalline Semiconductors
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CH4を炭素源に用いたCat-CVD法によるナノ結晶SiC薄膜の作成
香村勇介、田畑彰守、成田知岐、近藤明弘、水谷照吉
第2回Cat-CVD研究会
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Properties of hydrogenated amorphous silicon carbide films prepared at various hydrogen gas flow rates by hot-wire chemical vapor deposition
3rd International Conference on Hot-Wire CVD (Cat-CVD) process
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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor deposition International conference
3rd International Conference on Hot-Wire CVD (Cat-CVD) process
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メタンを炭素源として用いたHW-CVD法によるワイドバンドギャップ炭化シリコン薄膜の作成
田畑彰守、水谷照吉
第1回Cat-CVD研究会
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Preparation of microcrystalline silicon by DC-RF coupled magnetron sputtering
20th International Conference on Amorphous and Microcrystalline Semiconductors
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Band-gap control of hydrogenated amorphous silicon carbide films prepared by hot-wire chemical vapor deposition
20th International Conference on Amorphous and Microcrystalline Semiconductors
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Structure of amorphous and microcrystalline silicon films prepared at various gas pressure by hot-wire chemical vapor deposition
20th International Conference on Amorphous and Microcrystalline Semiconductors
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Dependence on gas pressure of μc-Si:H prepared by RF magnetron sputtering International conference
7th International Symposium on Sputtering and Plasma Processes
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Effect of total gas pressure on hydrogenated amorphous silicon carbide films by hot-wire CVD International conference
3rd World Conference on Photovoltaic Energy Conversion, 13th PV Science and Engineering Conference, 30th IEEE PV Specialists Conference, 18th European PV Solar Energy Conference
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電力需要および日射量の実績からみた太陽光発電システムのｋＷ価値
加藤丈佳, 長江宣久, 田畑彰守, 横水康伸, 岡本達生, 鈴置保雄
電気学会論文誌B