論文 - 堤 隆嘉
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Real-time control of a wafer temperature for uniform plasma process
T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori
2018 International Symposium on Semiconductor Manufacturing 2019年2月
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Nguyen, TTN; Sasaki, M; Odaka, H; Tsutsumi, T; Ishikawa, K; Hori, M
JOURNAL OF APPLIED PHYSICS 125 巻 ( 6 ) 頁: 063304 - 063304 2019年2月
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Liquid dynamics in response to an impinging low-temperature plasma jet
Brubaker, TR; Ishikawa, K; Kondo, H; Tsutsumi, T; Hashizume, H; Tanaka, H; Knecht, SD; Bilén, SG; Hori, M
JOURNAL OF PHYSICS D-APPLIED PHYSICS 52 巻 ( 7 ) 2019年2月
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Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition 査読有り
Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori
Japanese Journal of Applied Physics 58 巻 ( 3 ) 頁: 030912 2019年2月
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Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries 査読有り
Ranjit R. Borude, Hirotsugu Sugiura, Kenji Ishikawa, Takayoshi Tsutsumi, Hiroki Kondo, Nobuyuki Ikarashi, Masaru Hori
ACS Appplied Nano Materials 2 巻 ( 2 ) 頁: 649-654 2019年2月
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Ichikawa, T; Tanaka, S; Kondo, H; Ishikawa, K; Tsutsumi, T; Sekine, M; Hori, M
APPLIED PHYSICS EXPRESS 12 巻 ( 2 ) 2019年2月
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Fukunaga, Y; Tsutsumi, T; Kondo, H; Ishikawa, K; Sekine, M; Hori, M
JAPANESE JOURNAL OF APPLIED PHYSICS 58 巻 ( 2 ) 2019年2月
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Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma 査読有り
Borude Ranjit R., Sugiura Hirotsugu, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Han Jeon Geon, Hori Masaru
JAPANESE JOURNAL OF APPLIED PHYSICS 58 巻 ( SA ) 2019年2月
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Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition 査読有り
H. Sugiura, H. Kondo, T. Tsutsumi, K. Ishikawa, M. Hori
C 5 巻 ( 1 ) 頁: 8 2019年1月
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Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition 査読有り
Masakazu Tomatsu , Mineo Hiramatsu, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori
C 5 巻 ( 1 ) 頁: 7 2019年1月
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Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas 査読有り
Yan Zhang, Kenji Ishikawa, Miran Mozetič, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, Masaru Hori
Plasma Processes and Polymers 2019年1月
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Imai, S; Kondo, H; Hyungjun, C; Ishikawa, K; Tsutsumi, T; Sekine, M; Hiramatsu, M; Hori, M
APPLIED PHYSICS EXPRESS 12 巻 ( 1 ) 2019年1月
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Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching 査読有り
Zhang Yan, Imamura Masato, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru
JAPANESE JOURNAL OF APPLIED PHYSICS 57 巻 ( 10 ) 2018年10月
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Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma 査読有り
Zecheng Liu, Kenji Ishikawa, Masato Imamura, Takayoshi Tsutsumi, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori
Japanese Journal of Applied Physics 57 巻 ( 6 ) 2018年6月
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Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition 査読有り
Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori
Japanese Journal of Applied Physics 57 巻 ( 6 ) 2018年6月
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Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons 査読有り
Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori
Japanese Journal of Applied Physics 57 巻 ( 2 ) 2018年2月
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Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol 査読有り
Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori
Applied Physics Express 11 巻 ( 1 ) 2018年1月
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Real-time control of a wafer temperature for uniform plasma process
Tsutsumi, T; Fuknaga, Y; Ishikawa, K; Kondo, H; Sekine, M; Hori, M
2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM) 頁: . 2018年
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Measurement of F-, O- and CF3- densities in 60 and 100 MHz asymmetric capacitively coupled plasma discharge produced in an Ar/O2/C4F8 gas mixture 査読有り
N. Sirse, T. Tsutsumi, M. Sekine, M. Hori, A. R. Ellingboe
Journal of Physics D: Applied Physics 50 巻 ( 33 ) 頁: 335205 2017年7月
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Temperature dependence of protection layer formation on organic trench sidewall in H2/N2 plasma etching with control of substrate temperature 査読有り
Y. Fukunaga, T. Tsutsumi, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori
Japanese Journal of Applied Physics 56 巻 ( 7 ) 頁: 076202 2017年6月