Papers - TABATA, Akimori
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Preparation of nanocrystalline silicon carbide thin films by hot-wire CVD at various filament-to-substrate distances Reviewed
A. Tabata, Y. Komura
Surf. Coat. Technol. Vol. 201 page： 8986-8990 2007
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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor deposition Reviewed
T. Daimaru, A. Tabata, T. Mizutani
Thin Solid Films Vol. 501 ( 1-2 ) page： 102-106 2006
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Effect of hot-wire passivation on film properties of hydrogenated microcrystalline silicon films Reviewed
S. Mitsuhashi, A. Tabata, T. Mizutani
J. Non-Cryst. Solids Vol. 352 page： 2943-2946 2006
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Nanocrystalline cubic silicon carbide prepared by hot-wire chemical vapor deposition using SiH4/CH4/H2 at a low substrate temperature Reviewed
Y. Komura, A. Tabata, T. Narita, A. Kondo, T. Mizutani
J. Non-Cryst. Solids Vol. 352 page： 1367-1370 2006
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Properties of hydrogenated amorphous silicon carbide films prepared at various hydrogen gas flow rates by hot-wire chemical vapor deposition Reviewed
M. Mori, A. Tabata, T. Mizutani
Thin Solid Film Vol. 501 ( 1-2 ) page： 177-180 2006
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Influence of target direct current bias voltage on the film structure of hydrogenated microcrystalline silicon prepared by direct-current- radiofrequency coupled magnetron sputtering Reviewed
K. Fukaya, A. Tabata, T. Mizutani
Thin Solid Films Vol. 478 ( 1-2 ) page： 132-136 2005
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Control of crystallinity and deposition rate of hydrogenated silicon thin films prepared by radio frequency magnetron sputtering using layer-by layer growth Reviewed
A. Tabata, K. Okada, T. Mizutani, Y. Suzuoki
Thin Solid Film Vol. 491 ( 1-2 ) page： 148-152 2005
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Band-gap control of hydrogenated amorphous silicon carbide films prepared by hot-wire chemical vapor deposition Reviewed
A. Tabata, M. Kuroda, M. Mori, T. Mizutani, Y. Suzuoki
Journal of Non-Crystalline Solids Vol. 338-340 page： 521-524 2004
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Properties of hydrogenated amorphous silicon carbide films prepared at various hydrogen gas flow rates by hot-wire chemical vapor deposition
M. Mori, A. Tabata, T. Mizutani
3rd International Conference on Hot-Wire CVD (Cat-CVD) process page： 393-395 2004
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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor deposition
T. Daimaru, A. Tabata, T. Mizutani
3rd International Conference on Hot-Wire CVD (Cat-CVD) process page： 389-392 2004
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Dependence on gas pressure of μc-Si:H prepared by RF magnetron sputtering Reviewed
K. Fukaya, A. Tabata, T. Mizutani
Vacuum Vol. 74 ( 3-4 ) page： 561-565 2004
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日射量の多地点同時観測結果に基づくＰＶシステム出力変動のＬＦＣへの影響評価 Reviewed
柳川茂幸, 加藤丈佳, 田畑彰守, 鈴置保雄
電気学会論文誌Ｂ Vol. 123 ( 12 ) page： 1504-1511 2003
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Effect of total gas pressure on hydrogenated amorphous silicon carbide films by hot-wire CVD
A. Tabata, T. Nakajima, T. Mizutani, Y. Suzuoki
3rd World Conference on Photovoltaic Energy Conversion, 13th PV Science and Engineering Conference, 30th IEEE PV Specialists Conference, 18th European PV Solar Energy Conference 2003
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Dependence on gas pressure of μc-Si:H prepared by RF magnetron sputtering
7th International Symposium on Sputtering and Plasma Processes page： 43-46 2003
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Structure of amorphous and microcrystalline silicon films prepared at various gas pressure by hot-wire chemical vapor deposition
T. Daimaru, A. Tabata, T. Mizutani, Y. Suzuoki
20th International Conference on Amorphous and Microcrystalline Semiconductors page： P-Tu-1/9 2003
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Preparation of microcrystalline silicon by DC-RF coupled magnetron sputtering
K. Fukaya, A. Tabata, T. Mizutani
20th International Conference on Amorphous and Microcrystalline Semiconductors page： P-Tu-1/5 2003
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Band-gap control of hydrogenated amorphous silicon carbide films prepared by hot-wire chemical vapor deposition
A. Tabata, M. Kuroda, T. Mizutani, Y. Suzuoki
20th International Conference on Amorphous and Microcrystalline Semiconductors page： P-Th-5/5 2003
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Preparation of wide-gap hydrogenated amorphous silicon carbide thin films by hot-wire chemical vapor deposition at a low tungsten temperature Reviewed
A. Tabata, T. Nakajima, T. Mizutani, Y. Suzuoki
Japanese Journal of Applied Physics Vol. 42 ( 1AB ) page： L10-L12 2003
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Dependence on substrate temperature of the film structure of μc-Si:H prepared by RF magnetron sputtering Reviewed
J. Kondo, A. Tabata, T. Kawamura, T. Mizutani
Vacuum Vol. 66 page： 409-413 2002
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電力需要および日射量の実績からみた太陽光発電システムのｋＷ価値
加藤丈佳, 長江宣久, 田畑彰守, 横水康伸, 岡本達生, 鈴置保雄
電気学会論文誌B Vol. 122-B ( 1-2 ) page： 77-83 2002