担当区分：筆頭著者   掲載種別：研究論文（学術雑誌）   出版者・発行元：IOP Publishing  

We simulate the erosion profiles of a rectangular planar target in the DC magnetron sputtering system. The simulation model assumes time-independent magnetic and electric fields that are not disturbed by the magnetron plasma. The electron trajectories are obtained by integrating partial orbits. The Monte Carlo technique, taking account of the differential cross section, is used to discriminate the ionization collision from the excitation and elastic collisions. Thus we determine the coordinates where an argon ion and an electron appear to indicate the erosion profiles. The calculated 3D erosion profiles are in very good agreement with those of the target actually used. This simulation technique for the sputtering process will be valuable in designing the magnet arrangement of a magnetron sputter target.

DOI： 10.1143/jjap.33.4281

その他リンク： https://iopscience.iop.org/article/10.1143/JJAP.33.4281/pdf